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41. 发明申请

US20120318669A1 SPUTTERING TARGET-BACKING PLATE ASSEMBLY 审中-公开
标题翻译：喷射目标板组件
公开(公告)号：US20120318669A1
公开(公告)日：2012-12-20
申请号：US13579606
申请日：2011-02-16
申请人： Yuki Ikeda , Yuichiro Nakamura , Atsutoshi Arakawa
发明人： Yuki Ikeda , Yuichiro Nakamura , Atsutoshi Arakawa
IPC分类号： C23C14/06 , B05D5/12 , B32B15/04 , C23C14/08
CPC分类号： C04B35/645 , B22F3/14 , B22F7/08 , C04B37/026 , C04B2237/123 , C04B2237/126 , C04B2237/34 , C04B2237/405 , C22C1/0433 , C22C1/051 , C22C19/07 , C22C38/002 , C23C14/3414 , H01F41/183
摘要： Provided is a sputtering target-backing plate assembly where a raw material powder prepared so as to have the composition of a magnetic material sputtering target is filled in a die together with a backing plate and hot-pressed, thereby being bonded to the backing plate simultaneously with sintering of the magnetic material target powder.It is an object of the present invention to provide a sputtering target-backing plate assembly having a high average pass through flux and allowing more stable sputtering, by disposing the raw material powder for a target on the backing plate and sintering them.By simultaneously performing sintering and bonding, a sputtering target-backing plate assembly has a shorter manufacturing process, can shorten manufacturing period, and does not cause a problem of detachment due to an increase in temperature during sputtering. In addition, it is also an object of the present invention to provide a sputtering target-backing plate assembly at a reduced cost and with an improved average pass through flux (PTF).
摘要翻译：提供了一种溅射靶 - 背板组件，其中将具有磁性材料溅射靶的组成的原料粉末与背板一起填充在模具中并进行热压，从而同时粘合到背板上通过烧结磁性材料目标粉末。本发明的目的是提供一种具有高平均通过焊剂的溅射靶 - 背板组件，通过将用于靶材的原料粉末设置在背板上并进行烧结来提供更稳定的溅射。通过同时进行烧结和接合，溅射靶 - 背板组件具有较短的制造工艺，可以缩短制造周期，并且不会由于溅射期间的温度升高而引起分离的问题。此外，本发明的另一个目的是以降低的成本提供溅射靶 - 背板组件，并且具有改进的平均通过焊剂（PTF）。

42. 发明申请

US20120088853A1 MOLDING MATERIAL FOR EXTRUSION FOAM MOLDING, PROCESS FOR PRODUCING SAME, WOODY MOLDED FOAM PRODUCED FROM THE MOLDING MATERIAL, AND PROCESS AND APPARATUS FOR PRODUCING THE WOODY MOLDED FOAM 审中-公开
标题翻译：用于挤出泡沫成型的成型材料，其生产方法，从模塑材料生产的木制模制泡沫，以及用于生产木模泡沫的方法和装置
公开(公告)号：US20120088853A1
公开(公告)日：2012-04-12
申请号：US13377710
申请日：2010-05-13
申请人： Takeyasu Kikuchi , Kazumasa Morita , Koji Higashi , Yuichiro Nakamura
发明人： Takeyasu Kikuchi , Kazumasa Morita , Koji Higashi , Yuichiro Nakamura
IPC分类号： C08L23/06 , B29C47/36 , C08K11/00 , C08L55/02 , C08L27/06 , B29C47/12 , C08L23/12
CPC分类号： B29C44/12 , B29B7/484 , B29B7/603 , B29B7/845 , B29B7/90 , B29B9/065 , B29B9/14 , B29B9/16 , B29C48/0012 , B29C48/04 , B29C48/07 , B29C48/12 , B29C48/285 , B29C48/297 , B29C48/30 , B29C48/345 , B29C48/362 , B29C48/385 , B29C48/39 , B29C48/40 , B29C48/53 , B29C2793/0027 , B29C2948/92019 , B29C2948/92514 , B29C2948/926 , B29C2948/92704 , B29C2948/92857 , B29K2105/04 , B29K2105/251 , B29K2711/14 , C08J9/0061 , C08J2201/03 , C08J2323/12 , C08J2397/02 , C08J2423/00 , C08J2491/00 , C08J2497/00 , C08L97/02
摘要： Disclosed is a molding material for extrusion foam molding from which woody molded foam of high quality can be obtained. From the molding material, woody molded foam of high quality with no defects is efficiently produced. Constituent materials comprising woodmeal and a thermoplastic resin as major components and containing 1-5 wt % alkane having a molecular weight of 300-1,000 g/mol are melt-kneaded until the components come into an evenly dispersed state, and the resultant mixture is molded into pellets having a given diameter to obtain a molding material. Subsequently, this molding material is extrusion-molded into a given shape together with a blowing agent by means of an extrusion molding device, thereby obtaining woody molded foam. The extrusion molding is preferably conducted in a manner such that the extrudate (25a) extruded from the extruder (12) is introduced into the molding chamber (31) of a molding die (30) while keeping the extrudate in the pressurized state and the extrudate (25a) is released from the pressure upon introduction into the molding chamber (31) of the molding die (30) to foam the extrudate (25a).
摘要翻译：公开了一种用于挤出发泡成型的成型材料，由此可以获得高品质的木质模塑泡沫。从成型材料可以有效地生产高质量的无缺陷的木质成型泡沫。将包含木粉和热塑性树脂作为主要组分并含有1-5重量％的分子量为300-1,000g / mol的烷烃的组成材料进行熔融捏合，直到组分均匀分散，并将所得混合物模塑成型为具有给定直径的颗粒以获得成型材料。随后，将该成型材料与发泡剂一起通过挤出成型装置挤出成型为规定形状，从而得到木质成型泡沫。挤出成型优选以使得从挤出机（12）挤出的挤出物（25a）被引入成型模具（30）的模制室（31）中同时保持挤出物处于加压状态并且挤出物（25a）在被引入成型模具（30）的模制室（31）中时从压力释放以使挤出物（25a）发泡。

