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41. 发明授权

US07470932B2 Liquid crystal display panel and fabricating method thereof 有权
标题翻译：液晶显示面板及其制造方法
公开(公告)号：US07470932B2
公开(公告)日：2008-12-30
申请号：US11715889
申请日：2007-03-09
申请人： Soon Sung Yoo , Youn Gyoung Chang , Heung Lyul Cho
发明人： Soon Sung Yoo , Youn Gyoung Chang , Heung Lyul Cho
IPC分类号： H01L29/04
CPC分类号： H01L27/1288 , G02F1/133707 , G02F1/13394 , G02F1/13458 , G02F2001/136231 , H01L27/1214
摘要： A liquid crystal display (LCD) panel is fabricated in a simplified process. The LCD panel includes a thin film transistor (TFT) array substrate with a gate and data lines crossing each other to define a pixel area, a TFT at the crossings of the gate and data lines, a protective film, and a pixel electrode connected to the TFT and formed within a pixel opening that is arranged at the pixel area and formed through the protective film and a gate insulating film. A color filter array substrate is joined to the TFT array substrate. A pattern spacer is between the TFT and color filter array substrate and overlaps at least one of the gate line, the data line, and the thin film transistor. A rib is formed from the same layer as the pattern spacer and overlaps the pixel electrode. Liquid crystal material is provided within the LCD panel.
摘要翻译：以简化的工艺制造液晶显示器（LCD）面板。 LCD面板包括薄膜晶体管（TFT）阵列基板，栅极和数据线彼此交叉以限定像素区域，在栅极和数据线的交叉处的TFT，保护膜和连接到 TFT形成在像素区域内，并形成在像素区域并形成在保护膜和栅极绝缘膜上的像素开口内。滤色器阵列基板连接到TFT阵列基板。图案间隔物位于TFT和滤色器阵列基板之间，并与栅极线，数据线和薄膜晶体管中的至少一个重叠。肋由与图案间隔物相同的层形成，并且与像素电极重叠。液晶材料设置在LCD面板内。

42. 发明授权

US07411217B2 Thin film transistor array substrate and manufacturing method of the same 有权
标题翻译：薄膜晶体管阵列基板及其制造方法相同
公开(公告)号：US07411217B2
公开(公告)日：2008-08-12
申请号：US11594950
申请日：2006-11-09
申请人： Soon Sung Yoo , Youn Gyoung Chang , Heung Lyul Cho
发明人： Soon Sung Yoo , Youn Gyoung Chang , Heung Lyul Cho
IPC分类号： H01L29/04
CPC分类号： H01L27/124 , G02F1/13458 , G02F1/136213 , G02F1/136227 , G02F2001/136236 , H01L27/1214 , H01L27/1255 , H01L27/1288 , Y10S438/942
摘要： A thin film transistor array substrate has a gate electrode of the thin film transistor, a gate line connected to the gate electrode, and a gate pad connected to the gate line; a source/drain pattern including a source electrode and a drain electrode of the thin film transistor, a data line connected to the source electrode, a data pad connected to the data line, a storage electrode formed and superimposed with the gate line; a semiconductor pattern formed in low part of the substrate; a transparent electrode pattern including a pixel electrode connected to the drain electrode and the storage electrode, a gate pad protection electrode covering the gate pad, and a data pad protection electrode covering the data pad; and a protection pattern and a gate insulation pattern stacked in a region other than the region where the transparent electrode pattern is formed.
摘要翻译：薄膜晶体管阵列基板具有薄膜晶体管的栅电极，连接到栅电极的栅极线和连接到栅极线的栅极焊盘; 源极/漏极图案，包括薄膜晶体管的源电极和漏电极，连接到源电极的数据线，连接到数据线的数据焊盘，形成并与栅极线重叠的存储电极; 形成在基板的低部分的半导体图案; 包括连接到漏电极和存储电极的像素电极的透明电极图案，覆盖栅极焊盘的栅极焊盘保护电极和覆盖数据焊盘的数据焊盘保护电极; 以及层叠在除了形成透明电极图案的区域之外的区域中的保护图案和栅极绝缘图案。

