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    • 50. 发明专利
    • Mask forming method, material for mask, and pattern film forming system using the same
    • 掩模成型方法,掩模材料和使用其的图案膜成型系统
    • JP2006263685A
    • 2006-10-05
    • JP2005089831
    • 2005-03-25
    • Fuji Photo Film Co LtdFuji Xerox Co Ltd富士ゼロックス株式会社富士写真フイルム株式会社
    • NAKADA JUNJIAKIYOSHI HIROKAZUKATO TAKASHIARISAWA HIROSHIYAMAMOTO SHIGERU
    • B05D1/32B32B7/06C23C14/04
    • PROBLEM TO BE SOLVED: To provide a mask forming method which enables the formation of a thin film on a base with a pattern of high precision and definition with high productivity at low costs, a material for a mask, and a pattern film forming system using it.
      SOLUTION: A release material part to be released corresponding a shape of a mask is only released by an release operation means from the material for the mask. The exposed surface of a predetermined part of a second adhesive layer 16 is brought into contact with the surface of the base 22 in a mask adherend part. In a mask transfer part, a sheet 14 for a mask corresponding to the shape of the mask is attached by the second adhesive layer 16 to be transferred. Further, on the surface of the base 22 attached with the sheet 14 for the mask by the second adhesive layer 16 in a thin film forming part, a thin film 98 is formed by a vacuum film deposition method. The sheet 14 for the mask is removed by a mask removal part, thereby forming the thin film 98 of a predetermined pattern on the base 22.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 解决的问题:提供一种掩模形成方法,其能够以低成本高生产率的高精度和定义的图案在基底上形成薄膜,掩模用材料和图案膜 使用它的成型系统。 解决方案:对应于掩模形状的待释放的释放材料部分仅通过释放操作装置从掩模的材料释放。 第二粘合剂层16的预定部分的暴露表面在掩模被粘物部分中与基底22的表面接触。 在掩模转印部分中,通过第二粘合剂层16附着用于与掩模形状相对应的掩模用片材14以进行转印。 此外,在通过薄膜形成部分中的第二粘合剂层16附着有掩模用片材14的基底22的表面上,通过真空膜沉积法形成薄膜98。 用于掩模的片材14通过掩模去除部分去除,从而在基底22上形成预定图案的薄膜98。版权所有(C)2007,JPO&INPIT