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    • 35. 发明申请
    • MONOLITHICALLY INTEGRATED PHOTODETECTORS
    • 单一集成的光电复印机
    • US20090242935A1
    • 2009-10-01
    • US11591658
    • 2006-11-01
    • Eugene A. Fitzgerald
    • Eugene A. Fitzgerald
    • H01L31/0336H01L31/00
    • H01L27/14601H01L21/0245H01L21/0251H01L21/76254H01L21/8258H01L27/0605H01L27/144H01L27/1446H01L27/14683H01L27/15H01L27/156H01L31/0328H01L31/143H01L31/162H01L2924/0002Y10S438/933H01L2924/00
    • Methods and structures for monolithically integrating monocrystalline silicon and monocrystalline non-silicon materials and devices are provided. In one structure, a monolithically integrated semiconductor device structure comprises a silicon substrate and a first monocrystalline semiconductor layer disposed over the silicon substrate, wherein the first monocrystalline semiconductor layer has a lattice constant different from a lattice constant of relaxed silicon. The structure further includes an insulating layer disposed over the first monocrystalline semiconductor layer in a first region and a monocrystalline silicon layer disposed over the insulating layer in the first region. The structure includes at least one silicon-based photodetector comprising an active region including at least a portion of the monocrystalline silicon layer. The structure also includes a second monocrystalline semiconductor layer disposed over at least a portion of the first monocrystalline semiconductor layer in a second region and absent from the first region, wherein the second monocrystalline semiconductor layer has a lattice constant different from the lattice constant of relaxed silicon. The structure includes at least one non-silicon photodetector comprising an active region including at least a portion of the second monocrystalline semiconductor layer.
    • 提供了单晶硅和单晶非硅材料和器件单片集成的方法和结构。 在一种结构中,单片集成半导体器件结构包括硅衬底和设置在硅衬底上的第一单晶半导体层,其中第一单晶半导体层具有与松弛硅的晶格常数不同的晶格常数。 该结构还包括设置在第一区域中的第一单晶半导体层上的绝缘层和设置在第一区域中的绝缘层上的单晶硅层。 该结构包括至少一个硅基光电检测器,其包括至少部分单晶硅层的有源区。 该结构还包括第二单晶半导体层,其设置在第二区域中的第一单晶半导体层的至少一部分上且不存在于第一区域中,其中第二单晶半导体层具有与松弛硅的晶格常数不同的晶格常数 。 该结构包括至少一个非硅光电检测器,其包括包括第二单晶半导体层的至少一部分的有源区。
    • 36. 发明授权
    • Monolithically integrated light emitting devices
    • 单片集成发光器件
    • US07535089B2
    • 2009-05-19
    • US11591657
    • 2006-11-01
    • Eugene A. Fitzgerald
    • Eugene A. Fitzgerald
    • H01L23/06
    • H01L27/14601H01L21/0245H01L21/0251H01L21/76254H01L21/8258H01L27/0605H01L27/144H01L27/1446H01L27/14683H01L27/15H01L27/156H01L31/0328H01L31/143H01L31/162H01L2924/0002Y10S438/933H01L2924/00
    • Methods and structures for monolithically integrating monocrystalline silicon and monocrystalline non-silicon materials and devices are provided. In one structure, a monolithically integrated semiconductor device structure comprises a silicon substrate and a first monocrystalline semiconductor layer disposed over the silicon substrate, wherein the first monocrystalline semiconductor layer has a lattice constant different from a lattice constant of relaxed silicon. The structure further includes an insulating layer disposed over the first monocrystalline semiconductor layer in a first region and a monocrystalline silicon layer disposed over the insulating layer in the first region. The structure includes at least one silicon-based electronic device including an element including at least a portion of the monocrystalline silicon layer. The structure also includes a second monocrystalline semiconductor layer disposed over at least a portion of the first monocrystalline semiconductor layer in a second region and absent from the first region, wherein the second monocrystalline semiconductor layer has a lattice constant different from the lattice constant of relaxed silicon. The structure includes at least one III-V light-emitting device including an active region including at least a portion of the second monocrystalline semiconductor layer.
    • 提供了单晶硅和单晶非硅材料和器件单片集成的方法和结构。 在一种结构中,单片集成半导体器件结构包括硅衬底和设置在硅衬底上的第一单晶半导体层,其中第一单晶半导体层具有与松弛硅的晶格常数不同的晶格常数。 该结构还包括设置在第一区域中的第一单晶半导体层上的绝缘层和设置在第一区域中的绝缘层上的单晶硅层。 该结构包括至少一个硅基电子器件,其包括至少部分单晶硅层的元件。 该结构还包括第二单晶半导体层,其设置在第二区域中的第一单晶半导体层的至少一部分上且不存在于第一区域中,其中第二单晶半导体层具有与松弛硅的晶格常数不同的晶格常数 。 该结构包括至少一个III-V发光器件,其包括包括第二单晶半导体层的至少一部分的有源区。
    • 37. 发明申请
    • Image display apparatus with ambient light sensing system
    • 具有环境光感测系统的图像显示装置
    • US20080164481A1
    • 2008-07-10
    • US11987852
    • 2007-12-05
    • Mitsuharu TaiHiroshi Kageyama
    • Mitsuharu TaiHiroshi Kageyama
    • H01L33/00
    • H01L31/143G02F1/13318G09G3/3406G09G2320/0666G09G2360/145H01L27/1446H01L31/02162H01L31/03682H01L31/03762H01L31/182H01L31/202Y02E10/546Y02P70/521
    • An image display apparatus with an illuminance sensor, where the packaging cost, mechanical reliability due to packaging, and product yield are maintained. In the same semiconductor film as a thin-film-transistor (TFT) consisting of a pixel formed over an insulating substrate constituting a pixel, plural photo-sensors composed of a TFT for detecting light which has different detecting wavelength bands, and a signal processing circuit for generating a signal which controls the brightness of the pixel on the basis of the output of the photo-sensor are formed. The photo-sensor detects light energy of different wavelength bands by using a filter having a different film thickness of the semiconductor film or a different light transmission band. Ambient illuminance is detected by processing the output of each sensor in the signal processing circuit. The detected signal is fed back to the brightness control of the pixel.
    • 具有照度传感器的图像显示装置,其中保持包装成本,由包装引起的机械可靠性和产品产量。 在与由构成像素的绝缘基板上形成的像素构成的薄膜晶体管(TFT)相同的半导体膜中,由用于检测具有不同检测波长带的光的TFT构成的多个光电传感器以及信号处理 形成用于基于光传感器的输出来生成控制像素的亮度的信号的电路。 光传感器通过使用具有不同的半导体膜的膜厚的滤光器或不同的透光带来检测不同波长带的光能。 通过处理信号处理电路中的每个传感器的输出来检测环境照度。 检测到的信号被反馈到像素的亮度控制。