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    • 50. 发明授权
    • Electronic device, manufacturing method of electronic device, electrophotographic photoreceptor, and process cartridge
    • 电子设备,电子设备的制造方法,电子照相感光体和处理盒
    • US06372398B1
    • 2002-04-16
    • US09722684
    • 2000-11-28
    • Wataru YamadaKatsumi NukadaRie IshiiMieko Seki
    • Wataru YamadaKatsumi NukadaRie IshiiMieko Seki
    • G03G1504
    • G03G5/142G03G5/10
    • The present invention relates to a manufacturing method of an electronic device comprising the steps of: preparing at least two kinds of hydrolytic silicon compounds that are different in reactivity to water; preparing a protective group precursor having a substituent having a reactivity to water equal or substantially equal to the reactivity of a reactive group of one of the hydrolytic silicon compounds to water; exchanging a reactive group of the other hydrolytic silicon compound with the substituent of the protective group precursor; preparing a silicon-containing coating agent containing the one of the hydrolytic silicon compounds and a hydrolytic silicon compound having the reactive group which has been exchanged with the substituent of the protective group precursor; and coating and curing the silicon-containing coating agent on a base plate so that at least one layer of a cured film is formed.
    • 本发明涉及一种电子器件的制造方法,包括以下步骤:制备至少两种与水的反应性不同的水解硅化合物; 制备具有对水的反应性具有反应性的取代基的保护基前体等于或基本上等于其中一种水解硅化合物与水的反应性的反应性; 将其它水解硅化合物的反应性基团与保护基前体的取代基交换; 制备含有水解硅化合物之一的含硅涂层剂和具有与保护基前体的取代基交换的反应性基团的水解硅化合物; 在基板上涂布固化含硅涂层剂,使至少一层固化膜形成。