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41. 发明授权

US4917136A Process gas supply piping system 失效
标题翻译：工艺供气管道系统
公开(公告)号：US4917136A
公开(公告)日：1990-04-17
申请号：US198079
申请日：1988-05-24
申请人： Tadahiro Ohmi , Kazuhiko Sugiyawa , Fumio Nakahara , Masaru Umeda
发明人： Tadahiro Ohmi , Kazuhiko Sugiyawa , Fumio Nakahara , Masaru Umeda
IPC分类号： F17D1/04 , B01J4/00 , B08B9/02 , B08B9/032 , C23C16/455 , F17D1/02 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/31
CPC分类号： B08B9/0325 , B08B9/0328 , C23C16/455 , C23C16/45561 , H01J37/3244 , Y10S134/902 , Y10T137/0419 , Y10T137/4259
摘要： This invention relates to the supply piping system of the process gas for various types of thin-film making and fine pattern dry etching process, and more particularly to the process gas supply system, which makes it possible to form high quality thin films and to perform high quality etching.Specifically, when there are a unit in operation with process gas supplied and a unit not in operation with no process gas supplied in a process gas supply piping system, supplying the process gas to two or more process units from a cylinder cabinet piping system, this invention provides a gas supply piping system, where the process gas supply piping line to the process unit not in operation can be purged with purge gas all the time and where gas flows all the time through all of gas supply piping lines to eliminate the stagnation of gas.
摘要翻译：本发明涉及用于各种薄膜制造和精细图案干蚀刻工艺的工艺气体的供应管道系统，更具体地涉及工艺气体供应系统，这使得可以形成高质量的薄膜并执行高品质蚀刻。具体地说，当在处理气体供给管道系统中存在具有工业气体运转的单元和不进行工艺气体运转的单元时，将处理气体从筒柜配管系统供给到两个以上的处理单元时，本发明提供了一种气体供应管道系统，其中不处于操作的处理单元的工艺气体供应管线可以一直被吹扫气体吹扫，并且其中气体始终流过所有气体供应管线，以消除停滞加油站。

42. 发明授权

US4869301A Cylinder cabinet piping system 失效
标题翻译：气缸柜管道系统
公开(公告)号：US4869301A
公开(公告)日：1989-09-26
申请号：US194841
申请日：1988-05-17
申请人： Tadahiro Ohmi , Kazuhiko Sugiyama , Fumio Nakahara , Masaru Umeda
发明人： Tadahiro Ohmi , Kazuhiko Sugiyama , Fumio Nakahara , Masaru Umeda
IPC分类号： B01D46/42 , H01L21/00 , H01L21/302 , H01L21/304 , H01L21/3065 , B08B9/00
CPC分类号： H01L21/67069 , Y10T137/4259
摘要： The cylinder cabinet piping system of this invention has a system to supply a purge gas continuously to the main line, or to the main line and the branch line, thereby to prevent stagnation of gas in the purge gas line and to supply a super-high-purity gas to a process unit.
摘要翻译：本发明的气缸柜配管系统具有连续向主管线，主管线和分支管路供给净化气体的系统，从而防止气体在净化气体管路中停滞，并提供超高压纯度气体输送到处理单元。

43. 发明授权

US09020332B2 Center rod for use in the carburetor or carburetor for MOCVD 有权
标题翻译：用于化油器或化油器的中心杆用于MOCVD
公开(公告)号：US09020332B2
公开(公告)日：2015-04-28
申请号：US14520537
申请日：2014-10-22
申请人： WACOM R&D Corporation , Masayuki Toda
发明人： Masayuki Toda , Masaru Umeda
IPC分类号： A01G13/06 , A61M16/00 , C23C16/448 , B01B1/00
CPC分类号： B01B1/005 , C23C16/4481
摘要： Provided is a vaporizer that can efficiently cool a carrier gas, improve the effect of preventing a material from being clogged near the outlet port of a gas passage, contribute to prolonging the timing of maintenance and improving operating efficiency, and exert more uniform dispersing effect. A vaporizer includes: a center rod inserted into a carrier gas introduction hole formed in a disperser to form the gas passage in cooperation with the inner wall of the carrier gas introduction hole; a cooling part disposed on the outer circumferential side of the carrier gas introduction hole in the disperser to cool the inside of the gas passage; a cooling member insertion hole formed across almost the entire length of the center rod along the axial direction of the center rod; and a cooling member disposed in the inside of the cooling member insertion hole to cool the center rod.
摘要翻译：本发明提供一种能够有效地冷却载气的蒸发器，提高防止材料在气体通路的出口附近堵塞的效果，有助于延长维护时间，提高作业效率，发挥更均匀的分散效果。蒸发器包括：插入到分散器中形成的载气导入孔中的中心杆，与载气引入孔的内壁配合形成气体通道; 冷却部，其设置在所述分散器中的所述载气导入孔的外周侧，以冷却所述气体通道的内部; 沿所述中心杆的轴向方向跨过所述中心杆的整个长度形成的冷却构件插入孔; 以及设置在冷却部件插入孔的内部以冷却中心杆的冷却部件。

44. 发明授权

US09644264B2 Evaporation method and film deposition method 有权
公开(公告)号：US09644264B2
公开(公告)日：2017-05-09
申请号：US13913981
申请日：2013-06-10
申请人： KABUSHIKI KAISHA WATANABE SHOKO , Masayuki Toda
发明人： Masayuki Toda , Masaki Kusuhara , Masaru Umeda , Mitsuru Fukagawa
IPC分类号： C23C16/40 , C23C16/448
CPC分类号： C23C16/407 , C23C16/4486
摘要： Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.

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