专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明授权

US5998115A Photographic elements containing composite reflective grains 失效
标题翻译：含有复合反射晶粒的摄影元件
公开(公告)号：US5998115A
公开(公告)日：1999-12-07
申请号：US292500
申请日：1999-04-15
申请人： Joseph F. Bringley , James A. Friday , Thomas B. Brust
发明人： Joseph F. Bringley , James A. Friday , Thomas B. Brust
IPC分类号： G03C7/00 , G03C1/035 , G03C1/09 , G03C1/74 , G03C1/76 , G03C7/30 , G03C1/46
CPC分类号： G03C7/3029 , G03C7/3022
摘要： A photographic element is disclosed that relies upon high bromide silver halide grains that are sulfur and/or gold sensitized for latent image formation. Coated to receive exposing radiation directly from a layer containing the latent image forming grains is a non-imaging layer containing (a) tabular silver halide grains (i) comprised of greater than 50 mole percent bromide, based on silver, (ii) having a thickness in the range of from 0.03 to 0.20 .mu.m, and (iii) having an average aspect ratio of greater than 20, and (b) silver halide epitaxy selectively positioned adjacent edges of said tabular grains in said non-imaging layer, said silver halide epitaxy (i) containing greater than 50 mole percent chloride, based on silver, and (ii) accounting for from 0.1 to 50 percent of the total silver in the composite grains.
摘要翻译：公开了一种照相材料，其依赖于用于潜像形成的硫和/或金敏化的高溴化银卤化物颗粒。涂覆以从包含潜像形成颗粒的层直接接收曝光辐射是非成像层，其包含（a）由大于50摩尔百分比的溴化银（基于银）构成的片状卤化银颗粒（i），（ii）具有厚度在0.03至0.20μm的范围内，和（iii）具有大于20的平均纵横比，以及（b）选择性地定位在所述非成像层中所述片状颗粒的边缘附近的卤化银外延，所述银卤化物外延（i）含有大于50摩尔百分比的氯化物，以银为基准，和（ii）占复合颗粒中总银的0.1％至50％。

42. 发明授权

US5491050A Method of processing originating photographic elements containing tabular silver chloride grains bounded by (100) faces 失效
标题翻译：处理由（100）面界定的含片状氯化银颗粒的起始照相元件的处理方法
公开(公告)号：US5491050A
公开(公告)日：1996-02-13
申请号：US193831
申请日：1994-02-09
申请人： Thomas B. Brust , Sharon Gould , James E. Sutton , Richard P. Szajewski
发明人： Thomas B. Brust , Sharon Gould , James E. Sutton , Richard P. Szajewski
IPC分类号： G03C1/035 , G03C1/005 , G03C1/43 , G03C5/26 , G03C5/30 , G03C7/392 , G03C7/413 , G03C7/42 , G03C7/46 , G03C1/494 , G03C1/46
CPC分类号： G03C7/39252 , G03C1/0053 , G03C7/413 , G03C2001/0055 , G03C2001/03535 , G03C2001/03558 , G03C2001/03594 , G03C2200/01 , G03C5/3035 , Y10S430/156 , Y10S430/158 , Y10S430/164
摘要： A method of processing an exposed originating silver halide color photographic element comprising developing the photographic element in a color devoloper containing a p-phenylenediamine color developing agent in the presence of a 1-phenyl pyrazolidin-3-one compoundwherein the originating silver halide photographic element comprises a radiation sensitive emulsion in reactive association with a development inhibitor releasing compound and containing a silver halide grain population comprised of grains comprising at least 50 mole percent silver chloride, based on total silver forming the grain population projected area, wherein at least 50 percent of total grain projected area is accounted for by intrinsically stable silver halide tabular grains(1) bounded by {100} major faces having adjacent edge ratios of less than 10 and(2) each having an average aspect ratio of at least 2, and wherein the silver halide content of the photographic element comprises at least 50 mole % silver chloride and no more than 2 mole % silver iodide.
摘要翻译：一种处理暴露的起始卤化银彩色照相元件的方法，包括在1-苯基吡唑烷-3-酮化合物存在下，将含有对苯二胺彩色显影剂的彩色脱色器中的照相元件显影，其中起始卤化银照相元件包括与显影抑制剂释放化合物反应性相关的辐射敏感乳剂，并且包含由包含至少50摩尔％氯化银的颗粒组成的卤化银颗粒群，基于形成颗粒群投影面积的总银，其中至少50％总颗粒投影面积由本征稳定的卤化银片状颗粒（1）占据了具有相邻边缘比率小于10的{100}主面和（2）各自具有至少2的平均纵横比，并且其中照相元件的卤化银含量至少为50％（摩尔）氯化银 e且不超过2摩尔％的碘化银。

