专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明公开

EP2700082A1 HOCHLEISTUNGSZERSTÄUBUNGSQUELLE 有权转让
公开(公告)号：EP2700082A1
公开(公告)日：2014-02-26
申请号：EP12714576.1
申请日：2012-03-30
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , RUHM, Kurt
IPC分类号： H01J37/34 , C23C14/34
CPC分类号： C23C14/35 , C23C14/352 , H01J37/3405 , H01J37/3444 , H01J37/3464 , H01J37/3467 , H01J37/3497
摘要： The invention relates to a magnetron sputtering process that allows material to be sputtered from a target surface in such a way that a high percentage of the sputtered material is provided in the form of ions. According to the invention, said aim is achieved using a simple generator, the power of which is fed to multiple magnetron sputtering sources spread out over several time intervals, i.e. the maximum power is supplied to one sputtering source during one time interval, and the maximum power is supplied to the following sputtering source in the subsequent time interval, such that discharge current densities of more than 0.2A/cm
2 are obtained. The sputtering target can cool down during the off time, thus preventing the temperature limit from being exceeded.
摘要翻译：本发明涉及一种磁控溅射工艺，该工艺允许从靶表面溅射材料，使得高比例的溅射材料以离子形式提供。根据本发明，所述目标是通过使用简单的发生器实现的，其发射功率被馈送到分布在多个时间间隔上的多个磁控溅射源，即，在一个时间间隔期间将最大功率提供给一个溅射源，并且最大值在随后的时间间隔内将功率提供给下一个溅射源，使得获得大于0.2A / cm 2的放电电流密度。在关闭时间期间，溅射靶可以冷却，从而防止超过温度限制。

42. 发明公开

EP2359382A1 ZÜNDVORRICHTUNG FÜR ARC QUELLEN 有权
标题翻译：对于ARC-源点火装置
公开(公告)号：EP2359382A1
公开(公告)日：2011-08-24
申请号：EP09743852.7
申请日：2009-10-08
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , GSTOEHL, Oliver , HAGMANN, Juerg
IPC分类号： H01J37/32
CPC分类号： H01J37/32 , C23F1/08 , H01J37/32009 , H01J37/32055
摘要： The present invention relates to an ignition device for igniting a high-current discharge of an electrical arc evaporator in a vacuum coating system. Ignition is performed by means of mechanically closing and opening a contact between the cathode and anode. Contact is established by means of an ignition finger which can move on a forced path. On account of the forced path, the ignition finger can be moved to a park position, which is protected against coating, by means of a simple mechanical drive and said ignition finger can also be used to ignite a second target.

43. 发明公开

EP2274763A1 METHOD FOR MANUFACTURING WORKPIECES WITH ION-ETCHED SURFACE 有权转让
标题翻译：过程：用于产生表面工件IONENGEÄTZTER
公开(公告)号：EP2274763A1
公开(公告)日：2011-01-19
申请号：EP09734820.5
申请日：2009-04-15
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , GSTOEHL, Oliver , ESSELBACH, Markus
IPC分类号： H01J37/32 , H01L21/00
CPC分类号： H01J37/32 , H01J2237/334
摘要： Planetary carriers (22) for workpieces mounted on a carousel (19) are provided within a vacuum chamber. A source (24) for a cloud comprising ions (CL) is provided so that a central axis (ACL) of the cloud intercepts the rotary axis (A20) of the carousel (19). The cloud (CL) has an ion density profile at the moving path (T) of planetary axes (A22) which drops to 50% of the maximum ion density at a distance from the addressed center axis (ACL) which is at most half the diameter of the planetary carriers (22). When workpieces upon the planetary carriers (22) are etched by the cloud comprising ions material which is etched off is substantially not redeposited on neighboring planetary carriers but rather ejected towards the wall of the vacuum chamber.

