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42. 发明公开

EP2041623A2 GETTER AND CLEANING ARRANGEMENT FOR A LITHOGRAPHIC APPARATUS AND METHOD FOR CLEANING A SURFACE 审中-公开
标题翻译： Getter和清洗装置清洁表面的光刻设备和方法
公开(公告)号：EP2041623A2
公开(公告)日：2009-04-01
申请号：EP07747540.8
申请日：2007-06-28
申请人： ASML Netherlands B.V.
发明人： VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , BANINE, Vadim, Yevgenyevich , MOORS, Johannes, Hubertus, Josephina , SOER, Wouter, Anthon
IPC分类号： G03F7/20 , B08B7/00
CPC分类号： G03F7/70925 , G03F7/70916
摘要： A lithographic apparatus includes a radiation source and an object (301) with a first surface (302) which is configured to retain metal contaminants. This surface has the function of a getter. The first surface is arranged substantially outside the region traversed by the radiation beam generated by the radiation source during lithographic processing. The first surface may further be used to retain volatile contaminants generated in a cleaning method.

43. 发明公开

EP1393134A2 BELEUCHTUNGSSYSTEM MIT EINER VIELZAHL VON EINZELGITTERN 审中-公开
标题翻译：与单个条各种照明系统
公开(公告)号：EP1393134A2
公开(公告)日：2004-03-03
申请号：EP02743087.5
申请日：2002-05-24
申请人： Carl Zeiss SMT AG , ASML Netherlands B.V.
发明人： WEISS, Markus , KLEEMANN, Bernd , OSTERRIED, Karlfried , SINGER, Wolfgang , WANGLER, Johannes , MELZER, Frank , HEISLER, Andreas , BANINE, Vadim, Yevgenyevich
IPC分类号： G03F7/20 , G21K1/06
CPC分类号： G03F7/70158 , G03F7/702 , G21K1/06
摘要： The invention relates to a lighting system for wavelengths of 100 nm having an object plane and a field plane. Said invention is characterized in that the lighting system comprises at least one grid element (1) having a plurality of individual grids (9), and at least one physical diaphragm (7.3) in a diaphragm plane, which is connected downstream of the grid element (1) in the optical path from the object plane to the image plane.

45. 发明授权

EP2076818B1 APPARATUS COMPRISING A ROTATING CONTAMINANT TRAP 有权
标题翻译：包含旋转污染物陷阱的装置
公开(公告)号：EP2076818B1
公开(公告)日：2009-12-23
申请号：EP07808582.6
申请日：2007-09-17
申请人： ASML Netherlands B.V.
发明人： FRANKEN, Johannes, Christiaan, Leonardus , BANINE, Vadim, Yevgenyevich , WASSINK, Arnoud, Cornelis
IPC分类号： G03F7/20 , F16C32/06
CPC分类号： G03F7/70916 , B82Y10/00 , F16C32/0603 , F16C32/0685 , F16C33/02 , F16C33/72 , F16C2300/62 , G03F7/70033 , G03F7/70941
摘要： A contaminant trap apparatus (10) arranged in a path (R) of a radiation beam to trap contaminants emanating from a radiation source (50) configured to produce the radiation beam is disclosed. The contaminant trap (10) apparatus includes a rotor (10) having a plurality of channel forming elements (11) defining channels (ch) which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor (10) including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source (50); and a bearing (20) configured to rotatably hold the rotor (10) with respect to a rotor carrying structure (30), wherein the apparatus is configured to (i) control or redirect an electrical discharge (10) of the rotor (ED), or (ii) suppress an electrical discharge (ED) of the rotor (10), or (iii) both,(i) and (ii).
摘要翻译：公开了一种布置在辐射束的路径（R）中的污染物收集装置（10），以捕获从配置成产生辐射束的辐射源（50）发出的污染物。污染物捕集器（10）装置包括具有多个通道形成元件（11）的转子（10），该通道形成元件限定基本平行于辐射束传播方向布置的通道（ch），转子（10）包括电气由于所述辐射源（50）的操作，所述可充电材料被布置为被充电; 和配置成相对于转子承载结构（30）可旋转地保持转子（10）的轴承（20），其中所述设备构造成（i）控制或重定向转子（ED）的放电（10），或者（ii）抑制转子（10）的放电（ED），或者（iii）（i）和（ii）两者。