43. 发明授权

US09709889B2 Forming conductive metal patterns using thiosulfate copolymers 有权
公开(公告)号：US09709889B2
公开(公告)日：2017-07-18
申请号：US15012959
申请日：2016-02-02
申请人： Mark Edward Irving , Thomas B. Brust , Grace Ann Bennett
发明人： Mark Edward Irving , Thomas B. Brust , Grace Ann Bennett
IPC分类号： G03F7/004 , G03F7/038 , G03F7/16 , G03F7/20 , G03F7/40 , G03F7/11
CPC分类号： G03F7/038 , G03F7/0384 , G03F7/11 , G03F7/16 , G03F7/2002 , G03F7/40 , G03F7/405
摘要： A precursor article has a substrate and a polymeric layer having a reactive composition that contains a non-crosslinked thiosulfate copolymer comprising: (a) recurring units comprising pendant thiosulfate groups, and (b) recurring units comprising pendant carboxy, carboxylate, phospho, phosphonate, phosphate, sulfo, sulfonate, or sulfite groups. The (a) recurring units are present in an amount of 1 to 30 mol %, and the (b) recurring units are present in an amount of 70 to 99 mol %. This precursor article can be used to provide a product article comprising a substrate in which the polymeric layer has both exposed regions and non-exposed regions. The exposed regions contain a pattern of electrolessly plated metal within or deposited on the surface of an at least partially crosslinked polymer that has been derived from the non-crosslinked thiosulfate copolymer. The non-exposed regions have none of the electrolessly plated metal or the non-crosslinked thiosulfate polymer.

44. 发明授权

US09366965B2 Forming electrically-conductive patterns using crosslinkable reactive polymers 有权
标题翻译：使用可交联反应性聚合物形成导电图案
公开(公告)号：US09366965B2
公开(公告)日：2016-06-14
申请号：US14457396
申请日：2014-08-12
申请人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
发明人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
IPC分类号： G03F7/20 , G03F7/16 , G03F7/038 , G03F7/004
CPC分类号： G03F7/16 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0382 , G03F7/0388 , G03F7/26
摘要： An electrically-conductive pattern is prepared using a reactive composition having: (1) a reactive polymer; (2) a compound that provides a cleaving acid upon exposure to radiation; and (3) a crosslinking agent that reacts in the presence of the cleaving acid, to provide crosslinking in the reactive polymer. A polymeric layer of the reactive composition is patternwise exposed to provide a polymeric layer comprising non-exposed regions and exposed regions comprising a polymer comprising sulfonic acid or sulfonate groups. The exposed regions are contacted with electroless seed metal ions to form a pattern of electroless seed metal ions, which pattern is reduced to provide a pattern of corresponding electroless seed metal particles. Electrolessly plating is then carried out in the exposed regions. The unique reactive comprises (a) recurring units represented Structure (A) as described in the disclosure, and can also include other recurring units that are crosslinkable or provide other properties.
摘要翻译：使用具有以下物质的反应性组合物制备导电图案：（1）反应性聚合物; （2）暴露于辐射时提供裂解酸的化合物; 和（3）在裂解酸存在下反应以在反应性聚合物中提供交联的交联剂。将反应性组合物的聚合物层图案地暴露以提供包含非暴露区域的聚合物层和包含包含磺酸或磺酸盐基团的聚合物的暴露区域。暴露的区域与无电子种子金属离子接触以形成无电晶种金属离子的图案，该图案被还原以提供相应的无电子种子金属颗粒的图案。然后在暴露的区域进行无电镀。独特的反应性包括（a）如本公开所述的结构（A）所示的重复单元，并且还可以包括可交联或提供其它性质的其它重复单元。

