专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明申请

US20090067468A1 Laser system 有权
标题翻译：激光系统
公开(公告)号：US20090067468A1
公开(公告)日：2009-03-12
申请号：US11980172
申请日：2007-10-30
申请人： Daniel J.W. Brown , William N. Partlo , Richard L. Sandstrom
发明人： Daniel J.W. Brown , William N. Partlo , Richard L. Sandstrom
IPC分类号： H01S3/22
CPC分类号： H01S3/2383 , G03F7/70583 , H01S3/0057 , H01S3/08036 , H01S3/08059 , H01S3/10092 , H01S3/225 , H01S3/2325
摘要： A method/apparatus may comprise a laser light source which may comprise a solid state seed laser system producing a seed laser output having a nominal center wavelength at a pulse repetition rate; a first and a second gas discharge laser amplifier gain medium each operating at a pulse repetition rate less than that of the seed laser system; a beam divider providing each of the respective first and second amplifier gain mediums with seed laser output pulses; a frequency converter modifying the nominal center wavelength of the output of the seed laser to essentially the nominal center wavelength of the amplifier gain medium; a beam combiner combining the outputs of the respective amplifier gain mediums to provide a light source output having the pulse repetition rate of the seed laser; a coherence buster operating on either or both of the output of the seed laser or amplifier gain mediums.
摘要翻译：方法/装置可以包括激光光源，其可以包括固态种子激光器系统，其产生具有脉冲重复率的标称中心波长的种子激光器输出; 第一和第二气体放电激光放大器增益介质，每个以比种子激光器系统的脉冲重复频率工作; 一个分束器，为每个相应的第一和第二放大器增益介质提供种子激光输出脉冲; 变频器将种子激光器的输出的标称中心波长修改为基本上放大器增益介质的标称中心波长; 组合各个放大器增益介质的输出以提供具有种子激光器的脉冲重复率的光源输出的光束组合器; 在种子激光器或放大器增益介质的输出中的任一个或两者上工作的相干致动器。

42. 发明申请

US20080151944A1 Line narrowing module 有权
标题翻译：线窄模块
公开(公告)号：US20080151944A1
公开(公告)日：2008-06-26
申请号：US12074079
申请日：2008-02-28
申请人： J. Martin Algots , Robert A. Bergstedt , Walter D. Gillespie , Vladimir A. Kulgeyko , William N. Partlo , German E. Rylov , Richard L. Sandstrom , Brian Strate , Timothy S. Dyer
发明人： J. Martin Algots , Robert A. Bergstedt , Walter D. Gillespie , Vladimir A. Kulgeyko , William N. Partlo , German E. Rylov , Richard L. Sandstrom , Brian Strate , Timothy S. Dyer
IPC分类号： H01S3/10
CPC分类号： H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
摘要： A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic.
摘要翻译：一种用于窄带DUV大功率高重复率气体放电激光器的线窄化方法和模块，其产生具有标称光路的脉冲串中的输出激光束脉冲束脉冲，其可以包括：分散中心波长选择光学器件可移动地安装在线路窄化模块的光路内，为至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定的每个脉冲选择至少一个中心波长; 第一调谐机构部分地通过选择包含脉冲朝向分散中心的激光束的透射角度来选择包含分散中心波长选择光学器件上的各个脉冲的激光束的入射角波长选择光学元件。

43. 发明授权

US06778584B1 High power gas discharge laser with helium purged line narrowing unit 有权
标题翻译：大功率气体放电激光器与氦气吹扫线变窄单元
公开(公告)号：US06778584B1
公开(公告)日：2004-08-17
申请号：US09716041
申请日：2000-11-17
申请人： William N. Partlo , Richard L. Sandstrom , Raymond F. Cybulski , Igor V. Fomenkov , Alexander I. Ershov
发明人： William N. Partlo , Richard L. Sandstrom , Raymond F. Cybulski , Igor V. Fomenkov , Alexander I. Ershov
IPC分类号： H01S310
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/0404 , H01S3/041 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： A helium purge for a grating based line narrowing device for minimizing thermal distortions in line narrowed lasers producing high energy laser beams at high repetition rates. Applicants have shown substantial improvement in performance with the uses of helium purge as compared to prior art nitrogen purges. In preferred embodiments a stream of helium gas is directed across the face of the grating. In other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.
摘要翻译：用于基于光栅的线窄化装置的氦气吹扫，用于最大限度地减少线性窄激光器中的热失真，以高重复率产生高能激光束。与现有技术的氮气吹扫相比，申请人已经显示出使用氦吹扫的性能方面的显着改进。在优选实施例中，氦气流被引导穿过光栅的表面。在其它实施例中，减少吹扫气体压力以减少热气体层的光学效应。