43. 发明授权

US07612838B2 Thin film transistor array substrate, liquid crystal display panel having the same, and method of manufacturing thin film transistor array substrate and liquid crystal display panel 有权
标题翻译：薄膜晶体管阵列基板，具有该薄膜晶体管阵列基板的液晶显示面板以及制造薄膜晶体管阵列基板和液晶显示面板的方法
公开(公告)号：US07612838B2
公开(公告)日：2009-11-03
申请号：US10960545
申请日：2004-10-08
申请人： Byoung Ho Lim , Soon Sung Yoo , Youn Gyoung Chang , Heung Lyul Cho
发明人： Byoung Ho Lim , Soon Sung Yoo , Youn Gyoung Chang , Heung Lyul Cho
IPC分类号： G02F1/136
CPC分类号： G02F1/134336 , G02F1/133707
摘要： A thin film transistor array substrate for a liquid crystal display panel includes a gate line formed on a substrate. A data line crosses the gate line, thus defining a pixel region. A gate insulating film is positioned between the data line and the gate line. A thin film transistor is formed at a crossing of the gate line and the data line. A passivation film pattern exposes a portion of a drain electrode of the thin film transistor. At least one protrusion is provided to divide the pixel region into a plurality of regions, each of the regions having a different liquid crystal alignment from the other regions. A pixel electrode is connected to the thin film transistor to cover the pixel region excluding the passivation film pattern and the at least one protrusion.
摘要翻译：用于液晶显示面板的薄膜晶体管阵列基板包括形成在基板上的栅极线。数据线与栅极线交叉，从而限定像素区域。栅极绝缘膜位于数据线和栅极线之间。在栅极线和数据线的交叉处形成薄膜晶体管。钝化膜图案暴露薄膜晶体管的漏电极的一部分。提供至少一个突起以将像素区域划分成多个区域，每个区域与其他区域具有不同的液晶取向。像素电极连接到薄膜晶体管以覆盖除了钝化膜图案和至少一个突起之外的像素区域。

44. 发明授权

US07528918B2 Thin film transistor substrate of fringe field switching type and fabricating method thereof 有权
标题翻译：边缘场开关型薄膜晶体管基板及其制造方法
公开(公告)号：US07528918B2
公开(公告)日：2009-05-05
申请号：US11256092
申请日：2005-10-24
申请人： Soon Sung Yoo , Youn Gyoung Chang , Heung Lyul Cho
发明人： Soon Sung Yoo , Youn Gyoung Chang , Heung Lyul Cho
IPC分类号： G02F1/1343
CPC分类号： G02F1/134363 , G02F2001/134372 , G02F2001/13629
摘要： A fringe field switching type thin film transistor substrate includes a double layered structure gate line; a data line crossing the gate line, wherein a gate insulating film is formed therebetween; a thin film transistor having a gate electrode connected to the gate line, a source electrode connected to the data line, and a drain electrode opposing the source electrode; a double layered structure common line parallel to the gate line; a common electrode plate integrated with the transparent conductive layer of the common line and formed in a pixel area defined by the crossing of the gate line and the data line; a pixel electrode slit covering the drain electrode of the thin film transistor and overlapping the common electrode plate, wherein the gate insulating film is formed therebetween in the pixel area; and a data protection pattern covering the data line and the source electrode.
摘要翻译：条纹场开关型薄膜晶体管基板包括双层结构栅极线; 与栅极线交叉的数据线，其间形成有栅极绝缘膜; 薄膜晶体管，具有连接到栅极线的栅电极，连接到数据线的源电极和与源电极相对的漏电极; 平行于栅极线的双层结构公共线; 与公共线的透明导电层集成并形成在由栅极线与数据线的交叉限定的像素区域中的公共电极板; 覆盖所述薄膜晶体管的漏电极且与所述公共电极板重叠的像素电极狭缝，其中，在所述像素区域中形成所述栅极绝缘膜; 以及覆盖数据线和源电极的数据保护图案。

