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51. 发明专利

JP4870801B2 Gas-liquid separation device and a substrate processing apparatus including the same 有权
公开(公告)号：JP4870801B2
公开(公告)日：2012-02-08
申请号：JP2009208934
申请日：2009-09-10
申请人：セメス株式会社Semes Co., Ltd.
发明人：正善金
IPC分类号： B01D46/10 , H01L21/02

52. 发明专利

JP4768004B2 Brush assembly and substrate cleaning apparatus having the same 有权
公开(公告)号：JP4768004B2
公开(公告)日：2011-09-07
申请号：JP2008262903
申请日：2008-10-09
申请人：セメス株式会社Semes Co., Ltd.
发明人：晟熙李 , 在 ▲ユン▼ 申
IPC分类号： H01L21/304 , B08B1/04

53. 发明专利

JP2010130021A Spin head and apparatus for treating substrate including the same, and method for supporting substrate 有权
标题翻译：用于处理包括其的基板的旋转头和装置以及用于支撑基板的方法
公开(公告)号：JP2010130021A
公开(公告)日：2010-06-10
申请号：JP2009269018
申请日：2009-11-26
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： LEE TAEK-YOUB , BAE JEONG-YONG , KIM CHOON-SIK
IPC分类号： H01L21/683 , H01L21/304
CPC分类号： H01L21/68728 , H01L21/67051 , H01L21/68785
摘要： PROBLEM TO BE SOLVED: To provide: a spin head supporting a substrate and rotating the substrate; an apparatus for treating a substrate having the same; and a method for supporting a substrate. SOLUTION: The spin head includes: a body; a plurality of chuck pins installed on the body and moving between supporting positions where a substrate is supported and waiting positions providing space for loading/unloading the substrate; and a chuck pin moving unit configured to move the chuck pins. The chuck pin moving unit includes a rotation rod coupled with each of the chuck pins, a pivot pin fixing the rotation rod to the body, and a driving member rotating the rotation rod using the pivot pin as a rotation shaft to move the chuck pin from the supporting position to the waiting position. When the body rotates, the rotation rod uses reverse centrifugal force to apply force to the chuck pin in a direction from the waiting position to the supporting position. The plurality of chuck pins include first pins and second pins that alternately chuck a substrate during a process. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供：支撑基板并旋转基板的旋转头; 用于处理具有该装置的基板的装置; 以及支撑基板的方法。解决方案：旋转头包括：身体; 多个卡盘销安装在主体上并在支撑基板的支撑位置之间移动，等待位置提供用于装载/卸载基板的空间; 以及配置成移动所述卡盘销的卡盘销移动单元。卡盘销移动单元包括与每个卡盘销连接的旋转杆，将旋转杆固定到主体的枢轴销，以及使用枢轴作为旋转轴将旋转杆旋转的驱动构件，以使卡盘销从支持位置到等待位置。当主体旋转时，旋转杆使用反向离心力，在从等待位置到支撑位置的方向上向卡盘销施加力。多个卡盘销包括在工艺期间交替地卡住衬底的第一销和第二销。版权所有（C）2010，JPO＆INPIT

54. 发明专利

JP2010114448A Substrate processing apparatus 有权
标题翻译：基板加工设备
公开(公告)号：JP2010114448A
公开(公告)日：2010-05-20
申请号：JP2009253231
申请日：2009-11-04
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： KO YOUNG MIN
IPC分类号： H01L21/027 , B65G49/06 , H01L21/677
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of forming a photoresist film on a substrate without using a substrate transfer robot.
SOLUTION: The substrate processing apparatus includes a coating module 100 which transfers a substrate 2 horizontally and supplies a photoresist composition to the substrate 2 to form a photoresist film on the substrate 2 during transfer of the substrate 2, a baking module 200 which is disposed adjacent to the coating module 100 and heats the substrate 2 to harden the photoresist film during the horizontal transfer of the substrate 2, and a transfer module 300 which is disposed between the coating module 100 and the baking module 200 and delivers the substrate 2 in the direction of transfer of the substrate 2.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在不使用基板传送机器人的情况下在基板上形成光致抗蚀剂膜的基板处理装置。基板处理装置包括：涂覆模块100，其在基板2的转印期间水平地传送基板2并将光致抗蚀剂组合物供给到基板2以在基板2上形成光致抗蚀剂膜;烘烤模块200，被布置成与涂层模块100相邻并且在衬底2的水平传送期间加热衬底2以硬化光致抗蚀剂膜;以及传送模块300，其设置在涂覆模块100和烘焙模块200之间并且传送衬底2 在底物2的转移方向。版权所有（C）2010，JPO＆INPIT

