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    • 44. 发明授权
    • Method for producing group III nitride semiconductor
    • III族氮化物半导体的制造方法
    • US09028611B2
    • 2015-05-12
    • US12926995
    • 2010-12-22
    • Shiro Yamazaki
    • Shiro Yamazaki
    • C30B19/10C30B19/04C30B29/40C30B9/10C30B19/02C30B9/06
    • C30B29/403C30B9/06C30B9/10C30B19/02C30B19/04C30B29/406
    • A method for producing a Group III nitride semiconductor includes reacting a molten mixture containing at least a Group III element and an alkali metal with a gas containing at least nitrogen, to thereby grow a Group III nitride semiconductor crystal on the seed crystal. The method includes forming a template substrate including a sapphire substrate and a first Group III nitride semiconductor layer as the seed crystal which is formed by vapor phase growth and which includes a c-plane as a main plane is employed, and the template substrate is placed and maintained in the molten mixture under conditions where crystal growth of the Group III nitride semiconductor is inhibited, to thereby partially melt back a plurality of separated parts of the first Group III nitride semiconductor layer to such a depth that the sapphire substrate is partially exposed.
    • 制备III族氮化物半导体的方法包括使至少含有III族元素和碱金属的熔融混合物与至少含有氮的气体反应,从而在晶种上生长III族氮化物半导体晶体。 该方法包括形成包含蓝宝石衬底和第一III族氮化物半导体层的模板衬底,作为通过气相生长形成并且包括c面作为主平面的晶种,并且将模板衬底放置 并且在III族氮化物半导体的晶体生长被抑制的条件下保持在熔融混合物中,从而部分地将第一III族氮化物半导体层的多个分离部分熔融回到蓝宝石衬底部分暴露的深度。
    • 47. 发明授权
    • Method for producing semiconductor crystal
    • 半导体晶体的制造方法
    • US07459023B2
    • 2008-12-02
    • US11590930
    • 2006-11-01
    • Shiro YamazakiKoji HirataKatsuhiro ImaiMakoto IwaiTakatomo SasakiYusuke MoriMasashi YoshimuraFumio KawamuraYuji Yamada
    • Shiro YamazakiKoji HirataKatsuhiro ImaiMakoto IwaiTakatomo SasakiYusuke MoriMasashi YoshimuraFumio KawamuraYuji Yamada
    • C30B25/12
    • C30B25/00C30B9/00C30B29/403C30B29/406
    • The present invention provides a method for producing a Group III nitride compound semiconductor crystal, the semiconductor crystal being grown through the flux method employing a flux. At least a portion of a substrate on which the semiconductor crystal is to be grown is formed of a flux-soluble material. While the semiconductor crystal is grown on a surface of the substrate, the flux-soluble material is dissolved in the flux from a surface of the substrate that is opposite the surface on which the semiconductor crystal is grown. Alternatively, after the semiconductor crystal has been grown on a surface of the substrate, the flux-soluble material is dissolved in the flux from a surface of the substrate that is opposite the surface on which the semiconductor crystal has been grown. The flux-soluble material is formed of silicon. Alternatively, the flux-soluble material or the substrate is formed of a Group III nitride compound semiconductor having a dislocation density higher than that of the semiconductor crystal to be grown.
    • 本发明提供一种用于制造III族氮化物化合物半导体晶体的方法,该半导体晶体通过使用焊剂的焊剂法生长。 待生长半导体晶体的基板的至少一部分由助熔剂材料形成。 半导体晶体在衬底的表面上生长时,该助熔剂材料从衬底的与生长半导体晶体的表面相反的表面溶解在焊剂中。 或者,在半导体晶体已经在基板的表面上生长之后,从基板的与半导体晶体已经生长的表面相对的表面的助熔剂中溶解助熔剂。 助熔剂材料由硅形成。 或者,助熔剂材料或衬底由位错密度高于要生长的半导体晶体的位错密度的III族氮化物化合物半导体形成。