45. 发明授权

US07205571B2 Thin film transistor substrate for display device and fabricating method thereof 有权
公开(公告)号：US07205571B2
公开(公告)日：2007-04-17
申请号：US10963599
申请日：2004-10-14
申请人： Byung Chul Ahn , Soon Sung Yoo , Heung Lyul Cho
发明人： Byung Chul Ahn , Soon Sung Yoo , Heung Lyul Cho
IPC分类号： H01L29/15 , G02F1/1365
CPC分类号： G02F1/136227 , G02F1/136213 , H01L27/124 , H01L27/1255 , H01L27/1288
摘要： A thin film transistor (TFT) substrate is fabricated in three mask processes. In a first mask process, a gate line and a gate electrode are formed. In a second mask process, a data line, a source electrode, a drain electrode, a semiconductor layer, and a first upper storage electrode overlapping the gate line are formed from a gate insulating film, undoped and doped amorphous silicon layers, and a data metal layer. In a third mask process, a pixel hole is formed through protective and gate insulating films within and outside a pixel area, the first upper storage electrode is partially removed, a pixel electrode contacts a side of the drain electrode within the pixel hole at the pixel area, and a second upper storage electrode contacts a side of the first upper storage electrode in the pixel hole outside the pixel area.

46. 发明授权

US07078279B2 Manufacturing method of a thin film transistor array substrate 有权
标题翻译：薄膜晶体管阵列基板的制造方法
公开(公告)号：US07078279B2
公开(公告)日：2006-07-18
申请号：US10950493
申请日：2004-09-28
申请人： Soon Sung Yoo , Heung Lyul Cho
发明人： Soon Sung Yoo , Heung Lyul Cho
IPC分类号： H01L21/336 , H01L29/41 , G02F1/1343
CPC分类号： G02F1/13458 , G02F1/1368 , G02F2001/136231 , G02F2201/50 , H01L27/12 , H01L27/124 , H01L27/1288 , Y10S438/951
摘要： A method of manufacturing a thin film transistor capable of simplifying a substrate structure and a manufacturing process is disclosed. The method of manufacturing a thin film transistor array substrate includes involves a three-round mask process, which includes: forming a gate pattern on a substrate; forming a gate insulating film on the substrate having the gate pattern thereon; forming a source/drain pattern and a semiconductor pattern; forming a passivation film to protect the thin film transistor on an entire surface of the substrate; forming a photo-resist pattern on the passivation film; patterning the passivation film using the photo-resist pattern to form a passivation film pattern; and forming a transparent electrode pattern being extended from a lateral surface of the passivation film pattern and formed at an area except for the passivation film pattern.
摘要翻译：公开了一种能够简化衬底结构和制造工艺的制造薄膜晶体管的方法。制造薄膜晶体管阵列基板的方法包括三向掩模工艺，其包括：在基板上形成栅极图案; 在其上具有栅极图案的衬底上形成栅极绝缘膜; 形成源极/漏极图案和半导体图案; 形成钝化膜，以在衬底的整个表面上保护薄膜晶体管; 在钝化膜上形成光刻胶图案; 使用光致抗蚀剂图案来图案化钝化膜以形成钝化膜图案; 以及形成从钝化膜图案的侧表面延伸并形成在除了钝化膜图案之外的区域的透明电极图案。

47. 发明授权

US08057691B2 Method of manufacturing printing plate and method of manufacturing liquid crystal display device using the same 有权
标题翻译：制造印版的方法和使用该印版的液晶显示装置的制造方法
公开(公告)号：US08057691B2
公开(公告)日：2011-11-15
申请号：US12721297
申请日：2010-03-10
申请人： Soon Sung Yoo , Oh Nam Kwon
发明人： Soon Sung Yoo , Oh Nam Kwon
IPC分类号： B44C1/22 , G03F7/00
CPC分类号： B41C1/025 , G02F2001/136231
摘要： A method of manufacturing a precise printing plate, and a method of manufacturing an LCD device using the same are disclosed, the method of manufacturing the precise printing plate comprising forming a mask layer of a predetermined pattern on a substrate; etching the substrate with an etchant including an anionic surfactant by using the mask layer of the predetermined pattern, to thereby form a trench; and removing the mask layer.
摘要翻译：公开了一种精密印刷版的制造方法及使用其的液晶显示装置的制造方法，其特征在于，制造精密印刷版的方法包括在基板上形成规定图案的掩模层; 通过使用预定图案的掩模层，用包括阴离子表面活性剂的蚀刻剂蚀刻基板，从而形成沟槽; 并去除掩模层。

