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    • 43. 发明申请
    • CLEANING APPARATUS AND METHOD FOR IMMERSION LIGHT EXPOSURE
    • 清洗装置和浸入式曝光方法
    • US20080133045A1
    • 2008-06-05
    • US11949287
    • 2007-12-03
    • Kouichi HontakeMasashi EnomotoHideharu Kyouda
    • Kouichi HontakeMasashi EnomotoHideharu Kyouda
    • G06F17/00B08B13/00B08B7/04
    • H01L21/67051H01L21/67225
    • A cleaning apparatus for immersion light exposure includes a cleaning apparatus main body including a mechanism configured to perform a cleaning process on the substrate, and a control section configured to control respective components of the cleaning apparatus main body. The control section is arranged to fabricate a new process recipe in response to input of a surface state of a film formed on a substrate, such that the new process recipe contains hardware conditions and/or process conditions corresponding to the surface state, with reference to relationships stored therein between parameter values representing a surface state of a film formed on a substrate and hardware conditions and/or process conditions for performing suitable cleaning for the parameter values; and to control the cleaning apparatus main body to perform a cleaning process in accordance with the new process recipe.
    • 用于浸没式曝光的清洁装置包括:清洁装置主体,包括构造成对基板执行清洁处理的机构;以及控制部,其被配置为控制清洁装置主体的各个部件。 控制部分被布置成响应于在基板上形成的膜的表面状态的输入而制造新的工艺配方,使得新工艺配方包含与表面状态相对应的硬件条件和/或工艺条件,参考 存储在其中的表示在基板上形成的膜的表面状态的参数值与用于对参数值执行适当清洁的硬件条件和/或处理条件之间的关系; 并且控制清洁装置主体以根据新的处理配方执行清洁处理。