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    • 52. 发明授权
    • Multi-layer chip capacitor
    • 多层片式电容器
    • US07292430B2
    • 2007-11-06
    • US11272877
    • 2005-11-15
    • Byoung Hwa LeeChang Hoon ShimKyong Nam HwangDong Seok ParkSang Soo ParkMin Cheol Park
    • Byoung Hwa LeeChang Hoon ShimKyong Nam HwangDong Seok ParkSang Soo ParkMin Cheol Park
    • H01G4/228
    • H01G4/232H01G4/30
    • A multi-layer chip capacitor includes a capacitor body; first and second internal electrodes alternately arranged therein and separated by dielectric layers, each of the internal electrodes having at least one opening formed at one or more sides thereof; first and second conductive vias passing through the openings and electrically connected to the first and second internal electrodes, respectively; first and second terminal electrodes of opposite polarities formed on one or more side faces of the capacitor body; and first and second lowermost electrode patterns being coplanar, each pattern including a via contact portion and a lead portion extending therefrom. The first and second lowermost electrode patterns are connected to the first and second terminal electrodes, respectively, through the respective lead portions of the lowermost patterns.
    • 多层片式电容器包括电容器体; 第一和第二内部电极交替地布置在其中并由电介质层分离,每个内部电极具有形成在其一侧或多侧的至少一个开口; 第一和第二导电通孔分别穿过开口并电连接到第一和第二内部电极; 形成在电容器主体的一个或多个侧面上的相反极性的第一和第二端子电极; 并且第一和第二最低电极图案是共面的,每个图案包括通孔接触部分和从其延伸的引线部分。 第一和第二最下面的电极图案分别通过最下面图案的相应引线部分连接到第一和第二端子电极。
    • 53. 发明授权
    • Laminated balun transformer
    • 叠层平衡不平衡变压器
    • US07236064B2
    • 2007-06-26
    • US11067872
    • 2005-02-28
    • Byoung Hwa LeeDong Seok ParkMin Cheol ParkSang Soo Park
    • Byoung Hwa LeeDong Seok ParkMin Cheol ParkSang Soo Park
    • H03H7/42H01P5/10
    • H01P5/10
    • The present invention relates a laminated balun transformer with an improved insertion loss characteristic in a pass band. The laminated balun transformer includes a first strip line and a third strip line form one coupler, a second strip line and a fourth strip line form another coupler, and a conductive non-ground electrode formed at an intermediate position between the third strip line and the fourth strip line. The non-ground electrode forms a ground by electromagnetic coupling between the third strip line and the fourth strip line. With the configuration, insertion loss in an operation band is reduced. In addition, by implementing an impedance and an electromagnetic shield using a ground pattern of a mount surface without separately forming an internal ground electrode on the bottom layer of a dielectric block, of ground electrodes formed above and below the first to fourth strip lines for the electromagnetic shield from the outside, the thickness of the laminated balun transformer can be reduced without any deterioration of characteristic of the transformer.
    • 本发明涉及在通带中具有改进的插入损耗特性的层叠平衡不平衡变压器。 所述叠层平衡不平衡转换器包括形成一个耦合器的第一带状线和第三带状线,形成另一个耦合器的第二带状线和第四带状线,以及形成在第三带状线和第三带状线之间的中间位置的导电非接地电极 第四条线。 非接地电极通过第三带状线和第四带状线之间的电磁耦合形成接地。 通过该结构,能够减少操作频带的插入损失。 此外,通过使用安装面的接地图案来实现阻抗和电磁屏蔽,而不在介质块的底层上分开形成内部接地电极,形成在第一至第四条带状线之上和之下的接地电极,用于 电磁屏蔽从外部,层压平衡不平衡变压器的厚度可以减小,而不会导致变压器特性的恶化。
    • 54. 发明申请
    • Method for fabricating semiconductor device having flask type recess gate
    • 具有烧瓶式凹槽的半导体器件的制造方法
    • US20070123014A1
    • 2007-05-31
    • US11496428
    • 2006-08-01
    • Ky-Hyun HanSang-Soo Park
    • Ky-Hyun HanSang-Soo Park
    • H01L21/3205H01L21/4763
    • H01L29/4236H01L29/66621
    • A method for fabricating a semiconductor device having a flask type recess gate includes forming a hard mask pattern on a substrate, etching the substrate to a predetermined depth using the hard mask pattern to form a first recess pattern, forming a passivation layer on sidewalls of the first recess pattern and the hard mask pattern, etching a bottom surface of the first recess pattern exposed by the passivation layer to form a second recess pattern, oxidizing sidewalls of the second recess pattern to form a silicon oxide layer, removing the passivation layer and the silicon oxide layer in sequential order, and forming a gate pattern over an intended recess pattern including the first recess pattern and the second recess pattern.
    • 一种用于制造具有烧瓶式凹槽的半导体器件的方法,包括在衬底上形成硬掩模图案,使用硬掩模图案将衬底蚀刻到预定深度以形成第一凹陷图案,在第二凹陷图案的侧壁上形成钝化层 蚀刻由钝化层暴露的第一凹陷图案的底表面以形成第二凹槽图案,氧化第二凹槽图案的侧壁以形成氧化硅层,去除钝化层和钝化层, 氧化硅层,并且在包括第一凹槽图案和第二凹陷图案的预期凹槽图案上形成栅极图案。