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41. 发明申请

WO2006072800A1 RAILWAY BOGIES 审中-公开
标题翻译：铁路博客
公开(公告)号：WO2006072800A1
公开(公告)日：2006-07-13
申请号：PCT/GB2006/000052
申请日：2006-01-06
申请人： SCT TECHNOLOGY, LLC , HEWITT, Paul , JAMIESON, Wayne
发明人： HEWITT, Paul , JAMIESON, Wayne
IPC分类号： B61F5/30 , B61F5/52
CPC分类号： B61F5/301 , B61F5/30 , B61F5/308 , B61F5/52
摘要： This invention relates to bogies for railway rolling stock. In particular it relates to suspension arrangements for such bogies wherein the frame is mounted on a spring suspension arrangement. In one embodiment the spring suspension arrangement comprises two groups of springs on either side of a wheel axle (11) , each group comprising an inner spring (14) and two outer fore and aft springs (15, 16). In another arrangement there are two lower springs (14) on either side of a wheel axle (11) and at least one upper spring (21) above the axle. The arrangements described provide better lateral and longitudinal stiffness and shear characteristics which, reduce hunting and wheel wear. They also enable the axles to accommodate increased loads.
摘要翻译：本发明涉及铁路车辆用转向架。特别地，其涉及这种转向架的悬挂装置，其中框架安装在弹簧悬挂装置上。在一个实施例中，弹簧悬挂装置包括在轮轴（11）的任一侧上的两组弹簧，每组包括内弹簧（14）和两个外前后弹簧（15,16）。在另一种布置中，在轮轴（11）的任一侧上有两个下弹簧（14）和在轴上方的至少一个上弹簧（21）。所描述的布置提供了更好的横向和纵向刚度和剪切特性，其减少了狩猎和车轮磨损。它们还使轴可以适应增加的负载。

42. 发明申请

WO2005089593A2 STEP ASSEMBLY 审中-公开
标题翻译：步骤汇编
公开(公告)号：WO2005089593A2
公开(公告)日：2005-09-29
申请号：PCT/GB2005/000945
申请日：2005-03-11
申请人： HEMMING-TAYLER, Dale, Jonathan
发明人： HEMMING-TAYLER, Dale, Jonathan
IPC分类号： A47B46/00
CPC分类号： A47B46/00 , A47B97/00
摘要： This invention relates to step assemblies and in particular, but not exclusively, to step assemblies for use in conjunction with fitted furniture such as is frequently found in the kitchen, dining room or garage or indeed shops. The assembly includes an open-mouthed chassis or carcass (15) and a body, generally indicated at (21), which comprises two dock portions (22) and (23), which are hinged at (24) so that they can take up either a flat storage configuration or a step forming configuration. For storage the body can be slid within the chassis, which sits beneath, for example, a kitchen unit, when the body is in its flat configuration.
摘要翻译：本发明涉及台阶组件，特别是但不限于与装配的家具一起使用的台阶组件，例如在厨房，餐厅或车库或商店中常见的台阶组件。该组件包括通常以（21）表示的开口底盘或胎体（15）和主体，该主体包括两个对接部分（22）和（23），其在（24）处铰接以使得它们可以占据无论是平面存储配置还是步骤形成配置。为了存放，当身体处于扁平状态时，身体可以滑入位于下方的底盘，例如厨房单元。

43. 发明申请

WO2004100736A1 DRINKING VESSEL 审中-公开
标题翻译：饮料容器
公开(公告)号：WO2004100736A1
公开(公告)日：2004-11-25
申请号：PCT/GB2004/002076
申请日：2004-05-14
申请人： CLARE, Claire
发明人： CLARE, Claire
IPC分类号： A47G19/22
CPC分类号： A47G19/2261
摘要： This invention relates to drinking vessels and in particular a cup, generally indicated at (10), comprising an inner liquid reservoir (11) and an outer splayed wall (12). The angle X between the reservoir (11) and the wall (12) is about 3°. The splayed out wall defines an enlarged based foot print, which both makes the cup stable and contributes to the ability of the cup to restore itself to a vertical position from a significantly titled position.
摘要翻译：本发明涉及饮用容器，尤其涉及一种通常用（10）表示的饮料容器，包括一个内部贮液器（11）和一个外部张开壁（12）。储存器（11）和壁（12）之间的角度X约为3°。伸出的墙壁定义了一个放大的脚印，这两者都使杯子稳定，并且有助于杯子从显着的标题位置恢复到垂直位置的能力。

