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    • 41. 发明授权
    • Electron optics for multi-beam electron beam lithography tool
    • 多光束电子束光刻工具的电子光学
    • US06617587B2
    • 2003-09-09
    • US10243585
    • 2002-09-12
    • N. William ParkerAlan D. BrodieGeorge Xinsheng GuoEdward M. YinMichael C. Matter
    • N. William ParkerAlan D. BrodieGeorge Xinsheng GuoEdward M. YinMichael C. Matter
    • H01J37147
    • B82Y10/00B82Y40/00H01J37/3174H01J37/3177
    • A charge particle optical column capable of being used in a high throughput, mutli-column, multi-beam electron beam lithography system is disclosed herein. The column has the following properties: purely electrostatic components; small column footprint (20 mm square); multiple, individually focused charge particle beams; telecentric scanning of all beams simultaneously on a wafer for increased depth of field; and conjugate blanking of the charged particle beams for reduced beam blur. An electron gun is disclosed that uses microfabricated field emission sources and a microfabricated aperture-deflector assembly. The aperture-deflector assembly acts as a perfect lens in focusing, steering and blanking a multipicity of electron beams through the back focal plane of an immersion lens located at the bottom of the column. Beam blanking can be performed using a gating signal to decrease beam blur during writing on the wafer.
    • 本文公开了一种能够在高通量,多列,多光束电子束光刻系统中使用的电荷粒子光学列。 该柱具有以下特性:纯静电成分; 小柱占地面积(20平方米); 多个单独聚焦的电荷粒子束; 同时在晶圆上同时扫描所有光束以增加景深; 并且用于减少光束模糊的带电粒子束的共轭消隐。 公开了一种电子枪,其使用微制造的场致发射源和微制造的孔径偏转器组件。 孔径偏转器组件用作聚焦,转向和消隐通过位于塔底部的浸没透镜的后焦平面的多个电子束的完美透镜。 可以使用门控信号进行光束消隐,以减少在晶片上写入期间的光束模糊。
    • 49. 发明授权
    • Charged particle optics with azimuthally-varying third-order aberrations for generation of shaped beams
    • 具有方位变化的三阶像差的带电粒子光学器件用于产生成形梁
    • US08242457B2
    • 2012-08-14
    • US12050035
    • 2008-03-17
    • N. William Parker
    • N. William Parker
    • G21K1/08
    • H01J37/153B82Y10/00B82Y40/00H01J37/3007H01J37/3023H01J37/3174H01J2237/1534H01J2237/303H01J2237/30494
    • A charged particle shaped beam column includes: a charged particle source; a gun lens configured to provide a charged particle beam approximately parallel to the optic axis of the column; an objective lens configured to form the charged particle shaped beam on the surface of a substrate, wherein the disk of least confusion of the objective lens does not coincide with the surface of the substrate; an optical element with 8N poles disposed radially symmetrically about the optic axis of the column, the optical element being positioned between the condenser lens and the objective lens, wherein N is an integer greater than or equal to 1; and a power supply configured to apply excitations to the 8N poles of the optical element to provide an octupole electromagnetic field. The octupole electromagnetic field is configured to induce azimuthally-varying third-order deflections to the beam trajectories passing through the 8N-pole optical element. By controlling the excitation of the 8N poles a shaped beam, such as a square beam, can be formed at the surface of the substrate. The 8N-pole element can be magnetic or electrostatic.
    • 带电粒子束柱包括:带电粒子源; 枪式透镜,其构造成提供近似平行于所述柱的光轴的带电粒子束; 配置为在基板的表面上形成带电粒子束的物镜,其中所述物镜的最小混淆盘与所述基板的表面不一致; 具有8N磁极的光学元件,其围绕所述列的光轴径向对称设置,所述光学元件位于所述聚光透镜和所述物镜之间,其中N是大于或等于1的整数; 以及电源,被配置为对所述光学元件的8N极施加激励以提供八极电磁场。 八极电磁场被配置为引起通过8N极光学元件的光束轨迹的方位角变化的三阶偏转。 通过控制8N极的激发,可以在衬底的表面上形成诸如方束的成形光束。 8N极元件可以是磁性的或静电的。