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41. 发明申请

WO1998010700A1 NASAL CAVITY PATENCY TESTER 审中-公开
公开(公告)号：WO1998010700A1
公开(公告)日：1998-03-19
申请号：PCT/JP1997003180
申请日：1997-09-10
申请人： HAMAMATSU PHOTONICS K.K. , YASUHARA, Akio , NOZUE, Michihiko , SHINODA, Kazunori , YAMASHITA, Yutaka , SUZUKI, Yoshiji
发明人： HAMAMATSU PHOTONICS K.K.
IPC分类号： A61B05/08
CPC分类号： A61B5/411 , A61B5/08
摘要： A nasal cavity patency tester (1) which tests the patency of the nasal cavity (C) of a subject, comprising a light transmitting member (85) having a first flat face (70) and a second face (71), transmitting light incident from the second face (71) and directing the transmitted light to the first face (70), a light source (16) which emits light directed to the second face (71) of the light transmitting member (85), an image pickup device (18) which picks up the image (I) of the exhale (B) through the nostrils of the subjects (P) blown over the first face (70), formed of water droplets (W), and an image processor (19) which processes the image (I) and finds nasal cavity patency information about at least one of the shape, area, change with time of the area, and coordinates of the distinctive end points of the image (I).
摘要翻译： 1.一种鼻腔通气测试器（1），其测试被检体的鼻腔（C）的通畅性，包括具有第一平面（70）和第二面（71）的透光部件（85），透光部件从所述第二面（71）向所述第一面（70）引导透射光，发射指向所述透光部件（85）的第二面（71）的光的光源（16），摄像装置（18），其通过由水滴（W）形成的穿过第一面（70）的被摄体（P）的鼻孔拾取呼气（B）的图像（I），以及图像处理器（19）其处理图像（I）并且找到关于区域的形状，面积，随时间的变化以及图像（I）的不同端点的坐标中的至少一个的鼻腔通畅信息。

42. 发明授权

US12156322B2 Inductively coupled plasma light source with switched power supply 有权
公开(公告)号：US12156322B2
公开(公告)日：2024-11-26
申请号：US18077443
申请日：2022-12-08
申请人： Hamamatsu Photonics K.K. , Energetiq Technology, Inc.
发明人： Frederick Marvin Niell, III , Donald K. Smith , Matthew M. Besen , Stephen F. Horne , David B. Reisman , Daniel J. Arcaro , Michael J. Roderick
IPC分类号： H05H1/00 , H01J37/32 , H05H1/10
CPC分类号： H05H1/10
摘要： A method and apparatus for generating light includes a chamber having a high voltage region, a low voltage region, and a plasma generation region that defines a plasma confinement region. A magnetic core is positioned around the chamber and is configured to generate a plasma in the plasma confinement region. A switched power supply includes a DC power supply and a switched resonant charging circuit that together generate a plurality of voltage pulses at the output causing a plurality of current pulses to be applied to the power delivery section around the magnetic core so that at least one plasma loop is established around the magnetic core that confines plasma in the plasma confinement region, thereby forming a magnetically confined Z-pinch plasma. Light generated by the Z-pinch plasma propagates out of a port in the light source.

43. 发明授权

US12152878B2 Mirror unit and optical module 有权
公开(公告)号：US12152878B2
公开(公告)日：2024-11-26
申请号：US18535364
申请日：2023-12-11
申请人： HAMAMATSU PHOTONICS K.K.
发明人： Tomofumi Suzuki , Kyosuke Kotani , Tatsuya Sugimoto , Yutaka Kuramoto , Katsumi Shibayama , Noburo Hosokawa , Hirokazu Yamamoto , Takuo Koyama
IPC分类号： G01B9/02 , B81B3/00 , G01J3/02 , G01J3/10 , G01J3/14 , G01J3/45 , G02B7/182 , G02B26/08 , G02B27/14 , G01J3/453
CPC分类号： G01B9/02051 , B81B3/00 , B81B3/0021 , B81B3/007 , G01B9/02049 , G01J3/0202 , G01J3/021 , G01J3/0237 , G01J3/108 , G01J3/14 , G01J3/45 , G02B7/182 , G02B26/0816 , G02B26/0833 , G02B26/0841 , G02B27/144 , B81B2201/042 , B81B2203/0154 , G01B2290/25 , G01B2290/35 , G01J2003/104 , G01J3/4532 , G01J3/4535
摘要： A mirror unit 2 includes a mirror device 20 including a base 21 and a movable mirror 22, an optical function member 13, and a fixed mirror 16 that is disposed on a side opposite to the mirror device 20 with respect to the optical function member 13. The mirror device 20 is provided with a light passage portion 24 that constitutes a first portion of an optical path between the beam splitter unit 3 and the fixed mirror 16. The optical function member 13 is provided with a light transmitting portion 14 that constitutes a second portion of the optical path between the beam splitter unit 3 and the fixed mirror 16. A second surface 21b of the base 21 and a third surface 13a of the optical function member 13 are joined to each other.

