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41. 发明申请

US20080316454A1 Exposure system 失效
标题翻译：曝光系统
公开(公告)号：US20080316454A1
公开(公告)日：2008-12-25
申请号：US12229501
申请日：2008-08-21
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03B27/42
CPC分类号： G03F7/70791 , G03F7/70383 , G03F7/704
摘要： In the case of an exposure system for substrate bodies which carry a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier which carries the substrate body and has a substrate carrier surface, and an exposure device with an optics unit, the optics unit and the machine frame being movable relative to one another in a first direction and in a second direction, so that the photosensitive coating can be exposed by this relative movement in the first direction and in the second direction, in order to improve said system in such a way that a compact configuration is possible, despite in this case a substrate body with a very large extent in the first and the second direction, it is proposed that the exposure device has a guide cross-member for at least one guide carriage of the exposure device, the guide carriage carrying the optics unit, in that the guide carriage is guided on the guide cross-member to be movable in the first direction, and in that the guide cross-member is arranged on the machine frame to be movable in the second direction.
摘要翻译：在用于在基板表面上承载感光涂层的基板体的曝光系统的情况下，包括机架，承载基板主体并具有基板载体表面的基板载体以及具有光学单元的曝光装置，光学单元和机架可以在第一方向和第二方向上相对于彼此移动，使得感光涂层可以通过在第一方向和第二方向上的这种相对运动而暴露，以便改进所述系统尽管在这种情况下，尽管在第一和第二方向上具有很大程度的衬底主体，但是提出了紧凑的构造，即，曝光装置具有用于至少一个导向架的导向横向构件承载光学单元的导向架，其特征在于，导向架在引导横向构件上被引导以在第一方向上可移动，并且在该t 他的引导横向构件布置在机架上可沿第二方向移动。

42. 发明申请

US20060170893A1 Lithography exposure device 失效
标题翻译：光刻曝光装置
公开(公告)号：US20060170893A1
公开(公告)日：2006-08-03
申请号：US11392970
申请日：2006-03-28
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03B27/52
CPC分类号： G03F7/7005 , G03F7/70383 , G03F7/704
摘要： In order to design a lithography exposure device comprising a mounting device for the layer sensitive to light, an exposure unit comprising several laser radiation sources and an optical focusing means associated with the laser radiation sources, a movement unit for generating a relative movement between the optical focusing means and the mounting device and a control for controlling intensity and position of the exposure spots in such a manner that exposed structures which are as precisely structured as possible can be produced, it is suggested that the optical focusing means have an end lens which generates focal points of the laser radiation exiting from each of the laser radiation sources close to the light-sensitive layer, that a laser radiation field propagate in the direction of the light-sensitive layer for generating each of the exposure spots from the respective focal points and have a power density which leads in the conversion area in the light-sensitive layer to the formation of a channel which penetrates the light-sensitive layer with an index of refraction increased in relation to its surroundings due to the Kerr effect and guides the respective laser radiation field in a spatially limited manner.
摘要翻译：为了设计包括用于对光敏感的层的安装装置的光刻曝光装置，包括若干激光辐射源和与激光辐射源相关联的光学聚焦装置的曝光单元，用于在光学器件之间产生相对运动的移动单元聚焦装置和安装装置以及用于控制曝光点的强度和位置的控制，使得可以产生尽可能精确地构造的暴露结构，使得光学聚焦装置具有产生激光辐射从靠近感光层的每个激光辐射源射出的焦点，激光辐射场沿着感光层的方向传播，用于从各个焦点产生每个曝光点，以及具有在感光层的转换区域中导致格式的功率密度由于克尔效应，折射率相对于其周围环境增加的透射感光层的通道的离子以空间有限的方式引导相应的激光辐射场。

