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    • 42. 发明申请
    • Sump assembly and dish washer using the same
    • 水槽组件和洗碗机使用相同
    • US20060249184A1
    • 2006-11-09
    • US11263824
    • 2005-11-02
    • Yang ChungYoung ParkSi JeonTae Lee
    • Yang ChungYoung ParkSi JeonTae Lee
    • B08B3/00
    • A47L15/4204A47L15/4225
    • The present invention is to provide a sump assembly which enables leaked washing water therein to be circulated smoothly without remaining therein, and a dishwasher using the same cleanly and sanitarily. For this, the present invention includes a sump housing for holding washing water; an impeller housing secured to the sump housing for placing an impeller pumping the washing water therein; a filter housing provided on an upper portion of the impeller housing for placing a filter filtering the washing water therein; and a connection device for making a lower portion of the filter housing in communication with the sump housing. Owing to the above configuration, the dishwasher may be used cleanly and sanitarily, resulting in enhancing washing efficiency and endurance of a product.
    • 本发明提供一种能够使其中泄漏的洗涤水能够平稳循环而不残留的贮槽组件,以及使用该洗涤水清洁地和卫生地使用的洗碗机。 为此,本发明包括用于保持洗涤水的贮槽壳体; 叶轮壳体固定到贮槽壳体上,用于将叶轮泵送其中的洗涤水; 过滤器壳体,其设置在所述叶轮壳体的上部,用于将过滤其中的洗涤水的过滤器放置; 以及用于使过滤器壳体的下部与贮槽壳体连通的连接装置。 由于上述结构,洗碗机可以清洁地和卫生地使用,从而提高了洗涤效率和产品的耐久性。
    • 44. 发明申请
    • Method of depositing thin film on substrate using impulse ALD process
    • 使用脉冲ALD工艺在衬底上沉积薄膜的方法
    • US20060210712A1
    • 2006-09-21
    • US11377153
    • 2006-03-16
    • Young ParkSahng LeeKi LeeTae Seo
    • Young ParkSahng LeeKi LeeTae Seo
    • C23C16/00
    • C23C16/45527C23C16/45523
    • Provided is a method of depositing a thin film on a substrate using an impulse feeding process. The method includes performing a second reaction gas continuous feeding process of continuously feeding a second reaction gas into a chamber in which the substrate is installed, and performing a number of times, during the second reaction gas continuous feeding process, a process cycle including a first reaction gas feeding process of feeding a first reaction gas into the chamber and a first reaction gas purge process of purging the first reaction gas that is not adhered onto the substrate. The second reaction gas continuous feeding process includes a second reaction gas impulse process of feeding the second reaction gas at an impulse flow rate greater than a basic flow rate during the first reaction gas purge process.
    • 提供了使用脉冲进给工艺在基板上沉积薄膜的方法。 该方法包括进行将第二反应气体连续供给到其中安装基板的室中的第二反应气体连续进料过程,并且在第二反应气体连续进料过程期间进行多次,包括第一反应气体 将第一反应气体进料到反应室中的反应气体进料过程以及清洗未附着在基材上的第一反应气体的第一反应气体吹扫工序。 第二反应气体连续进料方法包括在第一反应气体净化过程中以大于碱性流速的脉冲流速供给第二反应气体的第二反应气体脉冲过程。
    • 45. 发明申请
    • Rijndael block cipher apparatus and encryption/decryption method thereof
    • Rijndael块加密装置及其加密/解密方法
    • US20060147040A1
    • 2006-07-06
    • US10560220
    • 2004-06-01
    • Yun LeeYoung ParkYoung KimSung Jun
    • Yun LeeYoung ParkYoung KimSung Jun
    • H04L9/28
    • H04L9/0631H04L2209/122
    • A rijndael block cipher apparatus including an operational unit that efficiently performs a round operation for encrypting/decrypting a rijndael block cipher and an encryption/decryption method thereof are disclosed. The rijndael block cipher apparatus is mounted in a mobile terminal such as a cellular phone and a PDA or a smart card, which requires a high-rate and small-sized cipher processor, and can encrypt and decrypt important data that requires security at high speed and perform the round operation with respect to upper 64 bits and lower 64 bits which are divided from 128-bit input data. Thus, the cipher apparatus can reduce the time required for encryption/decryption of the rijndael block cipher and the size of the apparatus.
    • 公开了一种rijndael块密码装置,其包括有效执行加密/解密rijndael块密码的循环操作的操作单元及其加密/解密方法。 rijndael块密码装置安装在诸如蜂窝电话和PDA或智能卡的移动终端中,其需要高速率和小尺寸的加密处理器,并且可以加密和解密需要高速安全性的重要数据 并执行从128位输入数据划分的高64位和低64位的循环运算。 因此,加密装置可以减少rijndael块密码的加密/解密所需的时间以及装置的大小。
    • 47. 发明申请
    • Reflective liquid crystal display
    • 反光液晶显示屏
    • US20060132681A1
    • 2006-06-22
    • US10626152
    • 2003-07-24
    • Young ParkDong SuhHee Kim
    • Young ParkDong SuhHee Kim
    • G02F1/1335
    • G02F1/133553G02F2001/133638
    • A reflective liquid crystal display of the present invention is disclosed. The reflective liquid crystal display of the present invention comprising: a lower substrate including a reflective electrode and a lower orientation film; an upper substrate opposed to the lower substrate, the upper substrate including a transparent substrate and an upper orientation film, the transparent substrate being capable of compensating a phase of λ/4 with an optical axis of a predetermined angle, the upper orientation film being formed on a surface of the transparent substrate opposed to the lower substrate; a twisted nematic liquid crystal layer interposed between the lower substrate and the upper substrate, including a predetermined phase delay value (dΔ n); and a polarizing plate attached to a outer surface of the upper substrate not opposed to the lower substrate, having a predetermined polarizing axis. The present invention enables the phase compensation of the upper substrate to remove the using of the expensive phase film, so that it is possible to reduce production cost and simplify a manufacturing procedure.
    • 公开了本发明的反射型液晶显示器。 本发明的反射型液晶显示器包括:包括反射电极和下取向膜的下基板; 与下基板相对的上基板,上基板包括透明基板和上取向膜,透明基板能够以预定角度的光轴补偿λ/ 4的相位,形成上取向膜 在与所述下基板相对的所述透明基板的表面上; 插入在下基板和上基板之间的扭曲向列液晶层,包括预定的相位延迟值(dDelta n); 以及偏振板,其附接到所述上基板的与所述下基板相对的外表面,具有预定的偏振轴。 本发明能够对上基板进行相位补偿以消除昂贵的相膜的使用,从而可以降低生产成本并简化制造过程。