专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明授权

US06641972B2 Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the same 有权
标题翻译：用于形成厚膜的正性光致抗蚀剂组合物，光致抗蚀剂膜以及使用其形成凸块的方法
公开(公告)号：US06641972B2
公开(公告)日：2003-11-04
申请号：US10090170
申请日：2002-03-05
申请人： Kouichi Misumi , Koji Saito , Toshiki Okui , Hiroshi Komano
发明人： Kouichi Misumi , Koji Saito , Toshiki Okui , Hiroshi Komano
IPC分类号： G03F7023
CPC分类号： G03F7/0233 , G03F7/022
摘要： A positive photoresist composition includes an alkali-soluble novolak resin (A), an alkali-soluble acrylic resin (B) and a quinonediazido-group-containing compound (C) and is used for the formation of a thick film 5 to 100 &mgr;m thick. The ingredient (B) includes 30% to 90% by weight of a unit (b1) derived from a polymerizable compound having an ether bond and 2% to 50% by weight of a unit (b2) derived from a polymerizable compound having a carboxyl group. The composition is applied on a substrate and thereby yields a photoresist film. Likewise, the composition is applied onto a substrate on an electronic part, is patterned, is plated and thereby yields bumps.
摘要翻译：正型光致抗蚀剂组合物包括碱溶性酚醛清漆树脂（A），碱溶性丙烯酸树脂（B）和含醌二叠氮基的化合物（C），并用于形成厚度为5至100μm厚的厚膜。成分（B）含有30重量％〜90重量％的衍生自具有醚键的聚合性化合物的单元（b1）和2重量％〜50重量％的来自具有羧基的聚合性化合物的单元（b2）组。将组合物施加在基材上，从而得到光致抗蚀剂膜。同样地，将组合物施加到电子部件上的基板上，被图案化，被镀覆，从而产生凸块。

42. 发明授权

US06225476B1 Positive-working photoresist composition 有权
标题翻译：正光刻胶组合物
公开(公告)号：US06225476B1
公开(公告)日：2001-05-01
申请号：US09542952
申请日：2000-04-04
申请人： Hideo Hada , Kazufumi Sato , Hiroshi Komano
发明人： Hideo Hada , Kazufumi Sato , Hiroshi Komano
IPC分类号： C07D30733
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： Provided by the invention is a chemical-amplification positive-working photoresist composition used in the fine photolithographic patterning in the manufacturing process of semiconductor devices, which is suitable for the patterning light exposure with ArF excimer laser beams of very short wavelength by virtue of absence of aromatic structure in the ingredients of the composition. The composition comprises, as the film-forming resinous ingredient, an acrylic resin having unique monomeric units represented by the general formula &Brketopenst;CH2—CR1(—CO—O—CR2R3R4)&Brketclosest;, in which R1 is a hydrogen atom or a methyl group, R2 and R3 are each, independently from the other, an alkyl group having 1 to 4 carbon atoms and R4 is an alkoxycarbonyl group or a group derived from a molecule of a lactone compound or ketone compound by removing a hydrogen atom bonded to the carbon atom.
摘要翻译：本发明提供的是在半导体器件的制造过程中用于精细光刻图案化的化学放大正性光致抗蚀剂组合物，其适用于通过不存在非常短的波长的ArF准分子激光束来图案化曝光芳香结构在组成成分中。该组合物包含作为成膜树脂成分的丙烯酸树脂，其具有由通式为R 1为氢原子或甲基的单体单元表示的独特单体单元，R 2和R 3各自独立地为具有通过除去与碳原子键合的氢原子，R4是烷氧基羰基或衍生自内酯化合物或酮化合物的分子的基团。

