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    • 41. 发明授权
    • Quantum device utilizing the quantum effect
    • 使用量子效应的量子器件
    • US5444267A
    • 1995-08-22
    • US331270
    • 1994-10-28
    • Kenji OkadaKiyoshi MorimotoMasaharu UdagawaKoichiro YukiMasaaki NiwaYoshihiko HiraiJuro Yasui
    • Kenji OkadaKiyoshi MorimotoMasaharu UdagawaKoichiro YukiMasaaki NiwaYoshihiko HiraiJuro Yasui
    • H01L29/06H01L21/334H01L29/10H01L29/68H01L29/772H01L29/88H01L29/161
    • B82Y10/00B82Y30/00H01L29/1037H01L29/66931H01L29/772H01L29/882Y10S438/911Y10S438/962
    • A quantum device including a plate-like conductor part having a necking portion made by forming a first mask layer having a first strip portion on a conductor substrate; forming a second mask layer having a second strip portion on the conductor substrate; etching a region of the conductor substrate which is not covered with the first and second mask layers, by using the first and second mask layers as an etching mask, to form a plurality of first recess portions on a surface of the conductor substrate; selectively covering side faces of the plurality of first recess portions, and side faces of the first and second mask layers with a side wall film; selectively removing only the second mask layer; etching another region of the conductor substrate which is not covered with the first mask layer and the side wall film, by using the first mask layer and the side wall film as an etching mask, to form a plurality of second recess portions on the surface of the conductor substrate; selectively removing part of another region of the surface of the conductor substrate which is not covered with the first mask layer and the side wall film; and removing the first mask layer and the side wall film, to form the plate-like conductor part having the necking portion.
    • 公开了一种包括具有颈缩部的板状导体部的量子装置及其制造方法。 该方法包括以下步骤:在导体基板上形成具有第一条带部分的第一掩模层; 在所述导体基板上形成具有第二条带部分的第二层; 通过使用第一和第二掩模层作为蚀刻掩模蚀刻未被第一和第二掩模层覆盖的导体基板的区域,以在导体基板的表面上形成多个第一凹部; 选择性地覆盖所述多个第一凹部的侧面,所述第一和第二掩模层的侧面具有侧壁膜; 选择性地除去第二掩模层,第一掩模层和侧壁膜被去除; 通过使用第一掩模层和侧壁膜作为蚀刻来蚀刻未被第一掩模层和侧壁膜覆盖的导体基板的另一区域,以在第一掩模层和侧壁膜的表面上形成多个第二凹部 基体; 选择性地去除未被第一掩模层和侧壁膜覆盖的导体基板的表面的另一区域的一部分; 并且去除第一掩模层和侧壁膜,以在导体基板上形成具有颈缩部分的板状导体部分。
    • 44. 发明申请
    • PHOTO- IMPRINTING PROCESS, MOLD-DUPLICATING PROCESS, AND MOLD REPLICA
    • 照相印刷工艺,模具复印工艺和模具印刷
    • US20110076353A1
    • 2011-03-31
    • US12920519
    • 2009-02-13
    • Masamitsu ShiraiYoshihiko Hirai
    • Masamitsu ShiraiYoshihiko Hirai
    • B29C59/02B29C59/16
    • B29C59/022B29C33/3857B29C33/3878B29C33/40B29C35/0888B29C37/0053B82Y10/00B82Y40/00G03F7/0002
    • Provided are processes such as a photo-imprinting process having high productivity without causing defacement of an expensive mold. In the photo-imprinting process of the invention, a pattern is transferred to a resin layer 2 by forming the resin layer 2 by applying a rework type photocrosslinking/curing resin to a substrate 1, pressing a mold 3 to the resin layer 2, irradiating the resin layer 2 with light having a first wavelength, and detaching the mold 3 from the resin layer 2. The rework type photocrosslinking/curing resin crosslinks/cures by irradiation with light having the first wavelength and is solubilized in a solvent by irradiation with light having a second wavelength shorter than the first wavelength or by heating. Therefore, even if grooves of the mold 3 are obstructed with the crosslinked/cured resin, the crosslinked/cured resin can be easily removed by resolubilizing it by, for example, irradiating the mold 3 with light having the second wavelength.