43. 发明授权

US09328412B2 Fe—Pt-based ferromagnetic material sputtering target 有权
标题翻译： Fe-Pt系铁磁材料溅射靶
公开(公告)号：US09328412B2
公开(公告)日：2016-05-03
申请号：US13816043
申请日：2011-08-05
申请人： Shin-ichi Ogino , Yuichiro Nakamura
发明人： Shin-ichi Ogino , Yuichiro Nakamura
IPC分类号： C23C14/34 , G11B5/851 , H01F41/18 , H01J37/34 , H01F1/06 , C23C14/14
CPC分类号： C23C14/3414 , C23C14/14 , G11B5/851 , H01F1/068 , H01F41/183 , H01J37/3405 , H01J37/3426 , H01J37/3429
摘要： An Fe—Pt-based ferromagnetic material sputtering target comprising a metal and a metal oxide, wherein the metal has a composition in which Pt is contained in an amount of 5 mol % or more and 60 mol % or less and the remainder is Fe. An object of the present invention is to provide a ferromagnetic material sputtering target, which enables to form a magnetic recording layer composed of a magnetic phase such as an Fe—Pt alloy, and a non-magnetic phase to isolate the magnetic phase, and in which a metal oxide is used as one of the materials for the non-magnetic phase. Provided is a ferromagnetic material sputtering target wherein an inadvertent release of the metal oxide during sputtering and particle generation due to abnormal electrical discharge starting at a void inherently included in the target are suppressed, the adherence between the metal oxide and the matrix alloy is enhanced, and its density is increased.
摘要翻译：包含金属和金属氧化物的Fe-Pt系铁磁材料溅射靶，其中，所述金属的含量为5摩尔％以上且60摩尔％以下且余量为Fe的组成。本发明的目的是提供一种铁磁材料溅射靶，其能够形成由诸如Fe-Pt合金的磁相和非磁性相组成的磁记录层以隔离磁相，并且在其中使用金属氧化物作为非磁性相的材料之一。本发明提供一种强磁性材料溅射靶，其特征在于，抑制溅射时的金属氧化物的无意的释放以及由于靶内固有地形成的空穴而产生的异常放电而产生的粒子，从而提高了金属氧化物与基体合金之间的粘附性，其密度增加。

