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41. 发明授权

US07733501B2 Optical system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的光学系统
公开(公告)号：US07733501B2
公开(公告)日：2010-06-08
申请号：US12195920
申请日：2008-08-21
申请人： Joerge Tschischgale , Toralf Gruner
发明人： Joerge Tschischgale , Toralf Gruner
IPC分类号： G01B11/02
CPC分类号： G03F7/70591 , G03B13/00 , G03F7/70266
摘要： In a method for improving imaging properties of an illumination system or a projection objective of a microlithographic projection exposure apparatus, which comprises an optical element having a surface, the shape of the surface is measured directly at various points. To this end, a measuring beam is directed on the points, and the reflected or refracted beam is measured, e.g. using an interferometer. Based on deviations of the measured shape from a target shape, corrective measures are derived so that the imaging errors of the optical system are improved. The corrective measures may comprise a change in the position or the shape of the optical element being analyzed, or another optical element of the optical system. The target shape of the surface may, for example, be determined so that the optical element at least partially corrects imaging errors caused by other optical elements.
摘要翻译：在用于改善包括具有表面的光学元件的微光刻投影曝光装置的照明系统或投影物镜的成像特性的方法中，直接在各个点测量表面的形状。为此，测量光束被引导到这些点上，并且测量反射或折射的光束。使用干涉仪。基于测量形状与目标形状的偏差，导出校正措施，使得光学系统的成像误差得到改善。校正措施可以包括被分析的光学元件的位置或形状的改变，或光学系统的另一个光学元件的变化。例如，可以确定表面的目标形状，使得光学元件至少部分地校正由其它光学元件引起的成像误差。

42. 发明授权

US07589903B2 Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method 失效
标题翻译：适用于不同浸入液体或液体的投影物镜，转换方法及生产方法
公开(公告)号：US07589903B2
公开(公告)日：2009-09-15
申请号：US11420103
申请日：2006-05-24
申请人： Susanne Beder , Wilhelm Ulrich , Heiko Feldmann , Wolfgang Singer , Toralf Gruner
发明人： Susanne Beder , Wilhelm Ulrich , Heiko Feldmann , Wolfgang Singer , Toralf Gruner
IPC分类号： G02B3/00 , G02B3/12
CPC分类号： G02B13/143 , G03F7/70341
摘要： The invention relates to a projection objective (6), in particular for applications in microlithography, serving to project an image of an object (3) arranged in an object plane (4) onto a substrate (18) arranged in an image plane (7). The projection objective (6) has an object-side-oriented part (10) which is arranged adjacent to the object plane (4) and includes a plurality of optical elements, and it also has an image-side-oriented part (11) of the objective which is arranged adjacent to the image plane (7) and includes a free space (16) serving to receive a fluid (13) and further includes at least a part of an optical end-position element (14) serving to delimit the free space (16) towards the object side. The projection objective (6) is operable in different modes of operation in which the free space (16) is filled with fluids (13) that differ in their respective indices of refraction.
摘要翻译：本发明涉及一种投影物镜（6），特别是用于微光刻中的用于将布置在物平面（4）中的物体（3）的图像投影到布置在图像平面（7）中的基底（18）上的投影物镜）。投影物镜（6）具有与物平面（4）相邻配置并具有多个光学元件的物体侧取向部（10），还具有图像侧取向部（11）所述物镜布置成邻近所述图像平面（7）并且包括用于接收流体（13）的自由空间（16），并且还包括用于界定光学终点位置元件（14）的至少一部分朝向物体侧的自由空间（16）。投影物镜（6）可在不同的操作模式中操作，其中自由空间（16）填充有各自折射率不同的流体（13）。

43. 发明申请

US20080291419A1 PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY 审中-公开
公开(公告)号：US20080291419A1
公开(公告)日：2008-11-27
申请号：US12187116
申请日：2008-08-06
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

44. 发明授权

US07423765B2 Optical system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的光学系统
公开(公告)号：US07423765B2
公开(公告)日：2008-09-09
申请号：US11190555
申请日：2005-07-27
申请人： Joerg Tschischgale , Toralf Gruner
发明人： Joerg Tschischgale , Toralf Gruner
IPC分类号： G01B11/02 , G03B27/42
CPC分类号： G03F7/70591 , G03B13/00 , G03F7/70266
摘要： In a method for improving imaging properties of an illumination system or a projection objective of a microlithographic projection exposure apparatus, which comprises an optical element having a surface, the shape of the surface is measured directly at various points. To this end, a measuring beam is directed on the points, and the reflected or refracted beam is measured, e.g. using an interferometer. Based on deviations of the measured shape from a target shape, corrective measures are derived so that the imaging errors of the optical system are improved. The corrective measures may comprise a change in the position or the shape of the optical element being analyzed, or another optical element of the optical system. The target shape of the surface may, for example, be determined so that the optical element at least partially corrects imaging errors caused by other optical elements.
摘要翻译：在用于改善包括具有表面的光学元件的微光刻投影曝光装置的照明系统或投影物镜的成像特性的方法中，直接在各个点测量表面的形状。为此，测量光束被引导到这些点上，并且测量反射或折射的光束。使用干涉仪。基于测量形状与目标形状的偏差，导出校正措施，使得光学系统的成像误差得到改善。校正措施可以包括被分析的光学元件的位置或形状的改变，或光学系统的另一个光学元件的变化。例如，可以确定表面的目标形状，使得光学元件至少部分地校正由其它光学元件引起的成像误差。