44. 发明公开

EP2081700A1 METHOD AND APPARATUS FOR MANUFACTURING CLEANED SUBSTRATES OR CLEAN SUBSTRATES WHICH ARE FURTHER PROCESSED 审中-公开
标题翻译：用于制造清洗过的衬底的或纯SUBSTRATES的方法和设备这仍然PROCESSED
公开(公告)号：EP2081700A1
公开(公告)日：2009-07-29
申请号：EP06807618.1
申请日：2006-10-27
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , GSTOEHL, Oliver , LENDI, Daniel
IPC分类号： B08B7/00 , H01J37/32 , H01L21/306 , H01L21/00
CPC分类号： B08B7/0035 , H01J37/32568 , H01J37/32623 , H01J37/32633 , H01J2237/335 , H01L21/67028 , H01L21/67069
摘要： Plasma etch-cleaning of substrates is performed by means of a plasma discharge arrangement comprising an electron source cathode (5) and an anode arrangement (7). The anode arrangement (7) comprises on one hand an anode electrode (9) and on the other hand and electrically isolated therefrom a confinement (11). The confinement (11) has an opening (13) directed towards an area (S) of a substrate (21) to be cleaned. The electron source cathode (5) and the anode electrode (9) are electrically supplied by a supply circuit with a supply source (19). The circuit is operated electrically floating.

45. 发明公开

EP3013996A1 DEKORATIVE HIPIMS-HARTSTOFFSCHICHTEN 有权转让
公开(公告)号：EP3013996A1
公开(公告)日：2016-05-04
申请号：EP14732919.7
申请日：2014-06-26
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried
IPC分类号： C23C14/35 , C23C14/34 , C23C14/06 , C23C14/00
CPC分类号： C23C14/0036 , C23C14/0042 , C23C14/0641 , C23C14/3414 , C23C14/3485 , C23C14/35 , H01J37/3429 , H01J37/3467
摘要： The invention relates to a method for coating substrates with a decorative layer of hard material which is guided into a vacuum coating chamber, said decorative layer of hard material is deposited by means of a reactive HIPIMS-process, and the energy content in the power pulses is controlled in such a manner that the deposited layer of hard material has a homogeneous colour, a high degree of smoothness and a high strength.
摘要翻译：本发明涉及一种用硬质材料装饰层涂覆基材的方法，所述硬质材料装饰层被引导进入真空涂布室，所述硬质材料装饰层通过反应性HIPIMS工艺沉积，并且功率脉冲中的能量含量被控制为使得硬质材料的沉积层具有均匀的颜色，高度的平滑度和高的强度。

46. 发明公开

EP2834389A1 AN EINE INDIREKTE KÜHLVORRICHTUNG ANGEPASSTES TARGET 有权转让
标题翻译：涂层源的间接COOLER匹配的目标
公开(公告)号：EP2834389A1
公开(公告)日：2015-02-11
申请号：EP13709319.1
申请日：2013-03-05
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , HAGMANN, Juerg
IPC分类号： C23C14/34
CPC分类号： H01J37/3497 , C09J7/22 , C23C14/34 , C23C14/3407 , C23C14/54 , H01J37/3411 , H01J37/3417 , H01J37/3435 , H01J2237/002
摘要： The invention relates to a target which is embodied as a material source for a depositing method from the gas phase, comprising a front side and a rear side, characterized in that a self-adhesive carbon film is applied to the rear side. Said target can be embodied as a material source for a sputtering method and/or for an arc evaporation method. A particular advantage is that the target is used in a coating source with indirect cooling, the self-adhesive carbon film being in contact with the surface of the membrane which is part of a cooling channel.