44. 发明授权

US09181617B2 Sputtering target of ferromagnetic material with low generation of particles 有权
标题翻译：铁磁材料的溅射靶与低代粒子
公开(公告)号：US09181617B2
公开(公告)日：2015-11-10
申请号：US13808938
申请日：2011-01-28
申请人： Shin-ichi Ogino , Atsushi Sato , Yuichiro Nakamura , Atsutoshi Arakawa
发明人： Shin-ichi Ogino , Atsushi Sato , Yuichiro Nakamura , Atsutoshi Arakawa
IPC分类号： H01F41/18 , C23C14/34 , C22C1/04 , C22C19/07 , C22C32/00 , C22F1/10 , G11B5/851 , H01F10/16
CPC分类号： C23C14/3407 , C22C1/0433 , C22C19/07 , C22C32/0026 , C22F1/10 , C23C14/3414 , G11B5/851 , H01F10/16 , H01F41/18
摘要： Provided is a sputtering target of ferromagnetic material comprising a metal having a composition containing 20 mol % or less of Cr, and Co as the remainder; wherein the target structure includes a phase (A) which is a basis metal, and metal phases (B) having a component composition different from the peripheral texture within the phase (A), the area ratio occupied by oxides within 1 μm from the most outer periphery of metal phases (B) is 80% or less, and the average grain size of the metal phases (B) is 10 μm or more and 150 μm or less. Provided is a sputtering target of ferromagnetic material capable of inhibiting the generation of particles during sputtering, and improving the pass-through flux to achieve a stable electrical discharge with a magnetron sputtering device.
摘要翻译：提供一种铁磁材料的溅射靶，其包含具有20摩尔％以下的Cr的组成的金属，余量为Co; 其特征在于，所述目标结构体包括作为基础金属的相（A）和具有与相（A）以外的周边构造不同的成分组成的金属相（B），最大范围内的氧化物占所述面积比1μm以内金属相（B）的外周的平均粒径为80％以下，金属相（B）的平均粒径为10μm以上且150μm以下。本发明提供能够抑制溅射时粒子产生的强磁性材料的溅射靶，提高通过磁通以通过磁控溅射装置实现稳定的放电。

45. 发明授权

US08663402B2 Sputtering target with few surface defects, and surface processing method thereof 有权
标题翻译：表面缺陷少的溅射靶及其表面处理方法
公开(公告)号：US08663402B2
公开(公告)日：2014-03-04
申请号：US13025207
申请日：2011-02-11
申请人： Yuichiro Nakamura , Akira Hisano
发明人： Yuichiro Nakamura , Akira Hisano
IPC分类号： C22C19/07
CPC分类号： C23C14/3414 , C23C14/3407 , Y10T29/49989
摘要： A sputtering target and surface processing method is provided. Intermetallic compounds, oxides, carbides, carbonitrides and other substances without ductility exist in the target surface in a highly ductile matrix phase at a volume ratio of 1 to 50%. The target surface is preliminarily subjected to primary processing of cutting work, and then subsequently subjected to finish processing via polishing. The sputtering target subject to this surface processing has an improved target surface with numerous substances without ductility and prevents or suppresses the generation of nodules and particles upon sputtering.
摘要翻译：提供溅射靶和表面处理方法。金属间化合物，氧化物，碳化物，碳氮化物和其他没有延展性的物质以高达延性基体相的体积比为1〜50％存在于靶表面。目标表面预先进行切割加工的一次加工，然后通过研磨进行精加工。受到这种表面处理的溅射靶具有改进的目标表面，具有许多没有延展性的物质，并且防止或抑制溅射时产生结节和颗粒。

46. 发明申请

US20130213802A1 Sintered Compact Sputtering Target 审中-公开
标题翻译：烧结紧凑型溅射靶
公开(公告)号：US20130213802A1
公开(公告)日：2013-08-22
申请号：US13878438
申请日：2011-12-02
申请人： Atsushi Sato , Yuichiro Nakamura
发明人： Atsushi Sato , Yuichiro Nakamura
IPC分类号： C23C14/34
CPC分类号： C23C14/3407 , B22F3/14 , C22C1/10 , C22C19/07 , C22C30/00 , C22C32/0026 , C22F1/10 , C23C14/3414 , G11B5/851
摘要： A sintered compact sputtering target is provided and contains Co and Cr as metal components and includes oxides dispersed in the structure formed of the metal components. The structure of the sputtering target has a region (A) containing Co oxides dispersed in Co and a region (D) containing Cr oxides in a periphery of the region (A). In addition a method of producing the above referenced sintered compact sputtering target is provided and includes the steps of mixing a powder prepared by pulverizing a sintered compact containing Co oxide dispersed in Co, a Co powder, and a Cr power and pressure-sintering the resulting powder mixture to provide a sputtering target.
摘要翻译：提供了一种烧结微型溅射靶，其包含Co和Cr作为金属成分，并且包括分散在由金属成分形成的结构中的氧化物。溅射靶的结构具有分布在Co中的Co氧化物的区域（A）和区域（A）的周围含有Cr氧化物的区域（D）。此外，提供了制造上述烧结体的溅射靶的方法，包括以下步骤：将通过粉碎分散在Co中的Co氧化物的烧结体，Co粉末和Cr粉末进行粉碎而制备的粉末，并将所得到的粉末进行加压烧结粉末混合物以提供溅射靶。

