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    • 42. 发明授权
    • Light emitting device and method of manufacturing the same
    • 发光元件及其制造方法
    • US07663305B2
    • 2010-02-16
    • US10602980
    • 2003-06-24
    • Shunpei YamazakiTakeshi Noda
    • Shunpei YamazakiTakeshi Noda
    • H01J1/62
    • H01L27/3246H01L27/3272H01L51/0005H01L51/5218H01L51/5228H01L51/5253H01L51/5284
    • In a top emission structure, there has been a problem in that a wiring, a TFT, or the like is provided in regions other than a light emitting region so that light reflected by the wiring reaches eyes of an observer. The present invention prevents light that is reflected by a wire from reaching eyes of an observer by providing a light-absorbing multilayer film (61) in regions other than a light emitting region. Specifically, the light-absorbing multilayer film (61) is used as an upper layer of a partition wall (also called as a bank or a barrier) that covers ends of a first electrode (66b) whereas an organic resin film (67) is used as a lower layer of the partition wall. The partition wall in the present invention is characterized by being a laminate of three or more layers formed of different materials.
    • 在顶部发光结构中,存在在发光区域以外的区域中设置布线,TFT等的问题,使得由布线反射的光到达观察者的眼睛。 本发明通过在除了发光区域之外的区域中设置吸光多层膜(61)来防止被电线反射的光到达观察者的眼睛。 具体而言,吸光性多层膜(61)用作覆盖第一电极(66b)的端部的分隔壁(也称为隔堤或隔壁)的上层,有机树脂膜(67)为 用作分隔壁的下层。 本发明的分隔壁的特征在于由不同材料形成的3层以上的层叠体。
    • 45. 发明授权
    • Light emitting device
    • 发光装置
    • US07446742B2
    • 2008-11-04
    • US11041264
    • 2005-01-25
    • Takeshi NodaRyota Fukumoto
    • Takeshi NodaRyota Fukumoto
    • G09G3/30
    • G09G3/3233G09G3/3291G09G2300/0465G09G2300/0842G09G2300/0861G09G2310/0251G09G2310/0256G09G2320/0295G09G2320/043H01L27/1296H01L27/3262H01L27/3276
    • A light emitting device is provided where an area occupied by capacitors is decreased, luminance variations of light emitting elements caused by characteristics variations or fluctuations of the gate voltage Vgs of driving TFTs can be suppressed. Each of multiple pixels includes a light emitting element, a first transistor for determining a current value supplied thereto, a second transistor for selecting emission/non-emission thereof according to video signals, a first power supply line, and a second power supply line shared by the multiple pixels. In addition, a compensation circuit is provided each of which includes a third transistor whose gate and drain are connected to the second power supply line, and a fourth transistor for controlling the connection between a third power supply line and the gate and drain of the third transistor. The first and second transistors are connected in series between the light emitting element and the first power supply line, and the gate of the first transistor is connected to the second power supply line.
    • 提供了一种发光器件,其中由电容器占据的面积减小,可以抑制由驱动TFT的栅极电压Vgs的特性变化或波动引起的发光元件的亮度变化。 多个像素中的每一个包括发光元件,用于确定提供给其的电流值的第一晶体管,用于根据视频信号选择发光/不发光的第二晶体管,第一电源线和第二电源线共享 由多个像素。 此外,提供了一种补偿电路,每个补偿电路包括栅极和漏极连接到第二电源线的第三晶体管,以及用于控制第三电源线与第三电源线的栅极和漏极之间的连接的第四晶体管 晶体管。 第一和第二晶体管串联在发光元件和第一电源线之间,第一晶体管的栅极连接到第二电源线。
    • 46. 发明申请
    • MANUFACTURING METHOD OF DISPLAY DEVICE
    • 显示装置的制造方法
    • US20080176351A1
    • 2008-07-24
    • US11843693
    • 2007-08-23
    • Hideaki ShimmotoTakahiro KamoTakeshi NodaTakuo KaitohEiji Oue
    • Hideaki ShimmotoTakahiro KamoTakeshi NodaTakuo KaitohEiji Oue
    • H01L21/00
    • H01L21/02678H01L21/02683H01L21/02686H01L21/02691H01L27/1285H01L29/04
    • The present invention provides a manufacturing method of a display device which can prevent the reduction of a size of a pseudo single-crystalline region having strip-like crystals in forming such a pseudo single-crystalline silicon region on a substrate. A step for forming pseudo single crystals having strip-like crystals on a preset region of a semiconductor film formed on a substrate includes a step for forming the pseudo single crystal by radiating an energy beam to a first region of the semiconductor film while moving a radiation position of the energy beam in a first direction, and a step for forming the pseudo single crystal by radiating the energy beam to a second region of the semiconductor film while moving a radiation position of the energy beam in a second direction opposite to the first direction. The first region and the second region set sizes thereof at a position where the radiation of the energy beam is finished smaller than sizes thereof at a position where the radiation of the energy beam is started. The second region includes a portion where the second region overlaps the first region and a portion where the second region does not overlap the first region.