44. 发明授权

US12142470B2 Electron tube 有权
公开(公告)号：US12142470B2
公开(公告)日：2024-11-12
申请号：US18109388
申请日：2023-02-14
申请人： HAMAMATSU PHOTONICS K.K.
发明人： Yasuyuki Egawa , Atsuhito Fukasawa , Suenori Kimura , Takayasu Nagasawa , Shunsuke Kobayashi
IPC分类号： H01J43/28 , H01J43/08
CPC分类号： H01J43/28 , H01J43/08
摘要： An electron tube includes a photoelectric conversion unit, an electron detection unit configured to receive a photoelectrons from the photoelectric conversion unit, a gate electrode disposed between the photoelectric conversion unit and the electron detection unit, and a housing configured to accommodate the photoelectric conversion unit, the electron detection unit, and the gate electrode. The housing has a lid portion to which the photoelectric conversion unit is fixed and which constitutes one end side of the housing. The gate electrode includes a main body portion that control passage of the photoelectrons by applying a voltage, and a power supply part that supports the main body portion so as to be spaced apart from the photoelectric conversion unit and applies a voltage to the main body portion. The power supply part is held by the lid portion.

45. 发明授权

US12142450B2 Photoelectric-surface electron source 有权
公开(公告)号：US12142450B2
公开(公告)日：2024-11-12
申请号：US18021457
申请日：2021-06-09
申请人： HAMAMATSU PHOTONICS K.K.
发明人： Tomohiko Hirano , Hiroyuki Taketomi , Motohiro Suyama , Wataru Matsudaira , Akihiro Kageyama , Kota Iwasaki , Taku Yamada
IPC分类号： H01J1/34 , H01J1/88
CPC分类号： H01J1/34 , H01J1/88
摘要： A photoelectric-surface electron source includes: a glass substrate that receives laser light from a substrate light-receiving surface including microlenses and that focuses the laser light toward a substrate main surface located on the opposite side from the substrate light-receiving surface; a photoelectric surface that is provided to the substrate main surface, and that receives the focused laser light and emits photoelectrons; and an extraction electrode that is fixed to the substrate main surface and that extracts the photoelectrons from the photoelectric surface. The extraction electrode is disposed away from the photoelectric surface along the normal direction of the substrate main surface and has: an electrode part in which electrode holes for allowing the photoelectrons to pass therethrough are provided; and a frame part that is fixed to a region surrounding the photoelectric surface in the substrate main surface.

46. 发明授权

US12140776B2 Spectrometer module 有权
公开(公告)号：US12140776B2
公开(公告)日：2024-11-12
申请号：US18231940
申请日：2023-08-09
申请人： HAMAMATSU PHOTONICS K.K.
发明人： Kazumasa Murakami , Tatsuya Ogino , Shinsuke Okada
IPC分类号： G02B27/10 , G01J3/02 , G02B6/12 , G02B27/14
CPC分类号： G02B27/1006 , G01J3/02 , G02B27/14 , G02B2006/12109
摘要： A spectroscopic module includes M beam splitters that are arranged along an X direction, where M is a natural number of 2 or more; M bandpass filters disposed on one side in a Z direction with respect to the M beam splitters, each of the M bandpass filters facing each of the M beam splitters; a light detector disposed on the one side in the Z direction with respect to the M bandpass filters and includes M light receiving regions, each of the M light receiving regions facing each of the M bandpass filters; a first support body supporting the M beam splitters; and a second support body supporting the M bandpass filters. Each of N beam splitters among the M beam splitters has a plate shape and has a thickness of 1 mm or less, where N is a natural number of 2 to M.

