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    • 42. 发明授权
    • Semiconductor device with floating trap type nonvolatile memory cell and method for manufacturing the same
    • 具有浮动阱式非易失性存储单元的半导体器件及其制造方法
    • US07045850B2
    • 2006-05-16
    • US10844783
    • 2004-05-13
    • Sang-Su KimKwang-Wook KohGeum-Jong BaeKi-Chul KimSung-Ho KimJin-Hee KimIn-Wook Cho
    • Sang-Su KimKwang-Wook KohGeum-Jong BaeKi-Chul KimSung-Ho KimJin-Hee KimIn-Wook Cho
    • H01L29/76
    • H01L27/11568H01L21/823462H01L27/105H01L27/115H01L27/11526H01L27/11546
    • The present invention discloses a semiconductor device having a floating trap type nonvolatile memory cell and a method for manufacturing the same. The method includes providing a semiconductor substrate having a nonvolatile memory region, a first region, and a second region. A triple layer composed of a tunnel oxide layer, a charge storing layer and a first deposited oxide layer on the semiconductor substrate is formed sequentially The triple layer on the semiconductor substrate except the nonvolatile memory region is then removed. A second deposited oxide layer is formed on an entire surface of the semiconductor substrate including the first and second regions from which the triple layer is removed. The second deposited oxide layer on the second region is removed, and a first thermal oxide layer is formed on the entire surface of the semiconductor substrate including the second region from which the second deposited oxide layer is removed. The semiconductor device can be manufactured according to the present invention to have a reduced processing time and a reduced change of impurity doping profile. The thickness of a blocking oxide layer and a high voltage gate oxide layer can be controlled.
    • 本发明公开了一种具有浮动阱式非易失性存储单元的半导体器件及其制造方法。 该方法包括提供具有非易失性存储区域,第一区域和第二区域的半导体衬底。 依次形成由半导体衬底上的隧道氧化物层,电荷存储层和第一沉积氧化物层构成的三层,然后除去非易失性存储区域之外的半导体衬底上的三层。 第二沉积氧化物层形成在半导体衬底的包括去除三层的第一和第二区域的整个表面上。 去除第二区域上的第二沉积氧化物层,并且在包括除去第二沉积氧化物层的第二区域的半导体衬底的整个表面上形成第一热氧化物层。 可以根据本发明制造半导体器件以减少处理时间和降低杂质掺杂分布的变化。 可以控制阻挡氧化物层和高电压栅极氧化物层的厚度。
    • 46. 发明授权
    • Method for etching silicon oxynitride and dielectric antireflection coatings
    • 蚀刻氮氧化硅和介电抗反射涂层的方法
    • US06291356B1
    • 2001-09-18
    • US09317655
    • 1999-05-24
    • Pavel IonovSung Ho KimDean LiChun YanJames Chang Wang
    • Pavel IonovSung Ho KimDean LiChun YanJames Chang Wang
    • H01L21302
    • H01L21/32139H01L21/0276H01L21/31116H01L21/3143
    • The present disclosure pertains to a method for plasma etching a semiconductor film stack. The film stack includes at least one layer comprising silicon oxynitride. The method includes etching the silicon oxynitride-comprising layer using an etchant gas mixture comprising chlorine and at least one compound containing fluorine and carbon. The atomic ratio of fluorine to chlorine in the etchant gas ranges between about 3:1 and about 0.01:1; preferably, between about 0.5:1 and about 0.01:1; most preferably, between about 0.25:1 and about 0.1:1. The etchant gas forms a fluorine-comprising polymer or species which deposits on exposed surfaces adjacent to the silicon oxynitride-comprising layer in an amount sufficient to reduce the etch rate of an adjacent material (such as a photoresist) while permitting the etching of the silicon oxynitride-comprising layer.
    • 本公开涉及用于等离子体蚀刻半导体膜堆叠的方法。 薄膜叠层包括至少一层包含氮氧化硅的层。 该方法包括使用包含氯和至少一种含氟和碳的化合物的蚀刻剂气体混合物来蚀刻含氧氮化硅层。 蚀刻剂气体中氟与氯的原子比范围为约3:1至约0.01:1; 优选约0.5:1至约0.01:1; 最优选在约0.25:1至约0.1:1之间。 蚀刻剂气体形成含氟聚合物或物质,它们以足以降低邻近材料(例如光致抗蚀剂)蚀刻速率的量沉积在与含氮氧化硅层相邻的暴露表面上,同时允许蚀刻硅 含氧氮化物的层。
    • 48. 发明授权
    • Automotive headlamp system and method of controlling the same
    • 汽车前照灯系统及其控制方法
    • US09260053B2
    • 2016-02-16
    • US13478618
    • 2012-05-23
    • Jong Ryoul ParkSung Ho Kim
    • Jong Ryoul ParkSung Ho Kim
    • B60Q1/02B60Q7/00B60Q1/14F21S8/10
    • B60Q1/143B60Q2300/054B60Q2300/056B60Q2300/42F21S41/663
    • Disclosed is an automotive headlamp system which can control an illumination pattern of headlamps by rotating a headlamp unit and/or adjusting the light intensity of a light source included in the headlamp unit based on the position of a front vehicle located ahead in a driving direction, and a method of controlling the automotive headlamp system. The automotive headlamp system includes an image capture unit capturing an image of an area ahead of a vehicle in a driving direction of the vehicle, a position determination unit determining a position of a front vehicle based on the captured image, a headlamp unit comprising an array of a plurality of light sources, and a control unit controlling an illumination pattern of the headlamp unit by rotating the headlamp unit and/or adjusting a light intensity of a light source based on the determined position of the front vehicle.
    • 公开了一种汽车前照灯系统,其可以基于前方车辆在行驶方向上的位置来旋转前照灯单元和/或调整包含在前照灯单元中的光源的光强度来控制前照灯的照明图案, 以及一种控制汽车前照灯系统的方法。 汽车前照灯系统包括:图像捕获单元,其在车辆的行驶方向上捕获车辆前方的区域的图像;基于拍摄图像确定前方车辆的位置的位置确定单元;包括阵列的前照灯单元 以及控制单元,其通过基于前车辆的确定位置旋转前照灯单元和/或调整光源的光强度来控制前照灯单元的照明图案。