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    • 42. 发明授权
    • Plasma wafer processing tool having closed electron cyclotron resonance
    • 具有闭合电子回旋共振的等离子体晶片加工工具
    • US5189446A
    • 1993-02-23
    • US702654
    • 1991-05-17
    • Michael S. BarnesJohn C. ForsterJohn H. Keller
    • Michael S. BarnesJohn C. ForsterJohn H. Keller
    • H01J37/32
    • H01J37/32192H01J37/32678
    • A cylindrical plasma reaction chamber is equipped with a pair of axially separated solenoid coils and a multipole magnet structure extending between the coil pair. An axially-directed magnetic field and a transverse cusp field are respectively provided by the coils and the magnet. A working gas is contained within the chamber and is excited by applied microwave energy. The strengths of the two magnetic fields and the microwave frequency value are selected to produce a substantially closed electron cyclotron resonance (ECR) zone of proper size. This ECR zone is located axially between the solenoid fields. Baffling is used to separate the closed plasma ECR zone from the workpiece region of the chamber. A semiconductor wafer is positioned within the workpiece region to intercept most plasma particles which follow the axially directed magnetic lines passing through the ECR zone. Few of the particles from the closed ECR zone travel to destinations other than the wafer.
    • 圆柱形等离子体反应室配备有一对轴向分离的电磁线圈和在线圈对之间延伸的多极磁体结构。 分别由线圈和磁体提供轴向磁场和横向尖点场。 工作气体包含在室内,并被施加的微波能量激发。 选择两个磁场的强度和微波频率值以产生具有适当尺寸的基本闭合的电子回旋共振(ECR)区域。 该ECR区位于电磁场之间。 Baffling用于将封闭的等离子体ECR区域与腔室的工件区域分开。 半导体晶片位于工件区域内,以拦截大部分遵循经过ECR区的轴向定向磁线的等离子体颗粒。 来自闭合的ECR区域的少量颗粒行进到晶片以外的目的地。