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41. 发明授权

US09394376B2 Cellulose ethers and their use 有权
标题翻译：纤维素醚及其用途
公开(公告)号：US09394376B2
公开(公告)日：2016-07-19
申请号：US13825697
申请日：2011-10-06
申请人： Roland Adden , Meinolf Brackhagen , Matthias Knarr , Jin Zhao
发明人： Roland Adden , Meinolf Brackhagen , Matthias Knarr , Jin Zhao
IPC分类号： C08B11/02 , C08B11/193 , C08L1/28 , A61J3/07 , A61K9/48 , A61K47/38
CPC分类号： C08B11/02 , A61J3/077 , A61K9/4816 , A61K9/4866 , A61K47/38 , C08B11/193 , C08L1/284
摘要： Cellulose ethers are described herein which are useful in capsules or in coatings for dosage forms. In these cellulose ethers the ether substituents are methyl groups, hydroxyalkyl groups, and optionally alkyl groups being different from methyl, the cellulose ether has an MS (hydroxyalkyl) of 0.05 to 1.00, and hydroxy groups of anhydroglucose units are substituted with methyl groups such that [s23/s26−0.2*MS(hydroxyalkyl)] is 0.35 or less, wherein s23 is the molar fraction of anhydroglucose units wherein only the two hydroxy groups in the 2- and 3-positions of the anhydroglucose unit are substituted with methyl groups and wherein s26 is the molar fraction of anhydroglucose units wherein only the two hydroxy groups in the 2- and 6-positions of the anhydroglucose unit are substituted with methyl groups.
摘要翻译：本文描述了纤维素醚，其可用于胶囊或用于剂型的包衣。在这些纤维素醚中，醚取代基是甲基，羟基烷基和任选的不同于甲基的烷基，纤维素醚具有0.05至1.00的MS（羟基烷基），脱水葡萄糖单元的羟基被甲基取代，使得 [s23 / s26-0.2 * MS（羟烷基）]为0.35以下，其中s23为脱水葡萄糖单元的摩尔分数，其中脱水葡萄糖单元的2-和3-位上的两个羟基仅被甲基取代，其中s26是脱水葡萄糖单元的摩尔分数，其中脱水葡萄糖单元的2-和6-位中的两个羟基仅被甲基取代。

42. 发明申请

US20130321064A1 HIERARCHICAL SINGLE MOLECULE SWITCH BASED ON STIMULATED INTERNAL CLUSTER MOTION WITHIN A HOLLOW MOLECULAR CAGE 有权
标题翻译：基于激光内分离器运动的分光单分子开关
公开(公告)号：US20130321064A1
公开(公告)日：2013-12-05
申请号：US13899234
申请日：2013-05-21
申请人： Hrvoje Petek , Tian Huang , Jin Zhao
发明人： Hrvoje Petek , Tian Huang , Jin Zhao
IPC分类号： H01L51/05
CPC分类号： H01L51/0595 , G11C11/56 , G11C13/025 , H01L51/0046
摘要： Systems and methods related to single molecule switching devices are disclosed. One example method can include the step of applying a tunneling current across a tunneling junction. The tunneling junction can include an endohedral fullerene that includes a fullerene cage and a trapped cluster or a trapped atom. Such a method can also include exciting one or more internal motions of the trapped cluster or the trapped atom based at least in part on the tunneling current, and changing the conductance of the endohedral fullerene based at least in part on the one or more excited internal motions. One or more electronic processes can be controlled based at least in part on the changed conductance of the endohedral fullerene.
摘要翻译：公开了与单分子开关器件相关的系统和方法。一个示例性方法可以包括跨隧道结应用隧穿电流的步骤。隧道结可以包括内含富勒烯，其包括富勒烯笼和捕获的簇或被捕获的原子。这种方法还可以包括至少部分地基于隧穿电流激发被捕获的簇或被捕获的原子的一个或多个内部运动，以及至少部分地基于一个或多个激发的内部来改变内嵌的富勒烯的电导动议。可以至少部分地基于改变的内嵌式富勒烯的电导来控制一个或多个电子过程。

