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41. 发明申请

US20110053086A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 失效
标题翻译：化合物，树脂，耐蚀组合物和用于生产耐腐蚀图案的方法
公开(公告)号：US20110053086A1
公开(公告)日：2011-03-03
申请号：US12873919
申请日：2010-09-01
申请人： Kazuhiko Hashimoto , Koji Ichikawa
发明人： Kazuhiko Hashimoto , Koji Ichikawa
IPC分类号： G03F7/004 , C07C69/88 , C07C69/96 , C07C69/017 , C08F20/10 , G03F7/20
CPC分类号： C07C69/84 , C07C69/54 , C07C69/96 , C07C2603/74 , C08F20/30 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A compound of the present invention is represented by the formula (A); wherein R1 represents a hydrogen atom or a C1 to C6 alkyl group; Z1 represents a single bond, —CO—O—* or —CO—O—(CH2)k—CO—O—*; Z2 represents a single bond, *—O—CO—, *—CO—O—, *—O—(CH2)k—CO—, *—CO—(CH2)k—O—, *—O—(CH2)k—CO—O—, *—O—CO—(CH2)k—O— or *—O—CO—(CH2)k—O—CO—; k represents an integer of 1 to 6; * represents a binding position to W; W represents a C4 to C36 (n+1) valent alicyclic hydrocarbon group or a C6 to C18 (n+1) valent aromatic hydrocarbon group, one or more hydrogen atoms contained in the alicyclic hydrocarbon group and the aromatic hydrocarbon group may be replaced by a halogen atom, a C1 to C12 alkyl group, a C1 to C12 alkoxy group, a C2 to C4 acyl group or —OR10; R10 represents a hydrogen atom or a group represented by the formula (R2-2); R2 represents a hydrogen atom, a group represented by the formula (R2-1) or (R2-2); n represents an integer of 1 to 3; R4, R5 and R6 independently represent a C1 to C12 hydrocarbon group; R7 and R8 independently represent a hydrogen atom or a C1 to C12 hydrocarbon group; R9 represents a C1 to C14 hydrocarbon group.
摘要翻译：本发明的化合物由式（A）表示; 其中R1表示氢原子或C1-C6烷基; Z1表示单键，-CO-O- *或-CO-O-（CH2）k-CO-O- *; Z2表示单键，* -O-CO-，* -CO-O-，* -O-（CH2）k-CO-，* -CO-（CH2）k-O-，* -O- ）k-CO-O-，* -O-CO-（CH2）k-O-或* -O-CO-（CH2）k-O-CO-; k表示1〜6的整数， *表示与W的绑定位置; W表示C 4〜C 36（n + 1）价的脂环式烃基或C 6〜C 18（n + 1）价芳香族烃基，脂环式烃基和芳香族烃基所含有的1个以上氢原子可以被卤素原子，C1〜C12烷基，C1〜C12烷氧基，C2〜C4酰基或-OR10; R 10表示氢原子或式（R2-2）表示的基团。 R2表示氢原子，式（R2-1）或（R2-2）表示的基团; n表示1〜3的整数， R4，R5和R6独立地表示C1〜C12烃基; R7和R8独立地表示氢原子或C1〜C12烃基; R9表示C1〜C14烃基。

42. 发明授权

US06969943B2 Acoustic matching layer and ultrasonic transducer 有权
标题翻译：声匹配层和超声波换能器
公开(公告)号：US06969943B2
公开(公告)日：2005-11-29
申请号：US10475426
申请日：2003-01-28
申请人： Kazuhiko Hashimoto , Takashi Hashida , Masaaki Suzuki , Masahiko Hashimoto , Hidetomo Nagahara , Seigo Shiraishi , Norihisa Takahara
发明人： Kazuhiko Hashimoto , Takashi Hashida , Masaaki Suzuki , Masahiko Hashimoto , Hidetomo Nagahara , Seigo Shiraishi , Norihisa Takahara
IPC分类号： G01F1/66 , G10K11/02 , H01L41/08
CPC分类号： G01F1/662 , G10K11/02
摘要： An acoustic matching layer according to the present invention includes a powder of a dry gel. The dry gel preferably has a density of 500 kg/m3 or less and an average pore diameter of 100 nm or less. By using the dry gel powder, a variation in the property of the acoustic matching layer can be reduced.
摘要翻译：根据本发明的声匹配层包括干凝胶粉末。干凝胶的密度优选为500kg / m 3以下，平均孔径为100nm以下。通过使用干凝胶粉末，可以降低声匹配层的性质的变化。