44. 发明申请

WO2004040188A1 DEVICE FOR FIXING AN OBJECT TO A TREE 审中-公开
标题翻译：用于固定对象的设备
公开(公告)号：WO2004040188A1
公开(公告)日：2004-05-13
申请号：PCT/GB2003/004680
申请日：2003-10-31
申请人： FUEST, Benjamin
发明人： FUEST, Benjamin
IPC分类号： F16M13/02
CPC分类号： F16B45/00 , F16B35/06 , F16G11/00 , F16M13/02
摘要： A device (10) for fixing an object (24) to a tree (32). The device includes an elongate body (12, 14, 16, 18), one end of which is adapted for attachment to a tree (32). An object is slidably mounted on the elongate body. The device also includes a device (22) for biasing the object towards the end of the body adapted for attachment to the tree (32). In use, pressure resulting from growth of the tree (32) being transmitted to the object and pushing it along the elongate body against the bias and away from the tree (32).
摘要翻译：一种用于将物体（24）固定到树（32）上的装置（10）。该装置包括细长主体（12,14,16,18），其一端适于附接到树状物（32）。物体可滑动地安装在细长主体上。该装置还包括用于将物体朝向适于附接到树（32）的主体的端部偏压的装置（22）。在使用中，由树（32）的生长产生的压力被传递到物体，并且抵抗偏压而沿着细长体推动物体离开树（32）。

45. 发明申请

WO2004015165A1 IMPROVEMENTS TO SHOWERHEADS 审中-公开
标题翻译：对SHOWERHEADS的改进
公开(公告)号：WO2004015165A1
公开(公告)日：2004-02-19
申请号：PCT/GB2003/003113
申请日：2003-07-16
申请人： TRIKON TECHNOLOGIES LIMITED , SCHLOTTMAN, Ole
发明人： SCHLOTTMAN, Ole
IPC分类号： C23C16/455
CPC分类号： C23C16/45565 , C23C16/455 , H01J37/3244
摘要： A showerhead (5) for substrate processing including a gas (8) inlet leading to a gas reservoir (10). A faceplate (5) including a plurality of orifices (9) is fitted between the reservoir and a processing space (11). The showerhead further includes a sheet (16) including a plurality of orifices (18), the sheet orifices being smaller in size than the minimum diameter of the faceplate orifices. The sheet is fitted in or on the showerhead such that the fluid passes to the process space from the reservoir via the sheet orifices.
摘要翻译：一种用于衬底处理的喷头（5），包括通向气体贮存器（10）的气体（8）入口。包括多个孔（9）的面板（5）装配在储存器和处理空间（11）之间。喷头还包括包括多个孔口（18）的片材（16），所述片材孔口的尺寸小于所述面板孔口的最小直径。片材安装在喷头中或喷头上，使得流体经由片材孔从储存器传递到处理空间。

46. 发明申请

WO2003044843A2 FORMING LOW K DIELECTRIC LAYERS 审中-公开
标题翻译：形成低K电介质层
公开(公告)号：WO2003044843A2
公开(公告)日：2003-05-30
申请号：PCT/GB2002/005173
申请日：2002-11-15
申请人： TRIKON HOLDINGS LIMITED , MACNEIL, John , ISHAQ, Sajid , GRIS, Herve , GILES, Katherine
发明人： MACNEIL, John , ISHAQ, Sajid , GRIS, Herve , GILES, Katherine
IPC分类号： H01L21/316
CPC分类号： H01L21/02126 , H01L21/02203 , H01L21/02211 , H01L21/02274 , H01L21/0228 , H01L21/0234 , H01L21/02362 , H01L21/3122 , H01L21/31633 , H01L21/31695 , H01L23/49894 , H01L23/5329 , H01L2924/0002 , H01L2924/00
摘要： A low k dielectric layer is formed by depositing an unset dielectric layer on a substrate, the dielectric layer including Silicon, Carbon and Oxygen. The surface of the dielectric layer exposed to an activated gas to form a semi-permeable skin on or of the surface of the layer. The layer is then cured to render at least part of the layer porous.
摘要翻译：通过在衬底上沉积未设置的电介质层来形成低k电介质层，该电介质层包括硅，碳和氧。电介质层的表面暴露于活化气体以在该层的表面上或表面上形成半渗透性表层。然后固化该层以使该层的至少一部分多孔。