43. 发明授权

US07815738B2 Deposition tool cleaning process having a moving plasma zone 有权
标题翻译：具有移动等离子体区域的沉积工具清洁工艺
公开(公告)号：US07815738B2
公开(公告)日：2010-10-19
申请号：US11459819
申请日：2006-07-25
申请人： Ignacio Blanco , Jin Zhao , Nathan Kruse
发明人： Ignacio Blanco , Jin Zhao , Nathan Kruse
IPC分类号： C23C16/455 , H01L21/306
CPC分类号： H01J37/32082 , B08B7/0035 , C23C16/4405 , H01J2237/335 , Y10S438/905
摘要： The present invention provides, in one embodiment, a process for cleaning a deposition chamber (100). The process includes a step (100) of forming a reactive plasma cleaning zone by dissociating a gaseous fluorocompound introduced into a deposition chamber having an interior surface and in a presence of a plasma. The process (100) further includes a step (120) of ramping a flow rate of said gaseous fluorocompound to move the reactive plasma cleaning zone throughout the deposition chamber, thereby preventing a build-up of localized metal compound deposits on the interior surface. Other embodiments advantageously incorporate the process (100) into a system (200) for cleaning a deposition chamber (205) and a method of manufacturing semiconductor devices (300).
摘要翻译：在一个实施例中，本发明提供了一种用于清洁沉积室（100）的方法。该方法包括通过使引入到具有内表面并且存在等离子体的沉积室中的气态氟化合物离解形成反应性等离子体清洗区的步骤（100）。方法（100）还包括使所述气体氟化合物的流速升高以使整个沉积室中的反应性等离子体清洗区域移动的步骤（120），从而防止局部金属化合物沉积在内表面上。其他实施例有利地将工艺（100）并入到用于清洁沉积室（205）的系统（200）和制造半导体器件（300）的方法中。

44. 发明申请

US20100093937A1 POLAR GROUP FUNCTIONALIZED CO-POLYMERS 审中-公开
标题翻译：极性基团官能化聚合物
公开(公告)号：US20100093937A1
公开(公告)日：2010-04-15
申请号：US12515597
申请日：2007-11-12
申请人： Hoang T. Pham , Richard F. Fibiger , Eddy I. Garcia-Meitin , Jin Zhao
发明人： Hoang T. Pham , Richard F. Fibiger , Eddy I. Garcia-Meitin , Jin Zhao
IPC分类号： C08L23/08 , C08F210/02 , C08F8/00 , C08F8/32
CPC分类号： C08L23/0815 , B82Y30/00 , C08F255/02 , C08F287/00 , C08J5/005 , C08J2323/14 , C08L23/06 , C08L23/12 , C08L23/142 , C08L23/16 , C08L51/003 , C08L51/006 , C08L51/06 , C08L2666/24 , C08L2666/06 , C08L2666/02 , C08L2666/04
摘要： The invention relates to a polar group functionalized copolymer useful to prepare a nanocomposite polymer and to the nanocomposite polymer, wherein the polar group functionalized copolymer useful to prepare a nanocomposite polymer and the nanocomposite polymer are as defined in the specification.
摘要翻译：本发明涉及可用于制备纳米复合材料聚合物和纳米复合材料聚合物的极性基团官能化共聚物，其中可用于制备纳米复合材料聚合物的极性基官能化共聚物和纳米复合材料聚合物如本说明书中所定义。

