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    • 43. 发明授权
    • Glass substrate for magnetic recording media and manufacturing method thereof
    • 磁记录介质用玻璃基板及其制造方法
    • US06808784B2
    • 2004-10-26
    • US10143372
    • 2002-05-10
    • Junichi HashimotoKensuke MatsunoTakeo Watanabe
    • Junichi HashimotoKensuke MatsunoTakeo Watanabe
    • G11B582
    • G11B5/7315C03C19/00G11B5/8404Y10T428/219
    • There is provided a glass substrate for magnetic recording media, which enables damage to a magnetic recording medium using the glass substrate to be prevented. The glass substrate is a donut-shaped glass substrate comprising major surfaces, an outer peripheral edge surface, an inner peripheral edge surface, and chamfered surfaces, each connecting between one of the major surfaces and one of the outer peripheral edge surface and the inner peripheral edge surface. Each of the chamfered surfaces comprises a conical surface part and an annular curved surface part connected to one another, and for each of the chamfered surfaces, a percentage ratio of a length of an outline of the annular curved surface part to a length of an outline of the chamfered surface in a cross section of the glass substrate including a central axis of the glass substrate is not less than a predetermined value.
    • 提供了一种用于磁记录介质的玻璃基板,其能够防止使用玻璃基板的磁记录介质的损坏。 玻璃基板是包括主表面,外周边缘表面,内周边缘表面和倒角表面的环形玻璃基板,每个连接在一个主表面和外周边缘表面和内周边之一 边缘表面。 每个倒角表面包括圆锥形表面部分和相互连接的环形曲面部分,并且对于每个倒角表面,环形曲面部分的轮廓长度与轮廓长度的百分比 在包括玻璃基板的中心轴线的玻璃基板的截面中的倒角面的面积不小于预定值。
    • 45. 发明授权
    • Resist patterns and method of forming resist patterns
    • 抗蚀剂图案和形成抗蚀剂图案的方法
    • US5374502A
    • 1994-12-20
    • US083131
    • 1993-06-25
    • Toshihiko TanakaMitsuaki MorigamiIwao HigashikawaTakeo Watanabe
    • Toshihiko TanakaMitsuaki MorigamiIwao HigashikawaTakeo Watanabe
    • G03F7/30G03F7/32G03C5/00
    • G03F7/32G03F7/30
    • In accordance with a proposed resist pattern forming method, contact angles between the surface of a resist and a rinse is adjusted within a predetermined range, a volatil surfactant which does not remain by drying is mixed in the rinse so as to reduce a surface tension, the rinse is dried under a critical condition of the rinse in order not to cause the surface tension to exert. The occurrence of an attractive force between the resist patterns may be thereby weakened or nullified, so that falling of the patterns can be effectively prevented which very often happened at forming fine resist patterns or resist patterns of high aspect. On the other hand, depending upon structure of said resist pattern, it is possible to effectively prevent outermost main patterns of gathering resist patterns from falling down. By providing such effects, yieldings of products are increased. Further, the present invention may be also applied to a lithography illumination sources of which are light, electron, X-ray, ion beam, etc.
    • 根据所提出的抗蚀剂图案形成方法,将抗蚀剂表面和冲洗液之间的接触角调节到预定范围内,将不保持干燥的挥发性表面活性剂在冲洗液中混合以降低表面张力, 冲洗液在冲洗的临界条件下干燥,以免引起表面张力。 因此抗蚀剂图案之间的吸引力的发生可能被削弱或消失,从而可以有效地防止图形的下降,这在形成精细抗蚀剂图案或高方面的抗蚀剂图案时经常发生。 另一方面,根据所述抗蚀剂图案的结构,可以有效地防止聚集抗蚀剂图案的最外面的主要图案掉落。 通过提供这样的效果,产品的产量增加。 此外,本发明还可以应用于光,电子,X射线,离子束等的光刻照明源