47. 发明公开

EP2795658A1 HOMOGENES HIPIMS-BESCHICHTUNGSVERFAHREN 审中-公开
标题翻译：齐HIPIMS涂装工艺
公开(公告)号：EP2795658A1
公开(公告)日：2014-10-29
申请号：EP12812516.8
申请日：2012-11-23
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , RUDIGIER, Helmut
IPC分类号： H01J37/34 , C23C14/34
CPC分类号： C23C14/35 , C23C14/3464 , C23C14/3485 , C23C14/3492 , C23C14/542 , H01J37/3417 , H01J37/3467
摘要： The invention relates to a HIPIMS method by means of which homogeneous layers can be deposited over the height of a coating chamber. Two partial cathodes are used for said purpose. According to the invention, the length of the individual power pulse intervals applied to the partial cathodes is chosen individually and thus a required coating thickness profile over the height of the coating chamber is achieved.

48. 发明公开

EP2794952A1 LOW TEMPERATURE ARC ION PLATING COATING 有权转让
标题翻译：低温电弧离子镀覆
公开(公告)号：EP2794952A1
公开(公告)日：2014-10-29
申请号：EP12805589.4
申请日：2012-12-14
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , KURAPOV, Denis , LECHTHALER, Markus
IPC分类号： C23C14/32 , H01J37/32
CPC分类号： C23C14/345 , C23C14/325 , H01J37/32055 , H01J37/32568
摘要： Coating method for arc coating or arc ion plating coating of substrates in a vacuum chamber in which using an arc evaporator solid material that functions as cathode is evaporated, during arc evaporation the motion of the cathode spot on the solid material surface is accelerated using a magnetic field for avoiding ejection of a large amount of macro-particles or droplets from the solid material surface, negative charged particles resulted from the arc evaporation flow from the cathode to an anode, characterized by the motion of the negative charged particles from the cathode to the anode fundamentally doesn't cause an additional increase of the absolute value of the potential difference between cathode and anode allowing a lower increment of the substrate temperature during coating.

49. 发明公开

EP2771901A1 VERFAHREN ZUR BEREITSTELLUNG SEQUENZIELLER LEISTUNGSPULSE 有权转让
标题翻译：方法用于提供电力连续脉冲
公开(公告)号：EP2771901A1
公开(公告)日：2014-09-03
申请号：EP12784435.5
申请日：2012-10-08
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , LENDI, Daniel , LECHTHALER, Markus
IPC分类号： H01J37/34 , C23C14/34
CPC分类号： H03K3/012 , C23C14/3485 , C23C14/352 , C23C14/54 , H01J37/3467
摘要： The present invention relates to a method for providing power pulses for PVD sputter cathodes which comprise a power consumption component and a cathode element, wherein during a power increase interval for a generator the power on the power consumption component is decreased and then the power on the cathode element is decreased, with changeover being effected such that the power draw from the generator providing the power does not have to be interrupted.

50. 发明公开

EP2768999A2 BOHRER MIT BESCHICHTUNG 有权转让
标题翻译：有涂层钻头
公开(公告)号：EP2768999A2
公开(公告)日：2014-08-27
申请号：EP12783880.3
申请日：2012-10-18
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried
IPC分类号： C23C14/06 , C23C14/54 , C23C16/50 , C23C30/00 , C23C14/34 , C23C28/04 , C23C16/27 , B23G5/00 , C23C14/35 , H01J37/34
CPC分类号： C23C14/35 , B23B2228/105 , B23G5/06 , B23G2200/26 , C23C14/0635 , C23C14/0641 , C23C14/345 , C23C14/3485 , C23C14/3492 , C23C14/352 , C23C14/355 , C23C14/54 , C23C14/548 , C23C16/276 , C23C16/277 , C23C16/278 , C23C16/50 , C23C28/044 , C23C28/046 , C23C28/048 , C23C30/005 , H01J37/3405 , H01J37/3467 , Y10T408/78 , Y10T408/89
摘要： The invention relates to a method for coating a substrate, preferably a drill, wherein at least one first HiPIMS layer is applied by means of a HiPIMS process. Preferably, at least one second layer is applied to the first HiPIMS layer by means of a coating process that does not contain a HiPIMS process.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式