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    • 41. 发明授权
    • Semiconductor apparatus, led head, and image forming apparatus
    • 半导体装置,LED头和图像形成装置
    • US07061113B2
    • 2006-06-13
    • US10926890
    • 2004-08-26
    • Hiroyuki FujiwaraMitsuhiko Ogihara
    • Hiroyuki FujiwaraMitsuhiko Ogihara
    • H01L23/48
    • B41J2/45H01L25/0753H01L27/153H01L2924/0002H01L2924/00
    • A semiconductor apparatus has a substrate to which is attached a thin semiconductor film including at least one semiconductor device. A first interconnecting line formed on the thin semiconductor film makes electrical contact with the semiconductor device. A second interconnecting line extends from the thin semiconductor film to the substrate, electrically coupling the first interconnecting line to an interconnection pattern on the substrate. At the point where the first and second interconnecting lines meet, one of the two interconnecting lines is widened to provide an increased positioning margin, thereby relaxing the requirement for precise positioning of the thin semiconductor film. The thin semiconductor film may include an array of light-emitting diodes and the substrate may include driving circuitry for driving them.
    • 半导体装置具有附着有包括至少一个半导体器件的薄半导体膜的衬底。 形成在薄半导体膜上的第一互连线与半导体器件电接触。 第二互连线从薄半导体膜延伸到衬底,将第一互连线电连接到衬底上的互连图案。 在第一和第二互连线相交的点处,两个互连线中的一个被加宽以提供增加的定位裕度,从而放松对薄半导体膜的精确定位的要求。 薄半导体膜可以包括发光二极管的阵列,并且衬底可以包括用于驱动它们的驱动电路。
    • 42. 发明授权
    • Method of manufacturing a semiconductor device
    • 制造半导体器件的方法
    • US06913985B2
    • 2005-07-05
    • US10870142
    • 2004-06-18
    • Mitsuhiko OgiharaHiroyuki FujiwaraMasaaki SakutaIchimatsu Abiko
    • Mitsuhiko OgiharaHiroyuki FujiwaraMasaaki SakutaIchimatsu Abiko
    • H01L21/20H01L33/00H01L21/46
    • H01L21/2007H01L33/0079H01L2221/68368H01L2924/0002Y10S438/977H01L2924/00
    • A peeling layer (13) and semiconductor thin film (20a) are formed on a first substrate (11), individual support materials (19) are formed thereupon, grooves (23) penetrating the semiconductor thin film and reaching the peeling layer (13) are formed in the semiconductor thin film (20a) by etching using the individual support materials (19) as a mask so as to divide the semiconductor thin film (20a) into a plurality of semiconductor thin film pieces (20) and form a plurality of assemblies of the semiconductor thin film pieces (20) and the individual support materials (19) fixed thereto, the semiconductor thin film pieces (20) are separated from the first substrate (11) while the individual support materials (19) remain fixed to the semiconductor thin film pieces (20), and they are then affixed to a second substrate (31). The invention facilitates handling of semiconductor thin film pieces.
    • 在第一基板(11)上形成有剥离层(13)和半导体薄膜(20a),在其上形成有单独的支撑材料(19),穿过半导体薄膜并到达剥离层(13)的凹槽 )通过使用各个支撑材料(19)作为掩模的蚀刻形成在半导体薄膜(20a)中,以将半导体薄膜(20a)分成多个半导体薄膜片(20)并形成 半导体薄膜片(20)和固定于其上的各个支撑材料(19)的多个组件,半导体薄膜片(20)与第一衬底(11)分离,同时保持各个支撑材料(19) 固定到半导体薄膜片(20)上,然后将它们固定到第二衬底(31)上。 本发明有利于半导体薄膜片的处理。