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    • 44. 发明授权
    • Ion beam blanking apparatus and method
    • 离子束净化装置和方法
    • US5155368A
    • 1992-10-13
    • US686043
    • 1991-04-16
    • David Edwards, Jr.Billy W. Ward
    • David Edwards, Jr.Billy W. Ward
    • H01J37/09H01J37/04H01J37/147H01J37/30
    • H01J37/045H01J2237/028
    • Ion beam apparatus provides beam blanking by utilizing an aperture through which the beam passes during unblanked periods, and elements for deflecting the beam during blanking so that the beam is deflected away from the aperture. Electrodes between the aperture element and the deflecting elements generate a potential exceeding the kinetic energy of charged particles emitted from the aperture element due to ions striking the aperture element during blanking. Charged particles emitted from the aperture element are thus prevented from striking the beam deflecting elements, thereby reducing hydrocarbon cracking, insulator accumulation, and charge accumulation on the deflecting elements. Beam stability is thereby enhanced. Charged particles emitted from the aperture element are also returned to the aperture element, so that an accurate measure of ion beam current is obtained by measuring current flow to the aperture element.
    • 离子束装置通过利用光束在未曝光期间通过的孔而提供光束消隐,以及用于在遮光期间偏转光束的元件,使得光束偏离光圈。 孔径元件和偏转元件之间的电极产生超过从孔元件发射的带电粒子的动能的电位,因为在消隐期间由于离子撞击孔元件。 因此,防止了从孔元件发射的带电粒子撞击光束偏转元件,从而减少了偏转元件上的碳氢化合物裂缝,绝缘体积聚和电荷积聚。 从而增强了梁的稳定性。 从孔径元件发射的带电粒子也返回到孔径元件,从而通过测量到孔径元件的电流来获得离子束电流的精确测量。