45. 发明申请

US20080204692A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND METHOD FOR PRODUCING MICROSTRUCTURED COMPONENTS 审中-公开
标题翻译：微结构投影曝光装置及其生产微结构元件的方法
公开(公告)号：US20080204692A1
公开(公告)日：2008-08-28
申请号：US12054991
申请日：2008-03-25
申请人： Toralf Gruner , Bernd Geh
发明人： Toralf Gruner , Bernd Geh
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70441 , G03F7/70083 , G03F7/70141 , G03F7/70391 , G03F7/70566 , G03F7/70941
摘要： A method for producing microstructured components in a microlithographic projection exposure apparatus is disclosed. The method includes imaging a pattern of structures into an image plane of a projection objective. The dose distribution of projection light in the image plane can be influenced so that the image of a structure is at least essentially independent of the topography of structures which lie inside a region surrounding the structure.
摘要翻译：公开了一种在微光刻投影曝光装置中制造微结构元件的方法。该方法包括将结构图案成像到投影物镜的像平面中。可以影响投影光在图像平面中的剂量分布，使得结构的图像至少基本上独立于位于围绕结构的区域内的结构的形貌。

46. 发明授权

US07321465B2 Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lenses 失效
标题翻译：氟化物晶体透镜优化目标的方法，以及氟化物晶体透镜的目标
公开(公告)号：US07321465B2
公开(公告)日：2008-01-22
申请号：US11071699
申请日：2005-03-02
申请人： Michael Totzeck , Vladimir Kamenov , Toralf Gruner
发明人： Michael Totzeck , Vladimir Kamenov , Toralf Gruner
IPC分类号： G02B27/28
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G02B13/143 , G03F7/70241 , G03F7/705 , G03F7/70966 , Y10S359/90
摘要： A numerical optimizing method serves to reduce harmful effects caused by intrinsic birefringence in lenses of a fluoride crystal material of cubic crystal structure in an objective, particularly a projection objective for a microlithography system. Under the optimizing method, an optimizing function which takes at least one birefringence-related image aberration into account is minimized. The birefringence-related image aberration is determined from a calculation for a light ray passing through the fluoride crystal lenses. To the extent that the birefringence-related image aberration is a function of parameters of the light ray, it depends only on geometric parameters of the light ray. The numerical optimizing method is used to produce objectives in which an optical retardation as well as an asymmetry of the optical retardation are corrected. The lenses are arranged in homogeneous groups, where each homogeneous group is corrected for the optical retardation asymmetry.
摘要翻译：数值优化方法用于减少物镜中的立方晶体结构的氟化物晶体材料的透镜中的固有双折射引起的有害影响，特别是微光刻系统的投影物镜。在优化方法下，考虑到至少一个双折射相关图像像差的优化函数被最小化。从通过氟化物晶体透镜的光线的计算确定双折射相关图像像差。在双折射相关图像像差是光线参数的函数的程度上，其仅取决于光线的几何参数。使用数值优化方法来产生其中光学延迟以及光学延迟的不对称性被校正的目标。透镜被排列成均匀的组，其中每个均匀组被校正用于光学延迟不对称。

