会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 41. 发明授权
    • Oxime derivatives and the use thereof as latent acids
    • 肟衍生物及其作为潜伏酸的用途
    • US06512020B1
    • 2003-01-28
    • US09820115
    • 2001-03-28
    • Toshikage AsakuraHitoshi YamatoMasaki OhwaJean-Luc BirbaumKurt DietlikerJunichi Tanabe
    • Toshikage AsakuraHitoshi YamatoMasaki OhwaJean-Luc BirbaumKurt DietlikerJunichi Tanabe
    • C08J328
    • G03F7/0045B33Y70/00C07C251/62C07C309/00C07C309/65C07C317/32C07C323/47C07C381/00C07C2602/42C07D319/18C07D333/22
    • Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as photosensitive acid-donors in chemically amplified resist formulations.
    • 式I,II和III的化合物,其中R1是例如氢,C1-C12烷基,C3-C30环烷基,C2-C12链烯基,C4-C8环烯基,苯基,未取代或取代的萘基,蒽基或菲基,未取代或取代的, 未取代或取代的杂芳基; 其中除氢之外的所有基团R1可以另外被具有在酸作用下切割的-O-C键或-O-Si键的基团取代; R'1是例如亚苯基,亚萘基,亚二苯基或氧联二苯基,其中这些基团是未取代的或被取代的; R2是卤素或C1-C10卤代烷基; R3是例如C1-C18烷基磺酰基,苯基磺酰基,萘基磺酰基,蒽磺酰基或菲基磺酰基,其中基团是未取代的或被取代的,或者R3是例如。 C 2 -C 6卤代烷酰基或卤代苯甲酰基,R'3是例如亚苯基二磺酰基,萘基二磺酰基,二苯基二磺酰基或氧基二苯基二磺酰基,其中这些基团是未取代的或被取代的,X是卤素; 在化学放大抗蚀剂配方中特别适合用作光敏酸供体。
    • 45. 发明授权
    • Oxime ester photoinitiators
    • 肟酯光引发剂
    • US08586268B2
    • 2013-11-19
    • US12086567
    • 2006-11-09
    • Akira MatsumotoJunichi TanabeHisatoshi KuraMasaki Ohwa
    • Akira MatsumotoJunichi TanabeHisatoshi KuraMasaki Ohwa
    • G02B5/20G03F7/031
    • G03F7/031B33Y70/00C07D209/86C07D409/06C08F2/50G03F7/0007G03F7/001
    • Compounds of the Formula (I) and (II) wherein M1, M2 and M3 independently of one another are no bond, a direct bond, CO, O, S, SO, SO2 or NR14; provided that at least one of M1, M2 or M3 is a direct bond, CO, O, S, SO, SO2 or NR14; M4 is a direct bond, CR″3R″4, CS, O, S, SO, or SO2; Y is S or NR18; R1 for example is hydrogen, C3-C8cycloalkyl, phenyl or naphthyl, both of which are optionally substituted; R2 for example is C1-C20alkyl; R″2 has one of the meanings given for R2; R3 and R4 are for example hydrogen, halogen, C1-C20alkyl; R′3, R′4, R″3 and R″4 independently of one another have one of the meanings given for R3 and R4; and R5 is for example hydrogen, halogen, C1-C20alkyl; provided that in the compounds of the Formula (I) at least two oxime ester groups are present; exhibit an unexpectedly good performance in photopolymerization reactions.
