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41. 发明专利

JPH08160609A PHOTOSENSITIVE COMPOSITION FOR LITHOGRAPHIC PRINTING PLATE 失效
公开(公告)号：JPH08160609A
公开(公告)日：1996-06-21
申请号：JP29916194
申请日：1994-12-02
申请人： OKAMOTO KAGAKU KOGYO KK
发明人： NAKATSUKA MASAO
IPC分类号： G03F7/004 , G03F7/00 , G03F7/021
摘要： PURPOSE: To provide photosensitive composition for a lithographic printing plate excellent in the visible image property, aging stability, and bright room workability. CONSTITUTION: A photosensitive composition for a lithographic plate contains a ziazo resin, an organic polymer compound, and a blue dye. The ziazo resin contains a compound expressed by formula I or II, and the photosensitive compound contains a compound expressed by the formula III. In formulas I and II, X indicates organic anion, R -R indicate the hydrogen atom, alkyl group, alkoxy group, or hydroxy group, R indicates the hydrogen atom, alkyl group, or phenyl group, and (n) indicates an integer of 1 or more. In the formula II, A indicates the group introduced from an aromatic compound having the carboxyl group and/or hydroxyl group.

42. 发明专利

JPH07207146A PHOTOSENSITIVE COMPOSITION FOR LITHOGRAPHIC PRINTING 失效
公开(公告)号：JPH07207146A
公开(公告)日：1995-08-08
申请号：JP143294
申请日：1994-01-12
申请人： OKAMOTO KAGAKU KOGYO KK
发明人： NAKATSUKA MASAO
IPC分类号： G03F7/016 , C08F299/06 , C08G18/67 , C08L75/00 , C08L75/14 , C09D11/03 , C09D11/10 , C09D11/101 , C09D11/103 , C09D11/106 , C09D11/108 , C09D175/14 , G03F7/00 , G03F7/038
摘要： PURPOSE:To obtain a photosensitive composition for lithographic printing, providing a negative photosensitive lithographic plate having high sensitivity, excellent film strength, chemical resistance and printing resistance, containing a diazonium compound, an alkali-soluble polymer compound, a specific polyurethane resin and a halogen-containing condensed phosphoric ester. CONSTITUTION:The photosensitive composition contains (A) preferably 1-60wt.% of a diazonium compound such as 4-diazodiophenylamine, (B) preferably 1-55wt.% of an alkali-soluble polymer compound such as N-(4-hydroxyphenyl) acrylamide polymer, (C) preferably 40-95wt.% of a polyurethane resin having a structure of the formula and (D) preferably 0.1-40wt.% of a halogen-containing condensed phosphoric ester.

43. 发明专利

JPH06138658A ALKALI-DEVELOPABLE PHOTOSENSITIVE COMPOSITION 失效
公开(公告)号：JPH06138658A
公开(公告)日：1994-05-20
申请号：JP11561191
申请日：1991-04-19
申请人： OKAMOTO KAGAKU KOGYO KK
发明人： NAKATSUKA MASAO
IPC分类号： G03F7/004 , G03F7/00 , G03F7/027 , G03F7/028 , G03F7/033 , G03F7/038 , H01L21/027
摘要： PURPOSE:To enable an aqueous solution of alkali containing substantially no organic solvent to be used for development by incorporating an alkali-soluble copolymer made from a specified monomer and as structural units, and a cation- photogenerator. CONSTITUTION:This composition contains the cation-photogenerator and the alkali-soluble copolymer made from the monomer represented by formula I or II, and the monomer represented by formula III. In formulae I-II, each of R1 and R2 is H or CH3. The monomer of formula I is embodied by N-(4- hydroxyphenyl)-maleimide and the like, that of formula II is embodied by N-(hydroxyphenyl)-methacrylimide and the like, and that of formula III is embodied by glycidyl metyhacrylate and the like. It is preferred that the amount of the monomer of formula I or II to be used for forming the copolymer is 10-80weight% of the copolymer and that of formula III is 20-90weight% of the copolymer.

