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    • 42. 发明授权
    • Process for making low optical polymers and copolymers for photoresists
and optical applications
    • 制备用于光致抗蚀剂和光学应用的低光学聚合物和共聚物的方法
    • US5625007A
    • 1997-04-29
    • US295362
    • 1994-08-24
    • Michael T. SheehanJames H. Rea
    • Michael T. SheehanJames H. Rea
    • C08F8/12C08F8/14
    • C08F8/14C08F2810/50
    • The present invention pertains to polymers comprising poly(4-hydroxystyrene) or substituted poly(4-hydroxystyrene) or both. The polymers have low optical density (absorbance) over a wavelength range from about 240 to about 260 nm, as well as low optical density over the near UV and visible spectrum (310 to 800 nm). Such polymers are produced by polymerizing 4-acetoxystyrene and/or substituted 4-acetoxystyrene monomers, with or without other comonomers, and subsequently performing transesterification. In the most preferred embodiment of the present invention, the polymers are produced using at least one alcohol as a reaction medium, a chain transfer agent and a transesterification reactant, providing an unusually economic process. These polymers are particularly useful as photoresist components for use in combination with deep UV, X-ray, and E-Beam imaging systems.
    • 本发明涉及包含聚(4-羟基苯乙烯)或取代的聚(4-羟基苯乙烯)或两者的聚合物。 聚合物在约240至约260nm的波长范围内具有低光密度(吸光度),以及在近紫外和可见光谱(310至800nm)下的低光密度。 这样的聚合物通过聚合4-乙酰氧基苯乙烯和/或取代的4-乙酰氧基苯乙烯单体,与或不与其它共聚单体共聚,然后进行酯交换。 在本发明的最优选的实施方案中,使用至少一种醇作为反应介质,链转移剂和酯交换反应物来生产聚合物,提供非常经济的方法。 这些聚合物特别可用作与深UV,X射线和E-Beam成像系统组合使用的光致抗蚀剂组分。
    • 47. 发明授权
    • Process for making low optical density polymers and copolymers for
photoresists and optical applications
    • 制备用于光致抗蚀剂和光学应用的低光密度聚合物和共聚物的方法
    • US5239015A
    • 1993-08-24
    • US706601
    • 1991-05-28
    • Michael T. SheehanJames H. Rea
    • Michael T. SheehanJames H. Rea
    • C08F8/12C08F8/14
    • C08F8/14C08F2810/50
    • The present invention pertains to a process for the preparation of polymers comprising poly(4-hydroxystyrene) or substituted poly(4-hydroxystyrene) or both. The polymers have low optical density (absorbance) over a wavelength range from about 240 to about 260 nm, as well as low optical density over the near UV and visible spectrum (310 to 800 nm). Such polymers are produced by polymerizing 4-acetoxystyrene and/or substituted 4-acetoxystyrene monomers, with or without other comonomers, and subsequently performing transesterification. In the most preferred embodiment of the present invention, the polymers are produced using at least one alcohol as a reaction medium, a chain transfer agent and a transesterification reactant, providing an unusually economic process. These polymers are particularly useful as photoresist components for use in combination with deep UV, X-ray, and E-Beam imaging systems.To obtain polymers having low optical density over the 240 to 260 nm radiation wavelength range, it is necessary to use an initiator which does not comprise a substantially absorbant structure over the 240 to 260 nm range or to use an initiator concentration of less than about 3 mole % of the monomer(s), to obtain a polymerization conversion of the initial polymerization monomers of at least about 90% by weight, or to remove residual monomer(s) from the reaction medium prior to transesterification, and to obtain a transesterification conversion of the polymerized monomers of at least 85% by weight. It is also necessary to avoid the use of transesterification catalyst which can cause the formation of chemical structures which can absorb over the 240 to 260 nm radiation wavelength range.
    • 本发明涉及制备包含聚(4-羟基苯乙烯)或取代的聚(4-羟基苯乙烯)或两者的聚合物的方法。 聚合物在约240至约260nm的波长范围内具有低光密度(吸光度),以及在近紫外和可见光谱(310至800nm)下的低光密度。 这样的聚合物通过聚合4-乙酰氧基苯乙烯和/或取代的4-乙酰氧基苯乙烯单体,与或不与其它共聚单体共聚,然后进行酯交换。 在本发明的最优选的实施方案中,使用至少一种醇作为反应介质,链转移剂和酯交换反应物来生产聚合物,提供非常经济的方法。 这些聚合物特别可用作与深UV,X射线和E-Beam成像系统组合使用的光致抗蚀剂组分。 为了获得在240至260nm辐射波长范围内具有低光密度的聚合物,必须使用在240至260nm范围内不包含基本吸收结构的引发剂,或者使用小于约3的引发剂浓度 摩尔%的单体,以获得至少约90重量%的初始聚合单体的聚合转化率,或者在酯交换之前从反应介质中除去残留的单体,并获得酯交换转化 的聚合单体为至少85重量%。 还有必要避免使用酯交换催化剂,其可导致可以在240至260nm辐射波长范围内吸收的化学结构的形成。