43. 发明授权

US06919394B2 Electrically conductive resin composition and production process thereof 失效
标题翻译：导电树脂组合物及其制备方法
公开(公告)号：US06919394B2
公开(公告)日：2005-07-19
申请号：US10284091
申请日：2002-10-31
申请人： Takaaki Miyoshi , Kazuhiko Hashimoto
发明人： Takaaki Miyoshi , Kazuhiko Hashimoto
IPC分类号： C08K3/04
CPC分类号： C08L77/00 , C08L71/00 , C08L71/12 , C08L71/123 , C08L77/02 , C08L77/06 , Y10S977/753
摘要： An electrically conductive resin composition comprising a polyamide, a polyphenylene ether, an impact modifier and an electrically conductive filler, not less than 50 wt. % of all of the filler used being preliminarily compounded with a mixture containing the impact modifier and the polyphenylene ether, wherein electrical conductivity having a level in which electrostatic coating is possible, a low coefficient of linear expansion and high surface appearance have been accomplished at the same time, and wherein generation of fines caused by pelletizing on extruding has been suppressed.
摘要翻译：包含聚酰胺，聚苯醚，抗冲改性剂和导电填料的导电树脂组合物，其含量不小于50wt。使用的所有填料的百分比预先与含有抗冲改性剂和聚苯醚的混合物混合，其中具有可以进行静电涂覆的水平的导电性，低的线性膨胀系数和高的表面外观已经在相同时间，并且其中通过挤出造粒造成的细粒产生被抑制。

44. 发明授权

US06239706B1 In-bed state detection system 有权
标题翻译：床上状态检测系统
公开(公告)号：US06239706B1
公开(公告)日：2001-05-29
申请号：US09154493
申请日：1998-09-16
申请人： Nobuyuki Yoshiike , Shigeyuki Inoue , Kazuhiko Hashimoto
发明人： Nobuyuki Yoshiike , Shigeyuki Inoue , Kazuhiko Hashimoto
IPC分类号： G08B2300
CPC分类号： G08B21/22
摘要： An in-bed state detection system includes: a load detection section for detecting a load applied to a bed and providing a corresponding load signal; a determination section for determining an in-bed state based on the load signal; and a transmission section for transmitting a result of the determination.
摘要翻译：床上状态检测系统包括：负载检测部分，用于检测施加到床上的负载并提供相应的负载信号; 确定部分，用于基于所述负载信号确定床上状态; 以及用于发送确定结果的发送部分。

