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41. 发明申请

US20090073408A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20090073408A1
公开(公告)日：2009-03-19
申请号：US12292329
申请日：2008-11-17
申请人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/70341
摘要： Lithographic Apparatus and Device Manufacturing Method A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
摘要翻译：平版印刷设备和设备制造方法公开了一种光刻投影设备，其中采取措施来防止或减少投影光束通过其流出的液体中气泡的存在。这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。

42. 发明授权

US08860924B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08860924B2
公开(公告)日：2014-10-14
申请号：US13589841
申请日：2012-08-20
申请人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia M. Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia M. Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
摘要翻译：浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至可能。最小的理论尺寸是由投影系统成像的目标部分的尺寸。在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。

44. 发明授权

US08248577B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08248577B2
公开(公告)日：2012-08-21
申请号：US11120186
申请日：2005-05-03
申请人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia M. Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia M. Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
摘要翻译：浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至可能。最小的理论尺寸是由投影系统成像的目标部分的尺寸。在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。

45. 发明申请

US20110188015A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20110188015A1
公开(公告)日：2011-08-04
申请号：US13083966
申请日：2011-04-11
申请人： Roelof Frederik DE GRAAF , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Roelof Frederik DE GRAAF , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
摘要翻译：公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。

46. 发明授权

US07817243B2 Vibration isolation system 有权
标题翻译：隔振系统
公开(公告)号：US07817243B2
公开(公告)日：2010-10-19
申请号：US10822139
申请日：2004-04-12
申请人： Marcel François Heertjes , Jan-Gerard Cornelis Van Der Toorn
发明人： Marcel François Heertjes , Jan-Gerard Cornelis Van Der Toorn
IPC分类号： G03B27/42
CPC分类号： F16F15/02 , G03F7/709
摘要： A vibration isolation system isolates a body from its surroundings with respect to vibrations. The vibration isolation system includes active isolator devices that isolate and damp the body in unstable directions. However, such active isolators may exert damping forces not only in the unstable direction, but simultaneously in other stable directions due to mechanical coupling of the stable and unstable directions. As a result the damping and isolation in the other stable directions may be deteriorated due to the active isolation and damping. Employing modal decoupling, i.e. decomposing any vibration into independent directions, and isolating and damping in the independent directions, enables compensation of any vibration in an unstable direction without influencing the isolation and damping performance in any other, possibly stable, direction.
摘要翻译：振动隔离系统将身体与其周围环境相隔离。隔振系统包括主动隔离装置，可在不稳定的方向隔离和潮湿身体。然而，这种有源隔离器不仅可以在不稳定的方向施加阻尼力，而且可以由于稳定和不稳定方向的机械耦合而在其它稳定的方向上施加阻尼力。结果，由于主动隔离和阻尼，其它稳定方向的阻尼和隔离可能会恶化。采用模态去耦，即将任何振动分解为独立的方向，以及在独立方向上进行隔离和阻尼，可以补偿不稳定方向上的任何振动，而不会影响任何其他可能稳定的方向的隔离和阻尼性能。

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