45. 发明申请

US20080146043A1 METHOD FOR MANUFACTURING AN ISOLATION STRUCTURE USING AN ENERGY BEAM TREATMENT 有权
标题翻译：使用能量束处理制造隔离结构的方法
公开(公告)号：US20080146043A1
公开(公告)日：2008-06-19
申请号：US11610758
申请日：2006-12-14
申请人： Puneet Kohli , Manoj Mehrotra , Jin Zhao , Sameer Ajmera
发明人： Puneet Kohli , Manoj Mehrotra , Jin Zhao , Sameer Ajmera
IPC分类号： H01L21/00
CPC分类号： H01L21/3105 , H01L21/76224 , H01L21/823412 , H01L21/823481 , H01L21/823807 , H01L21/823878 , H01L29/6656 , H01L29/6659 , H01L29/7843 , H01L29/7846
摘要： The invention provides a method for manufacturing a semiconductor device. The method for manufacturing the semiconductor device, among others, may include forming one or more layers of material within an opening in a substrate, the opening and the one or more layers forming at least a portion of an isolation structure, and subjecting at least one of the one or more layers to an energy beam treatment, the energy beam treatment configured to change a stress of the one or more layers subjected thereto, and thus change a stress in the substrate.
摘要翻译：本发明提供一种制造半导体器件的方法。用于制造半导体器件的方法尤其可以包括在衬底的开口内形成一层或多层材料，所述开口和所述一层或多层形成隔离结构的至少一部分，并使至少一层的能量束处理，所述能量束处理被配置为改变受其影响的一个或多个层的应力，从而改变衬底中的应力。

46. 发明申请

US20070213339A1 Quinolone Carboxylic Acid Derivatives for Treatment of Hyperproliferative Conditions 审中-公开
标题翻译：喹诺酮羧酸衍生物治疗过度增生症状
公开(公告)号：US20070213339A1
公开(公告)日：2007-09-13
申请号：US10594978
申请日：2005-03-31
申请人： Uday Khire , Xiao-Gao Liu , Dhanapalan Nagarathnam , Jill Wood , Lei Wang , Donglei Liu , Jin Zhao , Leatte Guernon , Lei Zhang
发明人： Uday Khire , Xiao-Gao Liu , Dhanapalan Nagarathnam , Jill Wood , Lei Wang , Donglei Liu , Jin Zhao , Leatte Guernon , Lei Zhang
IPC分类号： A61K31/506 , A61K31/496 , C07D403/14
CPC分类号： C07D215/56 , C07D401/12 , C07D401/14
摘要： Quinolone carboxylic acid derivatives of formula (I) wherein Ar is an optionally substituted phenyl, pyridyl, or pyrimidinyl group and the substituent groups R1, R4, R10, R11, R19, and R20 are as defined in the specification, pharmaceutical compositions containing them, and methods of using them in treatment of hyperproliferative diseases such as cancer are disclosed and claimed.
摘要翻译：式（I）的喹诺酮羧酸衍生物，其中Ar是任选取代的苯基，吡啶基或嘧啶基，取代基R 1，R 4，R 4， 10，R 11，R 19和R 20如说明书中所定义，含有它们的药物组合物和方法将其用于治疗过度增殖性疾病如癌症的方法。

47. 发明授权

US07199047B2 Bi-layer etch stop process for defect reduction and via stress migration improvement 有权
公开(公告)号：US07199047B2
公开(公告)日：2007-04-03
申请号：US10857150
申请日：2004-05-28
申请人： Tae S. Kim , Jin Zhao , Nathan J. Kruse , August J. Fischer , Ralf B. Willecke
发明人： Tae S. Kim , Jin Zhao , Nathan J. Kruse , August J. Fischer , Ralf B. Willecke
IPC分类号： H01L21/4763
CPC分类号： H01L21/76801 , H01L21/76822 , H01L21/76832
摘要： A method of forming a film stack in an integrated circuit, said method comprising depositing a layer of silicon carbide adjacent a first layer of dielectric material, depositing a layer of silicon nitride adjacent the layer of silicon carbide, and depositing a second layer of dielectric material adjacent the layer of silicon nitride.

