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41. 发明授权

US07691577B2 Protein having an EGF-like repeat sequence 失效
标题翻译：具有EGF样重复序列的蛋白质
公开(公告)号：US07691577B2
公开(公告)日：2010-04-06
申请号：US11475860
申请日：2006-06-28
申请人： Noriko Nakamura , Tetsuo Sudo , Takatoshi Yamada
发明人： Noriko Nakamura , Tetsuo Sudo , Takatoshi Yamada
IPC分类号： C12N15/11 , C12N15/63 , C12N5/10 , C12Q1/68
CPC分类号： C07K14/475 , C07K14/485 , C07K2319/30 , C07K2319/43
摘要： The present invention provides SELF protein having controlling effects on growth and differentiation of undifferentiated cells, wherein the protein contains a novel EGF-like repeat sequence, SELF gene encoding the same, a recombinant vector and a transformed cell containing the SELF gene, a method for treatment or prophylaxis with SELF protein or a recombinant expression vector containing SELF gene, SELF promoter, a recombinant vector and a transformed cell containing SELF promoter, and a screening method using the transformed cell containing SELF promoter.
摘要翻译：本发明提供具有对未分化细胞的生长和分化具有控制作用的SELF蛋白质，其中所述蛋白质含有新的EGF样重复序列，编码其的SELF基因，重组载体和含有SELF基因的转化细胞， SELF蛋白或包含SELF基因，SELF启动子，重组载体和含有SELF启动子的转化细胞的重组表达载体的治疗或预防以及使用含有SELF启动子的转化细胞的筛选方法。

42. 发明申请

US20090121614A1 DIAMOND ELECTRON SOURCE HAVING CARBON-TERMINATED STRUCTURE AND METHOD FOR PRODUCING THE SAME 有权
标题翻译：具有碳结构的金刚石电子源及其制造方法
公开(公告)号：US20090121614A1
公开(公告)日：2009-05-14
申请号：US11994065
申请日：2006-06-21
申请人： Takatoshi Yamada , Christoph Nebel , Shinichi Shikata
发明人： Takatoshi Yamada , Christoph Nebel , Shinichi Shikata
IPC分类号： H01J1/62 , H01J9/02
CPC分类号： H01J9/025 , H01J1/304
摘要： The present invention provides a diamond electron source exerting stable and excellent electron emission characteristics, which can be used for a cold cathode surface structure operable with low voltage and a method for producing the diamond electron source. Specifically, the diamond electron source having a carbon-terminated structure has a structure composed of an electrode and a diamond film and emits electrons or electron beams from the diamond film when voltage is applied to the electrode. The diamond film is made of diamond having a carbon-terminated structure. The method for producing the diamond electron source is also provided herein.
摘要翻译：本发明提供了可用于低电压可操作的冷阴极表面结构的稳定且优异的电子发射特性的金刚石电子源和用于制备金刚石电子源的方法。具体地说，具有碳末端结构的金刚石电子源具有由电极和金刚石膜构成的结构，并且当施加电压时，从金刚石膜发射电子或电子束。金刚石膜由具有碳末端结构的金刚石制成。本文还提供了制备金刚石电子源的方法。

43. 发明授权

US07488236B2 Polishing pad and method of producing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US07488236B2
公开(公告)日：2009-02-10
申请号：US11466909
申请日：2006-08-24
申请人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura
发明人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura
IPC分类号： B24B7/22
CPC分类号： C08G18/00 , B24B37/24 , B24D3/30 , B24D18/00 , C08G18/10 , C08G18/12 , C08G18/4211 , C08G18/4236 , C08G18/4808 , C08G18/4854 , C08G18/61 , C08G18/664 , C08G18/6674 , C08G18/724 , C08G2101/00 , C08G2101/0066 , C08J9/0061 , C08J2205/052 , C08J2375/04 , C08J2483/00 , C08L83/00 , C09D175/08 , H01L21/30625 , Y10T428/249953 , Y10T428/249976 , C08G18/3814 , C08G18/3243 , C08G18/5096
摘要： The invention provides a polishing pad by which optical materials such as lenses, reflecting mirrors etc., or materials requiring a high degree of surface planarity, as in the polishing of silicone wafers, glass substrates or aluminum substrates for hard disks, or general metal polishing, can be flattened with stability and high polishing efficiency. The invention also provides a polishing pad for semiconductor wafers, which is superior in planarizing characteristic, is free from scratches and can be produced at low cost. There is provided a polishing pad which is free from dechucking error so that neither damage to wafers nor decrease in operating efficiency occurs. There is provided a polishing pad which is satisfactory in planarity, within wafer uniformity, and polishing rate and produces less change in polishing rate. There is provided a polishing pad which can make planarity improvement and scratch decrease compatible.
摘要翻译：本发明提供了抛光垫，通过该抛光垫，诸如透镜，反射镜等的光学材料或需要高度表面平坦度的材料，如在硅树脂晶片，玻璃基板或用于硬盘的铝基板的抛光中，或通常的金属抛光，可平坦化，抛光效率高。本发明还提供一种平面化特性优异的半导体晶片用抛光垫，无磨损，可以低成本地制造。提供了没有脱扣误差的抛光垫，从而不会损坏晶片，也不会降低工作效率。提供了平面性良好，晶片均匀性和抛光速度均匀且抛光速度变化小的抛光垫。提供了可以使平面性改善和划痕减少兼容的抛光垫。