44. 发明专利

JPH04152345A PHOTOSENSITIVE LAYER FOR PLANOGRAPHIC PRINTING PLATE 失效
公开(公告)号：JPH04152345A
公开(公告)日：1992-05-26
申请号：JP27755590
申请日：1990-10-16
申请人： OKAMOTO KAGAKU KOGYO KK
发明人： NAKATSUKA MASAO
IPC分类号： G03F7/004 , G03F7/00 , G03F7/021 , G03F7/031 , G03F7/033
摘要： PURPOSE:To enhance printability and storage stability with time lapse by mixing a specified amount of specified compound. CONSTITUTION:The photosensitive layer containing an acrylic copolymer having hydroxy groups and carboxy groups, the organic acid salt of a diazo resin, and a dye, for forming the plano-graphic printing plate further contains the acid-photogenerating compound represented by formula I in an amount of 0.3-10wt.%. This compound is embodied by trichloromethyl phenylsulfonate, tribromophenylsulfonate, and trichloromethyl 2,4-dichlorophenylsulfonate. In the formula I, R is optionally substituted alkyl, such aryl, or a heterocyclic group, and each of X1-X3, is halogen, thus permitting a printed image to be sharp and storage stability to to be enhanced.

45. 发明专利

JPH0497253A PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE 失效
公开(公告)号：JPH0497253A
公开(公告)日：1992-03-30
申请号：JP21184790
申请日：1990-08-10
申请人： OKAMOTO KAGAKU KOGYO KK
发明人： NAKATSUKA MASAO
IPC分类号： G03F7/016 , G03F7/027 , G03F7/038
摘要： PURPOSE:To improve an inking property by incorporating a copolymer contg. a stearyl acrylate monomer as one constituting unit of a high-polymer compd. into a photosensitive layer. CONSTITUTION:The copolymer contg. 10 to 50wt.% having an alcoholic hydroxyl group, 10 to 50wt.% constitutional unit having an arom. hydroxyl group, 5 to 40wt.% constitutional unit expressed by formula I, and 1 to 20wt.% constitutional unit expressed by formula III, etc., is incorporated at 0.5 to 30wt.% into the photosensitive layer. In the formulas I to III, R1 to R3 denote a hydrogen atom or methyl group. The photosensitive planographic printing plate which has the excellent inking property and can be developed by both of developers for negative type and positive type PS plates.

46. 发明专利

JPS5944044A Photosensitive lithographic plate 失效
标题翻译：光敏光刻板
公开(公告)号：JPS5944044A
公开(公告)日：1984-03-12
申请号：JP15478482
申请日：1982-09-06
申请人： Okamoto Kagaku Kogyo Kk
发明人： EZAKA TERUO , OOTA TAKATOSHI , NAKATSUKA MASAO
IPC分类号： G03F7/021 , G03F7/016 , G03C1/71 , G03F7/08
CPC分类号： G03F7/016
摘要： PURPOSE:To obtain a photosensitive compsn. not causing stains on unexposed parts even after lapse of several days under severe conditions, by incorporating a diazo compd. soluble in org. solvents in a photosensitive layer composed of a diazo resin org. salt or a diazo resin inorg. salt, and a polymer compd. soluble in org. solvents in a specified amt. per said layer. CONSTITUTION:A diazo compd. salt soluble in org. solvents is incorporated in the photosensitive layer composed of a diazo resin org. or inorg. salt and a polymer compd. soluble in org. solvents by 0.1-50wt% of the total weight of said layer to obtain a photosensitive lithographic plate. The diazo resin org. or inorg. salt used for the layer is obtained by bringing an acidic aromatic compd. or an inorg. compd. into reaction with a condensation product of p- diazophenylamine, 3-methoxydiphenylamine or its deriv. with form- or aceto-aldehyde, and insolubilizing it in water, and solubilizing in org. solvents.
摘要翻译：目的：获得光敏组合物。即使在恶劣条件下经过几天后，也不会引起未曝光部位的污渍，通过掺入重氮化合物。可溶于组织由重氮树脂组成的感光层中的溶剂。盐或重氮树脂。盐和聚合物。可溶于组织溶剂在规定的amt。每个层。规定：重氮化合物盐溶于组织在由重氮树脂组成的感光层中加入溶剂。或inorg。盐和聚合物可溶于组织溶剂占所述层的总重量的0.1-50重量％，以获得光敏平版印刷版。重氮树脂组织或inorg。通过使酸性芳香族化合物得到用于该层的盐。或一个inorg。卤素化合物。与对二氮苯胺，3-甲氧基二苯胺或其衍生物的缩合产物反应。与形式或乙醛，并将其不溶于水，并溶解于有机溶剂中。溶剂。