44. 发明授权

US06538737B2 High resolution etalon-grating spectrometer 有权
公开(公告)号：US06538737B2
公开(公告)日：2003-03-25
申请号：US10003513
申请日：2001-10-31
申请人： Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Daniel J. W. Brown
发明人： Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Daniel J. W. Brown
IPC分类号： G01J314
CPC分类号： G01J3/12 , G01J1/4257 , G01J3/22 , G01J3/26 , G01J9/02
摘要： A high resolution etalon-grating spectrometer. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The etalon and the grating are placed in a leak-fight enclosure filled with a gas, such as nitrogen or helium. The wavelength scanning of the spectrometer is done by changing the gas pressure in the enclosure during the scan.

45. 发明授权

US06744060B2 Pulse power system for extreme ultraviolet and x-ray sources 有权
标题翻译：用于极紫外和X射线源的脉冲电力系统
公开(公告)号：US06744060B2
公开(公告)日：2004-06-01
申请号：US10120655
申请日：2002-04-10
申请人： Richard M. Ness , Igor V. Fomenkov , William N. Partlo
发明人： Richard M. Ness , Igor V. Fomenkov , William N. Partlo
IPC分类号： H05H104
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： The present invention provides a pulse power system for extreme ultraviolet and x-ray light sources. The pulse power system produces electrical pulses of at least 12 J at pulse repetition rates of at least 2000 Hz. The system is extremely reliable and has design lifetime substantially in excess of 10 billion pulses. The system includes a charging capacitor bank, a fast charger for charging the charging capacitor bank in time periods of less than 0.5 seconds. A voltage control circuit is provided for controlling the charging voltage capacitor to within less than 0.5 percent of desired values. The system includes a magnetic compression circuit for creating, compressing in duration and amplifying voltage pulses. A trigger circuit discharges the charging capacitor bank into the pulse compression circuit so as to produce EUV or x-ray light pulses with a timing accuracy of less than 10 ns. In a preferred embodiment a pulse transformer with at least two one-turn primary windings and a single one turn secondary winding is included in the pulse compression circuit and increases the pulse voltage by at least a factor of 3. The pulse power system described herein is useful for providing high energy electrical pulses at repetition rates in excess of 2000 Hz for several high temperature discharge EUV or x-ray light sources. These include dense plasma focus devices, Z pinch devices, hollow cathode Z-pinch devices and capillary discharge devices. Inclusion of the pulse transformer is recommended when the system is used for dense plasma focus, and the two types of Z-pinch devices.
摘要翻译：本发明提供一种用于极紫外和X射线光源的脉冲电力系统。脉冲功率系统产生至少为12 J的脉冲重复频率至少为2000 Hz的电脉冲。该系统非常可靠，设计寿命基本上超过100亿个脉冲。该系统包括充电电容器组，用于在小于0.5秒的时间段内对充电电容器组充电的快速充电器。提供了一种电压控制电路，用于将充电电压电容器控制在所需值的0.5％以内。该系统包括用于产生，压缩持续时间并放大电压脉冲的磁压缩电路。触发电路将充电电容器组放电到脉冲压缩电路中，以便产生具有小于10ns的定时精度的EUV或X射线光脉冲。在优选实施例中，具有至少两个单匝初级绕组和单个匝次级绕组的脉冲变压器包括在脉冲压缩电路中，并且将脉冲电压增加至少3倍。本文描述的脉冲功率系统是对于几个高温放电EUV或X射线光源，以超过2000Hz的重复率提供高能电脉冲是有用的。这些包括致密等离子体聚焦装置，Z夹紧装置，空心阴极Z夹点装置和毛细管放电装置。当系统用于等离子体浓度较高时，推荐使用脉冲变压器，以及两种类型的Z夹式器件。

46. 发明授权

US5936988A High pulse rate pulse power system 失效
标题翻译：高脉冲脉冲电源系统
公开(公告)号：US5936988A
公开(公告)日：1999-08-10
申请号：US118773
申请日：1998-07-18
申请人： William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
发明人： William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
IPC分类号： H01F30/00 , G03F7/20 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： G03F7/70483 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/097 , H03K17/80 , H03K3/57 , H01S3/225
摘要： A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 2000 charges per second.
摘要翻译：用于以2000Hz或更高的速率提供受控高能电脉冲的高脉冲脉冲电源。源包括一个包括充电电容器，固态开关和限流电感器的脉冲发生电路。在脉冲发生电路中产生的脉冲在至少两个脉冲压缩电路中被压缩，并且升压脉冲变压器将峰值电压增加到至少12000伏特。提供了一种非常快速的调节电源，用于在小于400微秒内对充电电容器充电，并且包括编程的处理器的脉冲控制系统以至少2000的速率控制充电电容器的充电至小于约百分之一的精度每秒收费