48. 发明申请

US20050045213A1 Deposition tool cleaning process having a moving plasma zone 有权
标题翻译：具有移动等离子体区域的沉积工具清洁工艺
公开(公告)号：US20050045213A1
公开(公告)日：2005-03-03
申请号：US10653661
申请日：2003-09-02
申请人： Ignacio Blanco , Jin Zhao , Nathan Kruse
发明人： Ignacio Blanco , Jin Zhao , Nathan Kruse
IPC分类号： B08B7/00 , C23C16/44 , B08B9/00
CPC分类号： H01J37/32082 , B08B7/0035 , C23C16/4405 , H01J2237/335 , Y10S438/905
摘要： The present invention provides, in one embodiment, a process for cleaning a deposition chamber (100). The process includes a step (100) of forming a reactive plasma cleaning zone by dissociating a gaseous fluorocompound introduced into a deposition chamber having an interior surface and in a presence of a plasma. The process (100) further includes a step (120) of ramping a flow rate of said gaseous fluorocompound to move the reactive plasma cleaning zone throughout the deposition chamber, thereby preventing a build-up of localized metal compound deposits on the interior surface. Other embodiments advantageously incorporate the process (100) into a system (200) for cleaning a deposition chamber (205) and a method of manufacturing semiconductor devices (300).
摘要翻译：在一个实施例中，本发明提供了一种用于清洁沉积室（100）的方法。该方法包括通过使引入到具有内表面并且存在等离子体的沉积室中的气态氟化合物离解形成反应性等离子体清洗区的步骤（100）。方法（100）还包括使所述气体氟化合物的流速升高以使整个沉积室中的反应性等离子体清洗区域移动的步骤（120），从而防止局部金属化合物沉积在内表面上。其他实施例有利地将工艺（100）并入到用于清洁沉积室（205）的系统（200）和制造半导体器件（300）的方法中。

49. 发明申请

US20050019963A1 Maintaining a reactor chamber of a chemical vapor deposition system 审中-公开
标题翻译：维持化学气相沉积系统的反应室
公开(公告)号：US20050019963A1
公开(公告)日：2005-01-27
申请号：US10623757
申请日：2003-07-21
申请人： Jin Zhao , Nathan Kruse , Ignacio Blanco , Mercer Brugler
发明人： Jin Zhao , Nathan Kruse , Ignacio Blanco , Mercer Brugler
IPC分类号： C23C16/44 , C23C16/52 , C23C16/00 , C25F1/00 , C25F5/00 , H01L21/31 , H01L21/66
CPC分类号： C23C16/4405 , C23C16/52
摘要： Maintaining a reactor chamber of a chemical vapor deposition system includes depositing layers on an inner surface of the reactor chamber, where the layers form an accumulation layer. When the accumulation layer reaches a specified thickness, a plasma clean cycle is performed by introducing cleaning gas into the reactor chamber. The volume of the cleaning gas used during one or more plasma clean cycles is calculated, where the volume indicates the volume of cleaning gas introduced into the reactor chamber. A notification is provided when the volume of the cleaning gas used during the plasma clean cycles has reached a predetermined volume.
摘要翻译：维持化学气相沉积系统的反应室包括在反应室的内表面上沉积层，其中层形成堆积层。当累积层达到规定厚度时，通过将清洁气体引入反应室来执行等离子体清洁循环。计算在一个或多个等离子体清洁循环期间使用的清洁气体的体积，其中体积表示引入反应器室的清洁气体的体积。当在等离子体清洁循环期间使用的清洁气体的体积达到预定体积时，提供通知。

50. 发明授权

US06649666B1 Propylene polymer coupling and foams 失效
标题翻译：丙烯聚合物偶联和泡沫
公开(公告)号：US06649666B1
公开(公告)日：2003-11-18
申请号：US10153058
申请日：2002-05-21
申请人： Michael D. Read , Kevin R. Hughes , Jin Zhao , Thomas J. Styranec , Eung Kyu Kim
发明人： Michael D. Read , Kevin R. Hughes , Jin Zhao , Thomas J. Styranec , Eung Kyu Kim
IPC分类号： C08J900
CPC分类号： C08J9/0033 , C08J9/12 , C08J2323/10 , C08J2323/12 , C08K5/43 , C08L23/10
摘要： The invention includes a process for providing a coupled propylene polymer foam. The invention also includes any composition comprising a product formed by the process of the invention and any article formed from such a composition.
摘要翻译：本发明包括提供偶联的丙烯聚合物泡沫的方法。本发明还包括包含通过本发明的方法形成的产品和由这种组合物形成的任何制品的任何组合物。

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