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41. 发明申请

US20080012061A1 NONVOLATILE SEMICONDUCTOR MEMORY 有权
标题翻译：非易失性半导体存储器
公开(公告)号：US20080012061A1
公开(公告)日：2008-01-17
申请号：US11687758
申请日：2007-03-19
申请人： Masayuki Ichige , Fumitaka Arai , Riichiro Shirota , Toshitake Yaegashi , Yoshio Ozawa , Akihito Yamamoto , Ichiro Mizushima , Yoshihiko Saito
发明人： Masayuki Ichige , Fumitaka Arai , Riichiro Shirota , Toshitake Yaegashi , Yoshio Ozawa , Akihito Yamamoto , Ichiro Mizushima , Yoshihiko Saito
IPC分类号： H01L29/788
CPC分类号： H01L29/42336 , H01L21/28273 , H01L27/0207 , H01L27/115 , H01L27/11521 , H01L27/11524 , H01L29/42324 , H01L29/7881
摘要： A nonvolatile semiconductor memory includes first and second memory cells having a floating gate and a control gate. The floating gate of the first and second memory cells is comprised a first part, and a second part arranged on the first part, and a width of the second part in an extending direction of the control gate is narrower than that of the first part. A first space between the first parts of the first and second memory cells is filled with one kind of an insulator. The control gate is arranged at a second space between the second parts of the first and second memory cells.
摘要翻译：非易失性半导体存储器包括具有浮动栅极和控制栅极的第一和第二存储单元。第一和第二存储单元的浮置栅极包括第一部分和布置在第一部分上的第二部分，并且第二部分在控制栅极的延伸方向上的宽度比第一部分的宽度窄。第一和第二存储单元的第一部分之间的第一空间填充有一种绝缘体。控制栅极被布置在第一和第二存储单元的第二部分之间的第二空间处。

42. 发明授权

US07310270B2 Nonvolatile semiconductor memory device 有权
标题翻译：非易失性半导体存储器件
公开(公告)号：US07310270B2
公开(公告)日：2007-12-18
申请号：US11737154
申请日：2007-04-19
申请人： Tomoharu Tanaka , Hiroshi Nakamura , Ken Takeuchi , Riichiro Shirota , Fumitaka Arai , Susumu Fujimura
发明人： Tomoharu Tanaka , Hiroshi Nakamura , Ken Takeuchi , Riichiro Shirota , Fumitaka Arai , Susumu Fujimura
IPC分类号： G11C16/04
CPC分类号： G11C16/0483 , G11C11/5621 , G11C11/5628 , G11C11/5635 , G11C16/3404 , G11C16/3409 , G11C16/344 , G11C16/3445 , G11C16/345 , G11C16/3454 , G11C16/3459 , G11C16/3463 , G11C2211/5621
摘要： A NAND cell unit includes memory cells which are connected in series. An erase operation is effected on all memory cells. Then, a soft-program voltage, which is opposite in polarity to the erase voltage applied in an erase operation, is applied to all memory cells, thereby setting all memory cells out of an over-erased state. Thereafter, a program voltage of 20V is applied to the control gate of a selected memory cell, 0V is applied to the control gates of the two memory cells provided adjacent to the selected memory cell, and 11V is applied to the control gates of the remaining memory cells. Data is thereby programmed into the selected memory cell. The time for which the program voltage is applied to the selected memory cell is adjusted in accordance with the data to be programmed into the selected memory cell. Hence, data “0” can be correctly programmed into the selected memory cell, multi-value data can be read from any selected memory cell at high speed.
摘要翻译： NAND单元单元包括串联连接的存储单元。对所有存储单元进行擦除操作。然后，将与擦除操作中施加的擦除电压极性相反的软编程电压施加到所有存储单元，从而将所有存储单元设置为过擦除状态。此后，将20V的编程电压施加到所选择的存储单元的控制栅极，将0V施加到与所选择的存储单元相邻设置的两个存储单元的控制栅极，并且将11V施加到其余的控制栅极记忆细胞因此数据被编程到所选择的存储单元中。根据要编程到所选择的存储单元中的数据来调整对所选存储单元施加编程电压的时间。因此，可以将数据“0”正确地编程到所选择的存储单元中，可以从任何选择的存储单元高速读取多值数据。

43. 发明授权

US07122858B2 Nonvolatile semiconductor memory device including improved gate electrode 有权
公开(公告)号：US07122858B2
公开(公告)日：2006-10-17
申请号：US11118478
申请日：2005-05-02
申请人： Fumitaka Arai , Yasuhiko Matsunaga , Makoto Sakuma , Riichiro Shirota , Akira Shimizu
发明人： Fumitaka Arai , Yasuhiko Matsunaga , Makoto Sakuma , Riichiro Shirota , Akira Shimizu
IPC分类号： H01L29/788
CPC分类号： H01L27/115 , G11C16/0483 , G11C16/10 , H01L21/28273 , H01L27/11521 , H01L29/42324 , H01L29/42336 , H01L29/7883
摘要： A floating gate is formed on a semiconductor substrate via a gate insulating film. Diffused layers are formed as sources or drain regions on opposite sides of the floating gate in the semiconductor substrate. First and second control gates are formed opposite to both of the diffused layers on the opposite sides of the floating gate via an inter-gate insulating film to drive the floating gate.