55. 发明专利

JP2009088535A Method and apparatus for cleaning substrate 有权
标题翻译：清洗基板的方法和装置
公开(公告)号：JP2009088535A
公开(公告)日：2009-04-23
申请号：JP2008257351
申请日：2008-10-02
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： LEE SE-WON
IPC分类号： H01L21/3065 , H01L21/302 , H01L21/304
CPC分类号： H01L21/67028 , B08B7/0042
摘要： PROBLEM TO BE SOLVED: To provide a method for cleaning a substrate, with which energy efficiency can be improved and a chamber can be prevented from being damaged with a laser-induced plasma shockwave.
SOLUTION: In a method and an apparatus for cleaning a substrate using a laser beam, an inner chamber is disposed in a step chamber to confine a space in which a laser-induced shockwave is generated. The laser beam is focused on a laser focus positioned in the inner chamber, and thus the laser-induced plasma shockwave is generated around the laser focus. The plasma shockwave is reflected from inner surfaces of the inner chamber and the substrate is irradiated through a lower portion of the inner chamber. As a result, the intensity of the plasma shockwave with which the substrate is irradiated is increased, and thus the contaminants on the substrate may be more effectively removed.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于清洁基板的方法，能够提高能量效率并且可以通过激光诱发的等离子体冲击波来防止室被损坏。解决方案：在使用激光束清洗衬底的方法和装置中，将内室设置在台阶室中以限制产生激光诱发的冲击波的空间。激光束聚焦在位于内腔中的激光焦点上，因此在激光焦点周围产生激光诱导的等离子体冲击波。等离子体冲击波从内室的内表面反射，并且基板通过内室的下部被照射。结果，照射基板的等离子体冲击波的强度增加，从而可以更有效地去除基板上的污染物。版权所有（C）2009，JPO＆INPIT

56. 发明专利

JP2009062271A Apparatus and method for producing carbon nanotubes 有权
标题翻译：用于生产碳纳米管的装置和方法
公开(公告)号：JP2009062271A
公开(公告)日：2009-03-26
申请号：JP2008228253
申请日：2008-09-05
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： JEON JONG-KWAN
IPC分类号： C01B31/02
CPC分类号： B82Y40/00 , B01J4/002 , B01J8/1818 , B01J8/1836 , B82Y30/00 , C01B32/162 , Y10S977/842 , Y10S977/843 , Y10S977/844 , Y10S977/89 , Y10S977/891
摘要： PROBLEM TO BE SOLVED: To provide an apparatus and a method for producing carbon nanotubes which can prevent loss of a metal catalyst due to deposition and improve space utilization when producing the carbon nanotubes by dispersing and suspending particles of the catalyst.
SOLUTION: The apparatus for producing the carbon nanotubes is provided with a reaction chamber and a dispersion plate arranged at the lower bottom of the reaction chamber. The dispersion plate is provided with a plate and a gas guiding portion formed on an edge of the plate, and a catalyst supply hole is formed in the central portion of the plate. The gas guiding portion guides source gas toward above the central portion of the plate and suspends the metal catalyst discharged from the catalyst supply hole in the upward direction in the reaction chamber.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种制造碳纳米管的装置和方法，其可以防止由于沉积而导致的金属催化剂损失，并且通过分散和悬浮催化剂颗粒来制备碳纳米管时可以提高空间利用率。解决方案：用于制造碳纳米管的装置设置有反应室和布置在反应室的下部底部的分散板。分散板设置有形成在板的边缘上的板和气体引导部，并且在板的中心部分形成催化剂供给孔。气体引导部将源气体引导到板的中心部分的上方，并将从催化剂供给孔排出的金属催化剂向上方向悬浮在反应室中。版权所有（C）2009，JPO＆INPIT

57. 发明专利

JP2009060111A Method of developing substrate, and apparatus for performing the same 审中-公开
标题翻译：开发基板的方法和用于实施基板的装置
公开(公告)号：JP2009060111A
公开(公告)日：2009-03-19
申请号：JP2008222103
申请日：2008-08-29
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： OH DOO-YOUNG , RYU IN-CHEOL
IPC分类号： H01L21/027 , G03F7/30
CPC分类号： G03F7/3021 , H01L21/67057 , H01L21/67178
摘要： PROBLEM TO BE SOLVED: To disclose an apparatus for performing a substrate developing process.
SOLUTION: A first washing tank and a second washing tank for washing a developing nozzle can be disposed on both sides opposite to each other of a substrate support section for supporting the substrate. The developing nozzle can move in a horizontal direction from the first washing tank toward the second washing tank and can supply a developing solution onto a top surface of the substrate. After supplying the developing solution, the developing nozzle can be received in the second washing tank, and the developing solution adhered to the developing nozzle can be removed by a washing solution in the second washing tank.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：公开一种用于进行基板显影处理的装置。解决方案：用于洗涤显影喷嘴的第一洗涤槽和第二洗涤槽可以设置在用于支撑基板的基板支撑部分的彼此相对的两侧。显影喷嘴可以从第一洗涤槽朝向第二洗涤槽在水平方向上移动，并且可以将显影溶液供应到基板的顶表面上。在提供显影溶液之后，显影喷嘴可以被容纳在第二洗涤槽中，并且可以通过第二洗涤槽中的洗涤溶液去除附着在显影喷嘴上的显影液。版权所有（C）2009，JPO＆INPIT