47. 发明授权

US07596164B2 Control system for a two chamber gas discharge laser 有权
标题翻译：双室气体放电激光器控制系统
公开(公告)号：US07596164B2
公开(公告)日：2009-09-29
申请号：US11376364
申请日：2006-03-15
申请人： John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
发明人： John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
IPC分类号： H01S3/223
CPC分类号： H01S3/097 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/08031 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/10038 , H01S3/1055 , H01S3/225 , H01S3/2251 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。特别适用于双室气体放电激光系统的新型控制特征包括：（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度控制和（4）F2注入控制与新的学习算法。

48. 发明授权

US07079564B2 Control system for a two chamber gas discharge laser 有权
标题翻译：双室气体放电激光器控制系统
公开(公告)号：US07079564B2
公开(公告)日：2006-07-18
申请号：US11181258
申请日：2005-07-14
申请人： John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
发明人： John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
IPC分类号： H01S3/22
CPC分类号： H01S3/097 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/08031 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/10038 , H01S3/1055 , H01S3/225 , H01S3/2251 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。特别适用于双室气体放电激光系统的新型控制特征包括：（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度控制和（4）F 2注入控制与新的学习算法。

49. 发明授权

US06815700B2 Plasma focus light source with improved pulse power system 失效
标题翻译：等离子聚焦光源具有改进的脉冲电源系统
公开(公告)号：US06815700B2
公开(公告)日：2004-11-09
申请号：US10189824
申请日：2002-07-03
申请人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin
发明人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin
IPC分类号： H05H104
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： The present invention provides a high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially. The central electrode is preferably hollow and the active gas is introduced out of the hollow electrode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. In preferred embodiments the central electrode is pulsed with a high negative electrical pulse so that the central electrode functions as a hollow cathode. Preferred embodiments present optimization of capacitance values, anode length and shape and preferred active gas delivery systems are disclosed. Preferred embodiments also include a pulse power system comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer. Special techniques are described for cooling the central electrode. In one example, water is circulated through the walls of the hollow electrode. In another example, a heat pipe cooling system is described for cooling the central electrode.
摘要翻译：本发明提供了一种高能量光子源。一对等离子体夹紧电极位于真空室中。该室包含工作气体，其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。脉冲电源在电压足够高的电压下提供电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹持，从而在源或活性气体的光谱线处提供辐射。优选地，电极被同轴配置。中心电极优选是中空电极，并且活性气体从中空电极引出。这允许对光谱线源进行优化和缓冲气体的单独优化。在优选的实施例中，中心电极用高的负电脉冲脉冲，使得中心电极用作空心阴极。本发明优选的实施例公开了电容值的优化，阳极长度和形状以及优选的活性气体输送系统。优选实施例还包括脉冲功率系统，其包括充电电容器和包括脉冲变压器的磁压缩电路。描述了用于冷却中心电极的特殊技术。在一个实例中，水通过中空电极的壁循环。在另一个实例中，描述了用于冷却中心电极的热管冷却系统。

50. 发明授权

US6028872A High pulse rate pulse power system with resonant power supply 有权
标题翻译：高脉冲脉冲电源系统具有谐振电源
公开(公告)号：US6028872A
公开(公告)日：2000-02-22
申请号：US211825
申请日：1998-12-15
申请人： William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
发明人： William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
IPC分类号： G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/097 , H01S3/0971 , H01S3/225 , H02M9/02 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/097 , H01S3/0971 , H01S3/225 , H03K17/80 , H03K3/57 , H01S3/09702
摘要： A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated resonant power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 2000 charges per second.
摘要翻译：用于以2000Hz或更高的速率提供受控高能电脉冲的高脉冲脉冲电源。源包括一个包括充电电容器，固态开关和限流电感器的脉冲发生电路。在脉冲发生电路中产生的脉冲在至少两个脉冲压缩电路中被压缩，并且升压脉冲变压器将峰值电压增加到至少12000伏特。提供了一种非常快速的调节谐振电源，用于在小于400微秒内对充电电容器充电，并且包括编程处理器的脉冲控制系统以至少的速率控制充电电容器的充电至小于约百分之一的精度 2000次每秒收费。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式