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    • 42. 发明申请
    • Interconnects forming method and interconnects forming apparatus
    • 互连形成方法和互连形成装置
    • US20050064702A1
    • 2005-03-24
    • US10896014
    • 2004-07-22
    • Xinming WangDaisuke TakagiAkihiko TashiroYukio FukunagaAkira Fukunaga
    • Xinming WangDaisuke TakagiAkihiko TashiroYukio FukunagaAkira Fukunaga
    • H01L21/3205H01L21/768H01L21/4763
    • H01L21/76849H01L21/76819H01L21/7685Y10S438/976Y10T29/41
    • The present invention provides an interconnects-forming method and an interconnects-forming apparatus which can minimize the lowering of processing accuracy in etching, light exposure or the like processing for the formation of interconnect recesses in the production of multi-level interconnects, can improve the electromigration resistance of interconnects without impairing the electrical properties of the interconnects, and can enhance the reliabilityof the device. The interconnects-formingmethod, including: providing interconnect recesses in an insulating film formed in a surface of a substrate; embedding an interconnect material in the interconnect recesses while forming a metal film of the interconnect material on a surface of the insulating film; removing an extra metal material other than the metal material in the interconnect recesses and flattening the substrate surface, thereby forming interconnects; forming a first protective film of a conductive material selectively on exposed surfaces of the interconnects; forming a second protective film on the surface of the substrate having the thus-formed first protective film; forming an interlevel insulating film on the surface of the substrate having the thus-formed second protective film; and flattening a surface of the interlevel insulating film.
    • 本发明提供一种互连形成方法和互连形成装置,其可以最小化在制造多层互连中形成互连凹槽的蚀刻,曝光等处理中的处理精度的降低, 互连的电迁移电阻,而不损害互连的电性能,并且可以提高器件的可靠性。 所述互连形成方法包括:在形成在基板的表面中的绝缘膜中提供互连凹槽; 在互连凹槽中嵌入互连材料,同时在绝缘膜的表面上形成互连材料的金属膜; 除去互连凹部中的金属材料以外的多余的金属材料,使基板表面变平,从而形成互连件; 在互连的暴露表面上选择性地形成导电材料的第一保护膜; 在具有如此形成的第一保护膜的基板的表面上形成第二保护膜; 在具有如此形成的第二保护膜的基板的表面上形成层间绝缘膜; 并平坦化层间绝缘膜的表面。
    • 43. 发明授权
    • Optical module
    • 光模块
    • US06354747B1
    • 2002-03-12
    • US09219901
    • 1998-12-24
    • Takeshi IrieKazunori KurimaIchiro TonaiToshio MizueDaisuke Takagi
    • Takeshi IrieKazunori KurimaIchiro TonaiToshio MizueDaisuke Takagi
    • G02B636
    • G02B6/4292G02B6/4201
    • The present invention relates to an optical module or the like having a structure which prevents the efficiency in a sleeve securing operation or optical characteristics from deteriorating and improves adhesion durability. In particular, a resin mold portion including an optical device in the optical module according to the present invention is processed into a shape which can directly irradiate the UV-curable resin introduced between the resin mold portion and the sleeve with ultraviolet rays, and a structure for restricting the flow of the resin changing into a flowing state during the sleeve securing operation or a structure for improving the adhesion durability of the sleeve is provided on at least one of the sleeve side and resin mold portion side.
    • 本发明涉及具有防止套筒固定操作或光学特性劣化并提高粘合耐久性的结构的光学模块等。 特别地,将根据本发明的光学组件中的光学装置的树脂模具部分加工成可以用紫外线直接照射引入到树脂模制部分和套筒之间的UV固化树脂的形状, 为了限制在套筒固定操作期间树脂变成流动状态的流动,或者在套筒侧和树脂模制部分侧中的至少一个上提供用于提高套筒的粘合耐久性的结构。