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    • 45. 发明授权
    • Digital PID control apparatus
    • 数字PID控制装置
    • US5745362A
    • 1998-04-28
    • US666089
    • 1996-06-19
    • Kazuo HiroiYoshiyuki Yamamoto
    • Kazuo HiroiYoshiyuki Yamamoto
    • G05B11/36G05B11/42G05B13/02G05B21/02
    • G05B11/42G05B13/024
    • In the digital PID (P:proportional, I:integral, D:derivative) control apparatus of the present invention, in which a deviation is obtained from a controlling amount of an object to be controlled, and a target value, a velocity type PI control operation is carried out on the deviation, a velocity type D control operation is carried out on the deviation or the controlling amount, these velocity type control operation outputs are synthesized, and then converted into a position type manipulation signal, and this signal is supplied to the object to be controlled, the derivation processing unit includes the judgment unit for judging whether K=2.multidot..DELTA.t/(.DELTA.t+2.eta..multidot.TD).ltoreq.1, or K>1 by using a control operation period .DELTA.t, a derivative time TD and a derivative gain 1/.eta., and the operation unit which carries out a lagged derivative operation by a bilinear transfer method when K.ltoreq.1, or carries out an exact derivative operation when K>1.
    • 在本发明的数字PID(P:比例,I:积分,D:微分)控制装置中,从被控制物的控制量和目标值获得偏差,速度型PI 对偏差进行控制操作,对偏差或控制量执行速度类型D控制操作,合成这些速度型控制操作输出,然后转换为位置型操作信号,并且提供该信号 导出处理单元包括用于通过使用控制操作期间DELTA t来判断K = 2×DELTA t /(DELTA t + 2 eta x TD)= 1或K> 1的判断单元, 衍生时间TD和微分增益1 / eta,以及当K <1时通过双线性传递方法执行滞后导数运算的操作单元,或当K> 1时执行精确导数运算。
    • 47. 发明授权
    • Method of manufacturing GaN-based film
    • 制造GaN基膜的方法
    • US08697564B2
    • 2014-04-15
    • US13283963
    • 2011-10-28
    • Shinsuke FujiwaraKoji UematsuYoshiyuki YamamotoIssei Satoh
    • Shinsuke FujiwaraKoji UematsuYoshiyuki YamamotoIssei Satoh
    • H01L21/28H01L21/3205
    • C30B29/406C30B25/02H01L33/007H01L33/0079
    • A method of manufacturing a GaN-based film includes the steps of preparing a composite substrate, the composite substrate including a support substrate in which a coefficient of thermal expansion in its main surface is more than 0.8 time and less than 1.0 time as high as a coefficient of thermal expansion of GaN crystal in a direction of a axis and a single crystal film arranged on a main surface side of the support substrate, the single crystal film having threefold symmetry with respect to an axis perpendicular to a main surface of the single crystal film, and forming a GaN-based film on the main surface of the single crystal film in the composite substrate, the single crystal film in the composite substrate being an SiC film. Thus, a method of manufacturing a GaN-based film capable of manufacturing a GaN-based film having a large main surface area and less warpage without crack being produced in a substrate is provided.
    • 制造GaN基膜的方法包括以下步骤:制备复合基板,该复合基板包括其主表面的热膨胀系数大于0.8倍且小于1.0倍的支撑基板 GaN晶体沿着轴方向的热膨胀系数和布置在支撑基板的主表面侧的单晶膜,单晶膜相对于垂直于单晶主表面的轴线具有三重对称性 并且在复合衬底中的单晶膜的主表面上形成GaN基膜,复合衬底中的单晶膜是SiC膜。 因此,提供了一种制造能够制造基板上具有大的主表面积和较少翘曲的GaN基膜的GaN基膜的方法。