    • 提供了诸如光印记过程的工艺,其具有高生产率而不会引起昂贵的模具的污损。 在本发明的光刻工序中,通过在基板1上涂布返工型光交联/固化树脂,将模具3压在树脂层2上,形成树脂层2,将图案转印到树脂层2上 具有第一波长的光的树脂层2,并且将模具3从树脂层2分离。返修型光交联/固化树脂通过用具有第一波长的光照射而交联/固化,并通过照射被溶解在溶剂中 具有比第一波长短的第二波长或通过加热。 因此,即使模具3的沟槽被交联/固化树脂阻塞,也可以通过例如用具有第二波长的光照射模具3使其重新溶解来容易地除去交联/固化树脂。
    • 49. 发明授权
    • Active matrix liquid crystal display panel
    • 有源矩阵液晶显示面板
    • US06965419B2
    • 2005-11-15
    • US10879209
    • 2004-06-30
    • Shinichi NishidaTeruaki SuzukiMasayoshi SuzukiMakoto WatanabeEriko FujimakiYoshihiko Hirai
    • Shinichi NishidaTeruaki SuzukiMasayoshi SuzukiMakoto WatanabeEriko FujimakiYoshihiko Hirai
    • G02F1/1333G02F1/1335G02F1/13363G02F1/1343
    • G02F1/13363G02F1/133371G02F1/133632G02F1/134363G02F2413/02G02F2413/10G02F2413/105
    • An active matrix liquid crystal display panel by which a good display characteristic can be obtained without suffering from gradation reversal over a wide visibility angle range. A liquid crystal layer 4 is formed such that the thickness thereof varies in accordance with transmission wavelengths of color layers 6, 7 and 8 so that a very good display which does not exhibit any coloring in whichever direction it is viewed may be obtained.An active matrix substrate A includes a plurality of opposing electrodes 2, a plurality of pixel electrodes 3 parallel to the opposing electrodes 2, a thin film transistor, and an orientation film 23 all formed on a glass substrate 10. A color filter substrate C includes an orientation film 56 provided on one surface of another glass substrate 10 and an optical compensation layer 35 provided on the other surface of the glass substrate 10 and formed from a plastic film. The two substrates are disposed such that the orientation films thereof oppose each other, and polarization plates 34 and 5 are disposed on the outer sides of the two substrates, and a liquid crystal layer 4 having a positive refractive index anisotropy is provided between the orientation films 23. The optical compensation layer 35 has a negative one axial refractive index anisotropy and can cancel a retardation produced in the liquid crystal layer 4 thereby to suppress white floating of a black display portion.
    • 一种有源矩阵液晶显示面板,通过该有源矩阵液晶显示面板可以获得良好的显示特性,而不会在宽的可见度范围内遭受灰度反转。 形成液晶层4,使得其厚度根据着色层6,7和8的透射波长而变化,从而可以获得在观看方向上不显示任何着色的非常好的显示。 有源矩阵基板A包括多个相对电极2,平行于相对电极2的多个像素电极3,薄膜晶体管和全部形成在玻璃基板10上的取向膜23。 滤色器基板C包括设置在另一个玻璃基板10的一个表面上的取向膜56和设置在玻璃基板10的另一个表面上并由塑料膜形成的光学补偿层35。 两个基板被布置成使得其取向膜相对,并且偏振板34和5设置在两个基板的外侧上,并且在取向膜之间设置具有正折射率各向异性的液晶层4 23。 光学补偿层35具有负的一个轴向折射率各向异性,并且可以抵消在液晶层4中产生的延迟,从而抑制黑色显示部分的白色浮动。