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    • 42. 发明授权
    • Generator cooling with mixing downstream of the cooler
    • 发电机冷却与冷却器下游混合
    • US06239522B1
    • 2001-05-29
    • US09450725
    • 1999-11-30
    • Joern GlahnJosef BaumgartnerMichael Jung
    • Joern GlahnJosef BaumgartnerMichael Jung
    • H02K908
    • H02K9/10
    • In a generator with a cooling system which draws in, from the generator, cooling medium heated by the heat-generating elements of the generator and which guides the hot cooling medium to at least two cooling units (23), which cooling units (23) operate in parallel and cool the cooling medium before it is led back to the heat-generating elements of the generator, operation substantially uninfluenced by failures of the cooling units (23) is made possible by means being provided which mix together the cooling medium flows (31) flowing from the different cooling units (23) after they emerge from the cooling units (23) and before they are supplied to the heat-generating elements of the generator.
    • 在具有冷却系统的发电机中,该冷却系统从发电机吸入由发电机的发热元件加热并将热冷却介质引导到至少两个冷却单元(23)的冷却介质,该冷却单元(23) 在冷却介质被引导回到发电机的发热元件之前并行地冷却并且冷却冷却介质,通过提供冷却单元(23)的故障基本上不受影响的操作可以通过将冷却介质流动混合在一起而实现 31)在从冷却单元(23)出来之后并且在它们被供应到发电机的发热元件之前从不同的冷却单元(23)流出。
    • 46. 发明授权
    • Apparatus for plasma treatment
    • 等离子体处理装置
    • US5399254A
    • 1995-03-21
    • US659817
    • 1991-02-22
    • Michael GeislerMichael Jung
    • Michael GeislerMichael Jung
    • C23C16/509C23C16/54H01J37/32C23C14/00C23C16/00
    • H01J37/32651C23C16/509C23C16/545H01J37/32568H01J37/32596
    • The invention concerns an apparatus for the plasma treatment of substrates in a plasma discharge excited by a high frequency between two electrodes 3, 8 to which power is supplied by a high frequency source, where the first electrode is configured as a hollow electrode 3 and the second one as an electrode 8 holding a substrate 7 and situated upstream of the hollow chamber 10 of the first electrode which it also passes. The hollow electrode is enclosed by a dark space shield and has an edge pointing in direction of the second electrode and also has projection located between the edge. These projections are on the same potential as the second electrode. The radio frequency power is thus decoupled from the substrate bias voltage (selfbias) and the distance between the first and the second electrode can be changed.
    • 本发明涉及一种用于等离子体处理等离子体处理装置,该等离子体处理由两个电极3,8之间的高频激发的等离子体放电,两个电极之间由高频源供电,其中第一电极被配置为中空电极3, 第二个作为保持基板7并位于第一电极的中空室10的上游的电极8。 中空电极由暗空间屏蔽物包围,并且具有指向第二电极的方向的边缘,并且还具有位于边缘之间的突起。 这些突起与第二电极具有相同的电位。 因此,射频功率与衬底偏置电压(自耦合)分离,并且可以改变第一和第二电极之间的距离。
    • 48. 发明授权
    • Device for mounting and transporting substrates in vacuum apparatus
    • 用于在真空设备中安装和运输基板的装置
    • US5259603A
    • 1993-11-09
    • US828259
    • 1992-01-30
    • Michael GeislerMichael Jung
    • Michael GeislerMichael Jung
    • C23C14/50B25B1/20
    • B65G49/068B65G49/061C23C14/50B65G2249/02
    • Device for mounting thin, preferably flat substrates (11, 11', . . . ) and for the transport of these substrates (11, 11'. . . ) in treatment apparatus, for example vacuum coating and etching apparatus, the device being formed by a frame (1), preferably in a rectangular shape, which is of such size that in the area surrounded by the frame (1) a support, e.g., a support formed of spoke-like round rods (6, 6', . . . ). can be inserted, and on this support fastening means for mounting the substrates (11, 11', . . . ) are provided, which hold the substrates (11, 11', . . . ) such that their substantially planar lateral surfaces run approximately parallel to the plane of the frame.
    • 用于安装薄的,优选平坦的基板(11,11'等)并且用于将这些基板(11,11')输送到处理装置中的装置,例如真空涂覆和蚀刻装置,所形成的装置 通过框架(1),优选为矩形形状,其尺寸使得在由框架(1)包围的区域中,支撑件(例如由辐条状圆棒(6,6',...)形成的支撑件)形成。 ...)。 并且在该支撑件上提供用于安装基板(11,11'...)的紧固装置,其固定基板(11,11'...),使得其基本上平坦的侧表面大致运行 平行于框架的平面。
    • 49. 发明授权
    • Movable device for heating substrates
    • 用于加热基板的可移动装置
    • US5122636A
    • 1992-06-16
    • US460357
    • 1990-01-03
    • Michael Jung
    • Michael Jung
    • C23C16/458C23C16/46H01M2/10
    • C23C16/4587C23C16/46H01M2/1055
    • A device for heating up a substrate to be coated in a vacuum coating system, for example a plasma sputtering system, has a heating device 23 disposed on a substrate carriage 20 which can be moved across the process chamber transversely to the coating source. This heating device has an independent voltage generator, for example a rechargeable accumulator, disposed in a special chamber of the heating device. The chamber for the accumulators can be hermetically sealed by way of a cover such that this chamber is under atmospheric pressure even when the substrate carraige 20, together with the heating device 23, enters the process chamber of the system which contains the vacuum. The accumulators are recharged via plug couplings 14,14' after the heating device has heated up the substrate 8 which is clamped thereto and the device has exited the process chamber via a sluiceway.
    • 用于将待涂覆的基板加热到真空涂覆系统(例如等离子体溅射系统)中的装置具有设置在基板滑架20上的加热装置23,该加热装置可以横向于涂覆源移动到处理室。 该加热装置具有设置在加热装置的特殊室中的独立电压发生器,例如可充电蓄电池。 用于蓄能器的室可以通过盖子气密地密封,使得即使当衬底加热器20与加热装置23一起进入包含真空的系统的处理室时,该室也处于大气压力下。 在加热装置加热被夹紧在其上的基板8之后,蓄电池通过插头联接器14,14'再次充电,并且该装置已经通过一个滑梯离开了处理室。