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41. 发明申请

US20120168785A1 DISPLAY DEVICE 有权
标题翻译：显示设备
公开(公告)号：US20120168785A1
公开(公告)日：2012-07-05
申请号：US13390716
申请日：2010-08-05
申请人： Keiichi Tanaka , Satoru Kishimoto
发明人： Keiichi Tanaka , Satoru Kishimoto
IPC分类号： H01L33/08
CPC分类号： H01L51/5281 , G02F1/133512 , G02F1/136286 , H01L27/3276 , H05B33/12
摘要： The present invention provides a display device using a copper wiring and having high display properties in which without preventing a higher aperture ratio of the pixel, coloring of a screen due to reflected light of external light produced within the display device can be prevented. The display device according to the present invention is a display device including a plurality of pixel regions, wherein each of the pixel regions includes a copper wiring containing copper or an alloy thereof, and a red-colored layer and a colored layer of another color; and an area of the copper wiring is smaller in the pixel region including the red-colored layer than in the pixel region including the colored layer of another color, the area of the copper wiring reflecting incident light entering from the display surface side of the display device.
摘要翻译：本发明提供了一种使用铜布线并具有高显示特性的显示装置，其中不会妨碍像素的较高的开口率，可以防止由于在显示装置内产生的外部光的反射光引起的屏幕着色。根据本发明的显示装置是包括多个像素区域的显示装置，其中每个像素区域包括包含铜或其合金的铜布线，以及红色层和另一种颜色的着色层; 并且在包括红色层的像素区域中的铜布线的面积比包括另一种颜色的着色层的像素区域小，反射从显示器的显示表面侧入射的光的铜布线的面积设备。

42. 发明申请

US20110307448A1 REPRODUCTION DEVICE 审中-公开
标题翻译：复制设备
公开(公告)号：US20110307448A1
公开(公告)日：2011-12-15
申请号：US12920852
申请日：2009-09-30
申请人： Keiichi Tanaka , Ken Yamashita
发明人： Keiichi Tanaka , Ken Yamashita
IPC分类号： G06F17/30 , G06F7/00
CPC分类号： G11B27/10 , G11B20/00086 , G11B20/00115 , G11B20/00123 , G11B20/00166 , G11B20/00173 , G11B20/00659 , G11B20/00688 , G11B27/322 , G11B27/329 , G11B2020/10842 , G11B2220/213 , G11B2220/2541 , H04N5/85 , H04N5/913 , H04N9/8205 , H04N21/42646 , H04N21/4405 , H04N21/4627 , H04N21/8355 , H04N2005/91321
摘要： In conventional managed copy, files are copied to the copy destination, while maintaining the file structure of the copy source. A problem pertaining to the conventional managed copy is that, when a partial copy, which changes the file structure of the copy source, is performed, the created disc does not conform to the standard and thus cannot be played back by the playback device.In the playback device of the present invention, a managed copy control unit 423 includes a mapping data processing unit 609, and in the case of a partial copy, copies a file to the copy destination disc 802 by changing its file name to a file name for use in the copy destination disc 802. With this structure, it is possible to create a disc that conforms to the standard and can be played back by the playback device.
摘要翻译：在传统的托管副本中，将文件复制到复制目的地，同时保留复制源的文件结构。与常规托管副本相关的问题在于，当执行改变复制源的文件结构的部分副本时，所创建的盘不符合标准，因此不能由回放设备重放。在本发明的回放装置中，托管复制控制单元423包括映射数据处理单元609，并且在部分复制的情况下，通过将文件名改为文件名将文件复制到复制目的地盘802 用于复制目的地光盘802中。通过这种结构，可以创建符合标准的光盘并且可以由播放设备重放。