    • 本发明提供一种显示装置的制造方法,其可以防止在基板上形成这样的假单晶硅区域时具有带状晶体的伪单晶区域的尺寸的减小。 在形成在衬底上的半导体膜的预设区域上形成具有带状晶体的伪单晶的步骤包括:通过在移动辐射的同时将能量束照射到半导体膜的第一区域来形成伪单晶的步骤 能量束在第一方向的位置,以及通过在与第一方向相反的第二方向移动能量束的辐射位置的同时将能量束照射到半导体膜的第二区域来形成伪单晶的步骤 。 第一区域和第二区域在能量束的辐射被完成的位置处的尺寸设定为小于能量束的辐射开始的位置处的尺寸。 第二区域包括第二区域与第一区域重叠的部分和第二区域与第一区域不重叠的部分。
    • 48. 发明申请
    • Semiconductor device and method for manufacturing the same
    • 半导体装置及其制造方法
    • US20070034874A1
    • 2007-02-15
    • US11584524
    • 2006-10-23
    • Tatsuya AraoTakeshi NodaTakuya MatsuoHidehito KitakadoMasanori Kyoho
    • Tatsuya AraoTakeshi NodaTakuya MatsuoHidehito KitakadoMasanori Kyoho
    • H01L29/04H01L21/84
    • H01L27/124H01L27/1214H01L27/1259H01L29/6675H01L29/78621H01L29/78648
    • A semiconductor device that can be manufactured with a reduced cost by decreasing the number of masks is disclosed, and a method for manufacturing the semiconductor device is disclosed. The method for manufacturing the semiconductor device comprises the steps of: forming a semiconductor layer 3 having a source and a drain regions 10, 11, and LDD regions 16, 17; a gate insulating film 5; and a gate electrode 6; forming a first and a second interlayer insulating films 24, 25 over the gate electrode 6 and the gate insulating film 5; forming contact holes 25a, 25c to these interlayer insulating films so as to be located over each of the source region and the drain region; and an opening portion 25b to these interlayer insulating films so as to be located over the gate electrode and the LDD region; forming a second gate electrode 26b by a conductive film in the opening portion so as to cover the gate electrode and the LDD region; and a pixel electrode 26a over the second interlayer insulating film; removing the gate insulating film in the contact hole; and forming wirings 27, 28 connected to each the source region and the drain region.
    • 公开了可以通过减少掩模数而降低成本的半导体器件,并且公开了一种用于制造半导体器件的方法。 制造半导体器件的方法包括以下步骤:形成具有源极和漏极区域10,11以及LDD区域16,17的半导体层3; 栅极绝缘膜5; 和栅电极6; 在栅极电极6和栅极绝缘膜5上形成第一和第二层间绝缘膜24,25; 向这些层间绝缘膜形成接触孔25a,25c,以便位于源极区域和漏极区域之上; 和这些层间绝缘膜的开口部分25b,以便位于栅电极和LDD区之上; 通过开口部中的导电膜形成第二栅电极26b,以覆盖栅电极和LDD区; 以及在第二层间绝缘膜上的像素电极26a; 去除接触孔中的栅极绝缘膜; 以及形成连接到每个源极区域和漏极区域的布线27,28。