43. 发明申请

US20050083509A1 Apparatus for exposing substrate materials 失效
标题翻译：用于曝光基材的装置
公开(公告)号：US20050083509A1
公开(公告)日：2005-04-21
申请号：US10941308
申请日：2004-09-14
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03F7/20 , G03B27/58
CPC分类号： G03F7/70383 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70766
摘要： The invention relates to a device for exposing substrate materials comprising: at least one optical exposure device, at least one substrate platform; a device for generating a relative displacement between the exposure device and the substrate platform in two transversal directions, whereby the relative displacement in a primary direction occurs with a greater dynamic response than in a secondary direction; at least one primary drive for generating the relative displacement in the primary direction; and at least one secondary drive for generating the relative displacement in the secondary direction. The aim of the invention is to position the substrate platform with the greatest possible accuarcy and the greatest possible dynamic response. To achieve this, the device comprises two substrate platforms that move substantially in opposition to one another in the primary direction.
摘要翻译：本发明涉及一种用于曝光衬底材料的装置，包括：至少一个光学曝光装置，至少一个衬底平台; 用于在两个横向上产生曝光装置和基板平台之间的相对位移的装置，由此在主方向上的相对位移以比在次方向上更大的动态响应发生; 用于产生主要方向上的相对位移的至少一个主驱动器; 以及用于产生次要方向上的相对位移的至少一个次级驱动器。本发明的目的是以最大可能的准确度和尽可能最大的动态响应来定位衬底平台。为了实现这一点，该装置包括在主要方向上基本上彼此相对移动的两个基板平台。

44. 发明授权

US06859261B2 Lithography exposure device 失效
标题翻译：光刻曝光装置
公开(公告)号：US06859261B2
公开(公告)日：2005-02-22
申请号：US10314002
申请日：2002-12-06
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03F7/20 , G03B27/42 , G03B27/52 , G03B27/54
CPC分类号： G03F7/70391 , G03F7/704
摘要： A lithography exposure device for producing exposed structures in a layer sensitive to light includes an exposure unit with a movement unit for the relative movement between the optical focusing element and a mounting device. A controler is provided for controlling intensity and position of the exposure spots, such that a plurality of conversion areas can be produced in the light-sensitive layer via the exposure spots. A controllable deflection device is provided between the laser radiation sources and the optical focusing means for the movement of the exposure spot in the deflection direction.
摘要翻译：用于在对光敏感的层中产生曝光结构的光刻曝光装置包括具有用于光学聚焦元件和安装装置之间的相对移动的移动单元的曝光单元。提供控制器用于控制曝光点的强度和位置，使得可以在感光层中经由曝光点产生多个转换区域。在激光辐射源和光学聚焦装置之间设置可控偏转装置，用于在偏转方向上移动曝光点。

45. 发明授权

US5936993A Laser system 失效
标题翻译：激光系统
公开(公告)号：US5936993A
公开(公告)日：1999-08-10
申请号：US961922
申请日：1997-10-31
申请人： Hans Opower , Rolf Nowack
发明人： Hans Opower , Rolf Nowack
IPC分类号： H01S3/063 , H01S3/081
CPC分类号： H01S3/063 , H01S3/081 , H01S3/005 , H01S3/0602 , H01S3/0813 , H01S3/083 , H01S3/2333 , H01S3/2383
摘要： In order to improve upon a laser system, comprising a laser-active medium which is arranged between mutually opposed waveguide surfaces of an optical waveguide and a resonator which by means of resonator mirrors defines a coherent resonator radiation field permeating the optical waveguide and from which a plurality of mutually coherent radiation fields issue, in such manner that higher laser output power levels can be attained it is proposed that the plurality of radiation fields are conducted as coupled-out radiation fields to a coupling element, and that the coupling element combines the plurality of radiation fields with a defined mutual phase relationship to form one single coherent output radiation field.
摘要翻译：为了改进激光系统，包括布置在光波导的相互相对的波导表面和谐振器之间的激光活性介质，其通过谐振器反射镜限定穿透光波导的相干谐振器辐射场，发出多个相互相干的辐射场，使得能够获得较高的激光输出功率电平的方式，提出将多个辐射场作为耦合的辐射场传导到耦合元件，并且耦合元件组合多个具有确定的相互关系的辐射场形成一个单一的相干输出辐射场。