43. 发明申请

US20110256483A1 RESIDUE REMOVING LIQUID COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR ELEMENT USING SAME 有权
标题翻译：残留液体组合物的清除方法及使用其清洗半导体元件的方法
公开(公告)号：US20110256483A1
公开(公告)日：2011-10-20
申请号：US13057338
申请日：2009-07-07
申请人： Kyoko Kamata , Keiichi Tanaka , Hiroshi Matsunaga
发明人： Kyoko Kamata , Keiichi Tanaka , Hiroshi Matsunaga
IPC分类号： G03F7/20 , C11D7/60
CPC分类号： H01L21/02071 , C11D7/10 , C11D7/244 , C11D7/261 , C11D7/34 , C11D7/5004 , C11D7/5013 , C11D7/5022 , C11D11/0047 , H01L21/02063
摘要： Provided are a residue removing liquid composition capable of completely removing a resist residue and a titanium (Ti)-derived residue that remains after dry etching and ashing in via hole formation in a production process for a semiconductor substrate having metal wiring of aluminium (Al) or an Al alloy, at a low temperature in a short time, not corroding parts of an interlayer insulating material, a wiring material and others, and a cleaning method for semiconductor devices using it.The residue removing liquid composition contains (A) ammonium fluoride, (B) methanesulfonic acid, (C) a carbon-carbon triple bond-having compound, (D) a water-soluble organic solvent, and (E) water, wherein the content of (A), (C), (D) and (E) in the residue removing liquid composition is from 0.005 to 2% by mass, from 0.1 to 10% by mass, from 60 to 75% by mass and from 5 to 38% by mass, respectively, and (B) is contained in an amount of from 0.9 to 1.5 times (by mol) the amount of (A).
摘要翻译：本发明提供一种残留物除去液体组合物，其能够在具有铝（Al）金属配线的半导体基板的制造工序中完全除去抗蚀剂残渣和残留在通孔形成中的干法蚀刻和灰化之后残留的钛（Ti）或Al合金，在短时间内的低温下，不会腐蚀层间绝缘材料的部分，布线材料等，以及使用它的半导体器件的清洁方法。除去残渣的液体组合物含有（A）氟化铵，（B）甲磺酸，（C）具有碳 - 碳三键的化合物，（D）水溶性有机溶剂和（E）水，残渣除去液组合物中的（A），（C），（D）和（E）为0.005〜2质量％，0.1〜10质量％，60〜75质量％ 38质量％，（B）的含量为（A）的量的0.9〜1.5倍（摩尔）。

44. 发明申请

US20110052153A1 REPRODUCTION DEVICE, REPRODUCTION METHOD, AND PROGRAM 有权
标题翻译：复制设备，复制方法和程序
公开(公告)号：US20110052153A1
公开(公告)日：2011-03-03
申请号：US12989872
申请日：2009-07-14
申请人： Keiichi Tanaka , Takahiro Yamaguchi , Ken Yamashita
发明人： Keiichi Tanaka , Takahiro Yamaguchi , Ken Yamashita
IPC分类号： H04N5/93
CPC分类号： G11B20/00086 , G11B20/00115 , G11B20/00224 , G11B20/00862 , G11B2220/2541
摘要： A problem with high resource-consuming managed copy is that simultaneous execution of the managed copy, which is controlled by a playback device, and a BD-J application, which is recorded on a recording medium, leads to a shortage in resources. Provided is a playback device that enables simultaneous execution of the managed copy and the BD-J application while preventing resource contention therebetween, by imposing an access limitation on the disc medium by causing the BD-J application to assume that the disc medium has been virtually ejected.
摘要翻译：高资源管理拷贝的问题在于，记录在记录介质上的由再现装置控制的被管理副本和BD-J应用程序的同时执行导致资源短缺。提供了一种播放装置，其能够通过使BD-J应用程序假定盘介质已被虚拟地对盘介质施加访问限制，从而同时执行托管副本和BD-J应用程序，同时防止其间的资源争用弹出

45. 发明授权

US07801415B2 Recording medium, reproduction device, program, reproduction method and recording method 失效
标题翻译：记录介质，再现装置，程序，再现方法和记录方法
公开(公告)号：US07801415B2
公开(公告)日：2010-09-21
申请号：US12612503
申请日：2009-11-04
申请人： Wataru Ikeda , Tomoyuki Okada , Keiichi Tanaka , Masahiro Oashi
发明人： Wataru Ikeda , Tomoyuki Okada , Keiichi Tanaka , Masahiro Oashi
IPC分类号： H04N5/91
CPC分类号： H04N9/8205 , G11B20/0021 , G11B27/10 , G11B27/329 , G11B2020/1288 , G11B2220/213 , G11B2220/2541 , H04N5/765 , H04N5/775 , H04N5/85 , H04N9/8042 , H04N9/8063 , H04N9/8227
摘要： A BD-ROM contains PlayList information. The PlayList information defines a reproduction section for each of a plurality of AV Clips and contains MainPath information and SubPath information. The MainPath information specifies one of the AV Clips as the MainClip and defines a main reproduction section for the MainClip. The SubPath information specifies another one of the AV Clips as the SubClip and defines a sub-reproduction section to be synchronized with the main reproduction section for the SubClip. The BD-ROM contains those AV Clips specifies as SubClips while being correlated with EP_map. The EP_map correlates and indicates the entry time in the time axis of the SubClip with a plurality of entry positions in the SubClip.
摘要翻译： BD-ROM包含播放列表信息。播放列表信息为多个AV剪辑中的每一个定义再现部分，并且包含MainPath信息和SubPath信息。 MainPath信息指定一个AV剪辑作为MainClip，并定义MainClip的主要复制部分。子路径信息指定AV剪辑中的另一个作为子剪辑，并且定义要与子剪辑的主再现部分同步的子再现部分。 BD-ROM包含指定为子剪辑的AV剪辑，同时与EP_map相关。 EP_map在SubClip中与SubClip的时间轴上的多个入口位置相关并指示入口时间。