47. 发明申请

US20130206591A1 Sputtering Target for Magnetic Recording Film and Method for Producing Same 审中-公开
标题翻译：磁记录膜溅射靶及其制作方法
公开(公告)号：US20130206591A1
公开(公告)日：2013-08-15
申请号：US13880865
申请日：2011-11-09
申请人： Hideo Takami , Atsushi Nara , Shin-ichi Ogino , Yuichiro Nakamura
发明人： Hideo Takami , Atsushi Nara , Shin-ichi Ogino , Yuichiro Nakamura
IPC分类号： C23C14/34
CPC分类号： C23C14/3414 , B22F2998/10 , C22C1/101 , C22C19/07 , C22C38/002 , C22C2202/02 , C22F1/00 , C22F1/16 , G11B5/851 , H01F41/183 , B22F9/04 , C22C1/05 , B22F3/10
摘要： Provided is a sputtering target for a magnetic recording film containing SiO2, wherein the sputtering target for a magnetic recording film contains B (boron) in an amount of 10 to 1000 wtppm. An object of this invention is to obtain a sputtering target for a magnetic recording film capable of inhibiting the formation of cristobalites in the target which cause the generation of particles during sputtering, shortening the burn-in time, and realizing a stable discharge with a magnetron sputtering device.
摘要翻译：提供了一种用于含有SiO 2的磁记录膜的溅射靶，其中用于磁记录膜的溅射靶含有10至1000重量ppm的B（硼）。本发明的目的是获得能够抑制溅射中产生颗粒的目标中形成方英石的磁记录膜的溅射靶，缩短烧结时间，并且用磁控管实现稳定的放电溅射装置。

48. 发明申请

US20130065053A1 METHOD FOR PRODUCING COMPOSITE PELLET FOR EXTRUSION MOLDING, AND COMPOSITE PELLET FOR EXTRUSION MOLDING PRODUCED BY THE METHOD 有权
标题翻译：用于生产用于挤出成型的复合材料颗粒的方法，以及通过该方法生产的用于挤出成型的复合材料颗粒
公开(公告)号：US20130065053A1
公开(公告)日：2013-03-14
申请号：US13641536
申请日：2011-04-27
申请人： Takeyasu Kikuchi , Kazumasa Morita , Koji Higashi , Yuichiro Nakamura
发明人： Takeyasu Kikuchi , Kazumasa Morita , Koji Higashi , Yuichiro Nakamura
IPC分类号： B29C47/00
CPC分类号： B29C47/0066 , B29B9/06 , B29B9/065 , B29B9/12 , B29B9/14 , B29B9/16 , B29C47/0004 , B29C47/0011 , B29C47/0042 , B29C47/10 , B29C47/1009 , B29C47/1018 , B29C47/1027 , B29C47/1081 , B29C47/30 , B29C47/362 , B29C47/366 , B29C47/369 , B29C47/40 , B29C47/767 , B29C2793/0027 , B29C2793/009 , B29K2105/04 , B29K2105/16 , B29K2105/251 , B29K2711/14 , Y10T428/2982 , Y10T428/2991 , Y10T428/2998
摘要： Disclosed are composite pellets for extrusion molding wherein fusion does not occur between the pellets, and there is no variation in size and density. A molten material obtained by an extruder for a raw material containing a thermoplastic resin and wood powder is extruded into a strand shape through a die nozzle of the extruder, and cut into a predetermined length to form a pellet. At this time, the extrusion amount, the diameter of each nozzle hole, and the number of nozzle holes are adjusted so that the linear velocity (νd) of the molten material in each nozzle hole of the die nozzle is in the range of 12 to 50 cm/sec. Further, regardless of the variations in particle diameter, etc., a stable amount of the composite pellets are supplied to the extruder, and smoothly introduced to a screw of the extruder. The composite pellets and 12-hydroxystearic acid containing a metal of Ca, Mg, or Zn are agitated together, and 0.03 to 0.4 mass % of the 12-hydroxystearic acid is attached to the periphery of 100 mass % of the composite pellet, and the pellets are used for extrusion molding.
摘要翻译：公开了用于挤出成型的复合颗粒，其中在颗粒之间不发生熔融，并且尺寸和密度没有变化。通过挤出机将含有热塑性树脂和木粉的原料获得的熔融材料通过挤出机的模头喷嘴挤出成股线状，并切割成预定长度以形成丸粒。此时，调整挤出量，每个喷嘴孔的直径和喷嘴孔的数量，使得在模具喷嘴的每个喷嘴孔中的熔融材料的线速度（＆ngr; d）在 12至50厘米/秒。此外，不管粒径等的变化如何，将稳定量的复合颗粒供给到挤出机中，并且平稳地引入挤出机的螺杆。将复合粒料和含有Ca，Mg或Zn的金属的12-羟基硬脂酸一起搅拌，将0.03〜0.4质量％的12-羟基硬脂酸附着在复合粒料的100质量％的周边，颗粒用于挤出成型。