46. 发明授权

US5373525A Wave guide laser having a resonator mirror with successive reflecting segments and out coupling openings arranged in an azimuthal direction 失效
标题翻译：波导激光器具有谐振镜，其具有沿方位方向排列的连续反射段和耦合开口
公开(公告)号：US5373525A
公开(公告)日：1994-12-13
申请号：US10830
申请日：1993-01-29
申请人： Rolf Nowack , Hans Opower
发明人： Rolf Nowack , Hans Opower
IPC分类号： H01S3/02 , H01S3/03 , H01S3/08
CPC分类号： H01S3/0315
摘要： In order to improve a wave guide laser comprising a wave guide arranged between two resonator mirrors and having an outer cylindrical wave guide surface and an inner cylindrical wave guide surface facing the outer surface and arranged within this outer surface in spaced relation thereto, the two surfaces together forming a wave guide having a radiation coherent in the entire wave guide and essentially expanding in axial direction, and a high-frequency excited and diffusion-cooled laser gas arranged between the wave guide surfaces, such that the high-power Laser beam can be outcoupled by an element which is constructionally simple to produce and inexpensive, it is suggested that the second resonator mirror be composed in azimuthal direction of a plurality of successive reflecting segments, that outcoupling openings for the laser radiation to be outcoupled be provided between the respective reflecting segments and that the entire radiation expanding in the wave guide be diffraction-coupled in azimuthal direction.
摘要翻译：为了改进波导激光器，其包括布置在两个谐振器反射镜之间的波导，并且具有外圆柱形波导表面和面向外表面的内圆柱形波导表面并且以与其隔开的关系布置在该外表面内，一起形成在整个波导中具有辐射相干并且在轴向上基本上扩展的波导，以及布置在波导表面之间的高频激发和扩散冷却的激光气体，使得大功率激光束可以通过构造简单的制造和便宜的元件外耦合，建议将第二谐振镜组成在多个连续的反射段的方位角方向上，用于激光辐射的外耦合开口被提供在各个反射器之间并且波导中扩展的整个辐射是衍射耦合在方位角方向。

47. 发明授权

US5324552A Process for coating substrate material 失效
标题翻译：涂布基材的方法
公开(公告)号：US5324552A
公开(公告)日：1994-06-28
申请号：US958341
申请日：1993-02-11
申请人： Hans Opower , Kurt Koesters , Reinhold Ebner
发明人： Hans Opower , Kurt Koesters , Reinhold Ebner
IPC分类号： C23C14/24 , C23C14/28 , C23C14/56 , B05D3/06
CPC分类号： C23C14/28 , C23C14/246 , C23C14/562
摘要： To provide a process for coating substrate material in which coating material is ablated in an ablation region by a laser beam in a coating chamber containing a negative pressure, propagates in the form of a coating particle stream in the direction of the substrate material and is deposited on it in the form of a coating, with which substrate material can be coated in large quantities by laser ablation, it is proposed that the substrate material be flat material, that the flat material be passed continuously as a continuous strip through the coating chamber and coated under the negative pressure substantially maintained therein, and that the necessary coating material be fed to the coating chamber while the negative pressure is substantially maintained therein.
摘要翻译：为了提供一种涂覆衬底材料的方法，其中涂层材料在消融区域中通过激光束在包含负压的涂布室中烧蚀，在涂覆颗粒流的形式上沿着衬底材料的方向传播并沉积在其上以涂层的形式，通过激光烧蚀可以大量地涂覆基底材料，提出基材是扁平材料，扁平材料作为连续条带连续通过涂覆室，在基本上保持在其中的负压下涂覆，并且必需的涂料被输送到涂布室，同时基本上保持负压。

48. 发明授权

US4646314A High-power laser having an unstable optical resonator 失效
标题翻译：具有不稳定光谐振器的大功率激光器
公开(公告)号：US4646314A
公开(公告)日：1987-02-24
申请号：US848915
申请日：1986-04-07
申请人： Hans Opower
发明人： Hans Opower
IPC分类号： H01S3/081 , H01S3/08
CPC分类号： H01S3/0818
摘要： A high-power laser, especially one with a gaseous excitation medium, having an unstable optical resonator is disclosed. Fully reflecting mirrors, whose planes of curvature are parallel to one another, form the ends of the unstable optical resonator. A third mirror is concavely curved in a plane perpendicular with respect to the other two mirrors. The mirrors have a rectangular cross section and are preferably metallic. The mirrors constituting the ends of the unstable optical resonator form a confocal resonator.
摘要翻译：公开了一种具有不稳定光学谐振器的高功率激光器，特别是具有气体激发介质的激光器。全反射镜，其曲面平行彼此平行，形成不稳定光谐振器的端部。第三个反射镜在相对于其他两个反射镜垂直的平面内凹入弯曲。这些反射镜具有矩形横截面并且优选地是金属的。构成不稳定光谐振器的端部的反射镜形成共焦共振器。

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