47. 发明授权

US12140742B2 Light irradiation device and sample observation apparatus 有权
公开(公告)号：US12140742B2
公开(公告)日：2024-11-12
申请号：US17924160
申请日：2021-03-17
申请人： HAMAMATSU PHOTONICS K.K.
发明人： Masanori Kobayashi , Satoshi Yamamoto
IPC分类号： G02B21/00 , G01N21/64
CPC分类号： G02B21/0032 , G01N21/6456 , G01N2201/06113
摘要： A light irradiation device includes: a light source configured to output light having coherence; a light focusing element having a focusing axis and a non-focusing axis intersecting with the focusing axis and configured to focus the light on a focusing line so as to generate planar light; and an aperture mask having an opening part that limits a part of luminous fluxes of the light transmitted from the light source to the light focusing element. The opening part of the aperture mask has opening edges disposed to extend in a direction along the focusing axis of the light focusing element, and, in a case in which the opening edges are projected onto the focusing line, corresponding projected portions have linear spreads.

48. 发明授权

US12140715B2 Radiation detector and method for manufacturing radiation detector 有权
公开(公告)号：US12140715B2
公开(公告)日：2024-11-12
申请号：US17252595
申请日：2019-02-21
申请人： Kyoto University , HAMAMATSU PHOTONICS K.K.
发明人： Keiji Abe , Toshiyuki Izawa , Kenji Makino , Seiichiro Mizuno , Takumi Ikenoue , Yuki Haruta , Masao Miyake , Tetsuji Hirato
IPC分类号： G01T1/24 , G01N23/04 , G01N23/083 , H01G9/00 , H01G9/20 , H10K30/30 , H10K30/81 , H10K39/36 , H10K71/15 , H10K85/30
CPC分类号： G01T1/24 , G01N23/04 , G01N23/083 , H01G9/0036 , H01G9/2009 , H10K30/30 , H10K30/81 , H10K39/36 , H10K71/15 , H10K85/30 , G01N2223/04 , G01N2223/401 , G01N2223/50
摘要： A radiation detector includes a substrate including a first electrode portion, a radiation absorption layer disposed on one side with respect to the substrate and configured of a plurality of perovskite crystals, and a second electrode portion disposed on the one side with respect to the radiation absorption layer and being opposite to the first electrode portion with the radiation absorption layer interposed therebetween. Each of the plurality of perovskite crystals is formed to extend with a first direction in which the first electrode portion and the second electrode portion are opposite to each other as a longitudinal direction in a region between the first electrode portion and the second electrode portion in the radiation absorption layer.

49. 发明公开

US20240361664A1 OPTICAL PULSE TRAIN GENERATION DEVICE AND OPTICAL PULSE TRAIN GENERATION METHOD 审中-公开
公开(公告)号：US20240361664A1
公开(公告)日：2024-10-31
申请号：US18637686
申请日：2024-04-17
申请人： HAMAMATSU PHOTONICS K.K.
发明人： Koyo WATANABE , Takashi INOUE
IPC分类号： G02F1/35
CPC分类号： G02F1/353 , G02F1/3501 , G02F2203/12 , G02F2203/26 , G02F2203/54
摘要： An optical pulse train generation device includes a storage unit and a characteristic setting unit. The storage unit stores a plurality of phase patterns in advance. The plurality of phase patterns are phase patterns for forming, from a first optical pulse, an optical pulse train including a plurality of second optical pulses having time differences therebetween and having different center wavelengths. Between the plurality of phase patterns, one or both of a first characteristic regarding the first optical pulse and a second characteristic regarding the optical pulse train are different. The characteristic setting unit sets the first characteristic and the second characteristic in response to the user's input. The storage unit stores the plurality of phase patterns in association with the first characteristic and the second characteristic. A spatial light modulator displays a phase pattern corresponding to the first characteristic and the second characteristic set by the characteristic setting unit.

50. 发明公开

US20240361382A1 SEMICONDUCTOR FAILURE ANALYSIS DEVICE AND SEMICONDUCTOR FAILURE ANALYSIS METHOD 审中-公开
公开(公告)号：US20240361382A1
公开(公告)日：2024-10-31
申请号：US18579888
申请日：2022-03-15
申请人： HAMAMATSU PHOTONICS K.K.
发明人： Masataka IKESU , Tomonori NAKAMURA
IPC分类号： G01R31/311 , G01R31/28
CPC分类号： G01R31/311 , G01R31/2879
摘要： A semiconductor failure analysis device includes a first analysis unit that emits first irradiation light along a first path set on a first main surface of a semiconductor device, a second analysis unit that emits second irradiation light along a second path set on a second main surface that is a back side of the first main surface, an electric signal acquisition unit that receives an electric signal output from the semiconductor device irradiated with the first irradiation light and the second irradiation light, and a computer that controls the second analysis unit. A size of a first irradiation region is different from a size of a second irradiation region. The computer emits the first irradiation light and the second irradiation light while a state where the entire second irradiation region overlaps the first irradiation region is maintained.

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