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51. 发明授权

US07368727B2 Atomic level ion source and method of manufacture and operation 有权
标题翻译：原子级离子源及其制造和操作方法
公开(公告)号：US07368727B2
公开(公告)日：2008-05-06
申请号：US10966243
申请日：2004-10-15
申请人： Billy W. Ward
发明人： Billy W. Ward
IPC分类号： H01J37/08
CPC分类号： H01J37/08 , H01J27/26 , H01J2237/0807
摘要： Ion source and method of making and sharpening. The ion source is a single crystal metal conductor having a substantially conical tip portion with substantial rotational symmetry. The tip portion terminates with a tip radius of curvature in the range of 50–100 nanometers. The ion source is made by electrochemical etching so that a conical tip of a selected geometry is formed. The ion source is then sharpened to provide a source of ions from a volume near the size of a single atom. Further, this ion source makes possible a stable and practical light ion microscope which will have higher resolution than existing scanning electron microscopes and scanning metal-ion microscopes.
摘要翻译：离子源和制造和磨削的方法。离子源是单晶金属导体，其具有基本上圆锥形的尖端部分，具有显着的旋转对称性。尖端部分终止于50-100纳米范围内的尖端曲率半径。离子源通过电化学蚀刻制成，从而形成所选几何形状的锥形尖端。然后将离子源锐化以从靠近单个原子的尺寸的体积提供离子源。此外，该离子源使得稳定和实用的光离子显微镜成为可能，其具有比现有扫描电子显微镜和扫描金属离子显微镜更高的分辨率。

52. 发明授权

US4433384A Pattern data handling system for an electron beam exposure system 失效
标题翻译：用于电子束曝光系统的图案数据处理系统
公开(公告)号：US4433384A
公开(公告)日：1984-02-21
申请号：US309156
申请日：1981-10-05
申请人： Donald W. Berrian , Billy W. Ward
发明人： Donald W. Berrian , Billy W. Ward
IPC分类号： H01L21/30 , H01J37/302 , G02B27/00 , H01J37/00
CPC分类号： H01J37/3026
摘要： A pattern data handling system for an electron beam exposure system wherein figure data conversion is performed simultaneously with irradiation of a workpiece, thereby providing high speed operation. Figure data, containing figure descriptions for a stripe area, is subdivided into blocks of segment figure data and is stored in a pattern data memory. Multiple pattern generators, each including a bit map memory, simultaneously convert blocks of segment figure data to bit maps and store the bit maps in their respective bit map memories. The bit maps are transferred out of the bit map memories and through a shift register one at a time to provide continuous beam blanking data. The system is particularly useful for electron beam exposure of reticles which are characterized by little or no repetition of features and by relatively large features.
摘要翻译：一种用于电子束曝光系统的图案数据处理系统，其中图形数据转换与工件的照射同时进行，从而提供高速操作。包含条形区域的图形描述的图形数据被细分成段图形数据块，并存储在图形数据存储器中。每个包括位图存储器的多个图案生成器同时将段图数据块转换为位图，并将位图存储在它们各自的位图存储器中。位图由位图存储器和移位寄存器一次一个地传送，以提供连续的波束消隐数据。该系统对于特征为特征很少或不重复特征以及相对大的特征的电子束曝光特别有用。

53. 发明授权

US4424450A Hybrid moving stage and rastered electron beam lithography system employing approximate correction circuit 失效
标题翻译：混合移动平台和使用近似校正电路的电子束光刻系统
公开(公告)号：US4424450A
公开(公告)日：1984-01-03
申请号：US299681
申请日：1981-09-08
申请人： Billy W. Ward , William D. Wells
发明人： Billy W. Ward , William D. Wells
IPC分类号： H01L21/027 , H01J37/302
CPC分类号： H01J37/302
摘要： A hybrid moving stage and scanning electron beam lithography system employs a circuit to make an approximate correction to the electron optical beam steering element. Correction is accomplished for observed, repetitive distortions. The position of the beam is thereby corrected for various modes of raster scan distortion. Field curvature distortion is corrected by a circuit which employs a term proportional to the square of the value of the scan direction coordinate. Keystone error is corrected by a circuit which employs a term proportional to the value of the coordinate orthogonal to the scan direction.
摘要翻译：混合移动台和扫描电子束光刻系统使用电路对电子光束操纵元件进行近似校正。校正是为观察到的，重复的失真而完成的。从而针对各种光栅扫描失真模式校正光束的位置。场曲率失真由采用与扫描方向坐标值的平方成比例的项的电路来校正。梯形失真是由采用与扫描方向垂直的坐标值成正比的项的电路校正的。

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