45. 发明申请

US20160147148A1 FORMING CONDUCTIVE METAL PATTERNS USING THIOSULFATE COPOLYMERS 有权
标题翻译：使用硫代脂肪族共聚物形成导电金属图案
公开(公告)号：US20160147148A1
公开(公告)日：2016-05-26
申请号：US15012959
申请日：2016-02-02
申请人： Mark Edward Irving , Thomas B. Brust , Grace Ann Bennett
发明人： Mark Edward Irving , Thomas B. Brust , Grace Ann Bennett
IPC分类号： G03F7/038 , G03F7/11
CPC分类号： G03F7/038 , G03F7/0384 , G03F7/11 , G03F7/16 , G03F7/2002 , G03F7/40 , G03F7/405
摘要： A precursor article has a substrate and a polymeric layer having a reactive composition that contains a non-crosslinked thiosulfate copolymer comprising: (a) recurring units comprising pendant thiosulfate groups, and (b) recurring units comprising pendant carboxy, carboxylate, phospho, phosphonate, phosphate, sulfo, sulfonate, or sulfite groups. The (a) recurring units are present in an amount of 1 to 30 mol %, and the (b) recurring units are present in an amount of 70 to 99 mol %. This precursor article can be used to provide a product article comprising a substrate in which the polymeric layer has both exposed regions and non-exposed regions. The exposed regions contain a pattern of electrolessly plated metal within or deposited on the surface of an at least partially crosslinked polymer that has been derived from the non-crosslinked thiosulfate copolymer. The non-exposed regions have none of the electrolessly plated metal or the non-crosslinked thiosulfate polymer.
摘要翻译：前体制品具有底物和具有反应性组合物的聚合物层，其含有非交联硫代硫酸盐共聚物，其包含：（a）包含硫代硫酸盐基团的重复单元，和（b）包含侧羧基，羧酸根，磷酸根，膦酸根，磷酸盐，磺基，磺酸盐或亚硫酸盐基团。（a）重复单元的存在量为1〜30摩尔％，（b）重复单元的存在量为70〜99摩尔％。该前体制品可用于提供包含基材的产品制品，其中聚合物层具有两个暴露区域和非曝光区域。曝光区域包含在非交联硫代硫酸盐共聚物衍生的至少部分交联的聚合物的表面内或沉积在其表面上的无电镀金属的图案。未曝光区域不具有无电镀金属或非交联硫代硫酸盐聚合物。

46. 发明授权

US09329482B2 Forming conductive metal patterns using thiosulfate copolymers 有权
标题翻译：使用硫代硫酸盐共聚物形成导电金属图案
公开(公告)号：US09329482B2
公开(公告)日：2016-05-03
申请号：US14249390
申请日：2014-04-10
申请人： Mark Edward Irving , Thomas B. Brust , Grace Ann Bennett
发明人： Mark Edward Irving , Thomas B. Brust , Grace Ann Bennett
IPC分类号： G03F7/004 , G03F7/16 , G03F7/20 , G03F7/038
CPC分类号： G03F7/038 , G03F7/0384 , G03F7/11 , G03F7/16 , G03F7/2002 , G03F7/40 , G03F7/405
摘要： A conductive pattern can be formed using a polymeric layer that contains a reactive composition that comprises a reactive polymer that is metal ion-complexing, water-soluble, and crosslinkable. This reactive polymer comprises pendant thiosulfate groups as well as metal ion-complexing and water solubilizing groups. The reactive composition can be patternwise exposed to suitable radiation to induce crosslinking within the reactive polymer. The reactive composition and reactive polymer in the non-exposed regions can be removed due to their aqueous solubility, but the exposed regions of the polymeric layer are contacted with electroless seed metal ions, which are then reduced. The resulting electroless seed metal nuclei are electrolessly plated with a suitable metal to form the desired conductive pattern. Various articles can be prepared during this process, and the product article can be incorporated into various electronic devices.
摘要翻译：可以使用包含反应性组合物的聚合物层形成导电图案，所述反应性组合物包含金属离子络合，水溶性和可交联的反应性聚合物。该反应性聚合物包括硫代硫酸根基团以及金属离子络合和水溶性基团。反应性组合物可以图案化地暴露于合适的辐射以诱导反应性聚合物内的交联。非暴露区域中的反应性组合物和反应性聚合物可以由于其水溶性而被去除，但是聚合物层的暴露区域与无电晶种金属离子接触，然后将其还原。所得无电子种子金属核用无电镀的合适金属镀以形成所需的导电图案。在该过程中可以制备各种物品，并且产品可以并入各种电子设备中。

