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    • 41. 发明授权
    • In-plane switching mode liquid crystal display device and method of manufacturing the same
    • 面内切换模式液晶显示装置及其制造方法
    • US07573556B2
    • 2009-08-11
    • US11477385
    • 2006-06-30
    • Soon Sung YooHeung Lyul Cho
    • Soon Sung YooHeung Lyul Cho
    • G02F1/1343
    • G02F1/134363G02F2201/40
    • A method of manufacturing an in-plane switching mode liquid crystal display device includes forming an insulation layer on a substrate, patterning a resist layer on the insulation layer, etching the insulation layer to form an insulation layer pattern having tapered edges, forming electrode layers on exposed surfaces of the substrate, the tapered edges, and the resist layer, etching the electrode layers formed on the exposed surfaces and on the resist layer, and removing the resist layer to form the common electrode and the pixel electrode with slopes and that are arranged parallel to each other on the tapered edges of the insulation layer. The common electrode and the pixel electrode each have a width less than 1 μm, which increases aperture ratio and transmittance.
    • 一种面内切换模式液晶显示装置的制造方法包括在基板上形成绝缘层,在绝缘层上形成抗蚀剂层,蚀刻绝缘层,形成具有锥形边缘的绝缘层图案,形成电极层 衬底的暴露表面,锥形边缘和抗蚀剂层,蚀刻形成在暴露表面和抗蚀剂层上的电极层,并且去除抗蚀剂层以形成具有斜面的公共电极和像素电极,并且布置 在绝缘层的锥形边缘上彼此平行。 公共电极和像素电极各自具有小于1um的宽度,这增加了开口率和透射率。
    • 43. 发明授权
    • Thin film transistor substrate for display device and fabricating method thereof
    • 用于显示装置的薄膜晶体管基板及其制造方法
    • US07488632B2
    • 2009-02-10
    • US11713046
    • 2007-03-02
    • Byung Chul AhnSoon Sung YooHeung Lyul Cho
    • Byung Chul AhnSoon Sung YooHeung Lyul Cho
    • H01L29/15G02F1/1365
    • G02F1/136227G02F1/136213H01L27/124H01L27/1255H01L27/1288
    • A thin film transistor (TFT) substrate is fabricated in three mask processes. In a first mask process, a gate line and a gate electrode are formed. In a second mask process, a data line, a source electrode, a drain electrode, a semiconductor layer, and a first upper storage electrode overlapping the gate line are formed from a gate insulating film, undoped and doped amorphous silicon layers, and a data metal layer. In a third mask process, a pixel hole is formed through protective and gate insulating films within and outside a pixel area, the first upper storage electrode is partially removed, a pixel electrode contacts a side of the drain electrode within the pixel hole at the pixel area, and a second upper storage electrode contacts a side of the first upper storage electrode in the pixel hole outside the pixel area.
    • 在三个掩模工艺中制造薄膜晶体管(TFT)衬底。 在第一掩模工艺中,形成栅极线和栅电极。 在第二掩模处理中,从栅极绝缘膜,未掺杂和掺杂的非晶硅层形成数据线,源电极,漏极,半导体层和与栅极线重叠的第一上部存储电极,以及数据 金属层。 在第三掩模处理中,通过像素区域内和外部的保护栅极绝缘膜形成像素孔,部分地去除第一上部存储电极,像素电极在像素的像素孔内接触漏电极的一侧 并且第二上部存储电极接触像素区域外的像素孔中的第一上部存储电极的一侧。
    • 44. 发明授权
    • Liquid crystal display panel and fabricating method thereof
    • 液晶显示面板及其制造方法
    • US07470932B2
    • 2008-12-30
    • US11715889
    • 2007-03-09
    • Soon Sung YooYoun Gyoung ChangHeung Lyul Cho
    • Soon Sung YooYoun Gyoung ChangHeung Lyul Cho
    • H01L29/04
    • H01L27/1288G02F1/133707G02F1/13394G02F1/13458G02F2001/136231H01L27/1214
    • A liquid crystal display (LCD) panel is fabricated in a simplified process. The LCD panel includes a thin film transistor (TFT) array substrate with a gate and data lines crossing each other to define a pixel area, a TFT at the crossings of the gate and data lines, a protective film, and a pixel electrode connected to the TFT and formed within a pixel opening that is arranged at the pixel area and formed through the protective film and a gate insulating film. A color filter array substrate is joined to the TFT array substrate. A pattern spacer is between the TFT and color filter array substrate and overlaps at least one of the gate line, the data line, and the thin film transistor. A rib is formed from the same layer as the pattern spacer and overlaps the pixel electrode. Liquid crystal material is provided within the LCD panel.