44. 发明授权

US07378454B2 Polyurethane composition and polishing pad 有权
标题翻译：聚氨酯组合物和抛光垫
公开(公告)号：US07378454B2
公开(公告)日：2008-05-27
申请号：US10474370
申请日：2002-04-04
申请人： Takashi Masui , Masahiko Nakamori , Takatoshi Yamada , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Hiroshi Seyanagi
发明人： Takashi Masui , Masahiko Nakamori , Takatoshi Yamada , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Hiroshi Seyanagi
IPC分类号： C08G18/06
CPC分类号： B24B37/24 , C08G18/10 , C08G18/12 , C08G18/6674 , C08G18/724 , C08G2101/0066 , C08L1/00 , C08L33/00 , C08L75/04 , C08G18/3876 , C08G18/3812 , C08L2666/02
摘要： A polyurethane composition containing solid beads dispersed therein, is formed of a microcellular polyurethane foam, and the composition has a storage modulus of elasticity at 40° C. of 270 MPa or more as measured by means of a dynamic elasticity measuring device. Another polyurethane composition of this invention contains solid beads dispersed therein, that are capable of swelling with or are soluble in an aqueous medium. The former composition has excellent flattening capability, and the latter composition can provide a polished surface which combines good flatness and good uniformity and can also reduce scratches on the surface.
摘要翻译：包含分散在其中的固体珠的聚氨酯组合物由微孔聚氨酯泡沫形成，并且组合物通过动态弹性测量装置测量，其在40℃下的储能弹性模量为270MPa或更大。本发明的另一种聚氨酯组合物包含分散在其中的固体珠，其能够在水性介质中溶胀或溶解。前者的组合物具有优异的压平能力，后者的组合物可以提供结合良好的平整度和均匀性的抛光表面，并且还可以减少表面上的划痕。

45. 发明授权

US06188528B1 Optical lens, and optical pickup and optical disc apparatus using such lens 失效
标题翻译：光学透镜，以及使用这种透镜的光学拾取和光盘装置
公开(公告)号：US06188528B1
公开(公告)日：2001-02-13
申请号：US09343553
申请日：1999-06-30
申请人： Takatoshi Yamada , Norio Fukasawa
发明人： Takatoshi Yamada , Norio Fukasawa
IPC分类号： G02B302
CPC分类号： G11B7/1374
摘要： An optical lens composed of a transparent material, wherein one surface thereof on a light source side is a convex aspherical surface of rotation symmetry defined by a function relative to the radial distance from an optical axis. The aspherical surface is shaped to be a curved one without any stepped region with regard to the radial direction in the defined area, and has a portion where the derivatives of the function are discontinuous at a predetermined radial position. Although not equipped with an iris diaphragm, this optical lens is capable of eliminating an incident light beam outside the optical effective surface thereof without deteriorating the optical characteristics.
摘要翻译：由透明材料构成的光学透镜，其中在光源侧的一个表面是由相对于从光轴的径向距离的函数限定的旋转对称的凸非球面。该非球面成形为相对于限定区域的径向方向没有任何台阶状的弯曲形状，并且具有功能的导数在预定的径向位置处不连续的部分。虽然没有配备虹膜光阑，但是该光学透镜能够消除光学有效表面外的入射光束而不损害光学特性。

