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    • 41. 发明专利
    • DE60029838D1
    • 2006-09-14
    • DE60029838
    • 2000-06-05
    • OHMI TADAHIROFUJIKIN KK
    • OHMI TADAHIRONISHINO KOUJIIKEDA NOBUKAZUYAMAJI MICHIODOHI RYOUSUKEIDETA EIJIHIROSE TAKASHI
    • F16K47/08F04F1/08F16K7/14F16K7/16F16K25/00F16K27/00F16K31/02F16K47/00H04B17/00H04W4/90H04W48/12H04W74/08
    • It is an object of the present invention to provide at low costs a valve with an integral orifice for use in a gas feeding equipment provided with a pressure-type flow volume control device to be employed for manufacturing of semi-conductors and chemical goods. The valve with an integral orifice has the excellent flow rate control characteristics by improving the processing accuracy of the orifice and preventing the distortion of the orifice at the time of assembling. To realize the objects of the present invention, the main part of the valve with an integral orifice comprises a valve main body made of heat-resisting materials having a gas inflow passage in communication with a valve chamber with an upper open end and a gas outflow passage, a synthetic resin made valve seat body formed in the valve chamber and having a gas outflow passage in communication with the gas outflow passage of the aforementioned valve main body and a valve seat, an orifice disc made of heat-resisting materials removably installed in the gas outflow passage of the valve seat body, and an orifice formed in the orifice disc to reduce the gas outflow passage of the valve seat body; wherein the orifice is formed in the stainless steel made orifice disc in advance and the metal made orifice disc with the orifice formed by a separate processing and the synthetic resin made valve seat body are removably assembled, wherein the orifice disc and the synthetic resin made valve seat body are fixed airtight to the valve main body by pressing the valve seat body via the metal inner disc.
    • 45. 发明专利
    • AT310985T
    • 2005-12-15
    • AT98937819
    • 1998-08-13
    • FUJIKIN KKTOKYO ELECTRON LTDOHMI TADAHIRO
    • OHMI TADAHIROKAGAZUME TETUSUGIYAMA KAZUHIKODOHI RYOUSUKEUNO TOMIONISHINO KOUJIFUKUDA HIROYUKIIKEDA NOBUKAZUYAMAJI MICHIO
    • F16K17/22G05D7/06G05D16/20F16K7/16F16K7/14
    • A pressure-type flow rate control apparatus for use especially in the gas supply system in semiconductor manufacturing facilities. The flow control apparatus is provided with a bore-variable orifice, which permits easy switching of the fluid flow rate control range as well as size reduction of the pressure-type flow control apparatus, and offers other advantages including improved gas replaceability, prevention of dust formation, and reduced manufacturing costs of the flow control system. The pressure-type flow rate control apparatus comprises an orifice, a control valve provided on the upstream side of the orifice, a pressure detector provided between the control valve and the orifice, and a control unit to calculate a fluid flow rate Q on the basis of a pressure P1 detected by the pressure detector with the equation Q = KP1 (K = constant) and to output in a drive for the control valve the difference between the set flow rate signal Qs and the calculated flow rate signal Q as control signal Qy, wherein the pressure P1 on the upstream side of the orifice is regulated by actuating the control valve for controlling the flow rate of the fluid downstream of the orifice with the ratio P2/P1 between the pressure P1 on the upstream side of the orifice and the downstream pressure P2 maintained at not higher than the ratio of the critical pressure of the controlled fluid, characterized in that a direct touch type metal diaphragm valve unit functions as the orifice and that the ring-shaped gap between the valve seat and the diaphragm serves as variable orifice wherein the gap is adjusted by the orifice drive.