45. 发明授权

US5843616A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5843616A
公开(公告)日：1998-12-01
申请号：US419604
申请日：1995-04-10
申请人： Kunishige Edamatsu , Yuji Yoshida , Kazuhiko Hashimoto , Haruyoshi Osaki
发明人： Kunishige Edamatsu , Yuji Yoshida , Kazuhiko Hashimoto , Haruyoshi Osaki
IPC分类号： G03F7/022 , C08G8/24 , G03F7/004 , G03F7/023 , H01L21/027
CPC分类号： C08G8/24 , G03F7/0236
摘要： A positive resist composition sensitive to radiations such as ultraviolet rays, far ultraviolet rays, which comprises; an o-quinonediazide compound; and a novolac resin(1) obtained by allowing an aromatic aldehyde of the formula(I) ##STR1## wherein R.sub.4 to R.sub.6 represents hydrogen, alkyl, cycloalkyl, alkoxy, alkenyl or aryl, k'0 represents an integer not smaller than 0 and p represents 1, 2 or 3, to react with a phenol compound of the formula (II) ##STR2## wherein R.sub.7 to R.sub.9 represents hydrogen, hydroxy, alkyl, cycloalkyl, alkoxy, alkenyl or aryl, provided that at least one of R.sub.7 to R.sub.9 is cycloalkyl having 6 or less carbon atoms, in the presence of an acid catalyst to obtain a reaction product(1) containing low molecular weight ingredients; and, then, allowing the reaction product(1) to further react with a phenol compound(1) and formaldehyde.
摘要翻译：对紫外线，远紫外线等辐射敏感的正性抗蚀剂组合物，其包含：邻醌二叠氮化合物; 和通过使式（I）的芳香醛（I）得到的酚醛清漆树脂（1），其中R4至R6表示氢，烷基，环烷基，烷氧基，烯基或芳基，k'0表示不小于与式（II）的酚化合物反应，其中R 7至R 9表示氢，羟基，烷基，环烷基，烷氧基，烯基或芳基，条件是在酸催化剂的存在下，R7至R9中的至少一个是具有6个或更少个碳原子的环烷基，得到含有低分子量成分的反应产物（1）; 然后使反应产物（1）进一步与酚化合物（1）和甲醛反应。

46. 发明授权

US5792586A Positive resist composition comprising a novolac resin made from a cycloalkyl substituted phenol 失效
标题翻译：正型抗蚀剂组合物，其包含由环烷基取代的苯酚制成的酚醛清漆树脂
公开(公告)号：US5792586A
公开(公告)日：1998-08-11
申请号：US335406
申请日：1994-11-03
申请人： Kazuhiko Hashimoto , Haruyoshi Osaki , Yasunori Uetani
发明人： Kazuhiko Hashimoto , Haruyoshi Osaki , Yasunori Uetani
IPC分类号： C08G8/08 , G03F7/023 , H01L21/027 , G03F7/30
CPC分类号： C08G8/08 , G03F7/023
摘要： The present invention provides a positive photoresist composition comprising a 1,2-naphthoquinonediazide compound and a novolac resin obtained through a condensation reaction between an aldehyde compound and a phenol compound represented by the following general formula (I): ##STR1## wherein R.sub.5, R.sub.6 and R.sub.7 each independently represents hydrogen atom, hydroxyl group or alkyl, cycloalkyl, alkoxy or alkenyl group having 6 or less carbon atoms or aryl group, provided that at least one of R.sub.5, R.sub.6 and R.sub.7 represents a cycloalkyl group having 6 or less carbon atoms. The composition of the present invention is excellent in the balance between properties such as sensitivity, resolution, heat resistance, profile, depth of focus, etc. and free from scum.
摘要翻译：本发明提供一种正型光致抗蚀剂组合物，其包含通过醛化合物和由以下通式（I）表示的酚化合物之间的缩合反应获得的1,2-萘醌二叠氮化合物和酚醛清漆树脂：其中 R5，R6和R7各自独立地表示氢原子，羟基或具有6个或更少碳原子的烷基，环烷基，烷氧基或烯基或芳基，条件是R 5，R 6和R 7中的至少一个表示具有6或碳原子少。本发明的组合物在灵敏度，分辨率，耐热性，轮廓，焦深等等并且没有浮渣之类的性能之间的平衡方面是优异的。