47. 发明申请

US20150122778A1 ELECTROLESS PLATING METHOD USING NON-REDUCING AGENT 有权
标题翻译：使用非还原剂的电镀方法
公开(公告)号：US20150122778A1
公开(公告)日：2015-05-07
申请号：US14072049
申请日：2013-11-05
申请人： Mark Edward Irving , Thomas B. Brust
发明人： Mark Edward Irving , Thomas B. Brust
IPC分类号： C23C18/20
CPC分类号： C23C18/204 , C23C18/1608 , C23C18/1612 , C23C18/1641 , C23C18/2033 , C23C18/206 , C23C18/285 , C23C18/30 , G03F7/038 , G03F7/0392 , G03F7/265 , G03F7/38 , G03F7/40 , G03F7/405 , Y10T428/24802
摘要： A conductive pattern is formed in a polymeric layer that has (a) a reactive polymer comprising pendant tertiary alkyl ester groups, (b) a compound that provides an acid upon exposure to radiation, and (c) a crosslinking agent. The polymeric layer is patternwise exposed to radiation to provide a polymeric layer comprising non-exposed regions and exposed regions comprising a polymer comprising carboxylic acid groups. The exposed regions are contacted with electroless seed metal ions to form a pattern of electroless seed metal ions. This pattern of electroless seed metal ions can be contacted with a non-reducing reagent that reacts with the electroless seed metal ions to form an electroless seed metal compound that has a pKsp of less than 40. This bound electroless seed metal compound is then electrolessly plated with a suitable conductive metal.
摘要翻译：导电图案形成在聚合物层中，该聚合物层具有（a）包含叔烷基酯基侧基的反应性聚合物，（b）暴露于辐射时提供酸的化合物，和（c）交联剂。将聚合物层图案地暴露于辐射以提供包含非暴露区域的聚合物层和包含包含羧酸基团的聚合物的暴露区域。暴露的区域与无电子种子金属离子接触以形成无电子种子金属离子的图案。无电子种子金属离子的这种图案可以与非还原试剂接触，其与无电子种子金属离子反应形成pKsp小于40的化学金属化合物。然后将该结合的无电子种子金属化合物无电镀具有合适的导电金属。

48. 发明申请

US20150122777A1 ELECTROLESS PLATING METHOD USING HALIDE 有权
标题翻译：使用半导体的电镀方法
公开(公告)号：US20150122777A1
公开(公告)日：2015-05-07
申请号：US14071993
申请日：2013-11-05
申请人： Mark Edward Irving , Thomas B. Brust
发明人： Mark Edward Irving , Thomas B. Brust
IPC分类号： C23C18/20 , C23C18/16
CPC分类号： C23C18/204 , C23C18/1608 , C23C18/1612 , C23C18/1641 , C23C18/208 , Y10T428/24802
摘要： A conductive pattern is formed using a reactive polymer comprising pendant tertiary alkyl ester groups, a compound that provides an acid upon exposure to radiation, and a crosslinking agent. A polymeric layer is patternwise exposed to form first exposed regions with a polymer comprising carboxylic acid groups that are contacted with electroless seed metal ions, and then contacted with a halide to form corresponding electroless seed metal halide. Another exposure converts electroless seed metal halide to electroless seed metal nuclei and forms second exposed regions. A reducing agent is used to develop the electroless seed metal nuclei in the second exposed regions, or to develop the electroless seed metal halide in the first exposed regions. Fixing is used to remove any remaining electroless seed metal halide. The electroless seed metal nuclei are then electrolessly plated in various exposed regions.
摘要翻译：导电图案使用包含叔烷基叔酯基团的反应性聚合物，暴露于辐射时提供酸的化合物和交联剂形成。聚合物层被图案化地暴露以形成第一暴露区域，其中聚合物包含与无电子种子金属离子接触的羧酸基团，然后与卤化物接触以形成相应的无电子种子金属卤化物。另一种曝光将无电子种子金属卤化物转化为无电子种子金属核并形成第二暴露区域。还原剂用于在第二暴露区域中开发无电子种子金属核，或者在第一暴露区域中开发无电晶种金属卤化物。固定用于除去剩余的无电子种子金属卤化物。然后将无电子种子金属核无电镀在各种暴露区域中。