47. 发明申请

US20080002167A1 PROJECTION EXPOSURE APPARATUS AND METHOD FOR OPERATING THE SAME 有权
标题翻译：投影曝光装置及其操作方法
公开(公告)号：US20080002167A1
公开(公告)日：2008-01-03
申请号：US11427183
申请日：2006-06-28
申请人： Toralf Gruner , Olaf Conradi , Nils Dieckmann , Markus Schwab , Olaf Hmann , Michael Totzeck , Daniel Kraehmer , Vladimir Kamenov
发明人： Toralf Gruner , Olaf Conradi , Nils Dieckmann , Markus Schwab , Olaf Hmann , Michael Totzeck , Daniel Kraehmer , Vladimir Kamenov
IPC分类号： G03B27/42 , G02B9/00
CPC分类号： G03F7/70958 , G02B13/143 , G02B17/0856 , G02B17/0892 , G02B27/0012 , G03F7/70091
摘要： The invention concerns a method for operating a projection exposure apparatus to project the image of a structure of an object (5) arranged in an object plane (6) onto a substrate (10) arranged in an image plane (8). The object (5) is illuminated with light of an operating wavelength of the projection exposure apparatus according to one of several adjustable exposure modes. The light produces changes in at least one optical element (9) of the projection exposure apparatus, by which the optical properties of the projection exposure apparatus are influenced. The operation of the projection exposure apparatus makes allowance for the influencing of the optical properties of the projection exposure apparatus or a quantity dependent on the former, being calculated approximately on the basis of the exposure mode used and the structure of the object (5).
摘要翻译：本发明涉及一种用于操作投影曝光装置以将布置在物平面（6）中的物体（5）的结构的图像投影到布置在图像平面（8）中的基板（10）上的方法。根据多种可调曝光模式之一，物体（5）被投影曝光装置的工作波长的光照射。该光在投影曝光装置的至少一个光学元件（9）中产生变化，由此影响投影曝光装置的光学特性。投影曝光装置的操作允许基于所使用的曝光模式和对象（5）的结构大致计算投影曝光装置的光学特性或取决于前者的光学特性的影响。

48. 发明授权

US07145720B2 Objective with fluoride crystal lenses 有权
公开(公告)号：US07145720B2
公开(公告)日：2006-12-05
申请号：US10367989
申请日：2003-02-12
申请人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
发明人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
IPC分类号： G02B5/30
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

49. 发明授权

US07068436B2 Projection lens for a microlithographic projection exposure apparatus 失效
标题翻译：用于微光刻投影曝光装置的投影透镜
公开(公告)号：US07068436B2
公开(公告)日：2006-06-27
申请号：US10878611
申请日：2004-06-29
申请人： Toralf Gruner , Hans-Jürgen Mann
发明人： Toralf Gruner , Hans-Jürgen Mann
IPC分类号： G02B13/24
CPC分类号： G02B27/286 , G02B13/14 , G02B17/08 , G02B17/0892 , G03F7/70191 , G03F7/70225 , G03F7/70566
摘要： A projection lens (10) for a microlithographic projection exposure apparatus has a first optical element, for example a birefringent lens (L2), that has polarization dependent properties causing intensity fluctuations in an image plane of the projection lens. These fluctuation may be produced by a second optical element (24), for example a polarization selective beam splitting layer (28), that is arranged downstream of the first optical element. A gray filter (32; 132; 232) disposed in the beam path reduces the intensity fluctuations.
摘要翻译：用于微光刻投影曝光装置的投影透镜（10）具有第一光学元件（例如双折射透镜（L 2）），其具有导致投影透镜的图像平面中的强度波动的偏振相关特性。这些波动可以由布置在第一光学元件下游的第二光学元件（24）产生，例如偏振选择分束层（28）。设置在光束路径中的灰色滤光器（32; 132; 232）减小了强度波动。

50. 发明申请

US20060023179A1 Optical system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的光学系统
公开(公告)号：US20060023179A1
公开(公告)日：2006-02-02
申请号：US11190555
申请日：2005-07-27
申请人： Joerg Tschischgale , Toralf Gruner
发明人： Joerg Tschischgale , Toralf Gruner
IPC分类号： G03B27/42
CPC分类号： G03F7/70591 , G03B13/00 , G03F7/70266
摘要： In a method for improving imaging properties of an illumination system or a projection objective of a microlithographic projection exposure apparatus, which comprises an optical element having a surface, the shape of the surface is measured directly at various points. To this end, a measuring beam is directed on the points, and the reflected or refracted beam is measured, e.g. using an interferometer. Based on deviations of the measured shape from a target shape, corrective measures are derived so that the imaging errors of the optical system are improved. The corrective measures may comprise a change in the position or the shape of the optical element being analyzed, or another optical element of the optical system. The target shape of the surface may, for example, be determined so that the optical element at least partially corrects imaging errors caused by other optical elements.
摘要翻译：在用于改善包括具有表面的光学元件的微光刻投影曝光装置的照明系统或投影物镜的成像特性的方法中，直接在各个点测量表面的形状。为此，测量光束被引导到这些点上，并且测量反射或折射的光束。使用干涉仪。基于测量形状与目标形状的偏差，导出校正措施，使得光学系统的成像误差得到改善。校正措施可以包括被分析的光学元件的位置或形状的改变，或光学系统的另一个光学元件的变化。例如，可以确定表面的目标形状，使得光学元件至少部分地校正由其它光学元件引起的成像误差。

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