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    • 46. 发明授权
    • Method for forming film pattern
    • 薄膜图案形成方法
    • US08153356B2
    • 2012-04-10
    • US12351127
    • 2009-01-09
    • Shosei MoriMasahiro Terada
    • Shosei MoriMasahiro Terada
    • G03F7/26
    • G03F7/425G03F7/322
    • A method for forming a film pattern includes applying a water-soluble photosensitive resin on a substrate, exposing the photosensitive resin to light, developing the photosensitive resin with a developer, after developing the photosensitive resin, depositing a material for the film pattern on the substrate, and, after depositing the material for the film pattern, removing photosensitive resin remaining on the substrate with a remover. The remover and the developer include the same solute, and a concentration of the solute in the remover is higher than that in the developer.
    • 形成膜图案的方法包括在基板上涂布水溶性感光性树脂,将感光性树脂曝光,将显影剂显影后,用感光性树脂显影感光性树脂,在基板上沉积膜图案用材料 并且在沉积用于膜图案的材料之后,用去除剂去除残留在基材上的感光性树脂。 去除剂和显影剂包括相同的溶质,并且去除剂中的溶质的浓度高于显影剂中的溶质浓度。