49. 发明申请

US20140035976A1 EJECTOR WITH IMPROVED JETTING LATENCY FOR HIGH SOLIDS CONTENT 审中-公开
标题翻译：具有改进的高固体含量的喷射器的喷射器
公开(公告)号：US20140035976A1
公开(公告)日：2014-02-06
申请号：US13562347
申请日：2012-07-31
申请人： James West Blease , Christopher Newell Delametter , Thomas B. Brust , David Paul Trauernicht , John Andrew Lebens
发明人： James West Blease , Christopher Newell Delametter , Thomas B. Brust , David Paul Trauernicht , John Andrew Lebens
IPC分类号： B41J29/38 , B41J2/05
CPC分类号： B41J2/14145 , B41J2/1404 , B41J2002/14403 , B41J2002/14459 , B41J2002/14467
摘要： A liquid ejection system includes a liquid ejector having a structure defining a chamber, the chamber including a first surface and a second surface, the first surface including a nozzle orifice; a resistive heater located on the second surface of the chamber opposite the nozzle orifice; a first liquid feed channel and a second liquid feed channel being in fluid communication with the chamber; and a segmented liquid inlet, a first segment of the liquid inlet being in fluid communication with the first liquid feed channel, and a second segment of the liquid inlet being in fluid communication with the second liquid feed channel; and a liquid supply comprising a liquid including a carrier fluid and a solids content that is greater than 5 percent by weight, wherein the liquid supply is fluidically connected to the segmented liquid inlet.
摘要翻译：液体喷射系统包括具有限定腔室的结构的液体喷射器，所述腔室包括第一表面和第二表面，所述第一表面包括喷嘴孔口; 位于与喷嘴孔相对的腔室的第二表面上的电阻加热器; 第一液体供给通道和与所述室流体连通的第二液体供给通道; 以及分段液体入口，所述液体入口的第一部分与所述第一液体供给通道流体连通，并且所述液体入口的第二部分与所述第二液体进料通道流体连通; 以及液体供应源，其包括包含载体流体和大于5重量％的固体含量的液体，其中所述液体供应流体连接到所述分段的液体入口。

50. 发明授权

US6100019A Process of conducting epitaxial deposition as a continuation of emulsion precipitation 失效
标题翻译：导电外延沉积的过程是乳液沉淀的延续
公开(公告)号：US6100019A
公开(公告)日：2000-08-08
申请号：US292436
申请日：1999-04-15
申请人： Thomas B. Brust , Philip J. Dale , Mark R. Mis , Donald L. Black
发明人： Thomas B. Brust , Philip J. Dale , Mark R. Mis , Donald L. Black
IPC分类号： G03C1/015 , G03C1/005 , G03C1/035 , G03C1/047
CPC分类号： G03C1/0051
摘要： A process is disclosed of conducting in a single reaction vessel selective site high chloride epitaxy deposition as a continuation of host high bromide {1111} tabular grain emulsion precipitation. A host tabular grain emulsion is precipitated accounting for 0.05 to 1.5 moles of silver per liter of dispersing medium. Any iodide at the major faces of the tabular grains is uniformly distributed and any iodide in a surface region of the grains amounts to less than 7 mole, based on silver in the surface region. Until epitaxy is formed, pH is held in the range of 3 to 8. Gelatino-peptizer in an amount of 1 to 40 grams per Ag mole is added to the emulsion. Chloride ion in a range of from 0.03 to 0.15 mole per liter is dispersed in the emulsion. pBr is held in the range of from 3.0 to 3.8 until epitaxy is formed. Iodide ion in a concentration of from 5.times.10.sup.-6 to 1.times.10.sup.-4 mole per square meter of grain surface area is uniformly adsorbed to the major surfaces of the tabular grains.
摘要翻译：公开了在单个反应容器选择性位置进行高氯化物外延沉积作为主体高溴酸盐（1111）片状颗粒乳液沉淀的延续的方法。沉淀出主体片状颗粒乳剂，每升分散介质为0.05至1.5摩尔的银。在片状颗粒的主面上的任何碘化物均匀分布，并且基于表面区域中的银，颗粒的表面区域中的任何碘化物均小于7摩尔。直到形成外延，pH值保持在3至8的范围内。每摩尔Ag摩尔量为1至40克的明胶胶溶剂加到乳液中。在0.03至0.15摩尔/升范围内的氯离子分散在乳液中。 pBr保持在3.0至3.8的范围内，直到形成外延。浓度为5×10-6至1×10-4摩尔每平方米晶粒表面积的碘离子均匀地吸附到片状颗粒的主表面。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式