47. 发明授权

US5726449A Detecting apparatus and measuring method of warm object 失效
标题翻译：温暖物体的检测装置和测量方法
公开(公告)号：US5726449A
公开(公告)日：1998-03-10
申请号：US760865
申请日：1996-12-05
申请人： Nobuyuki Yoshiike , Kazuhiko Hashimoto , Katsuya Morinaka
发明人： Nobuyuki Yoshiike , Kazuhiko Hashimoto , Katsuya Morinaka
IPC分类号： G01V8/12 , F24F11/02 , G01J5/00 , G01J5/48 , G01S15/02 , G01S15/04 , G01V11/00 , G08B13/16 , G08B13/194 , G08B13/191
CPC分类号： G01S15/04 , G08B13/1645 , G01S15/025 , Y10S250/01
摘要： A warm object detector that includes an infrared object detector and an ultrasonic object detector. A thermal image signal processor obtains thermal object information representative of a warm object in an area by processing signals from the infrared object detector. An ultrasonic processor obtains ultrasonic object information representative of an object in an area by processing signals generated by the ultrasonic object detector. Then a new object determining device determines the presence of a new object in the area by comparing ultrasonic object information supplied from the ultrasonic image signal processor at a prior time with ultrasonic object information being currently supplied by the ultrasonic image signal processor. The new object determining device provides output information representative of a determined new object. Then, a new warm object determining device determines the presence of a new warm object in the area by comparing the thermal object information obtained by the thermal image processor with the output information from the new object determining processor by overlapping the thermal object information with the output information.
摘要翻译：一种暖物体检测器，包括红外物体检测器和超声波物体检测器。热图像信号处理器通过处理来自红外对象检测器的信号来获取表示区域中的暖物体的热物体信息。超声波处理器通过处理由超声波物体检测器产生的信号，获得表示区域中的物体的超声波物体信息。然后，新对象确定装置通过将超声波图像信号处理器提供的超声波对象信息与超声波图像信号处理器当前提供的超声波对象信息进行比较，来确定该区域中的新对象的存在。新对象确定装置提供表示所确定的新对象的输出信息。然后，新的温暖对象确定装置通过将热图像处理器获得的热对象信息与来自新对象确定处理器的输出信息进行比较，从而通过将热对象信息与输出信息。

48. 发明授权

US5543334A Method of screening semiconductor device 失效
标题翻译：半导体器件的筛选方法
公开(公告)号：US5543334A
公开(公告)日：1996-08-06
申请号：US356419
申请日：1994-12-15
申请人： Ichiro Yoshii , Hiroyuki Kamijoh , Yoshio Ozawa , Kikuo Yamabe , Kazuhiko Hashimoto , Katsuya Okumura , Kaoru Hama
发明人： Ichiro Yoshii , Hiroyuki Kamijoh , Yoshio Ozawa , Kikuo Yamabe , Kazuhiko Hashimoto , Katsuya Okumura , Kaoru Hama
IPC分类号： H01L21/66
CPC分类号： H01L22/14 , H01L2924/0002
摘要： A method of screening a semiconductor device. A silicon wafer having gate electrodes formed on the gate oxide film is prepared. An insulating layer is deposited on the silicon wafer. Gate electrode portions of a group of transistors to be tested are exposed. A conductive layer is deposited on the silicon wafer having exposed gate electrodes. The conductive layer is patterned to be a wiring layer so that the gate electrodes of a group of the transistors can be electrically connected to each other. The chip area to be tested is irradiated with light having intensity enough to generate a required quantity of carriers in a depletion layer between a well and a substrate. A predetermined test voltage is applied between the wiring layer and the substrate of the silicon wafer during irradiation of the light to measure current flowing through the wiring layer and the gate oxide film. An abnormality of the gate oxide film can be detected on the basis of the measured current value. The screening method may be conducted before the completion of forming the gate electrodes. Further, gate electrode portions not to be used by a user may not be electrically connected to the gate electrode portions to be used.
摘要翻译：一种半导体器件的屏蔽方法。制备在栅氧化膜上形成栅电极的硅晶片。绝缘层沉积在硅晶片上。待测试的一组晶体管的栅电极部分露出。在具有暴露的栅电极的硅晶片上沉积导电层。导电层被图案化为布线层，使得一组晶体管的栅电极可以彼此电连接。用足够强度的光照射要测试的芯片面积，以在阱和衬底之间的耗尽层中产生所需量的载流子。在光照射期间，在布线层和硅晶片的基板之间施加预定的测试电压，以测量流过布线层和栅氧化膜的电流。可以基于测量的电流值来检测栅氧化膜的异常。筛选方法可以在形成栅电极的完成之前进行。此外，用户不使用的栅电极部分可以不与要使用的栅电极部分电连接。