49. 发明申请

US20120097535A1 Sputtering Target of Ferromagnetic Material with Low Generation of Particles 有权
标题翻译：具有低产生粒子的铁磁材料的溅射靶
公开(公告)号：US20120097535A1
公开(公告)日：2012-04-26
申请号：US13320840
申请日：2010-09-30
申请人： Shin-ichi Ogino , Atsushi Sato , Yuichiro Nakamura , Atsutoshi Arakawa
发明人： Shin-ichi Ogino , Atsushi Sato , Yuichiro Nakamura , Atsutoshi Arakawa
IPC分类号： C23C14/06
CPC分类号： C23C14/3414 , B22F2998/00 , C22C19/07 , C22C32/00 , C22C2202/02 , H01F41/183 , C22C32/0026 , B22F9/082
摘要： A ferromagnetic sputtering target comprising metal having a composition containing 20 mol % or less of Cr, and Co as the remainder; wherein the target structure includes a basis metal (A), and flat phases (B), containing 90 wt % or more of Co, within the basis metal (A), the average grain size of the phases (B) is 10 μm or more and 150 μm or less, and the average aspect ratio of the phases (B) is 1:2 to 1:10. Provided is a ferromagnetic sputtering target capable of inhibiting the generation of particles during sputtering, and improving the pass-through flux to achieve a stable electrical discharge with a magnetron sputtering device.
摘要翻译：一种铁磁溅射靶，其包含具有20摩尔％以下的Cr的组成的金属，余量为Co; 其特征在于，在所述基体金属（A）中，所述基体金属（A）和含有90重量％以上的Co的平坦相（B），所述相（B）的平均粒径为10μm，多于150μm以下，相（B）的平均纵横比为1:2〜1:10。本发明提供能够抑制溅射时的粒子产生的铁磁性溅射靶，提高通过磁通以通过磁控溅射装置实现稳定的放电。

50. 发明申请

US20110284373A1 Inorganic-Particle-Dispersed Sputtering Target 有权
标题翻译：无机粒子分散溅射靶
公开(公告)号：US20110284373A1
公开(公告)日：2011-11-24
申请号：US13147782
申请日：2010-07-27
申请人： Atsushi Sato , Yuichiro Nakamura
发明人： Atsushi Sato , Yuichiro Nakamura
IPC分类号： C23C14/35
CPC分类号： G11B5/851 , C23C14/3414
摘要： Provided is an inorganic-particle-dispersed sputtering target in which inorganic particles are dispersed in a Co base material, wherein the inorganic particles have an electric resistivity of 1×101 Ω·m or less and the volume ratio of the inorganic particles in the target is 50% or less. The sputtering target thus adjusted is advantageous in that, when sputtering is performed using a magnetron sputtering device comprising a DC power source, the inorganic particles are less charged, and arcing occurs less frequently. Accordingly, by using the sputtering target of the present invention, the occurrence of particles attributable to the arcing reduces, and a significant effect of improving the yield in forming a thin film is obtained.
摘要翻译：本发明提供一种无机粒子分散溅射靶，其中无机颗粒分散在Co基材料中，其中无机颗粒的电阻率为1×10 11Ω·m·m·m以下，无机颗粒的体积比目标是50％以下。如此调整的溅射靶的优点在于，当使用包括直流电源的磁控管溅射装置进行溅射时，无机颗粒的带电少，并且电弧放电频率较低。因此，通过使用本发明的溅射靶，可以减少由于电弧引起的粒子的发生，并且获得提高薄膜形成的显着效果。

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