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41. 发明授权

US06614619B1 Cartridge library apparatus having an inner door to close an opening of the apparatus body 失效
标题翻译：墨盒库设备具有内门以封闭设备主体的开口
公开(公告)号：US06614619B1
公开(公告)日：2003-09-02
申请号：US09504583
申请日：2000-02-15
申请人： Tsutomu Satoh
发明人： Tsutomu Satoh
IPC分类号： G11B1568
CPC分类号： G11B33/027 , G11B15/68 , G11B17/22
摘要： A cartridge library apparatus comprises door 3 provided openably to an opening portion formed in apparatus body B and having a plurality of cells 4 for housing cartridges in its inner surface, inner door 1 provided movably in the apparatus body for opening and closing the opening portion of apparatus body B, and a motion converting mechanism (2, 5, 6 and 11) for driving the opening and closing of the inner door interlocking with opening and closing operations of the door between inner door 1 and door 3. When the door is pivotally moved in an opening direction, the motion converting mechanism causes the inner door to close the opening portion. When door 3 is pivotally moved in a closing direction, inner door 1 is moved to cause the opening portion to be opened.
摘要翻译：盒式库装置包括可开启地设置在设备主体B中的开口部分的门3，并且具有多个用于在其内表面容纳盒的单元4，内门1可移动地设置在设备主体中，用于打开和关闭装置主体B和用于驱动内门打开和关闭的运动转换机构（2,5,6和11），其与内门1和门3之间的门的打开和关闭操作互锁。当门枢转在打开方向上移动，运动转换机构使内门关闭开口部。当门3沿关闭方向枢转运动时，内门1移动以使开口部分打开。

42. 发明授权

US6093648A Production method for a discrete structure substrate 失效
标题翻译：离散结构基板的制造方法
公开(公告)号：US6093648A
公开(公告)日：2000-07-25
申请号：US114074
申请日：1998-07-13
申请人： Tsutomu Satoh
发明人： Tsutomu Satoh
IPC分类号： H01L21/22 , C30B33/00 , H01L21/304 , H01L21/302
CPC分类号： C30B29/06 , C30B33/00 , Y10S438/918 , Y10S438/923 , Y10S438/977
摘要： The problem to be solved by the present invention is providing a production method capable of adjusting a dislocation density freely to a required dislocation density level for a discrete structure substrate. According to the present invention, when producing a discrete structure substrate generally said to have a low level dislocation density in which an average dislocation density is 5000 pieces/cm.sup.2, diffusing a wafer after determining its thickness so as to meet required dislocation density level, a wafer thickness is adjusted within a specified range before diffusion is carried out.
摘要翻译：本发明要解决的问题是提供一种能够将位错密度自由调整为离散结构基板所需的位错密度水平的制造方法。根据本发明，当制造通常被认为具有平均位错密度为5000个/ cm 2的低水平位错密度的离散结构基板时，在确定其厚度之后扩散晶片以满足所需的位错密度水平，在扩散之前将晶片厚度调整到规定范围内。

43. 发明授权

US6066562A Method for fabricating silicon semiconductor discrete wafer 失效
标题翻译：制造硅半导体分立晶片的方法
公开(公告)号：US6066562A
公开(公告)日：2000-05-23
申请号：US898550
申请日：1997-07-22
申请人： Hisashi Ohshima , Tsutomu Satoh
发明人： Hisashi Ohshima , Tsutomu Satoh
IPC分类号： B24B7/22 , B24B37/04 , B28D5/02 , H01L21/02 , H01L21/304 , H01L21/306 , H01L21/302 , B24B53/00
CPC分类号： H01L21/02013 , B24B37/04 , B24B7/228 , B28D5/028 , H01L21/306
摘要： A method of fabricating a silicon semiconductor discrete wafer is disclosed that assures excellent finishing accuracy and productivity. The method for fabricating a discrete wafer having a double-layer structure including an impurity diffused layer at one side and an impurity non-diffused layer at the opposite side includes cutting a wafer, having one of the impurity diffused layers formed on both surfaces of the silicon semiconductor wafer and having an oxide film formed on the surface of the diffused layer, into two pieces at the center of thickness with an ID saw slicing machine. Then, both surfaces of the cutting surface are ground to a predetermined thickness with a surface grinding machine, and the grinding surfaces are lapped with abrasive grains having a count of at least #2000 and no more than #6000. The processing surface is wet-etched as the final processing.
摘要翻译：公开了一种制造硅半导体分立晶片的方法，其确保优异的精加工精度和生产率。用于制造具有包括一侧的杂质扩散层和相对侧的杂质非扩散层的双层结构的分立晶片的方法包括：切割晶片，其中形成有在两个表面上的杂质扩散层之一硅半导体晶片，并且在扩散层的表面上形成具有ID锯切机的厚度中心的两片。然后，利用表面研磨机将切割面的两面研磨成规定的厚度，研磨表面用至少＃2000且不超过＃6000的磨粒研磨。作为最终处理，将处理表面湿式蚀刻。