43. 发明授权

US5973187A Positive-working chemical-sensitization photoresist composition 有权
标题翻译：正性化学增感光刻胶组合物
公开(公告)号：US5973187A
公开(公告)日：1999-10-26
申请号：US179818
申请日：1998-10-28
申请人： Hideo Hada , Yoshiki Sugeta , Hiroyuki Yamazaki , Hiroshi Komano
发明人： Hideo Hada , Yoshiki Sugeta , Hiroyuki Yamazaki , Hiroshi Komano
IPC分类号： C07C307/02 , C07C309/65 , C07C309/66 , C07C309/73 , G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027 , C07C255/00
CPC分类号： C07C309/66 , C07C309/65 , C07C309/73 , G03F7/0045
摘要： Disclosed is a novel positive-working or negative-working chemical-sensitization photoresist composition useful in the photolithographic patterning works for the manufacture of electronic devices. The photoresist composition is characterized by a unique acid-generating agent capable of releasing an acid by the pattern-wise exposure of the resist layer to actinic rays so as to increase or decrease the solubility of the resist layer in an aqueous alkaline developer solution. The acid-generating agent proposed is a novel cyano group-containing oxime sulfonate di- or triester compound represented by the general formulaA[C(CN).dbd.N--O--SO.sub.2 --R].sub.n,in which each R is, independently from the others, an unsubstituted or substituted monovalent hydrocarbon group such as alkyl groups, A is a divalent or tervalent organic group or, preferably, phenylene group and the subscript n is 2, when A is a divalent group, or 3, when A is a tervalent group or, preferably 2. Since more than one of sulfonic acid molecules are released from one molecule of the sulfonate compound by the exposure to actinic rays, the chemical-sensitization photoresist composition exhibits high photosensitivity.
摘要翻译：公开了一种用于制造电子器件的光刻图案化工艺中的新型正性或负性化学增感光致抗蚀剂组合物。光致抗蚀剂组合物的特征在于能够通过抗蚀剂层与光化射线的图案曝光而释放酸的独特的酸产生剂，从而增加或降低抗蚀剂层在碱性显影剂水溶液中的溶解度。所提出的酸产生剂是由通式A [C（CN）= NO-SO 2 -R] n表示的新的含氰基的肟磺酸酯二酯或三酯化合物，其中每个R独立地为未取代或取代的一价烃基如烷基，A是二价或三价有机基团，或优选亚苯基，下标n为2，当A为二价基团时，或3，当A为三价基团或，优选2.由于通过暴露于光化射线，一个以上的磺酸分子从一分子的磺酸酯化合物中释放出来，化学增感光致抗蚀剂组合物表现出高的光敏性。

44. 发明授权

US5885746A Photosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plate 失效
标题翻译：感光树脂组合物，使用相同的感光印版和印刷主板的制造方法
公开(公告)号：US5885746A
公开(公告)日：1999-03-23
申请号：US580356
申请日：1995-12-28
申请人： Takeshi Iwai , Hiroshi Komano
发明人： Takeshi Iwai , Hiroshi Komano
IPC分类号： G03F7/028 , G03F7/105 , G03F7/029 , G03F7/031 , G03F7/033 , G03F7/037
CPC分类号： G03F7/028 , G03F7/105
摘要： A photosensitive resin composition comprising a high polymer binder, a monomer, a photopolymerization initiator generating a radical on exposure to visible light of a wavelength of 400 to 700 nm such as triazine compounds, titanocene compounds, or acridine compounds, an optically-activated acid generating agent generating an acid on exposure to light of a wavelength of 200 to 380 nm, and a color former developing a color in the presence of an acid, and a method manufacturing a printing master plate comprising the steps of exposing a photosensitive printing plate which has a laminated layer made from a photosensitive resin composition thereon to visible light of wavelength in the range of 400 to 600 nm selectively in an imagewise configuration in order to harden the resin composition layer, developing the photosensitive printing plate, and further exposing the developed plate to light of a wavelength in the range 200 to 380 nm.
摘要翻译：一种感光性树脂组合物，其包含高分子粘合剂，单体，在暴露于400〜700nm波长的可见光下产生自由基的光聚合引发剂，例如三嗪化合物，二茂钛化合物或吖啶化合物，产生光学活化的酸在暴露于200〜380nm的波长的光下产生酸的试剂和在酸存在下显色的成色剂，以及制造印刷母版的方法，包括以下步骤：将具有为了使树脂组合物层硬化，对感光性印刷版进行显影，进一步使显影板进一步曝光，由感光性树脂组合物形成的层叠层以400〜600nm范围内的波长的可见光选择性地成像波长在200至380nm范围内的光。