49. 发明授权

US5468590A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5468590A
公开(公告)日：1995-11-21
申请号：US348994
申请日：1994-11-29
申请人： Kazuhiko Hashimoto , Haruyoshi Osaki , Chinehito Ebina , Kyoko Nagase , Hiroshi Moriuma , Yasunori Uetani
发明人： Kazuhiko Hashimoto , Haruyoshi Osaki , Chinehito Ebina , Kyoko Nagase , Hiroshi Moriuma , Yasunori Uetani
IPC分类号： C08G8/24 , G03F7/023 , H01L21/027 , G03F7/30
CPC分类号： G03F7/0236 , C08G8/24
摘要： A positive resist composition containing a quinone diazide compound and an alkali-soluble resin which contains a resin (A) obtained by a condensation reaction of an aldehyde compound, at least one phenol compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are independently a hydrogen atom, or a C.sub.1 -C.sub.4 alkyl or alkoxy group, and j is 1 or 2, and at least one compound of the formula: ##STR2## wherein R'.sub.1, R'.sub.2, R'.sub.3, R'.sub.4, R'.sub.5 and R'.sub.6 are independently a hydrogen atom, or a C.sub.1 -C.sub.4 alkyl or alkoxy group, R'.sub.7 is a hydrogen, a C.sub.1 -C.sub.4 alkyl group or an aryl group, and k, m and n are independently 0, 1 or 2 provided that a sum of k, m and n is larger than 2, which composition is excellent in balance among various properties such as a profile, a sensitivity, heat resistance and a depth of focus.
摘要翻译：含有醌二叠氮化合物和碱溶性树脂的正性抗蚀剂组合物，其含有通过醛化合物，至少一种下式的酚化合物缩合反应获得的树脂（A）：其中R1， R2和R3独立地为氢原子或C1-C4烷基或烷氧基，j为1或2，以及至少一种下式化合物：其中R'1，R'2， R'3，R'4，R'5和R'6独立地是氢原子或C1-C4烷基或烷氧基，R'7是氢，C1-C4烷基或芳基，以及 k，m和n独立地为0,1或2，条件是k，m和n的和大于2，该组成在各种性质如轮廓，灵敏度，耐热性和深度之间的平衡优异焦点。

50. 发明授权

US5451261A Metal film deposition apparatus and metal film deposition method 失效
标题翻译：金属膜沉积装置和金属膜沉积方法
公开(公告)号：US5451261A
公开(公告)日：1995-09-19
申请号：US114144
申请日：1993-09-01
申请人： Toyokazu Fujii , Mikio Nishio , Mitsuru Sekiguchi , Kazuhiko Hashimoto
发明人： Toyokazu Fujii , Mikio Nishio , Mitsuru Sekiguchi , Kazuhiko Hashimoto
IPC分类号： C23C14/04 , C23C16/04 , H01L21/00 , H01L21/677 , C23C16/00
CPC分类号： H01L21/67167 , C23C14/042 , C23C16/042 , H01L21/67207 , H01L21/67225 , H01L21/67796 , H01L2223/54473 , H01L2223/5448 , Y10S438/975
摘要： On a semiconductor substrate, chips to be products and alignment chips located at a portion a part thereof is left out from a peripheral part of the semiconductor substrate are formed. Contact holes and alignment marks are formed at the chips to be products and the alignment chips. Covering the alignment chips with alignment mark cover parts of a substrate holder, a material for metal wiring is deposited on the semiconductor substrate to form a metal film on the substrate. A mask pattern is formed on the metal film using the alignment marks of the alignment chips on which the metal film is not formed.
摘要翻译：在半导体基板上，形成从半导体基板的周边部分留出的成为产品的芯片和位于其一部分的对准芯片。在作为产品的芯片和对准芯片上形成接触孔和对准标记。用衬底保持器的对准标记覆盖部分覆盖对准芯片，在半导体衬底上沉积用于金属布线的材料，以在衬底上形成金属膜。使用未形成金属膜的取向芯片的对准标记，在金属膜上形成掩模图案。

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