44. 发明授权

US5193256A Method of fabricating ink-jet type printer head 失效
标题翻译：制造喷墨打印机头的方法
公开(公告)号：US5193256A
公开(公告)日：1993-03-16
申请号：US907589
申请日：1992-07-02
申请人： Kuniaki Ochiai , Tsutomu Satoh
发明人： Kuniaki Ochiai , Tsutomu Satoh
IPC分类号： B41J2/045 , B41J2/055 , B41J2/14 , B41J2/16
CPC分类号： B41J2/1632 , B41J2/14209 , B41J2/1609 , B41J2/1623 , B41J2/1643 , B41J2202/20 , Y10T29/42 , Y10T29/49401 , Y10T29/49796
摘要： A method of producing an ink-jet type printer head wherein a plurality of plate-shaped piezoelectric members are stuck onto the surface of a low-rigidity member so that they are disposed adjacent to the low-rigidity member. A plurality of grooves extending from the surfaces of the piezoelectric members to the inside of the low-rigidity member are defined by grinding in parallel at given intervals inclusive of positions at which the grooves extend through joints between the adjacent piezoelectric members. In addition, posts are formed on both sides of each of the grooves and electrodes are disposed on both inner sides of each groove. A roof is stuck on the surfaces of the piezoelectric members so as to define a plurality of pressure chambers having one end in which a plurality of nozzles are formed.

45. 发明授权

US5149819A Squarylium compounds and optical information recording medium using the same 失效
标题翻译：方晶化合物和使用其的光学信息记录介质
公开(公告)号：US5149819A
公开(公告)日：1992-09-22
申请号：US694379
申请日：1991-05-01
申请人： Tsutomu Satoh , Ikuo Shimizu , Yukiyoshi Ito
发明人： Tsutomu Satoh , Ikuo Shimizu , Yukiyoshi Ito
IPC分类号： C07D209/12 , C07D491/048 , C09B23/01 , C09B57/00 , G11B7/244
CPC分类号： C09B57/007 , C07D209/12 , C09B23/0091 , G11B7/244
摘要： Squarylium compounds having the following formula (I), ##STR1## and an optical information recording medium comprising a substrate, and a recording layer formed on the substrate, comprising a squarylium compound having formula (II) are disclosed: ##STR2##
摘要翻译：公开了具有下式（I），（IMAGE）（I）的方酸化合物和包含基底的光学信息记录介质和形成在基底上的记录层，其包含具有式（II）的方酸化合物：（二）

46. 发明授权

US5085909A Squarylium compounds and optical information recording medium using the same 失效
标题翻译： SQUARYLIUM化合物和光学信息记录介质使用它
公开(公告)号：US5085909A
公开(公告)日：1992-02-04
申请号：US495715
申请日：1990-03-16
申请人： Tsutomu Satoh , Ikuo Shimizu , Yukiyoshi Ito
发明人： Tsutomu Satoh , Ikuo Shimizu , Yukiyoshi Ito
IPC分类号： B41M5/26 , C07D209/12 , C07D491/048 , C09B23/01 , C09B57/00 , G11B7/24 , G11B7/244
CPC分类号： C09B23/0091 , C07D209/12 , C09B57/007 , G11B7/244 , Y10S428/913 , Y10S430/146 , Y10S430/165
摘要： Squarylium compounds having the following formula (I), ##STR1## and an optical information recording medium comprising a substrate, and a recording layer formed on the substrate, comprising a squarylium compound having formula (II) are disclosed: ##STR2##
摘要翻译：公开了具有下式（I）的方酸化合物，以及包含基材的光学信息记录介质和形成在基材上的记录层，其包含具有式（II）的方酸化合物：（2）

47. 发明授权

US5002812A Optical information recording medium, information recording method and optical information recording system using the medium 失效
标题翻译：光信息记录介质，信息记录方法和使用介质的光信息记录系统
公开(公告)号：US5002812A
公开(公告)日：1991-03-26
申请号：US366141
申请日：1989-06-14
申请人： Masaakira Umehara , Tsutomu Satoh , Hideaki Ohba , Keiko Ichinose
发明人： Masaakira Umehara , Tsutomu Satoh , Hideaki Ohba , Keiko Ichinose
IPC分类号： G11B7/244 , G11B7/246 , G11B7/247 , G11B7/248 , G11B7/249
CPC分类号： G11B7/244 , G11B7/246 , G11B7/247 , G11B7/248 , G11B7/249 , G11B7/2533 , Y10S428/913 , Y10S430/146
摘要： An optical information recording medium comprising a substrate; a recording layer comprising as the main component an organic dye component, formed on the substrate, which recording layer has a maximum peak in the spectroscopic reflectance thereof near the wavelength of the information recording and reproduction light, and has a thickness at which the spectroscopic reflectance thereof is maximized at the wavelength of the information recording and reproduction light, and an optical information recording method, and a system for recording and/or reproducing information using this recording medium are disclosed.
摘要翻译：一种光学信息记录介质，包括基板; 记录层，包括形成在基板上的作为主要成分的有机染料成分，该记录层在信息记录和再现光的波长附近的分光反射率中具有最大峰值，并且具有其光谱反射率在信息记录和再现光的波长处被最大化，并且公开了光信息记录方法以及使用该记录介质来记录和/或再现信息的系统。

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