    • 其中M1,M2和M3彼此独立的式(I)和(II)的化合物不是键,直接键,CO,O,S,SO,SO 2或NR 14; 条件是M1,M2或M3中的至少一个是直接键,CO,O,S,SO,SO 2或NR 14; M4是直接键,CR''3R''4,CS,O,S,SO或SO2; Y为S或NR18; R 1例如是氢,C 3 -C 8环烷基,苯基或萘基,它们都是任选取代的; R 2例如是C 1 -C 20烷基; R'2具有R2中给出的含义之一; R3和R4是例如氢,卤素,C1-C20烷基; R 3,R'4,R“3和R”4彼此独立地具有R3和R4给出的含义之一; R5是例如氢,卤素,C1-C20烷基; 条件是在式(I)的化合物中存在至少两个肟酯基团; 在光聚合反应中表现出出人意料的良好性能。
    • 47. 发明授权
    • Method of drawn and ironed processing of resin coated metal sheet and resin coated drawn and ironed can produced thereby
    • 由此可以制造涂覆有树脂的金属板和涂覆了拉伸和熨烫的树脂的拉制和熨烫加工方法
    • US07878040B2
    • 2011-02-01
    • US11661687
    • 2005-06-27
    • Shinichi TayaMasahiro KaiJunichi TanabeEtsuro TutsumiNorihito Saiki
    • Shinichi TayaMasahiro KaiJunichi TanabeEtsuro TutsumiNorihito Saiki
    • B21D22/00
    • B21D22/28B21D51/26
    • A method of drawn and ironed processing of a resin coated metal sheet, in which in the drawn and ironed processing of resin coated metal sheet, there can be obtained a can body of satisfactorily small wall thickness and at an opening edge part of the can body, the coating resin is free from any defect; and a resin coating drawn and ironed processed can produced thereby.There is provided a method of drawn and ironed processing of a resin coated metal sheet, comprising performing drawn and ironed processing of a resin coated metal sheet composed of a metal sheet having at least one major surface thereof coated with an organic resin with the use of a punch and a die into a can body, characterized in that ironing is conducted with the use of a punch having a small-diameter portion at its rear end so that the ratio of ironing at an opening edge part of the can body after shaping falls within the range of 0 to 15%. Further, there is provided a drawn and ironed processed can of resin coated metal sheet produced through the processing method.
    • 一种对树脂涂覆的金属板进行拉伸和熨烫加工的方法,其中在树脂涂覆金属片的拉伸和熨烫加工中,可以获得令人满意的小壁厚的罐体和罐体的开口边缘部分 ,涂层树脂没有任何缺陷; 由此可以制造拉伸和熨烫加工的树脂涂层。 提供了一种拉伸和熨烫加工树脂涂覆金属片的方法,包括对由具有至少一个主表面涂覆有机树脂的金属片构成的树脂涂覆的金属片进行拉伸和熨烫加工,其中使用 将冲头和模具切成罐体,其特征在于,使用在其后端具有小直径部分的冲头进行熨烫,使得成形后罐体开口边缘部分的熨烫比例下降 在0〜15%的范围内。 此外,提供了一种通过加工方法生产的经拉伸和熨烫的经加工的树脂涂层金属片。
    • 48. 发明授权
    • Photosensitive resin composition
    • 感光树脂组合物
    • US07829257B2
    • 2010-11-09
    • US09734635
    • 2000-12-12
    • Hidetaka OkaKazuhiko KunimotoHisatoshi KuraMasaki OhwaJunichi Tanabe
    • Hidetaka OkaKazuhiko KunimotoHisatoshi KuraMasaki OhwaJunichi Tanabe
    • G03C1/00
    • C08F2/50G03F7/031
    • Photosensitive compositions comprising (A) an alkali soluble compound; (B) at least one compound, of formula I or II wherein R1 inter alia is C4-C9cycloalkanoyl, C3-C12alkenoyl, or benzoyl which is unsubstituted or substituted; Ar1 is either C6-C20aryl or C6-C20aryloyl each of which is unsubstituted or substituted; x is 2 or 3; M1 when x is 2, inter alia is a group phenylene or naphthylene, each of which optionally is substituted i.a. by OR3, SR4 or NR5R6; or M1, when x is 3, is a trivalent group, optionally substituted; R3 is for example hydrogen or C1-C12alkyl; C2-C6alkyl which is for example substituted by —OH, —SH, —CN, C3-C6alkenoxy, or —OCH2CH2CN; R4 is for example hydrogen, C1-C12alkyl, C3-C12alkenyl, cyclohexyl, or phenyl which is unsubstituted or substituted; R5 and R6 independently of each other inter alia are hydrogen, C1-C12alkyl, C2-C4hydroxyalkyl, C2-C10alkoxyalkyl, C3-C5alkenyl, C3-C8cycloalkyl, phenyl-C1-C3alkyl, C1-C4alkanoyl, C3-C6alkenoyl, benzoyl or phenyl which is unsubstituted or substituted; and (C) a photopolymerizable compound; exhibit an unexpectedly good performance, in particular in photoresist technology.