48. 发明授权

US07704678B2 Method of manufacturing printing plate and method of manufacturing liquid crystal display device using the same 有权
标题翻译：制造印版的方法和使用该印版的液晶显示装置的制造方法
公开(公告)号：US07704678B2
公开(公告)日：2010-04-27
申请号：US11479001
申请日：2006-06-29
申请人： Soon Sung Yoo , Oh Nam Kwon
发明人： Soon Sung Yoo , Oh Nam Kwon
IPC分类号： B31D3/00 , B44C1/22 , G03F7/26
CPC分类号： B41C1/025 , G02F2001/136231
摘要： A method of manufacturing a precise printing plate, and a method of manufacturing an LCD device using the same are disclosed, the method of manufacturing the precise printing plate comprising forming a mask layer of a predetermined pattern on a substrate; etching the substrate with an etchant including an anionic surfactant by using the mask layer of the predetermined pattern, to thereby form a trench; and removing the mask layer.
摘要翻译：公开了一种精密印刷版的制造方法及使用其的液晶显示装置的制造方法，其特征在于，制造精密印刷版的方法包括在基板上形成规定图案的掩模层; 通过使用预定图案的掩模层，用包括阴离子表面活性剂的蚀刻剂蚀刻基板，从而形成沟槽; 并去除掩模层。

49. 发明授权

US08007967B2 Shadow mask and manufacturing method thereof 有权
标题翻译：荫罩及其制造方法
公开(公告)号：US08007967B2
公开(公告)日：2011-08-30
申请号：US11475110
申请日：2006-06-27
申请人： Soon Sung Yoo , Oh Nam Kwon
发明人： Soon Sung Yoo , Oh Nam Kwon
IPC分类号： H01J29/07
CPC分类号： H05B33/10
摘要： Disclosed is a shadow mask having a fine slit that can improve precision and resolution of a pattern by reducing side etching during an etching process of a mask substrate, and a manufacturing method thereof. The shadow mask includes a mask substrate, a slit region formed by penetrating through the mask substrate, the slit region having a plurality of undercut portions at respective sides thereof, each undercut portion having a unit thickness, and a shadow region provided in the mask substrate, the shadow region corresponding to a region other than the slit region.
摘要翻译：公开了一种荫罩，其具有能够通过在掩模基板的蚀刻处理期间减少侧蚀刻而提高图案的精度和分辨率的细小狭缝及其制造方法。荫罩包括掩模基板，穿过掩模基板形成的狭缝区域，狭缝区域各自具有多个底切部分，每个底切部分具有单位厚度，以及设置在掩模基板中的阴影区域，对应于除狭缝区域以外的区域的阴影区域。

50. 发明申请

US20100167439A1 METHOD OF MANUFACTURING PRINTING PLATE AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME 有权
标题翻译：制造印版的方法和使用其制造液晶显示装置的方法
公开(公告)号：US20100167439A1
公开(公告)日：2010-07-01
申请号：US12721297
申请日：2010-03-10
申请人： Soon Sung Yoo , Oh Nam Kwon
发明人： Soon Sung Yoo , Oh Nam Kwon
IPC分类号： H01L33/58 , H01L21/50
CPC分类号： B41C1/025 , G02F2001/136231
摘要： A method of manufacturing a precise printing plate, and a method of manufacturing an LCD device using the same are disclosed, the method of manufacturing the precise printing plate comprising forming a mask layer of a predetermined pattern on a substrate; etching the substrate with an etchant including an anionic surfactant by using the mask layer of the predetermined pattern, to thereby form a trench; and removing the mask layer.
摘要翻译：公开了一种精密印刷版的制造方法及使用其的液晶显示装置的制造方法，其特征在于，制造精密印刷版的方法包括在基板上形成规定图案的掩模层; 通过使用预定图案的掩模层，用包括阴离子表面活性剂的蚀刻剂蚀刻基板，从而形成沟槽; 并去除掩模层。

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