    • 以简化的工艺制造液晶显示器(LCD)面板。 LCD面板包括薄膜晶体管(TFT)阵列基板,栅极和数据线彼此交叉以限定像素区域,在栅极和数据线的交叉处的TFT,保护膜和连接到 TFT形成在像素区域内,并形成在像素区域并形成在保护膜和栅极绝缘膜上的像素开口内。 滤色器阵列基板连接到TFT阵列基板。 图案间隔物位于TFT和滤色器阵列基板之间,并与栅极线,数据线和薄膜晶体管中的至少一个重叠。 肋由与图案间隔物相同的层形成,并且与像素电极重叠。 液晶材料设置在LCD面板内。
    • 46. 发明授权
    • Thin film transistor substrate of horizontal electric field type liquid crystal display device and fabricating method thereof
    • 水平电场型液晶显示装置薄膜晶体管基板及其制造方法
    • US07749823B2
    • 2010-07-06
    • US12475130
    • 2009-05-29
    • Byung Chul AhnOh Nam KwonHeung Lyul Cho
    • Byung Chul AhnOh Nam KwonHeung Lyul Cho
    • H01L21/336
    • H01L27/124G02F1/134363G02F1/136213G02F1/1368G02F2001/136295H01L27/1288
    • A thin film transistor substrate of horizontal electric field type includes: a gate line and a first common line formed on a substrate to be in parallel to each other; a data line crossing the gate line and the first common line with a gate insulating film therebetween to define a pixel area; a second common line crossing the first common line having the gate insulating film therebetween; a thin film transistor connected to the gate line and the data line; a common electrode extending from the second common line in said pixel area; a pixel electrode that is parallel to the common electrode and the second common line; a protective film for covering the thin film transistor; a gate pad having a lower gate pad electrode connected to an upper gate pad electrode through a first contact hole; a common pad having a lower common pad electrode connected to an upper common pad electrode through a second contact hole; and a data pad having a lower data pad electrode connected to an upper data pad electrode provided within a third contact hole.
    • 水平电场型薄膜晶体管基板包括:形成在彼此平行的基板上的栅极线和第一公共线; 跨越所述栅极线和所述第一公共线的数据线,其间具有栅极绝缘膜,以限定像素区域; 第二公共线与其间具有栅绝缘膜的第一公共线交叉; 连接到栅极线和数据线的薄膜晶体管; 在所述像素区域中从所述第二公共线延伸的公共电极; 平行于公共电极和第二公共线的像素电极; 用于覆盖薄膜晶体管的保护膜; 栅极焊盘,其具有通过第一接触孔连接到上部栅极焊盘电极的下部栅极焊盘电极; 公共焊盘,其具有通过第二接触孔连接到上公共焊盘电极的下公共焊盘电极; 以及数据焊盘,其具有连接到设置在第三接触孔内的上数据焊盘电极的下数据焊盘电极。
    • 47. 发明授权
    • Method for manufacturing printing plate
    • 印版制造方法
    • US07445724B2
    • 2008-11-04
    • US11416016
    • 2006-05-02
    • Oh Nam KwonHeung Lyul Cho
    • Oh Nam KwonHeung Lyul Cho
    • B44C1/22
    • G03F7/00
    • A method for manufacturing a printing plate to acheive a precise and fine pattern by minimizing a variation of etching critical dimension is disclosed. The method uses a hard mask having an opening on an insulating substrate to form a first trench having a first depth in the insulating substrate. A first etching stopper and a first photoresist may be applied on a surface of the insulating substrate including the first trench for patterning the first photoresist by exposing the first photoresist. Likewise, a second and third trench may be formed.
    • 公开了一种通过最小化蚀刻临界尺寸的变化来制造印版以获得精确和精细图案的方法。 该方法使用在绝缘基板上具有开口的硬掩模,以在绝缘基板中形成具有第一深度的第一沟槽。 第一蚀刻停止器和第一光致抗蚀剂可以施加在包括第一沟槽的绝缘基板的表面上,用于通过暴露第一光致抗蚀剂来图案化第一光致抗蚀剂。 类似地,可以形成第二和第三沟槽。
    • 48. 发明授权
    • Thin film transistor substrate of horizontal electric field type liquid crystal display device and fabricating method thereof
    • 水平电场型液晶显示装置薄膜晶体管基板及其制造方法
    • US07556988B2
    • 2009-07-07
    • US11345370
    • 2006-02-02
    • Byung Chul AhnOh Nam KwonHeung Lyul Cho
    • Byung Chul AhnOh Nam KwonHeung Lyul Cho
    • H01L21/82
    • H01L27/124G02F1/134363G02F1/136213G02F1/1368G02F2001/136295H01L27/1288
    • A thin film transistor substrate of horizontal electric field type includes: a gate line and a first common line formed on a substrate to be in parallel to each other; a data line crossing the gate line and the first common line with a gate insulating film therebetween to define a pixel area; a second common line crossing the first common line having the gate insulating film therebetween; a thin film transistor connected to the gate line and the data line; a common electrode extending from the second common line in said pixel area; a pixel electrode that is parallel to the common electrode and the second common line; a protective film for covering the thin film transistor; a gate pad having a lower gate pad electrode connected to an upper gate pad electrode through a first contact hole; a common pad having a lower common pad electrode connected to an upper common pad electrode through a second contact hole; and a data pad having a lower data pad electrode connected to an upper data pad electrode provided within a third contact hole.