    • 光敏组合物,其包含(A)碱溶性化合物; (B)至少一种式I或II的化合物,其中R 1特别是C 4 -C 9环烷酰基,C 3 -C 12烯酰基或未取代或取代的苯甲酰基; Ar 1是C 6 -C 20芳基或C 6 -C 20芳酰基,其各自为未取代或取代的; x为2或3; M1当x为2时,特别是亚苯基或亚萘基,其各自任选被取代。 由OR3,SR4或NR5R6; 或M1,当x为3时,为任选取代的三价基团; R3是例如氢或C1-C12烷基; 例如被-OH,-SH,-CN,C 3 -C 6烯氧基或-OCH 2 CH 2 CN取代的C 2 -C 6烷基; R4是例如氢,C1-C12烷基,C3-C12链烯基,环己基或未取代或取代的苯基; R 5和R 6彼此独立地尤其是氢,C 1 -C 12烷基,C 2 -C 4羟烷基,C 2 -C 10烷氧基烷基,C 3 -C 5烯基,C 3 -C 8环烷基,苯基-C 1 -C 3烷基,C 1 -C 4烷酰基,C 3 -C 6烯酰基,苯甲酰基或苯基 未取代或取代; 和(C)可光聚合化合物; 表现出意想不到的良好性能,特别是在光刻胶技术中。
    • 49. 发明申请
    • Oxime Ester Photoinitiators
    • 肟酯光引发剂
    • US20100188765A1
    • 2010-07-29
    • US12086567
    • 2006-11-09
    • Akira MatsumotoJunichi TanabeHisatoshi KuraMasaki Ohwa
    • Akira MatsumotoJunichi TanabeHisatoshi KuraMasaki Ohwa
    • G03F7/004C07D209/58C08F2/50G03F7/20G03F7/031G02B5/22
    • G03F7/031B33Y70/00C07D209/86C07D409/06C08F2/50G03F7/0007G03F7/001
    • Compounds of the Formula (I) and (II) wherein M1, M2 and M3 independently of one another are no bond, a direct bond, CO, O, S, SO, SO2 or NR14; provided that at least one of M1, M2 or M3 is a direct bond, CO, O, S, SO, SO2 or NR14; M4 is a direct bond, CR″3R″4, CS, O, S, SO, or SO2; Y is S or NR18; R1 for example is hydrogen, C3-C8cycloalkyl, phenyl or naphthyl, both of which are optionally substituted; R2 for example is C1-C20alkyl; R″2 has one of the meanings given for R2; R3 and R4 are for example hydrogen, halogen, C1-C20alkyl; R′3, R′4, R″3 and R″4 independently of one another have one of the meanings given for R3 and R4; and R5 is for example hydrogen, halogen, C1-C20alkyl; provided that in the compounds of the Formula (I) at least two oxime ester groups are present; exhibit an unexpectedly good performance in photopolymerization reactions.
    • 其中M1,M2和M3彼此独立的式(I)和(II)的化合物不是键,直接键,CO,O,S,SO,SO 2或NR 14; 条件是M1,M2或M3中的至少一个是直接键,CO,O,S,SO,SO 2或NR 14; M4是直接键,CR“3R”4,CS,O,S,SO或SO 2; Y为S或NR18; R 1例如是氢,C 3 -C 8环烷基,苯基或萘基,它们都是任选取代的; R 2例如是C 1 -C 20烷基; R“2具有R2的含义之一; R3和R4是例如氢,卤素,C1-C20烷基; R'3,R'4,R“3和R”4彼此独立地具有R3和R4给出的含义之一; R5是例如氢,卤素,C1-C20烷基; 条件是在式(I)的化合物中存在至少两个肟酯基团; 在光聚合反应中表现出出人意料的良好性能。