46. 发明公开

EP1891480A2 LITHOGRAPHIC APPARATUS AND CLEANING METHOD THEREFOR 审中-公开
标题翻译：光刻设备和清洁及其方法
公开(公告)号：EP1891480A2
公开(公告)日：2008-02-27
申请号：EP06747569.9
申请日：2006-06-13
申请人： ASML Netherlands B.V.
发明人： VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , BANINE, Vadim, Yevgenyevich , MOORS, Johannes, Hubertus, Josephina , KLUNDER, Derk , Jan, Wilfred
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70166 , G03F7/70916
摘要： A lithographic apparatus is disclosed. The apparatus includes a source (5) for supplying hydrogen radicals (1), a guide (2) for use in conjunction with the source, for directing hydrogen radicals to an application surface (4) to be targeted by the hydrogen radicals. The guide is provided with a coating (8) having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.

47. 发明公开

EP3707560A1 APPARATUS AND METHODS FOR CLEANING 审中-实审
公开(公告)号：EP3707560A1
公开(公告)日：2020-09-16
申请号：EP18786339.4
申请日：2018-10-16
申请人： ASML Netherlands B.V.
发明人： KUZNETSOV, Alexey, Sergeevich , BYSTROV, Kirill , BANINE, Vadim, Yevgenyevich , VAN DE KERKHOF, Marcus, Adrianus , SCHUH, Nadja , NIKIPELOV, Andrey
IPC分类号： G03F7/20 , B08B7/04 , B24C1/00 , B24C3/16 , B24C5/04 , H01L21/67 , G02B27/00

49. 发明公开

EP3418806A1 METHODS AND APPARATUS FOR OPTICAL METROLOGY 审中-公开
公开(公告)号：EP3418806A1
公开(公告)日：2018-12-26
申请号：EP17176638.9
申请日：2017-06-19
申请人： ASML Netherlands B.V.
发明人： SMORENBURG, Petrus, Wilhelmus , BRUSSAARD, Gerrit, Jacobus, Hendrik , BANINE, Vadim, Yevgenyevich
IPC分类号： G03F7/20 , G01N21/956
CPC分类号： G03F7/70616 , G01N21/956
摘要： Methods and apparatus for generation of radiation by high harmonic generation, HHG. The apparatus comprises: a chamber for holding a vacuum, the chamber comprising a radiation input, a radiation output and an interaction region at which, in use, a medium is present, the chamber being arranged such that, in use, when driving radiation propagates through the radiation input and is incident upon the medium, the medium emits radiation via HHG, the emitted radiation propagating through the radiation output; and at least one plasma generator at the radiation input and/or the radiation output for generating a plasma volume allowing the driving radiation and emitted radiation, respectively, to propagate through the plasma volume.

50. 发明公开

EP2247968A1 OPTICAL ELEMENT, LITHOGRAPHIC APPARATUS INCLUDING SUCH AN OPTICAL ELEMENT, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY 有权
标题翻译：光学元件中，光刻设备与用于制造部件，例如光学元件及其制造方法
公开(公告)号：EP2247968A1
公开(公告)日：2010-11-10
申请号：EP09715126.0
申请日：2009-02-24
申请人： ASML Netherlands B.V.
发明人： SOER, Wouter, Anthon , BANINE, Vadim, Yevgenyevich , MOORS, Johannes, Hubertus, Josephina , VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , YAKURIN, Andrey, Mikhailovich
IPC分类号： G02B5/20 , G02B5/22 , G02B5/26 , G03F7/20 , G21K1/06 , G02B5/08
CPC分类号： G02B5/208 , B82Y10/00 , G02B5/0891 , G02B5/22 , G02B5/26 , G03F7/70191 , G03F7/702 , G03F7/70575 , G03F7/70958 , G21K1/067 , G21K2201/061 , G21K2201/064 , G21K2201/065 , G21K2201/067
摘要： An optical element includes a first layer (4) that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer (2) that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer (3) that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.

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