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    • 51. 发明申请
    • ENVIRONMENTAL SYSTEM INCLUDING VACCUM SCAVANGE FOR AN IMMERSION LITHOGRAPHY APPARATUS
    • 环境系统,包括用于浸没式光刻设备的真空SCAVANGE
    • WO2004090634A2
    • 2004-10-21
    • PCT/IB2004/002704
    • 2004-03-29
    • NIKON CORPORATIONHAZELTON, Andrew, J.SOGARD, Michael
    • HAZELTON, Andrew, J.SOGARD, Michael
    • G03F
    • G03F7/70875G03F7/2041G03F7/70341G03F7/70775G03F7/70816G03F7/70866G03F7/709
    • An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254) and an immersion fluid system (252). The fluid barrier (254) is positioned near the device (30). The immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). The immersion fluid system (252) collects the immersion fluid (248) that is directly between the fluid barrier (254) and the device (30). The fluid barrier (254) can include a scavenge inlet (286) that is positioned near the device (30), and the immersion fluid system (252) can include a low pressure source (392A) that is in fluid communication with the scavenge inlet (286). The fluid barrier (254) confines any vapor (249) of the immersion fluid (248) and prevents it from perturbing a measurement system (22). Additionally, the environmental system (26) can include a bearing fluid source (290B) that directs a bearing fluid (290C) between the fluid barrier (254) and the device (30) to support the fluid barrier (254) relative to the device (30).
    • 用于控制光学组件(16)和装置(30)之间的间隙(246)中的环境的环境系统(26)包括流体屏障(254)和浸没流体系统(252)。 流体屏障(254)位于装置(30)附近。 浸没流体系统(252)输送填充间隙(246)的浸没流体(248)。 浸没流体系统(252)收集直接在流体屏障(254)和装置(30)之间的浸没流体(248)。 流体屏障(254)可以包括位于装置(30)附近的扫气入口(286),并且浸没流体系统(252)可包括低压源(392A),该低压源与扫气入口 (286)。 流体屏障(254)限制浸没流体(248)的任何蒸气(249)并防止其扰动测量系统(22)。 另外,环境系统(26)可以包括轴承流体源(290B),该轴承流体源引导在流体屏障(254)和装置(30)之间的轴承流体(290C)相对于装置支撑流体屏障(254) (30)。
    • 52. 发明申请
    • APPARATUS AND METHOD FOR MAINTAINING IMMERSION FLUID IN THE GAP UNDER THE PROJECTION LENS DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE
    • 在浸渍机上进行波纹交换时,在投影镜下保留浸润液中的浸润液的装置和方法
    • WO2004090577A2
    • 2004-10-21
    • PCT/IB2004/001259
    • 2004-03-17
    • NIKON CORPORATIONBINNARD, Michael
    • BINNARD, Michael
    • G02B
    • G03F7/70341G03B27/52G03F7/70716G03F7/70725G03F7/70733
    • An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed. The apparatus and method includes an optical assembly (16) configured to project an image onto a work piece (208) and a stage assembly (202) including a work piece table (204) configured to support the work piece (208) adjacent the optical assembly (16). An environmental system (26) is provided to supply and remove an immersion fluid (212) from a gap between the optical assembly (16) and the work piece (208) on the stage assembly (202). After exposure of the work piece (208) is complete, an exchange system (216) removes the work piece (208) and replaces it with a second work piece. An immersion fluid containment system (214) is provided to maintain the immersion liquid (212) in the gap during removal of the first work piece (208) and replacement with the second work piece.
    • 公开了一种用于在光刻机(10)中的工件(208)更换期间将浸没流体(212)保持在与投影透镜(16)相邻的间隙中的装置和方法。 该装置和方法包括:光学组件(16),其被配置成将图像投影到工件(208)和台架组件(202)上,所述工作台组件(202)包括工件台(204),所述工件台被配置为支撑邻近光学 总成(16)。 提供环境系统(26)以从台架组件(202)上的光学组件(16)和工件(208)之间的间隙提供和去除浸没流体(212)。 在完成工件(208)的曝光之后,交换系统(216)移除工件(208)并用第二工件代替它。 提供了浸没液体容纳系统(214),以在移除第一工件(208)期间和第二工件的更换期间将浸没液体(212)保持在间隙中。