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    • 44. 发明申请
    • Method for fabricating semiconductor laser device
    • 制造半导体激光器件的方法
    • US20070099321A1
    • 2007-05-03
    • US10581202
    • 2004-09-27
    • Mamoru MiyachiYoshinori KimuraKiyofumi Chikuma
    • Mamoru MiyachiYoshinori KimuraKiyofumi Chikuma
    • H01L21/00H01L21/28H01L21/3205
    • H01S5/4043H01S5/0217H01S5/0425H01S5/22H01S5/4087
    • A first intermediate body is fabricated on a semiconductor substrate. The first intermediate body includes a first lasing portion of a multi-layer stack and a metal adherent layer. A second intermediate body is fabricated on a support substrate. The second intermediate body includes a second lasing portion formed of a multi-layer stack to be less in size than the first lasing portion, and a groove formed adjacent thereto to form a metal adherent layer. Then, with waveguide paths brought into close proximity, the adherent layers of the first and second intermediate bodies are fused to generate an integrated adherent layer, thereby securely adhering the first and second lasing portions to each other. Thereafter, the support substrate is stripped off from the second lasing portion, thereby allowing the adherent layer to be partially exposed. A semiconductor laser device is thus fabricated which has the exposed adherent layer as a common electrode.
    • 在半导体衬底上制造第一中间体。 第一中间体包括多层堆叠的第一激光部分和金属粘附层。 在支撑基板上制造第二中间体。 第二中间体包括由多层叠层形成的尺寸小于第一激光部分的第二激光部分和与其相邻形成的沟槽以形成金属粘附层。 然后,随着波导路径相互靠近,第一和第二中间体的粘附层被熔合以产生一体化的粘合层,从而将第一和第二激光部分牢固地粘附到彼此。 此后,从第二激光部分剥离支撑基板,从而允许粘附层部分露出。 因此制造了具有暴露的粘附层作为公共电极的半导体激光器件。
    • 46. 发明授权
    • Nitride semiconductor laser and method of fabricating the same
    • 氮化物半导体激光器及其制造方法
    • US06411636B1
    • 2002-06-25
    • US09468082
    • 1999-12-21
    • Hiroyuki OtaKiyofumi Chikuma
    • Hiroyuki OtaKiyofumi Chikuma
    • H01S500
    • H01S5/0201H01S5/0202H01S5/32341
    • A method for fabricating a nitride-semiconductor laser constituted by superimposing a plurality of crystal layers respectively made of a group III nitride semiconductor (AlxGa1−x)1−YInyN (0≦x≦1, 0≦y≦1) on a cleavable or parting substrate in order comprises the crystal layer forming step of forming a plurality of crystal layers on a cleavable or parting substrate, the step of applying a light beam from the substrate side toward the interface between the substrate and the crystal layers and thereby forming the decomposed-matter area of the nitride semiconductor, and the step of cleaving or parting the substrate along a straight line intersecting with the decomposed-matter area and thereby forming a cleavage plane.
    • 一种制造氮化物半导体激光器的方法,其通过将由III族氮化物半导体(Al x Ga 1-x)1-Y In y N(0≤x≤1,0<= y <1))分别制成的多个晶体层叠加而构成, 在可切割或分离基板上的顺序包括在可切割或分离的基板上形成多个晶体层的晶体层形成步骤,将从基板侧的光束施加到基板和晶体层之间的界面的步骤,以及 从而形成氮化物半导体的分解物区域,以及沿着与分解物区域相交的直线切断或分离基板的步骤,从而形成解理面。
    • 47. 发明授权
    • Device for feeding raw material for chemical vapor phase deposition and method therefor
    • 用于进行化学气相沉积原料的装置及其方法
    • US06270839B1
    • 2001-08-07
    • US09621739
    • 2000-07-21
    • Atsushi OnoeAyako YoshidaKiyofumi Chikuma
    • Atsushi OnoeAyako YoshidaKiyofumi Chikuma
    • C23C1600
    • C23C16/4481
    • A raw material feeding apparatus is provided for a film-forming apparatus in which a thin film is formed from a solid matter as a raw material during chemical vapor-phase deposition. The apparatus includes sub-containers each having an opening for introduction of a gas, an opening for discharge of a gas, a bottom, on which a solid raw material is spread between the inlet opening and the outlet opening, and a wall defining a gap, in which a gas being introduced and discharged is made to contact the solid raw material spread on the bottom while the gas is moved on the surfaces of the material. The apparatus also includes a raw material container for receiving and holding the sub-containers. The apparatus also includes a heating device for heating the raw material container, and carrier gas conveying tubes for introducing a carrier gas into the raw material container and including a passage communicated to the outlet openings of the sub-containers.
    • 本发明提供一种原料输送装置,用于在化学气相沉积期间以固体物质作为原料形成薄膜的成膜装置。 该装置包括各自具有用于引入气体的开口,用于排出气体的开口,底部,其上固体原料在其上在入口和出口之间铺展的子容器,以及限定间隙的壁 其中引入和排出的气体在气体在材料的表面上移动时与扩散在底部上的固体原料接触。 该设备还包括用于接收和保持子容器的原料容器。 该装置还包括用于加热原料容器的加热装置和用于将载气引入原料容器中的载气输送管,并且包括连通到子容器的出口的通道。
    • 50. 发明授权
    • Wavelength converting device having an epitaxial waveguide layer
    • 具有外延波导层的波长转换器件
    • US5581396A
    • 1996-12-03
    • US491620
    • 1995-06-19
    • Hirofumi KubotaKiyofumi Chikuma
    • Hirofumi KubotaKiyofumi Chikuma
    • G02F1/37G02B6/13G02F1/35G02F1/377H01S3/06H01S3/109
    • G02F1/377G02F2001/3548
    • A wavelength converting device comprises: a substrate; an epitaxial cladding layer of K.sub.3 Li.sub.2-x Nb.sub.5+x-y Ta.sub.y O.sub.15+2x (-0.4.ltoreq.x.ltoreq.0.20, 0.ltoreq.y.ltoreq.0.33) deposited on the substrate by metalorganic compound gases including lithium, potassium, tantalum and niobium respectively by using a MOCVD method; and an epitaxial waveguide layer of K.sub.3 Li.sub.2-x' Nb.sub.5+x'-y' Ta.sub.y' O.sub.15+2x' (-0.4.ltoreq.x'.ltoreq.0.20, 0.ltoreq.y'.ltoreq.0.33, x+0.0005.ltoreq.x'.ltoreq.x+0.005 and x'.noteq.x) deposited on the epitaxial cladding layer by metalorganic compound gases including lithium, potassium, tantalum and niobium respectively by using the MOCVD method and having a refractive index larger than that of the epitaxial cladding layer thereby operat-able with a high thermal and electrical stability and a high output even when driven by a high load optical power.
    • 波长转换装置包括:基板; 通过包括锂,钾,钽的金属有机化合物气体沉积在衬底上的K3Li2-xNb5 + x-yTayO15 + 2x(-0.4≤x≤0.20,0≤y≤0.33)的外延包覆层 和铌分别使用MOCVD法; 和K3Li2-x'Nb5 + x'-y'Tay'O15 + 2x'(-0.4≤x≤0.20,0≤y≤0.33,x + 0.0005)的外延波导层 通过使用MOCVD法分别通过包括锂,钾,钽和铌的金属有机化合物气体沉积在外延包层上,并且折射率大于 因此即使在高负载光功率驱动的情况下,外延包覆层也可以具有高的热和电稳定性以及高的输出。