46. 发明授权

US08845852B2 Polishing pad and method of producing semiconductor device 有权
标题翻译：抛光垫及半导体装置的制造方法
公开(公告)号：US08845852B2
公开(公告)日：2014-09-30
申请号：US10536621
申请日：2003-11-27
申请人： Masahiko Nakamori , Tetsuo Shimomura , Takatoshi Yamada , Kazuyuki Ogawa , Atsushi Kazuno , Masahiro Watanabe
发明人： Masahiko Nakamori , Tetsuo Shimomura , Takatoshi Yamada , Kazuyuki Ogawa , Atsushi Kazuno , Masahiro Watanabe
IPC分类号： C23F1/00 , B24B37/20 , B24B37/013
CPC分类号： B24B37/205 , B24B37/013
摘要： A polishing pad enabling a highly precise optical endpoint sensing during the polishing process and thus having excellent polishing characteristics (such as surface uniformity and in-plane uniformity) is disclosed. A polishing pad enabling to obtain the polishing profile of a large area of a wafer is also disclosed. A polishing pad of a first invention comprises a light-transmitting region having a transmittance of not less than 50% over the wavelength range of 400 to 700 nm. A polishing pad of a second invention comprises a light-transmitting region having a thickness of 0.5 to 4 mm and a transmittance of not less than 80% over the wavelength range of 600 to 700 nm. A polishing pad of a third invention comprises a light-transmitting region arranged between the central portion and the peripheral portion of the polishing pad and having a length (D) in the diametrical direction which is three times or more longer than the length (L) in the circumferential direction.
摘要翻译：公开了一种抛光垫，其能够在抛光过程中进行高精度的光学终点感测，因此具有优异的抛光特性（例如表面均匀性和面内均匀性）。还公开了能够获得大面积晶片的抛光轮廓的抛光垫。第一发明的抛光垫包括在400〜700nm的波长范围内具有不小于50％透射率的透光区域。第二发明的抛光垫包括在600至700nm的波长范围内具有0.5至4mm厚度的透光区域和不小于80％的透光率。第三发明的抛光垫包括布置在抛光垫的中心部分和周边部分之间的透光区域，其沿直径方向的长度（D）比长度（L）长三倍或更长，在圆周方向。

47. 发明授权

US08842365B2 Phase difference element and method for manufacturing the same 有权
标题翻译：相位差元件及其制造方法
公开(公告)号：US08842365B2
公开(公告)日：2014-09-23
申请号：US13473100
申请日：2012-05-16
申请人： Nobuyuki Koike , Masatoshi Sasaki , Naoki Hanashima , Akio Takada , Takatoshi Yamada
发明人： Nobuyuki Koike , Masatoshi Sasaki , Naoki Hanashima , Akio Takada , Takatoshi Yamada
IPC分类号： G02B1/10 , G02B1/11
CPC分类号： G02B1/115
摘要： A phase difference element capable of reducing reflection of incident light and a manufacturing method for the phase difference element are disclosed. The phase difference element includes a transparent substrate 11, an interface anti-reflection film group 12 and an obliquely vapor deposited film 13. The interface anti-reflection film group is composed by one or more of alternately high and low refractive index films, with the film thicknesses of the respectively films being equal to or less than the wavelength of light in use. The obliquely vapor deposited film is formed by a plurality of layers of a dielectric material. These layers are alternately obliquely vapor deposited from two directions differing by 180° from each other. The refractive index of the interface anti-reflection film group 12 is higher than the refractive index of the transparent substrate 11 and lesser than that of the obliquely vapor deposited film 13.
摘要翻译：公开了能够减少入射光反射的相位差元件和相位差元件的制造方法。相位差元件包括透明基板11，界面防反射膜组12和倾斜气相沉积膜13.界面抗反射膜组由交替高和低折射率膜中的一个或多个组成，其中各膜的膜厚度等于或小于使用的光的波长。倾斜蒸镀膜由多层电介质材料形成。这些层从彼此相差180°的两个方向交替倾斜蒸镀。界面抗反射膜组12的折射率高于透明基板11的折射率，并且小于倾斜气相沉积膜13的折射率。

48. 发明申请

US20130005228A1 POLISHING PAD 有权
标题翻译：抛光垫
公开(公告)号：US20130005228A1
公开(公告)日：2013-01-03
申请号：US13607125
申请日：2012-09-07
申请人： Atsushi Kazuno , Kazuyuki Ogawa , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
发明人： Atsushi Kazuno , Kazuyuki Ogawa , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
IPC分类号： B24D3/00 , B24D11/00
CPC分类号： B24B37/24 , B24D3/28 , B24D3/32 , C08G18/12 , C08G18/4238 , C08G18/4854 , C08G18/724 , C08G18/758 , C08G18/7621 , C08G2101/0025 , C08G2101/0066 , C08J9/30 , C08J2375/08 , C08G18/3814 , C08G18/48 , C08G18/3865
摘要： A polishing pad generates very few scratches on a surface of a polishing object, and is excellent in planarization property. The polishing pad has a high polishing rate and is excellent in planarization property. The polishing pad grooves become very little clogged with abrasive grains or polishing swarf during polishing and, even when continuously used for a long period of time, the polishing rate is scarcely reduced.
摘要翻译：抛光垫在抛光对象的表面上产生很少的划痕，并且平坦化性能优异。抛光垫具有高的抛光速率，并且平坦化性能优异。抛光垫槽在抛光过程中变得很少被磨粒或抛光屑堵塞，并且即使长时间连续使用，抛光速率几乎不降低。