47. 发明专利

JPS5855572A PREPARATION OF ALUMINUM SUPPORT FOR PLANOGRAPHIC PRINTING 失效
公开(公告)号：JPS5855572A
公开(公告)日：1983-04-01
申请号：JP15145581
申请日：1981-09-25
申请人： OKAMOTO KAGAKU KOGYO KK
发明人： YOSHIDA KUNITERU , NAKATSUKA MASAO , EZAKA TERUO
IPC分类号： C23F3/02 , B41N3/00 , B41N3/04 , C23F3/00
摘要： PURPOSE:To continuously obtain a uniform Al support for planographic printing, by applying sandblasting to an Al plate while the surface polished state of the Al plate measured by projecting light is fed back to a polishing condition. CONSTITUTION:An Al plate A defatted in a defatting process 21 is transferred to a measuring process 31 through a brush polishing process 23, an alkali etching process 24, a neutralizing and washing process 26 by nitric acid, an anodic oxidation process 28 and a drying process 30. In this drawing, numerals 22, 25, 27, 29 show washing processes pespectively. Subsequently, in the process 31, light is projected to the Al plate A from a light source 2 and, while a light reflection amount measured by a light receiver 3 is returned to the brush polishing process 31, sandblasting is carried out to obtain the title Al support. This control means is carried out by a common automatic control means 32. Because this method for measuring the light reflection amount is contactless, said light reflection amount can be measured without damaging the surface of the Al plate as well as can be continuously measured from the start of polishing to the termination thereof and a measuring place can be also selected optionally.

48. 发明专利

JPS53120903A PHOTOSENSITIVE LAYER FOR PRINTING PLATE 失效
公开(公告)号：JPS53120903A
公开(公告)日：1978-10-21
申请号：JP3482377
申请日：1977-03-29
申请人： OKAMOTO KAGAKU KOGYO KK
发明人： OOTA TAKATOSHI , NAKATSUKA MASAO , NOGUCHI MITSUSHIGE
IPC分类号： C08F20/00 , C08F20/26 , C08F220/26 , C08F290/00 , C08F299/00 , G03C1/54 , G03C7/08

49. 发明专利

JPS52103201A PHOTOOSENSITIVE COMPOSITION 失效
公开(公告)号：JPS52103201A
公开(公告)日：1977-08-30
申请号：JP1978076
申请日：1976-02-25
申请人： OKAMOTO KAGAKU KOGYO KK
发明人： OOTA TAKATOSHI , NAKATSUKA MASAO
IPC分类号： C08F8/00 , C08F8/30 , G03F7/038

50. 发明专利

JPH11305428A PHOTOSENSITIVE COMPOSITION FOR LITHOGRAPHIC PRINTING PLATE 失效
公开(公告)号：JPH11305428A
公开(公告)日：1999-11-05
申请号：JP11483698
申请日：1998-04-24
申请人： OKAMOTO KAGAKU KOGYO KK
发明人： MATSUBA YUKO , NAKATSUKA MASAO
IPC分类号： G03F7/021 , G03F7/00 , G03F7/027 , G03F7/033
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive compsn. which can be developed with an alkali aq. soln. containing no org. solvent and which has excellent printing durability. chemical resistance and underdeveloping property as a printing plate by using a specified copolymer as an alkali-soluble polymer compd. SOLUTION: This compsn. contains an alkali-soluble diazo resin or its salt and an alkali-soluble polymer compd. The alkali-soluble polymer compd. is obtd. by copolymn. of 5 to 55 wt.% of p-isopropenylphenol or the like, 5 to 35 wt.% of acrylonitrile, 3 to 20 wt.% of compd. comprising mono (2- methacryloxyethyl) hexahydrophthalate and α,β-unsatd. carboxylic acid, 5 to 50 wt.% of compd. comprising acrylates and methacrylates having aliphatic hydroxyl groups, 5 to 50 wt.% of compd. comprising acrylates and methacrylates, and 1 to 50 wt.% of oligomers comprising carboxyl group-contg. urethane diacrylate oligomers and urethane dimethacrylate oligomers.

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