    • 水平电场型薄膜晶体管基板包括:形成在彼此平行的基板上的栅极线和第一公共线; 跨越所述栅极线和所述第一公共线的数据线,其间具有栅极绝缘膜,以限定像素区域; 第二公共线与其间具有栅绝缘膜的第一公共线交叉; 连接到栅极线和数据线的薄膜晶体管; 在所述像素区域中从所述第二公共线延伸的公共电极; 平行于公共电极和第二公共线的像素电极; 用于覆盖薄膜晶体管的保护膜; 栅极焊盘,其具有通过第一接触孔连接到上部栅极焊盘电极的下部栅极焊盘电极; 公共焊盘,其具有通过第二接触孔连接到上公共焊盘电极的下公共焊盘电极; 以及数据焊盘,其具有连接到设置在第三接触孔内的上数据焊盘电极的下数据焊盘电极。
    • 49. 发明授权
    • Thin film transistor array substrate and method of manufacturing the same
    • 薄膜晶体管阵列基板及其制造方法
    • US07413938B2
    • 2008-08-19
    • US11706392
    • 2007-02-15
    • Soon Sung YooHeung Lyul Cho
    • Soon Sung YooHeung Lyul Cho
    • H01L21/00
    • H01L27/1248H01L27/124H01L27/1255H01L29/458
    • A thin film transistor array substrate includes a gate pattern on a substrate. The gate pattern includes a gate electrode, a gate line connected to the gate electrode, and a lower gate pad electrode connected to the gate line. A source/drain pattern includes a source electrode and a drain electrode, a data line connected to the source electrode, and a lower data pad electrode connected to the data line. A semiconductor pattern is formed beneath the source/drain pattern. A transparent electrode pattern includes a pixel electrode connected to the drain electrode, an upper gate pad electrode connected to the lower gate pad electrode, and an upper data pad electrode connected to the lower data pad electrode. The thin film array substrate further includes a gate insulating pattern and a passivation film pattern stacked at remaining areas excluding areas within which the transparent electrode pattern is formed.
    • 薄膜晶体管阵列基板在基板上包括栅极图案。 栅极图案包括栅电极,连接到栅电极的栅极线和连接到栅极线的下栅极焊盘电极。 源极/漏极图案包括源电极和漏电极,连接到源电极的数据线和连接到数据线的下数据焊盘电极。 在源极/漏极图案之下形成半导体图案。 透明电极图案包括连接到漏电极的像素电极,连接到下栅极焊盘电极的上栅极焊盘电极和连接到下数据焊盘电极的上数据焊盘电极。 薄膜阵列基板还包括层叠在除了形成透明电极图案的区域之外的其余区域的栅极绝缘图案和钝化膜图案。
    • 50. 发明授权
    • Liquid crystal display panel and fabricating method thereof
    • 液晶显示面板及其制造方法
    • US07206057B2
    • 2007-04-17
    • US10981542
    • 2004-11-05
    • Soon Sung YooYoun Gyoung ChangHeung Lyul Cho
    • Soon Sung YooYoun Gyoung ChangHeung Lyul Cho
    • G02F1/1339G02F1/1337
    • H01L27/1288G02F1/133707G02F1/13394G02F1/13458G02F2001/136231H01L27/1214
    • A liquid crystal display (LCD) panel is fabricated in a simplified process. The LCD panel includes a thin film transistor (TFT) array substrate with a gate and data lines crossing each other to define a pixel area, a TFT at the crossings of the gate and data lines, a protective film, and a pixel electrode connected to the TFT and formed within a pixel opening that is arranged at the pixel area and formed through the protective film and a gate insulating film. A color filter array substrate is joined to the TFT array substrate. A pattern spacer is between the TFT and color filter array substrate and overlaps at least one of the gate line, the data line, and the thin film transistor. A rib is formed from the same layer as the pattern spacer and overlaps the pixel electrode. Liquid crystal material is provided within the LCD panel.
    • 以简化的工艺制造液晶显示器(LCD)面板。 LCD面板包括薄膜晶体管(TFT)阵列基板,栅极和数据线彼此交叉以限定像素区域,在栅极和数据线的交叉处的TFT,保护膜和连接到 TFT形成在像素区域内,并形成在像素区域并形成在保护膜和栅极绝缘膜上的像素开口内。 滤色器阵列基板连接到TFT阵列基板。 图案间隔物位于TFT和滤色器阵列基板之间,并与栅极线,数据线和薄膜晶体管中的至少一个重叠。 肋由与图案间隔物相同的层形成,并与像素电极重叠。 液晶材料设置在LCD面板内。