45. 发明授权

US5714286A Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof 失效
标题翻译：用于形成遮光膜的光敏树脂组合物，由其形成的黑色基质及其制备方法
公开(公告)号：US5714286A
公开(公告)日：1998-02-03
申请号：US759716
申请日：1996-12-06
申请人： Kiyoshi Uchikawa , Masaru Shida , Hiroshi Komano
发明人： Kiyoshi Uchikawa , Masaru Shida , Hiroshi Komano
IPC分类号： G02B5/20 , G02F1/1335 , G03F7/004 , G03F7/027 , G03F7/028 , G03F7/032 , G03F7/038 , G03F7/40 , H01J9/227 , H01J11/22 , H01J11/34 , H01J11/44 , H01J17/04 , G03F9/00
CPC分类号： H01J9/205 , G02F1/133512 , G03F7/0047 , H01J2211/444
摘要： A photosensitive resin composition for forming light shielding films is of particular utility in forming a black matrix for use in display elements such as of a CRT display, a liquid crystal panel, a plasma display and the like. The photosensitive resin composition is comprised of a photopolymerizable compound, a photopolymerization initiator, and light shielding materials composed of an oxide of copper and an oxide or oxides of at least one metal selected from iron, manganese, chromium, cobalt and nickel. The black matrix so obtained is conducive to high heat resistance, greatly light shielding and sharp image contrast as well as to excellent electrical insulation resistance. For use in the plasma display in particular, a black matrix is producible by coating of the photosensitive resin composition on a given substrate, followed by exposure of the coat to selective irradiation with active light rays to form a pattern therein and by subsequently burning of the pattern.
摘要翻译：用于形成遮光膜的感光性树脂组合物在形成用于CRT显示器，液晶面板，等离子体显示器等的显示元件的黑色矩阵中是特别有用的。感光性树脂组合物由光聚合性化合物，光聚合引发剂和由铜的氧化物和选自铁，锰，铬，钴和镍中的至少一种金属的氧化物或氧化物构成的遮光材料构成。这样获得的黑色矩阵有利于高耐热性，大大的光屏蔽和清晰的图像对比度以及优异的绝缘电阻。特别是在等离子体显示器中使用时，通过在给定的基材上涂布感光性树脂组合物，然后将涂层暴露于活性光线的选择性照射以在其中形成图案，并随后燃烧模式。

46. 发明授权

US5368991A Photosensitive resin composition for use as a light-shielding film which can be used as black matrices 失效
标题翻译：用作可用作黑色矩阵的遮光膜的光敏树脂组合物
公开(公告)号：US5368991A
公开(公告)日：1994-11-29
申请号：US94214
申请日：1993-07-21
申请人： Kiyoshi Uchikawa , Hiroshi Komano , Toshimi Aoyama , Katsuyuki Ohta
发明人： Kiyoshi Uchikawa , Hiroshi Komano , Toshimi Aoyama , Katsuyuki Ohta
IPC分类号： G02B5/20 , G02F1/1335 , G03F7/00 , G03F7/004 , G03F7/105 , G03F7/11 , G03C1/725 , G03F9/00
CPC分类号： G03F7/0007 , G02F1/133512
摘要： Disclosed is a photosensitive resin composition for use in a light-shielding film, comprising a photosensitive resin and a light-shielding coloring material, wherein light transmission properties after formation of the light-shielding film are controlled by the light-shielding coloring material so that (i) the light transmission through the light-shielding film is 1% or more in at least one wavelength of a light wavelength region of from 330 nm to less than 425 nm, and (ii) the light transmission through the light-shielding film is 2% or less in a light wavelength region of from 425 to 650 nm.
摘要翻译：公开了一种用于遮光膜的感光性树脂组合物，其包含光敏树脂和遮光性着色材料，其中在形成遮光膜之后的透光性由遮光性着色材料控制，使得（i）在330nm至小于425nm的光波长区域的至少一个波长中通过遮光膜的透光率为1％以上，（ii）通过遮光膜的透光率在425〜650nm的光波长区域中为2％以下。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式