47. 发明申请

WO2003043062A1 METHOD OF FORMING A PATTERNED METAL LAYER 审中-公开
标题翻译：形成图案金属层的方法
公开(公告)号：WO2003043062A1
公开(公告)日：2003-05-22
申请号：PCT/GB2002/005090
申请日：2002-11-08
申请人： TRIKON HOLDINGS LIMITED , O'SULLIVAN, James, Francis , BURGESS, Stephen, Robert
发明人： O'SULLIVAN, James, Francis , BURGESS, Stephen, Robert
IPC分类号： H01L21/027
CPC分类号： H01L21/0272 , H01L21/2855 , H05K3/048
摘要： A method of forming a patterned layer on a substrate including depositing a notched or undercut resist pattern to define at least one recess in the photoresist, with the notch or undercut circumjacent the base of the recess, sputtering a material into the recess and removing the resist and the material deposited on the resist characterised in that the aspect ratio of the recess and height of the mouth of the notch or undercut are such that the notch or undercut lies substantially in the shadow beneath the resist, the layer deposited upon it and the layer at the base of the recess in respect of any sputtered particle travelling in a straight line through the mouth of the recess such that material deposited on the walls of the recesses is not continuous with material deposited on the base of the recess.
摘要翻译：一种在衬底上形成图案层的方法，包括沉积缺口或底切抗蚀剂图案以限定光致抗蚀剂中的至少一个凹部，其中凹口或底切围绕凹部的底部，将材料溅射到凹部中并去除抗蚀剂并且沉积在抗蚀剂上的材料的特征在于，凹口的纵横比和凹口或底切口的高度使得凹口或底切基本上位于抗蚀剂下面的阴影中，沉积在其上的层和层相对于通过凹部的口直线行进的任何溅射颗粒的凹部的底部，使得沉积在凹槽的壁上的材料与沉积在凹部的基部上的材料不连续。

48. 发明申请

WO2003025249A1 METHOD OF FORMING NITRIDE FILMS 审中-公开
标题翻译：形成氮化物膜的方法
公开(公告)号：WO2003025249A1
公开(公告)日：2003-03-27
申请号：PCT/GB2002/004151
申请日：2002-09-12
申请人： TRIKON HOLDINGS LIMITED , PATEL, Jashu , BEEKMAN, Knut
发明人： PATEL, Jashu , BEEKMAN, Knut
IPC分类号： C23C16/34
CPC分类号： C23C16/345
摘要： A silicon nitride film, for example, is deposited by introducing into a plasma region of a chamber a silicon containing gas, molecular nitrogen and sufficient hydrogen to dissociate the nitrogen to allow the silicon and nitrogen to react to form a silicon nitride form on a surface adjacent the plasma region. The thus deposited film may then be subjected to an activation anneal.
摘要翻译：例如，通过将含硅气体，分子氮和足够的氢气引入室的等离子体区域来沉积氮化硅膜，以解离氮气，以使硅和氮反应以在表面上形成氮化硅形式邻近等离子体区域。然后可以对这样沉积的膜进行激活退火。

49. 发明申请

WO2003009371A1 METHOD OF FORMING A CONDUCTIVE INTERCONNECT 审中-公开
标题翻译：形成导电互连的方法
公开(公告)号：WO2003009371A1
公开(公告)日：2003-01-30
申请号：PCT/GB2002/002600
申请日：2002-05-29
申请人： TRIKON HOLDINGS LIMITED , RICH, Paul
发明人： RICH, Paul
IPC分类号： H01L21/768
CPC分类号： H01L21/02063 , H01L21/31116 , H01L21/76802 , H01L21/76826 , H01L21/76831 , H01L21/76838 , H01L23/5226 , H01L2924/0002 , H01L2924/00
摘要： A method of forming a conductive interconnect in a semiconductor structure. The method involves forming a via or trench (5) through an interlayer dielectric to lie above prior metallisation. The base of the via or trench is sputter etch cleaned to expose a conductive surface of the prior metallisation. The via or trench is then filled with metal. Prior to the sputter etch step, the surface of the wall or walls of the via or trench are chemically modified to form a surface (7) resistant to metal penetration.
摘要翻译：一种在半导体结构中形成导电互连的方法。该方法包括通过层间电介质形成通孔或沟槽（5），以覆盖在先前的金属化之上。通孔或沟槽的基底被溅射蚀刻清洁以暴露现有金属化的导电表面。然后用金属填充通孔或沟槽。在溅射蚀刻步骤之前，通孔或沟槽的壁或壁的表面被化学改性以形成耐金属渗透的表面（7）。

50. 发明申请

WO2003009364A3 LOW DIELECTRIC CONSTANT LAYERS 审中-公开
公开(公告)号：WO2003009364A3
公开(公告)日：2003-01-30
申请号：PCT/GB2002/003231
申请日：2002-07-15
申请人： TRIKON HOLDINGS LIMITED , GILES, Kathrine
发明人： GILES, Kathrine
IPC分类号： H01L21/316
摘要： This invention relates to low dielectric constant layers formed on the substrate having: (a) a base zone, adjacent the substrate, having pores distributed therein, at least the majority of the pores having diameters in the range 1 to 10 nm; (b) an atomically smooth surface zone, spaced from the substrate; and (c) an intermediate zone having pores distributed therein, at least the majority of the pores having diameters equal to or less than 2 nm so that there is a general reduction in pore size from the bottom of the layer towards the top.

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