44. 发明授权

US07027329B2 Nonvolatile semiconductor memory and programming method for the same 失效
公开(公告)号：US07027329B2
公开(公告)日：2006-04-11
申请号：US10865937
申请日：2004-06-14
申请人： Makoto Sakuma , Fumitaka Arai , Riichiro Shirota , Yasuhiko Matsunaga
发明人： Makoto Sakuma , Fumitaka Arai , Riichiro Shirota , Yasuhiko Matsunaga
IPC分类号： G11C16/04
CPC分类号： G11C16/10
摘要： A semiconductor memory has a memory cell matrix including a plurality of first and second cell columns alternately arranged along a row-direction, each of cell columns is implemented by a plurality of memory cell transistors, and peripheral circuits configured to drive the memory cell matrix and to read information from the memory cell matrix. The peripheral circuit encompasses (a) a leading program circuit configured to write first data into memory cell transistors in the first cell columns, (b) a lagging program circuit configured to write second data into memory cell transistors in the second cell columns after the first data are written, and (c) a voltage controller configured to control variation of threshold voltages for the memory cell transistors of the first cell columns.

45. 发明申请

US20050190600A1 Nonvolatile semiconductor memory device including improved gate electrode 有权
标题翻译：包括改进的栅电极的非易失性半导体存储器件
公开(公告)号：US20050190600A1
公开(公告)日：2005-09-01
申请号：US11118478
申请日：2005-05-02
申请人： Fumitaka Arai , Yasuhiko Matsunaga , Makoto Sakuma , Riichiro Shirota , Akira Shimizu
发明人： Fumitaka Arai , Yasuhiko Matsunaga , Makoto Sakuma , Riichiro Shirota , Akira Shimizu
IPC分类号： H01L27/115 , H01L21/8247 , H01L29/788 , G11C11/34
CPC分类号： H01L27/115 , G11C16/0483 , G11C16/10 , H01L21/28273 , H01L27/11521 , H01L29/42324 , H01L29/42336 , H01L29/7883
摘要： A floating gate is formed on a semiconductor substrate via a gate insulating film. Diffused layers are formed as sources or drain regions on opposite sides of the floating gate in the semiconductor substrate. First and second control gates are formed opposite to both of the diffused layers on the opposite sides of the floating gate via an inter-gate insulating film to drive the floating gate.
摘要翻译：通过栅极绝缘膜在半导体衬底上形成浮栅。扩散层在半导体衬底中的浮置栅极的相对侧上形成为源区或漏极区。第一和第二控制栅极通过栅极间绝缘膜与浮动栅极的相对侧上的两个扩散层相对形成，以驱动浮置栅极。

46. 发明申请

US20050013169A1 Nonvolatile semiconductor memory device 有权
标题翻译：非易失性半导体存储器件
公开(公告)号：US20050013169A1
公开(公告)日：2005-01-20
申请号：US10920161
申请日：2004-08-18
申请人： Tomoharu Tanaka , Hiroshi Nakamura , Ken Takeuchi , Riichiro Shirota , Fumitaka Arai , Susumu Fujimura
发明人： Tomoharu Tanaka , Hiroshi Nakamura , Ken Takeuchi , Riichiro Shirota , Fumitaka Arai , Susumu Fujimura
IPC分类号： G11C7/00 , G11C11/56 , G11C16/34 , G11C16/06
CPC分类号： G11C16/0483 , G11C11/5621 , G11C11/5628 , G11C11/5635 , G11C16/3404 , G11C16/3409 , G11C16/344 , G11C16/3445 , G11C16/345 , G11C16/3454 , G11C16/3459 , G11C16/3463 , G11C2211/5621
摘要： A NAND cell unit includes a plurality of memory cells which are connected in series. An erase operation is effected on all memory cells. Then, a soft-program voltage, which is opposite in polarity to the erase voltage applied in the erase operation, is applied to all memory cells, thereby setting all memory cells out of an over-erased state. Thereafter, a program voltage of 20V is applied to the control gate of any selected one of the memory cells, 0V is applied to the control gates of the two memory cells provided adjacent to the selected memory cell, and 11V is applied to the control gates of the remaining memory cells. Data is thereby programmed into the selected memory cell. The time for which the program voltage is applied to the selected memory cell is adjusted in accordance with the data to be programmed into the selected memory cell. Hence, data “0” can be correctly programmed into the selected memory cell, multi-value data can be read from any selected memory cell at high speed.
摘要翻译： NAND单元单元包括串联连接的多个存储单元。对所有存储单元进行擦除操作。然后，将与在擦除操作中施加的擦除电压极性相反的软编程电压施加到所有存储单元，从而将所有存储单元设置为过擦除状态。此后，将20V的编程电压施加到任何一个存储单元的控制栅极，将0V施加到与所选存储单元相邻设置的两个存储单元的控制栅极，并将11V施加到控制栅极的剩余存储单元。因此数据被编程到所选择的存储单元中。根据要编程到所选择的存储单元中的数据来调整对所选存储单元施加编程电压的时间。因此，可以将数据“0”正确地编程到所选择的存储单元中，可以从任何选择的存储单元高速读取多值数据。

