会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 50. 发明授权
    • Magnetoresistive effect element and magnetic memory having the same
    • 磁阻效应元件和具有相同的磁存储器
    • US06826078B2
    • 2004-11-30
    • US10395073
    • 2003-03-25
    • Katsuya NishiyamaYoshiaki SaitoMinoru Amano
    • Katsuya NishiyamaYoshiaki SaitoMinoru Amano
    • G11C1100
    • H01L43/10B82Y25/00G11C11/16H01F10/3254H01F10/3268H01F10/3272H01L27/224H01L27/228Y10T428/1114
    • There are provided a magnetoresistive effect element, which has a large MR ratio, excellent thermostability and a small switching magnetic field even if its size is decreased, and a magnetic memory using the magnetoresistive effect element. The magnetoresistive effect element includes: a storage layer formed by stacking a plurality of ferromagnetic layers via non-magnetic layers; a magnetic film having at least one ferromagnetic layer; and a tunnel barrier layer provided between the storage layer and the magnetic film. Each of the ferromagnetic layers of the storage layer is formed of an Ni—Fe—Co ternary alloy which has a composition selected from one of a composition region surrounded by a straight line of Co90(at %)Fe10(at %)—Fe30(at %)Ni70(at %), a straight line of Fe80(at %)Ni20(at %)—Fe30(at %)Ni70(at %) and a straight line of Fe80(at %)Ni20(at %)—Co65(at %)Ni35(at %), and a composition region surrounded by a straight line of Fe80(at %)Ni20(at %)—Co65(at %)Ni35(at %), a straight line of Co90(at %)Fe10(at %)—Fe70(at %)Ni30(at %) and a straight line of Co90(at %)Fe10(at %)—Fe30(at %)Ni70(at %). A maximum surface roughness on each of an interface between the storage layer and the tunnel barrier layer and an interface between the magnetic film and the tunnel barrier layer is 0.4 nm or less.
    • 提供了磁阻效应元件,即使其尺寸减小,也具有大的MR比,优异的热稳定性和小的开关磁场,以及使用磁阻效应元件的磁存储器。 磁阻效应元件包括:通过非磁性层堆叠多个铁磁层而形成的存储层; 具有至少一个铁磁层的磁性膜; 以及设置在所述存储层和所述磁性膜之间的隧道势垒层。 存储层的每个铁磁层由Ni-Fe-Co三元合金形成,该Ni-Fe-Co三元合金具有选自由Co90直线(原子%)Fe 10(原子%)-Fe 30(at%)包围的组成区域之一的组成 at%)Ni80(at%),直线Fe80(at%)Ni20(at%)-Fe30(at%)Ni70(at%)和直线Fe80(at%)Ni20(at%) - Co65(at%)Ni35(at%),由Fe80(原子%)Ni20(原子%)的直线包围的组成区域,Co65(原子%)Ni35(原子%),Co90的直线 %)Fe10(at%)-Fe70(at%)Ni30(at%)和Co90(at%)Fe10(at%)-Fe30(at%)Ni70(at%)的直线。 存储层和隧道势垒层之间的界面上的最大表面粗糙度以及磁性膜和隧道势垒层之间的界面的最大表面粗糙度为0.4nm以下。