46. 发明申请

US20100141923A1 STAGE APPARATUS AND ALIGNER 审中-公开
标题翻译：阶段装置和对准器
公开(公告)号：US20100141923A1
公开(公告)日：2010-06-10
申请号：US12525084
申请日：2008-01-25
申请人： Youichi Motomura , Toshiyuki Kono , Keiichi Tanaka
发明人： Youichi Motomura , Toshiyuki Kono , Keiichi Tanaka
IPC分类号： G03B27/58
CPC分类号： F16F15/02 , F16F2224/0275 , G03F7/70716 , G03F7/70766
摘要： There is provided a stage apparatus at low cost by constituting a counter mass constituting a movable portion of the stage apparatus at low cost.In a stage apparatus used for fabrication or for inspection, by fastening two pieces of first frames (1) and two pieces of second frames (2) by bolts in a positional relationship of making the first frames (1) and the second frames (2) respectively opposed to each other, a counter mass constituting a movable portion of the stage apparatus is constituted, by attaching ceramic-made air pads (4) to air pad attaching faces respectively formed at upper faces and lower faces of two pieces of the first frames (1) on both sides in a length direction, four air bearings are constituted at four corners of the counter mass of the stage apparatus, and the counter mass is floated up by the four air bearings.
摘要翻译：通过以低成本构成构成舞台装置的可动部分的计数器块，以低成本提供了舞台装置。在用于制造或检查的平台装置中，通过以使第一框架（1）和第二框架（2）的位置关系用螺栓紧固两个第一框架（1）和两个第二框架（2）），通过将陶瓷制的气垫（4）附接到分别形成在两个第一部分的两个第一部分的上表面和下表面上的气垫安装面，构成台架装置的可移动部分的反质量块在长度方向两侧的框架（1）中，四个空气轴承构成在平台装置的反质量块的四个角处，并且对质量由四个空气轴承浮起。

47. 发明申请

US20100046921A1 REPRODUCER, PROGRAM, AND REPRODUCING METHOD 失效
标题翻译：复制，程序和复制方法
公开(公告)号：US20100046921A1
公开(公告)日：2010-02-25
申请号：US12609137
申请日：2009-10-30
申请人： Keiichi Tanaka , Masahiro Oashi , Tomokazu Kanamaru
发明人： Keiichi Tanaka , Masahiro Oashi , Tomokazu Kanamaru
IPC分类号： H04N7/00 , H04N5/00
CPC分类号： G11B20/10 , G11B27/034 , G11B27/105 , G11B27/11 , G11B27/329 , G11B27/34 , G11B2220/213 , G11B2220/2541 , H04N5/85
摘要： When a plurality of AVClips recorded on a BD-ROM and Local Storage 18 constitute one stream sequence, a Playback Control Engine 32 starts playback if at least one AVClip of the stream sequence is in an enable status, even when the stream sequence also includes an AVClip which is in a disable status. While one AVClip is being played back, a Virtual FileSystem unit 38 changes a remaining AVClip to the enable status of being recognizable by the Playback Control Engine 32 or the disable status of being unrecognizable by the Playback Control Engine 32, according to a method call by an application.
摘要翻译：当记录在BD-ROM和本地存储器18上的多个AVClip构成一个流序列时，如果流序列的至少一个AVClip处于使能状态，则回放控制引擎32即使当流序列也包括处于禁用状态的AVClip。当一个AVClip正在被回放时，虚拟文件系统单元38将剩余的AVClip改变为可由播放控制引擎32识别的启用状态或者由播放控制引擎32无法识别的禁用状态，根据方法调用一个应用程序。