47. 发明授权

US06208560B1 Nonvolatile semiconductor memory device 有权
标题翻译：非易失性半导体存储器件
公开(公告)号：US06208560B1
公开(公告)日：2001-03-27
申请号：US09599397
申请日：2000-06-22
申请人： Tomoharu Tanaka , Hiroshi Nakamura , Ken Takeuchi , Riichiro Shirota , Fumitaka Arai , Susumu Fujimura
发明人： Tomoharu Tanaka , Hiroshi Nakamura , Ken Takeuchi , Riichiro Shirota , Fumitaka Arai , Susumu Fujimura
IPC分类号： G11C1606
CPC分类号： G11C16/0483 , G11C11/5621 , G11C11/5628 , G11C11/5635 , G11C16/3404 , G11C16/3409 , G11C16/344 , G11C16/3445 , G11C16/345 , G11C16/3454 , G11C16/3459 , G11C16/3463 , G11C2211/5621
摘要： A NAND cell unit comprising a plurality of memory cells which are connected in series. An erase operation is effected on all memory cells. Then, a soft-program voltage, which is opposite in polarity to the erase voltage applied in the erase operation, is applied to all memory cells, thereby setting all memory cells out of an over-erased state. Thereafter, a program voltage of 20 V is applied to the control gate of any selected one of the memory cells, 0 V is applied to the control gates of the two memory cells provided adjacent to the selected memory cell, and 11 V is applied to the control gates of the remaining memory cells. Data is thereby programmed into the selected memory cell. The time for which the program voltage is applied to the selected memory cell is adjusted in accordance with the data to be programmed into the selected memory cell. Hence, data “0” can be correctly programmed into the selected memory cell, multi-value data can be read from any selected memory cell at high speed.
摘要翻译：包括串联连接的多个存储单元的NAND单元单元。对所有存储单元进行擦除操作。然后，对所有存储单元施加与施加在擦除操作中的擦除电压极性相反的软编程电压，从而将所有存储单元设置为过擦除状态。此后，将20V的编程电压施加到存储单元中的任何一个存储单元的控制栅极，将0V施加到与所选存储单元相邻设置的两个存储单元的控制栅极，并且将11V施加到剩余存储单元的控制门。因此数据被编程到所选择的存储单元中。根据要编程到所选择的存储单元中的数据来调整对所选存储单元施加编程电压的时间。因此，可以将数据“0”正确地编程到所选择的存储单元中，可以从任何选择的存储单元高速读取多值数据。

48. 发明申请

US20120181598A1 NONVOLATILE SEMICONDUCTOR MEMORY 有权
标题翻译：非易失性半导体存储器
公开(公告)号：US20120181598A1
公开(公告)日：2012-07-19
申请号：US13430153
申请日：2012-03-26
申请人： Masayuki ICHIGE , Fumitaka Arai , Riichiro Shirota , Toshitake Yaegashi , Yoshio Ozawa , Akihito Yamamoto , Ichiro Mizushima , Yoshihiko Saito
发明人： Masayuki ICHIGE , Fumitaka Arai , Riichiro Shirota , Toshitake Yaegashi , Yoshio Ozawa , Akihito Yamamoto , Ichiro Mizushima , Yoshihiko Saito
IPC分类号： H01L29/788
CPC分类号： H01L29/42336 , H01L21/28273 , H01L27/0207 , H01L27/115 , H01L27/11521 , H01L27/11524 , H01L29/42324 , H01L29/7881
摘要： A nonvolatile semiconductor memory includes first and second memory cells having a floating gate and a control gate. The floating gate of the first and second memory cells is comprised a first part, and a second part arranged on the first part, and a width of the second part in an extending direction of the control gate is narrower than that of the first part. A first space between the first parts of the first and second memory cells is filled with one kind of an insulator. The control gate is arranged at a second space between the second parts of the first and second memory cells.
摘要翻译：非易失性半导体存储器包括具有浮动栅极和控制栅极的第一和第二存储单元。第一和第二存储单元的浮动栅极包括第一部分和布置在第一部分上的第二部分，并且第二部分在控制栅极的延伸方向上的宽度比第一部分的宽度窄。第一和第二存储单元的第一部分之间的第一空间填充有一种绝缘体。控制栅极被布置在第一和第二存储单元的第二部分之间的第二空间处。