49. 发明申请

US20120293732A1 PHASE DIFFERENCE ELEMENT AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：相差元件及其制造方法
公开(公告)号：US20120293732A1
公开(公告)日：2012-11-22
申请号：US13473100
申请日：2012-05-16
申请人： Nobuyuki Koike , Masatoshi Sasaki , Naoki Hanashima , Akio Takada , Takatoshi Yamada
发明人： Nobuyuki Koike , Masatoshi Sasaki , Naoki Hanashima , Akio Takada , Takatoshi Yamada
IPC分类号： G02F1/1335 , B05D5/06 , G02B1/11
CPC分类号： G02B1/115
摘要： A phase difference element capable of reducing reflection of incident light and a manufacturing method for the phase difference element are disclosed. The phase difference element includes a transparent substrate 11, an interface anti-reflection film group 12 and an obliquely vapor deposited film 13. The interface anti-reflection film group is composed by one or more of alternately high and low refractive index films, with the film thicknesses of the respectively films being equal to or less than the wavelength of light in use. The obliquely vapor deposited film is formed by a plurality of layers of a dielectric material. These layers are alternately obliquely vapor deposited from two directions differing by 180° from each other. The refractive index of the interface anti-reflection film group 12 is higher than the refractive index of the transparent substrate 11 and lesser than that of the obliquely vapor deposited film 13 (FIG. 1).
摘要翻译：公开了能够减少入射光反射的相位差元件和相位差元件的制造方法。相位差元件包括透明基板11，界面防反射膜组12和倾斜气相沉积膜13.界面抗反射膜组由交替高和低折射率膜中的一个或多个组成，其中各膜的膜厚度等于或小于使用的光的波长。倾斜蒸镀膜由多层电介质材料形成。这些层从彼此相差180°的两个方向交替倾斜蒸镀。界面抗反射膜组12的折射率高于透明基板11的折射率，并且小于倾斜气相沉积膜13（图1）的折射率。

50. 发明授权

US08309466B2 Polishing pad 有权
标题翻译：抛光垫
公开(公告)号：US08309466B2
公开(公告)日：2012-11-13
申请号：US12065219
申请日：2006-08-22
申请人： Kazuyuki Ogawa , Tetsuo Shimomura , Yoshiyuki Nakai , Masahiko Nakamori , Takatoshi Yamada
发明人： Kazuyuki Ogawa , Tetsuo Shimomura , Yoshiyuki Nakai , Masahiko Nakamori , Takatoshi Yamada
IPC分类号： H01L21/302 , H01L21/461 , B32B5/00 , B32B3/26
CPC分类号： B24B37/24 , B24D3/32 , C08G18/36 , C08G2101/00 , Y10T428/24 , Y10T428/249953
摘要： A polishing pad has an excellent polishing rate and is superior in longevity without generating center slow. A method of manufacturing a semiconductor device with the polishing pad is also provided. The polishing pad has a polishing layer consisting of a polyurethane foam having fine cells, wherein a high-molecular-weight polyol component that is a starting component of the polyurethane foam contains a hydrophobic high-molecular-weight polyol A having a number-average molecular weight of 550 to 800 and a hydrophobic high-molecular-weight polyol B having a number-average molecular weight of 950 to 1300 in an A/B ratio of from 10/90 to 50/50 by weight.
摘要翻译：抛光垫具有优异的抛光速率，寿命长，不会产生中心慢。还提供了一种制造具有抛光垫的半导体器件的方法。抛光垫具有由具有细小细胞的聚氨酯泡沫构成的抛光层，其中作为聚氨酯泡沫的起始成分的高分子量多元醇成分含有具有数均分子量的疏水性高分子量多元醇A 重量为550〜800的疏水性高分子量多元醇B，A / B比为10/90〜50/50的数均分子量为950〜1300的疏水性高分子量多元醇B.

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