58. 发明专利

JP2009055024A Substrate cleaning apparatus and substrate cleaning method 审中-公开
标题翻译：基板清洗装置和基板清洗方法
公开(公告)号：JP2009055024A
公开(公告)日：2009-03-12
申请号：JP2008212396
申请日：2008-08-21
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： AHN YOUNG-KI
IPC分类号： H01L21/304 , B08B3/12 , G02F1/13 , G02F1/1333
CPC分类号： B08B3/12 , B08B7/028 , H01L21/67051
摘要： PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus and a substrate cleaning method, of improved cleaning efficiency of a substrate.
SOLUTION: The substrate cleaning apparatus comprises a stage on which a substrate is loaded, a cleaning liquid supplying part for supplying a cleaning liquid to the substrate, a vibrator which contacts to the substrate by one end, to clean the substrate while transmitting sound waves, and a piezoelectric unit which is provided to the other end part of the vibrator for generating the sound waves, and comprises at least two piezoelectric bodies separated from each other. The sound waves are preferred to be generated from each of the piezoelectric body, and the generated sound waves interfere each other in reinforcing manner (duplex in the same phase) on the surface of one end of the vibrator adjoining the substrate.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种提高基板清洗效率的基板清洗装置和基板清洗方法。解决方案：基板清洁装置包括载置基板的台，用于向基板供给清洗液的清洗液供给部，通过一端与基板接触的振动器，在透射的情况下对基板进行清扫声波，以及设置在振动器的另一端部的压电单元，用于产生声波，并且包括彼此分离的至少两个压电体。优选从每个压电体产生声波，并且所生成的声波在与基板相邻的振动器的一端的表面上以加强方式（相位相同）相互干扰。版权所有（C）2009，JPO＆INPIT

59. 发明专利

JP2009046387A Method and apparatus for synthesizing carbon nanotube 有权
标题翻译：用于合成碳纳米管的方法和装置
公开(公告)号：JP2009046387A
公开(公告)日：2009-03-05
申请号：JP2008212755
申请日：2008-08-21
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： JANK SUK WON , KONG BYUNG-YUN , JEONG CHUNG-HEON
IPC分类号： C01B31/02
CPC分类号： B82Y40/00 , B01J19/088 , B01J2219/0869 , B01J2219/0871 , B01J2219/0875 , B01J2219/0892 , B01J2219/0898 , B82Y30/00 , C01B32/162
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for synthesizing a carbon nanotube. SOLUTION: In the synthesizing method of the carbon nanotube, the inside of a reaction chamber is heated and a catalyst is supplied to the inside of the heated reaction chamber. The catalyst is moved in a first direction in the reaction chamber. A source gas is supplied into the reaction chamber in a second direction opposed to the first direction. The source gas delays the movement of the catalyst in the first direction and is react with the catalyst to synthesize the carbon nanotube. Because the flow of the source gas to the flow of the catalyst delays the falling rate of the catalyst, the source gas is capable of react with the catalyst for a satisfactory long time. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于合成碳纳米管的方法和装置。解决方案：在碳纳米管的合成方法中，加热反应室的内部并向加热的反应室的内部提供催化剂。催化剂在反应室中沿第一方向移动。源气体在与第一方向相反的第二方向上被供应到反应室中。源气体延迟催化剂在第一方向上的移动，并与催化剂反应以合成碳纳米管。因为源气体向催化剂流动的流动延迟了催化剂的下降速率，源气体能够与催化剂反应达到令人满意的长时间。版权所有（C）2009，JPO＆INPIT

60. 发明专利

JP2008311624A Substrate treating equipment 有权
标题翻译：基板处理设备
公开(公告)号：JP2008311624A
公开(公告)日：2008-12-25
申请号：JP2008106549
申请日：2008-04-16
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： OH CHANG SUK
IPC分类号： H01L21/027
CPC分类号： H01L21/67742 , H01L21/67178 , H01L21/6719 , Y10S414/135
摘要： PROBLEM TO BE SOLVED: To provide substrate treating equipment for performing a coating process, a bake process, and a development process for a semiconductor substrate. SOLUTION: A first treating block 100 performs a coating process and a development process. A second treating block is opposed to the first treating block and performs thermal treatment. The first treating block comprises an upper, center, lower unit blocks 110, 150, and 130. The upper and lower unit blocks comprise at least one coating unit for forming a film on a substrate and at least one development unit for developing a photoresist film on the substrate, respectively. The center unit block is arranged detachably between the upper and lower unit blocks and comprises at least one of the coating unit and the development unit. The structure of the center block can be variously changed by the use of a process recipe. This can improve the throughput of the substrate treating equipment. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供用于进行涂覆工艺，烘烤工艺和半导体衬底的显影工艺的衬底处理设备。解决方案：第一处理块100进行涂布处理和显影处理。第二处理块与第一处理块相对并进行热处理。第一处理块包括上部，中心，下部单元块110,150和130.上部和下部单元块包括用于在基板上形成膜的至少一个涂覆单元和用于显影光致抗蚀剂膜的至少一个显影单元分别在基板上。中央单元块可拆卸地布置在上单元块和下单元块之间，并且包括涂覆单元和显影单元中的至少一个。可以通过使用工艺配方来改变中心块的结构。这可以提高基板处理设备的生产量。版权所有（C）2009，JPO＆INPIT

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