48. 发明申请

US20090114619A1 WET ETCHING METHOD AND WET ETCHING APPARATUS 审中-公开
标题翻译：湿蚀刻方法和湿蚀刻装置
公开(公告)号：US20090114619A1
公开(公告)日：2009-05-07
申请号：US12094103
申请日：2006-11-17
申请人： Ryuji Sotoaka , Keiichi Tanaka , Tomoyuki Azuma
发明人： Ryuji Sotoaka , Keiichi Tanaka , Tomoyuki Azuma
IPC分类号： B44C1/22 , C23F1/08
CPC分类号： C23F1/02 , C23F1/18 , C23F1/38 , H01J9/025 , H01J9/148 , H01J31/127 , H01L21/32134 , H01L21/67086 , H01L21/67115
摘要： A fine pattern is formed on a surface of a processing object without using photoresist. A wet etching for the processing object in an area to which ultraviolet light is applied is performed by bringing a solution in which nitrous oxide (N2O) is dissolved into contact with the processing object and applying the ultraviolet light to the solution in a vicinity of an area to the processing object other than portions shielded with a mask whereupon a light shielding pattern is formed.
摘要翻译：在不使用光致抗蚀剂的情况下，在加工对象的表面上形成精细图案。在施加紫外线的区域中的处理对象的湿法蚀刻是通过使其中溶解有一氧化二氮（N 2 O）的溶液与处理对象接触并将紫外光施加到溶液附近的除了形成有屏蔽图案的掩模之外的除了部分之外的处理对象的区域。

49. 发明申请

US20090015810A1 METHOD OF MEASURING THE POSITION OF A MASK SURFACE ALONG THE HEIGHT DIRECTION, EXPOSURE DEVICE, AND EXPOSURE METHOD 有权
标题翻译：测量高度方向的掩模表面，曝光装置和曝光方法的位置的方法
公开(公告)号：US20090015810A1
公开(公告)日：2009-01-15
申请号：US12206720
申请日：2008-09-08
申请人： Noriyuki Hirayanagi , Keiichi Tanaka
发明人： Noriyuki Hirayanagi , Keiichi Tanaka
IPC分类号： G03B27/42
CPC分类号： G03F7/70358 , G03F7/70783 , G03F9/7026 , G03F9/7034
摘要： A method to measure the height-direction position of a mask M in an exposure device having a function to irradiate the mask M with light emitted from a light source and transfer a pattern formed on the mask M onto a photosensitive substrate such as a wafer by a projection optical system, a mask surface height-direction position measurement method characterized by moving, before measuring the height-direction position of the mask M, an exposure area defining member 1 which is installed between the mask M and the projection optical system and defines an exposure area at the time of exposure.
摘要翻译：一种用于测量具有从光源发出的光照射掩模M的功能的曝光装置中的掩模M的高度方向位置的方法，并且将形成在掩模M上的图案转印到诸如晶片的感光基板上，投影光学系统，掩模表面高度方向位置测量方法，其特征在于在测量掩模M的高度方向位置之前移动曝光区域限定部件1，该曝光区域限定部件1安装在掩模M和投影光学系统之间并且限定曝光时的曝光区域。

50. 发明授权

US07433017B2 Method of measuring the position of a mask surface along the height direction, exposure device, and exposure method 有权
标题翻译：测量掩模表面沿着高度方向的位置，曝光装置和曝光方法的方法
公开(公告)号：US07433017B2
公开(公告)日：2008-10-07
申请号：US11312389
申请日：2005-12-21
申请人： Noriyuki Hirayanagi , Keiichi Tanaka
发明人： Noriyuki Hirayanagi , Keiichi Tanaka
IPC分类号： G03B27/42
CPC分类号： G03F7/70358 , G03F7/70783 , G03F9/7026 , G03F9/7034
摘要： A method to measure the height-direction position of a mask M in an exposure device having a function to irradiate the mask M with light emitted from a light source and transfer a pattern formed on the mask M onto a photosensitive substrate such as a wafer by a projection optical system, a mask surface height-direction position measurement method characterized by moving, before measuring the height-direction position of the mask M, an exposure area defining member 1 which is arranged between the mask M and the projection optical system and defines an exposure area at the time of exposure.
摘要翻译：一种用于测量具有从光源发出的光照射掩模M的功能的曝光装置中的掩模M的高度方向位置的方法，并且将形成在掩模M上的图案转印到诸如晶片的感光基板上，投影光学系统，掩模表面高度方向位置测量方法，其特征在于在测量掩模M的高度方向位置之前移动曝光区域限定部件1，曝光区域限定部件1布置在掩模M和投影光学系统之间并且限定曝光时的曝光区域。

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