49. 发明授权

US08148216B2 Nonvolatile semiconductor memory and process of producing the same 有权
标题翻译：非易失性半导体存储器及其制造方法
公开(公告)号：US08148216B2
公开(公告)日：2012-04-03
申请号：US12974873
申请日：2010-12-21
申请人： Fumitaka Arai , Riichiro Shirota
发明人： Fumitaka Arai , Riichiro Shirota
IPC分类号： H01L21/71
CPC分类号： H01L29/792 , G11C16/0483 , H01L27/11524 , H01L27/11529 , H01L27/11556 , H01L29/7926
摘要： A nonvolatile semiconductor memory of an aspect of the present invention comprises a semiconductor substrate, a pillar-shaped semiconductor layer extending in the vertical direction with respect to the surface of the semiconductor substrate, a plurality of memory cells arranged in the vertical direction on the side surface of the semiconductor layer and having a charge storage layer and a control gate electrode, a first select gate transistor arranged on the semiconductor layer at an end of the memory cells on the side of the semiconductor substrate, and a second select gate transistor arranged on the semiconductor layer on the other end of the memory cells opposite to the side of the semiconductor substrate, wherein the first select gate transistor includes a diffusion layer in the semiconductor substrate and is electrically connected to the pillar-shaped semiconductor layer by way of the diffusion layer that serves as the drain region.
摘要翻译：本发明的一个方面的非易失性半导体存储器包括半导体衬底，相对于半导体衬底的表面在垂直方向上延伸的柱状半导体层，沿着垂直方向排列的多个存储单元具有电荷存储层和控制栅电极的第一选择栅晶体管，布置在半导体衬底侧的存储单元的端部的半导体层上的第一选择栅极晶体管和布置在半导体层上的第二选择栅晶体管存储单元的与半导体衬底侧相反的另一端的半导体层，其中第一选择栅晶体管包括在半导体衬底中的扩散层，并通过扩散电连接到柱状半导体层作为漏极区域的层。

50. 发明授权

US08000147B2 Nonvolatile semiconductor memory device 有权
标题翻译：非易失性半导体存储器件
公开(公告)号：US08000147B2
公开(公告)日：2011-08-16
申请号：US12781396
申请日：2010-05-17
申请人： Tomoharu Tanaka , Hiroshi Nakamura , Ken Takeuchi , Riichiro Shirota , Fumitaka Arai , Susumu Fujimura
发明人： Tomoharu Tanaka , Hiroshi Nakamura , Ken Takeuchi , Riichiro Shirota , Fumitaka Arai , Susumu Fujimura
IPC分类号： G11C11/34 , G11C16/04 , G11C16/06
CPC分类号： G11C16/0483 , G11C11/5621 , G11C11/5628 , G11C11/5635 , G11C16/3404 , G11C16/3409 , G11C16/344 , G11C16/3445 , G11C16/345 , G11C16/3454 , G11C16/3459 , G11C16/3463 , G11C2211/5621
摘要： A NAND cell unit includes memory cells which are connected in series. An erase operation is effected on all memory cells. Then, a soft-program voltage, which is opposite in polarity to the erase voltage applied in an erase operation, is applied to all memory cells, thereby setting all memory cells out of an over-erased state. Thereafter, a program voltage of 20V is applied to the control gate of a selected memory cell, 0V is applied to the control gates of the two memory cells provided adjacent to the selected memory cell, and 11V is applied to the control gates of the remaining memory cells. Data is thereby programmed into the selected memory cell. The time for which the program voltage is applied to the selected memory cell is adjusted in accordance with the data to be programmed into the selected memory cell. Hence, data “0” can be correctly programmed into the selected memory cell, multi-value data can be read from any selected memory cell at high speed.
摘要翻译： NAND单元单元包括串联连接的存储单元。对所有存储单元进行擦除操作。然后，将与擦除操作中施加的擦除电压极性相反的软编程电压施加到所有存储单元，从而将所有存储单元设置为过擦除状态。此后，将20V的编程电压施加到所选择的存储单元的控制栅极，将0V施加到与所选存储单元相邻设置的两个存储单元的控制栅极，并且将11V施加到其余的控制栅极记忆细胞因此数据被编程到所选择的存储单元中。根据要编程到所选择的存储单元中的数据来调整对所选存储单元施加编程电压的时间。因此，可以将数据“0”正确地编程到所选择的存储单元中，可以从任何选择的存储单元高速读取多值数据。

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