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    • 42. 发明申请
    • CMOS IMAGE SENSOR WITH PHOTO DIODE GATE
    • 具有光电二极管的CMOS图像传感器
    • US20080011942A1
    • 2008-01-17
    • US11771255
    • 2007-06-29
    • Sungkwon HongJeff McKee
    • Sungkwon HongJeff McKee
    • H01L31/00
    • H01L27/14689H01L27/14603H01L27/14609H01L27/1462
    • A photodiode has a photodiode gate structure on the surface of the substrate. The photodiode may be located in a pixel sensor cell comprising a substrate having a first surface level. The photodiode has a first doped region of a first conductivity type and a second doped region of a second conductivity type located beneath the first surface level of the substrate. A photodiode gate is formed of a first dielectric substance layer formed over the first surface of the substrate, thereby forming a second surface, and a second polysilicon layer formed over the second surface of the first layer. A transistor is located adjacent to the photodiode. The photodiode gate improves charge transfer from the photodiode to the transfer gate and floating diffusion region. The improved charge transfer minimizes image lag and leakage and reduces energy barriers.
    • 光电二极管在基板的表面上具有光电二极管栅极结构。 光电二极管可以位于包括具有第一表面水平的衬底的像素传感器单元中。 光电二极管具有位于衬底的第一表面水平下方的第一导电类型的第一掺杂区域和第二导电类型的第二掺杂区域。 光电二极管栅极由在基板的第一表面上形成的第一电介质层形成,从而形成第二表面,以及形成在第一层的第二表面上的第二多晶硅层。 晶体管位于光电二极管附近。 光电二极管栅极改善了从光电二极管到传输门和浮动扩散区的电荷转移。 改进的电荷传输使图像滞后和泄漏最小化,并减少能量屏障。