会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 45. 发明申请
    • Managing Network Service Access
    • 管理网络服务访问
    • US20080095129A1
    • 2008-04-24
    • US11963368
    • 2007-12-21
    • Jayaraman Iyer
    • Jayaraman Iyer
    • H04Q7/24
    • H04W76/12
    • Managing network service access includes receiving a packet data service request. The packet data service request is associated with a mobile subscriber and a service identifier that can bypass validation for accessing a traffic destination. Access is requested from an access node in response to the packet data service request. The access node maps a target access point to the mobile subscriber, where the target access point provides the mobile subscriber with access to the traffic destination. An access acceptance message is received from the access node, where the access acceptance message identifies the target access point. A packet data context is created by associating the target access point with the mobile subscriber to allow the mobile subscriber to access the traffic destination.
    • 管理网络服务访问包括接收分组数据服务请求。 分组数据服务请求与移动用户相关联,并且可以绕过用于访问业务目的地的验证的服务标识符。 响应于分组数据服务请求,从接入节点请求接入。 接入节点将目标接入点映射到移动用户,其中目标接入点向移动用户提供对业务目的地的接入。 从接入节点接收接入接受消息,其中接入接受消息标识目标接入点。 通过将目标接入点与移动用户相关联来创建分组数据上下文以允许移动用户访问业务目的地。
    • 48. 发明申请
    • Method and system for radio-independent predictive handoffs in a wireless network
    • 无线网络中无线电独立预测切换的方法和系统
    • US20060258361A1
    • 2006-11-16
    • US11128730
    • 2005-05-13
    • Jayaraman IyerAnand Oswal
    • Jayaraman IyerAnand Oswal
    • H04Q7/20
    • H04W36/16H04W36/08
    • According to one embodiment of the invention, a method includes determining, at a base station, at least one usability factor providing a relative measure of the desirability of receiving control of a mobile unit. The method also includes communicating, from a base station to a remote controller, the determined at least one usability factor for comparison to at least one usability factor of another base station as determined at the other base station and communicated to the remote controller. The method also includes taking control, by the base station, of the mobile unit in response to receiving a signal from a controller to take control of the mobile unit in response to comparison of the controller of the at least one usability factor determined by the base station and the at least one usability factor determined by the other base station.
    • 根据本发明的一个实施例,一种方法包括在基站处确定提供对移动单元的接收控制的可取性的相对测量的至少一个可用性因素。 该方法还包括从基站向遥控器通信所确定的至少一个可用性因子,用于与在另一基站处确定并传送给遥控器的另一基站的至少一个可用性因子进行比较。 该方法还包括由基站控制移动单元以响应于从控制器接收到的信号来控制移动单元以响应控制器对基站确定的至少一个可用性因子的比较 站和由另一个基站确定的至少一个可用性因子。
    • 50. 发明授权
    • Vertical fuse structure for integrated circuits containing an exposure window in the layer over the fuse structure to facilitate programming thereafter
    • 用于集成电路的垂直熔丝结构,其在熔丝结构的层中包含曝光窗口,以便于之后进行编程
    • US06486527B1
    • 2002-11-26
    • US09344613
    • 1999-06-25
    • John MacPhersonJayaraman IyerAlan H. HugginsJohn S. StarzynskiKeith R. ErbDennis L. Lantz, Jr.
    • John MacPhersonJayaraman IyerAlan H. HugginsJohn S. StarzynskiKeith R. ErbDennis L. Lantz, Jr.
    • H01L2900
    • H01L23/5256H01L2924/0002H01L2924/00
    • According to the present invention, after manufacture of a disconnect fuse circuit, windows are opened in the insulating film overlying the second interconnect layer at all possible disconnection points, the disconnection points preferably being an exposure window that is aligned over a disconnect fuse circuit that includes a via that electrically connects electrical conductors disposed on different respective layers. This insulating film may consist of one or more layers of one or more materials, but preferentially consists of a single layer of silicon oxide. The wafer is then stored for later configuration. When the wafer is to be configured, a non-precision mask is manufactured. The wafer is coated with photoresist and patterned using the mask to produce disconnection holes in the photoresist at the desired disconnection points. Since the area over the desired disconnection points are free of the insulating film overlying the second patterned interconnect layer, the etching process can be limited to etch techniques which are optimized to etch metal with selectivity to the insulating film. The areas at the disconnection sites that are covered by the insulating film are further protected during the etch process, since the insulating film acts as an etch barrier to inhibit the etching of active circuit elements in proximity to the desired disconnect points.
    • 根据本发明,在断开保险丝电路的制造之后,在所有可能的断开点处在覆盖第二互连层的绝缘膜中打开窗口,断开点优选地是在断开熔丝电路上对准的曝光窗口, 通孔,其电连接设置在不同的各层上的电导体。 该绝缘膜可由一层或多层一层或多层材料组成,但优选由单层氧化硅组成。 然后将晶片存储以供稍后配置。 当要构造晶片时,制造非精密掩模。 晶片用光刻胶涂覆,并使用掩模进行图案化,以在期望的断开点处在光致抗蚀剂中产生断开孔。 由于期望的断开点上的区域没有覆盖第二图案化互连层的绝缘膜,所以蚀刻工艺可以限于蚀刻技术,其被优化以蚀刻具有对绝缘膜的选择性的金属。 在绝缘膜被覆盖的断开位置处的区域在蚀刻工艺期间被进一步保护,因为绝缘膜用作蚀刻阻挡层,以阻止在期望的断开点附近蚀刻有源电路元件。